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1. 发明授权

US06733656B2 Voltammetric reference electrode calibration 有权
标题翻译：伏安参考电极校准
公开(公告)号：US06733656B2
公开(公告)日：2004-05-11
申请号：US10115539
申请日：2002-04-03
申请人： Gene Chalyt , Peter Bratin , Michael Pavlov , Alex Kogan , Michael James Perpich
发明人： Gene Chalyt , Peter Bratin , Michael Pavlov , Alex Kogan , Michael James Perpich
IPC分类号： G01N2748
CPC分类号： C25D21/12 , G01N27/4163
摘要： In the present invention, the test reference electrode used for voltammetric analysis of a plating bath is calibrated relative to the zero-current point between metal plating and stripping at a rotating platinum disk electrode in the plating bath supporting electrolyte. This calibration is readily performed during the normal course of cyclic voltammetric stripping (CVS) or cyclic pulse voltammetric stripping (CPVS) plating bath analysis the need for additional instrumentation or removal of the test reference electrode from the analysis equipment. Automatic calibration of the reference electrode enabled by the present invention, saves labor, time and expense, and minimizes errors in the plating bath analysis.
摘要翻译：在本发明中，用于电镀液伏安分析的试验参比电极相对于在电镀浴支持电解质中的旋转铂盘电极处的金属电镀和剥离之间的零电流点进行校准。在循环伏安剥离（CVS）或循环脉冲伏安剥离（CPVS）电镀浴分析的正常过程中，这种校准很容易进行，需要额外的仪器仪表或从分析设备中去除测试参比电极。通过本发明实现的参考电极的自动校准，节省人力，时间和成本，并最大限度地减少电镀浴分析中的误差。

2. 发明授权

US06529841B2 Apparatus and method for conductivity measurement including probe contamination compensation 有权
标题翻译：电导率测量的装置和方法，包括探头污染补偿
公开(公告)号：US06529841B2
公开(公告)日：2003-03-04
申请号：US09841783
申请日：2001-04-24
申请人： Andrew J. Cocking , Wai Yin Cedric Chan , James W. Livingston
发明人： Andrew J. Cocking , Wai Yin Cedric Chan , James W. Livingston
IPC分类号： G01N2748
CPC分类号： D06F39/004 , A47L15/0049 , A47L15/0055 , A47L15/4297 , A47L2401/30 , A47L2501/26 , G01N27/045 , G01N27/06 , Y10T137/6977
摘要： A conductivity measurement system provides one or more DC pulses to first and second electrodes submerged in an aqueous solution such as, for instance, the wash water of an industrial dishwasher. The voltage at the first electrode is measured at a sequence of at least three predetermined times after initiation of one of the DC pulse. A non-linear curve fitting function is applied to the sequence of at least three voltage measurements to calculate the voltage at the first electrode at the beginning of the DC pulse(s), commonly denoted as being at time t=0. The resulting calculated voltage at time t=0 is then used to calculate the conductivity of the solution, and/or to control operation of the a chemical dispenser, and/or to perform another predetermined system analysis or system control function. In addition, the difference between two of the measured voltages, such as the first and second measured voltages, is compared to a predetermined threshold value to determine whether the electrodes are so contaminated that polarization compensation is no longer feasible, thereby signaling that the electrodes should be cleaned or replaced.
摘要翻译：电导率测量系统为浸在水溶液例如工业洗碗机的洗涤水中的第一和第二电极提供一个或多个DC脉冲。在开始DC脉冲之一后，以至少三个预定时间的顺序测量第一电极处的电压。将非线性曲线拟合函数应用于至少三个电压测量的序列，以计算在DC脉冲开始处的第一电极处的电压，通常表示为在时间t = 0。然后使用时间t = 0时产生的计算电压来计算溶液的电导率和/或控制化学分配器的操作和/或执行另一预定系统分析或系统控制功能。此外，将两个测量电压（例如第一和第二测量电压）之间的差异与预定阈值进行比较，以确定电极是否被污染，使得极化补偿不再可行，从而表明电极应该被清洁或更换。

3. 发明授权

US06551479B1 Apparatus for controlling and/or measuring additive concentration in an electroplating bath 有权
公开(公告)号：US06551479B1
公开(公告)日：2003-04-22
申请号：US09572603
申请日：2000-05-17
申请人： Lyndon W. Graham , Thomas C. Taylor , Thomas L. Ritzdorf , Fredrick A. Lindberg , Bradley C. Carpenter
发明人： Lyndon W. Graham , Thomas C. Taylor , Thomas L. Ritzdorf , Fredrick A. Lindberg , Bradley C. Carpenter
IPC分类号： G01N2748
CPC分类号： G01N27/48 , G01N27/4161
摘要： A method for measuring a target constituent of an electroplating solution using an electroanalytical technique is set forth in which the electroplating solution includes one or more constituents whose by-products skew an initial electrical response to an energy input of the electroanalytical technique. The method comprises a first step in which an electroanalytical measurement cycle of the target constituent is initiated by providing an energy input to a pair of electrodes disposed in the electroplating solution. The energy input to the pair of electrodes is provided for at least a predetermined time period corresponding to a time period in which the electroanalytical measurement cycle reaches a steady-state condition. In a subsequent step, an electroanalytical measurement of the energy output of the electroanalytical technique is taken after the electroanalytical measurement cycle has reached the steady-state condition. The electroanalytical measurement is then used to determine an amount of the target constituent in the electroplating solution. An automatic dosing system that includes the foregoing method and/or one or more known electroanalytical techniques in a close-loop system is also set forth.

