会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • MEMS package structure
    • MEMS封装结构
    • US08829628B2
    • 2014-09-09
    • US13535682
    • 2012-06-28
    • Hsin-Hui HsuSheng-Ta LeeChuan-Wei Wang
    • Hsin-Hui HsuSheng-Ta LeeChuan-Wei Wang
    • H01L23/29H01L23/31B81C1/00
    • B81B7/0058B81B7/0006B81B2201/0264B81C1/00246B81C1/00293B81C2203/0136B81C2203/0145B81C2203/0714B81C2203/0735
    • A MEMS package structure, including a substrate, an interconnecting structure, an upper metallic layer, a deposition element and a packaging element is provided. The interconnecting structure is disposed on the substrate. The MEMS structure is disposed on the substrate and within a first cavity. The upper metallic layer is disposed above the MEMS structure and the interconnecting structure, so as to form a second cavity located between the upper metallic layer and the interconnecting structure and communicates with the first cavity. The upper metallic layer has at least a first opening located above the interconnecting structure and at least a second opening located above the MEMS structure. Area of the first opening is greater than that of the second opening. The deposition element is disposed above the upper metallic layer to seal the second opening. The packaging element is disposed above the upper metallic layer to seal the first opening.
    • 提供了包括基板,互连结构,上金属层,沉积元件和封装元件的MEMS封装结构。 互连结构设置在基板上。 MEMS结构设置在基板上并在第一腔内。 上金属层设置在MEMS结构和互连结构之上,以便形成位于上金属层和互连结构之间的第二腔,并与第一腔连通。 上金属层具有位于互连结构上方的至少第一开口和位于MEMS结构上方的至少第二开口。 第一开口的面积大于第二开口的面积。 沉积元件设置在上金属层上方以密封第二开口。 包装元件设置在上金属层上方以密封第一开口。
    • 3. 发明授权
    • MEMS sensing device and method for the same
    • MEMS感测装置及其方法相同
    • US08772885B2
    • 2014-07-08
    • US13948128
    • 2013-07-22
    • Chuan-Wei WangMing-Han Tsai
    • Chuan-Wei WangMing-Han Tsai
    • H01L29/84
    • B81B3/0021B81C1/00333B81C2203/0118B81C2203/0735G01L9/0073
    • The present invention discloses a MEMS sensing device which comprises a substrate, a MEMS device region, a film, an adhesive layer, a cover, at least one opening, and a plurality of leads. The substrate has a first surface and a second surface opposite the first surface. The MEMS device region is on the first surface, and includes a chamber. The film is overlaid on the MEMS device region to seal the chamber as a sealed space. The cover is mounted on the MEMS device region and adhered by the adhesive layer. The opening is on the cover or the adhesive layer, allowing the pressure of the air outside the device to pressure the film. The leads are electrically connected to the MEMS device region, and extend to the second surface.
    • 本发明公开了一种MEMS感测装置,其包括衬底,MEMS器件区域,膜,粘合剂层,盖,至少一个开口和多个引线。 衬底具有与第一表面相对的第一表面和第二表面。 MEMS器件区域在第一表面上,并且包括腔室。 膜被覆盖在MEMS器件区域上,以密封腔室作为密封空间。 盖安装在MEMS器件区域上,并通过粘合剂层粘合。 开口在盖子或粘合剂层上,允许装置外的空气的压力对膜施加压力。 引线电连接到MEMS器件区域,并延伸到第二表面。
    • 7. 发明授权
    • Micro electronic device and method for fabricating micro electromechanical system resonator thereof
    • 微电子器件及其制造微机电系统谐振器的方法
    • US08329492B2
    • 2012-12-11
    • US12819278
    • 2010-06-21
    • Chuan-Wei WangHsin-Hui HsuSheng-Ta Lee
    • Chuan-Wei WangHsin-Hui HsuSheng-Ta Lee
    • H01L21/467
    • B81C1/00246B81B2201/0271B81C1/00182B81C2203/0714H03H3/0073
    • A method for fabricating a MEMS resonator is provided. A stacked main body including a silicon substrate, a plurality of metallic layers and an isolation layer is formed and has a first etching channel extending from the metallic layers into the silicon substrate. The isolation layer is filled in the first etching channel. The stacked main body also has a predetermined suspended portion. Subsequently, a portion of the isolation layer is removed so that a second etching channel is formed and the remained portion of the isolation layer covers an inner sidewall of the first etching channel. Afterwards, employing the isolation layer that covers the inner sidewall of the first etching channel as a mask, an isotropic etching process through the second etching channel is applied to the silicon substrate, thereby forming the MEMS resonator suspending above the silicon substrate. The method for fabricating MEMS resonator can be integrated with the process of fabricating the CMOS circuit, thereby the process of fabricating a microelectronic device can be simplified and the cost of fabricating a micro electronic device can be reduced. A micro electronic device is also provided in the present invention.
    • 提供了一种用于制造MEMS谐振器的方法。 形成包括硅衬底,多个金属层和隔离层的堆叠主体,并且具有从金属层延伸到硅衬底中的第一蚀刻通道。 隔离层填充在第一蚀刻通道中。 堆叠的主体还具有预定的悬挂部分。 随后,去除隔离层的一部分,使得形成第二蚀刻通道,并且隔离层的剩余部分覆盖第一蚀刻通道的内侧壁。 然后,使用覆盖第一蚀刻通道的内侧壁的隔离层作为掩模,通过第二蚀刻通道的各向同性蚀刻工艺被施加到硅衬底,从而形成悬浮在硅衬底之上的MEMS谐振器。 制造MEMS谐振器的方法可以与制造CMOS电路的过程集成,从而可以简化微电子器件的制造工艺,并且可以降低制造微电子器件的成本。 本发明还提供微电子装置。
    • 8. 发明申请
    • MEMS PACKAGE STRUCTURE
    • MEMS封装结构
    • US20120267732A1
    • 2012-10-25
    • US13535682
    • 2012-06-28
    • Hsin-Hui HSUSheng-Ta LEEChuan-Wei WANG
    • Hsin-Hui HSUSheng-Ta LEEChuan-Wei WANG
    • H01L29/84
    • B81B7/0058B81B7/0006B81B2201/0264B81C1/00246B81C1/00293B81C2203/0136B81C2203/0145B81C2203/0714B81C2203/0735
    • A MEMS package structure, including a substrate, an interconnecting structure, an upper metallic layer, a deposition element and a packaging element is provided. The interconnecting structure is disposed on the substrate. The MEMS structure is disposed on the substrate and within a first cavity. The upper metallic layer is disposed above the MEMS structure and the interconnecting structure, so as to form a second cavity located between the upper metallic layer and the interconnecting structure and communicates with the first cavity. The upper metallic layer has at least a first opening located above the interconnecting structure and at least a second opening located above the MEMS structure. Area of the first opening is greater than that of the second opening. The deposition element is disposed above the upper metallic layer to seal the second opening. The packaging element is disposed above the upper metallic layer to seal the first opening.
    • 提供了包括基板,互连结构,上金属层,沉积元件和封装元件的MEMS封装结构。 互连结构设置在基板上。 MEMS结构设置在基板上并在第一腔内。 上金属层设置在MEMS结构和互连结构之上,以便形成位于上金属层和互连结构之间的第二腔,并与第一腔连通。 上金属层具有位于互连结构上方的至少第一开口和位于MEMS结构上方的至少第二开口。 第一开口的面积大于第二开口的面积。 沉积元件设置在上金属层上方以密封第二开口。 包装元件设置在上金属层上方以密封第一开口。