专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20080044740A1 PHOTOMASK HAVING HAZE REDUCTION LAYER 审中-公开
标题翻译：具有减少雾度的薄膜
公开(公告)号：US20080044740A1
公开(公告)日：2008-02-21
申请号：US11466002
申请日：2006-08-21
申请人： Jiin-Hong Lin , Chin-Wang Hu , Ming-Tao Ho
发明人： Jiin-Hong Lin , Chin-Wang Hu , Ming-Tao Ho
IPC分类号： C23C14/00 , G21G5/00 , A61N5/00 , C23C14/32 , G03F1/00
CPC分类号： G03F1/48
摘要： A photomask is fabricated to have a patterned surface and a transparent layer formed on the patterned surface.
摘要翻译：制造光掩模以具有图案化表面和形成在图案化表面上的透明层。

2. 发明申请

US20120081226A1 BURGLARPROOF SECURITY SYSTEM AND INSTALLING METHOD THEREOF 审中-公开
标题翻译：防爆安全系统及其安装方法
公开(公告)号：US20120081226A1
公开(公告)日：2012-04-05
申请号：US12898234
申请日：2010-10-05
申请人： Chin-Wang Hu
发明人： Chin-Wang Hu
IPC分类号： G08B13/00 , H01R43/00
CPC分类号： G08B13/26 , G08B13/04 , Y10T29/49117
摘要： A burglarproof security system includes a substrate, a conducting wire layer, a sensing control unit, an alarm device and a power supply. The conducting wire layer is disposed on the substrate, and includes plural conducting wires. The plural conducting wires collectively define either a resistive sensing circuit or a capacitive sensing circuit. The sensing control unit is electrically connected with the plural conducting wires of the conducting wire layer for controlling and selectively switching the plural conducting wires to define either the resistive sensing circuit or the capacitive sensing circuit, and detecting the resistive sensing circuit or the capacitive sensing circuit, thereby generating a detecting signal. When the detecting signal from the sensing control unit is received by the alarm device, the alarm device generates a warning signal. The power supply is electrically connected with the sensing control unit and the alarm device for providing electric power.
摘要翻译：防盗安全系统包括基板，导线层，感测控制单元，报警装置和电源。导线层设置在基板上，并且包括多根导线。多个导线共同地限定电阻感测电路或电容感测电路。感测控制单元与导线层的多个导线电连接，用于控制和选择性地切换多个导线以限定电阻感测电路或电容感测电路，并且检测电阻感测电路或电容感测电路，从而产生检测信号。当来自感测控制单元的检测信号被报警装置接收时，报警装置产生报警信号。电源与检测控制单元和用于提供电力的报警装置电连接。

3. 发明授权

US06841311B1 Cleaning process for phase shift masks 失效
标题翻译：相移掩模的清洁过程
公开(公告)号：US06841311B1
公开(公告)日：2005-01-11
申请号：US10099029
申请日：2002-03-15
申请人： Same-Ting Chen , Cheng-Shien Lee , Chin-Wang Hu , Chieh-Yuan Cheng , Hsiang-Chien Hsu , Tzy-Ying Lin , Wen-Rong Huang
发明人： Same-Ting Chen , Cheng-Shien Lee , Chin-Wang Hu , Chieh-Yuan Cheng , Hsiang-Chien Hsu , Tzy-Ying Lin , Wen-Rong Huang
IPC分类号： G03F1/26 , G03F1/82 , G03F9/00 , H01L21/00
CPC分类号： G03F1/82 , G03F1/26
摘要： A new sequence and chemical composition for cleaning the surface of a halftone shift masks that use MoSiON as shifter material is provided. For purposes of repair or rework, the pellicle is removed from the mask so that the mask can be accessed. After the rework or repair has been completed, a new clean process is performed, for the new clean process the sequence of steps that is conventionally performed has been modified. After the new clean process has been completed, the pellicle is reinstalled over the surface of the mask.
摘要翻译：提供了一种用于清洁使用MoSiON作为移位材料的半色调移位掩模的表面的新的顺序和化学组成。为了维修或返工的目的，将防护薄膜组件从掩模中取出，以便可以访问掩模。返修或修理完成后，执行一个新的清洁过程，对于新的清洁过程，常规执行的步骤顺序已被修改。新的清洁过程完成后，防护薄膜组件重新安装在面罩的表面上。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式