4. 发明授权

US06365033B1 Methods for controlling and/or measuring additive concentration in an electroplating bath 有权
标题翻译：用于控制和/或测量电镀浴中的添加剂浓度的方法
公开(公告)号：US06365033B1
公开(公告)日：2002-04-02
申请号：US09387084
申请日：1999-08-31
申请人： Lyndon W. Graham , Thomas C. Taylor , Thomas L. Ritzdorf , Fredrick A. Lindberg , Bradley C. Carpenter
发明人： Lyndon W. Graham , Thomas C. Taylor , Thomas L. Ritzdorf , Fredrick A. Lindberg , Bradley C. Carpenter
IPC分类号： G01N2748
CPC分类号： G01N27/48 , G01N27/4161
摘要： A method for measuring a target constituent of an electroplating solution using an electroanalytical technique is set forth in which the electroplating solution includes one or more constituents whose by-products skew an initial electrical response to an energy input of the electroanalytical technique. The method comprises a first step in which an electroanalytical measurement cycle of the target constituent is initiated by providing an energy input to a pair of electrodes disposed in the electroplating solution. The energy input to the pair of electrodes is provided for at least a predetermined time period corresponding to a time period in which the electroanalytical measurement cycle reaches a steady-state condition. In a subsequent step, an electroanalytical measurement of the energy output of the electroanalytical technique is taken after the electroanalytical measurement cycle has reached the steady-state condition. The electroanalytical measurement is then used to determine an amount of the target constituent in the electroplating solution. An automatic dosing system that includes the foregoing method and/or one or more known electroanalytical techniques in a close-loop system is also set forth.
摘要翻译：提出了一种使用电分析技术测量电镀溶液的目标成分的方法，其中电镀溶液包括一种或多种成分，其中副产物偏置对电分析技术的能量输入的初始电响应。该方法包括第一步骤，其中通过向布置在电镀溶液中的一对电极提供能量输入来启动目标成分的电分析测量循环。输入到该对电极的能量被提供至少一个对应于电分析测量周期达到稳态条件的时间段的预定时间段。在随后的步骤中，在电分析测量循环达到稳态条件之后，进行电分析技术的能量输出的电分析测量。然后使用电分析测量来确定电镀溶液中的目标成分的量。还提出了一种包括前述方法和/或闭环系统中的一种或多种已知电分析技术的自动计量系统。

5. 发明授权

US06416651B1 Multi-electrode composition measuring device and method 有权
标题翻译：多电极组成测量装置及方法
公开(公告)号：US06416651B1
公开(公告)日：2002-07-09
申请号：US09258550
申请日：1999-02-26
申请人： Ord Millar
发明人： Ord Millar
IPC分类号： G01N2748
CPC分类号： G01N27/49
摘要： The Applicant's invention comprises an apparatus and method for determining the amount of one or more components in a pulping liquor. At a first electrode, a varying voltage is supplied in a voltage range including the half-wave potential of each component of a liquor to be measured, and accounting for variations in the half-wave potential caused by changing process parameters. At a second electrode, which is roughly ⅓ to ¼ the size of the first electrode, the derivative of current intensity is monitored near the known half-wave potential for the various liquor components. Using curve-fitting means, the derivative of current intensity and selected other process condition data is used to determine concentrations of the various liquor components.
摘要翻译：申请人的发明包括用于确定制浆液中一种或多种组分的量的装置和方法。在第一电极处，在包括要测量的液体的每个组分的半波电位的电压范围内提供变化的电压，并且考虑由改变的工艺参数引起的半波电位的变化。在大约为第一电极尺寸的1/3至1/4的第二电极处，在各种液体组分的已知半波电位附近监测电流强度的导数。使用曲线拟合方法，使用电流强度的导数和选定的其他工艺条件数据来确定各种液体组分的浓度。

6. 发明授权

US06223129B1 Apparatus and method for conductivity measurement including probe contamination compensation 失效
标题翻译：电导率测量的装置和方法，包括探头污染补偿
公开(公告)号：US06223129B1
公开(公告)日：2001-04-24
申请号：US09078400
申请日：1998-05-13
申请人： Wai Yin Cedric Chan , James W. Livingston
发明人： Wai Yin Cedric Chan , James W. Livingston
IPC分类号： G01N2748
CPC分类号： G01N27/06 , A47L15/4297 , Y10T137/7306
摘要： A conductivity measurement system provides one or more DC pulses to first and second electrodes submerged in an aqueous solution such as, for instance, the wash water of an industrial dishwasher. The voltage at the first electrode is measured at first and second predetermined times after initiation of DC pulse(s). Linear regression of the first and second measured voltages is used to calculate the voltage at the first electrode at the beginning of the DC pulse(s), i.e., at time t=0. The resulting voltage at time t=0 is then used to calculate the conductivity of the solution, thereby compensating for the effects of polarization. Further, the difference between the respective first and second measured voltages is compared to a predetermined threshold value to determine whether the electrodes are so contaminated that polarization compensation is no longer feasible, thereby signaling that the electrodes should be cleaned or replaced.
摘要翻译：电导率测量系统为浸在水溶液例如工业洗碗机的洗涤水中的第一和第二电极提供一个或多个DC脉冲。在开始DC脉冲之后的第一和第二预定时间测量第一电极处的电压。使用第一和第二测量电压的线性回归来计算在DC脉冲开始时的第一电极处的电压，即在时间t = 0。然后使用时间t = 0时产生的电压来计算溶液的电导率，从而补偿极化的影响。此外，将第一和第二测量电压之间的差异与预定阈值进行比较，以确定电极是否被污染，使得极化补偿不再可行，从而表明电极应该被清洁或更换。

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