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    • 2. 发明授权
    • Laser diodes comprising QWI output window and waveguide areas and methods of manufacture
    • 包括QWI输出窗口和波导区域的激光二极管以及制造方法
    • US08198112B2
    • 2012-06-12
    • US12760092
    • 2010-04-14
    • Chwan-Yang ChangChien-Chih ChenMartin Hai HuHong Ky NguyenChung-En Zah
    • Chwan-Yang ChangChien-Chih ChenMartin Hai HuHong Ky NguyenChung-En Zah
    • H01L21/00H01L31/0256
    • B82Y20/00H01S5/0092H01S5/06256H01S5/162H01S2302/00
    • In accordance with one embodiment of the present disclosure, a process of manufacturing a semiconductor laser diode comprising a gain section, a QWI output window, and QWI waveguide areas is provided. The QWI waveguide areas are fabricated using quantum well intermixing and define a QWI waveguide portion in the QWI output window of the laser diode. The QWI output window is transparent to the lasing wavelength λL. The QWI waveguide portion in the QWI output window is characterized by an energy bandgap that is larger than an energy bandgap of the gain section such that the band gap wavelength λQWI in the QWI waveguide portion and the QWI output window is shorter than the lasing wavelength λL. The QWI output window is characterized by a photoluminescent wavelength λPL. The manufacturing process comprises a λPL screening protocol that determines laser diode reliability based on a comparison of the lasing wavelength λL and the photoluminescent wavelength λPL of the QWI output window. Additional embodiments are disclosed and claimed.
    • 根据本公开的一个实施例,提供了制造包括增益部分,QWI输出窗口和QWI波导区域的半导体激光二极管的工艺。 使用量子阱混合制造QWI波导区域,并在激光二极管的QWI输出窗口中定义QWI波导部分。 QWI输出窗口对于激光波长λL是透明的。 QWI输出窗口中的QWI波导部分的特征在于能量带隙大于增益部分的能带隙,使得QWI波导部分和QWI输出窗口中的带隙波长λQWI比激光波长λL短 。 QWI输出窗口的特征在于光致发光波长λPL。 该制造工艺包括λPL筛选方案,其基于激光波长λL和QWI输出窗口的光致发光波长λPL的比较来确定激光二极管的可靠性。 公开并要求保护附加实施例。
    • 3. 发明申请
    • Laser Diodes Comprising QWI Output Window and Waveguide Areas and Methods of Manufacture
    • 包括QWI输出窗口和波导区域的激光二极管和制造方法
    • US20110255567A1
    • 2011-10-20
    • US12760092
    • 2010-04-14
    • Chwan-Yang ChangChien-Chih ChenMartin Hai HuHong Ky NguyenChung-En Zah
    • Chwan-Yang ChangChien-Chih ChenMartin Hai HuHong Ky NguyenChung-En Zah
    • H01S5/34H01L21/66H01L21/02
    • B82Y20/00H01S5/0092H01S5/06256H01S5/162H01S2302/00
    • In accordance with one embodiment of the present disclosure, a process of manufacturing a semiconductor laser diode comprising a gain section, a QWI output window, and QWI waveguide areas is provided. The QWI waveguide areas are fabricated using quantum well intermixing and define a QWI waveguide portion in the QWI output window of the laser diode. The QWI output window is transparent to the lasing wavelength λL. The QWI waveguide portion in the QWI output window is characterized by an energy bandgap that is larger than an energy bandgap of the gain section such that the band gap wavelength λQWI in the QWI waveguide portion and the QWI output window is shorter than the lasing wavelength λL. The QWI output window is characterized by a photoluminescent wavelength λPL. The manufacturing process comprises a λPL screening protocol that determines laser diode reliability based on a comparison of the lasing wavelength λL and the photoluminescent wavelength λPL of the QWI output window. Additional embodiments are disclosed and claimed.
    • 根据本公开的一个实施例,提供了制造包括增益部分,QWI输出窗口和QWI波导区域的半导体激光二极管的工艺。 使用量子阱混合制造QWI波导区域,并在激光二极管的QWI输出窗口中定义QWI波导部分。 QWI输出窗口对于激光波长λL是透明的。 QWI输出窗口中的QWI波导部分的特征在于能量带隙大于增益部分的能带隙,使得QWI波导部分和QWI输出窗口中的带隙波长λQWI比激光波长λL短 。 QWI输出窗口的特征在于光致发光波长λPL。 该制造工艺包括λPL筛选方案,其基于激光波长λL和QWI输出窗口的光致发光波长λPL的比较来确定激光二极管的可靠性。 公开并要求保护附加实施例。
    • 6. 发明授权
    • Thermal compensation in semiconductor lasers
    • 半导体激光器的热补偿
    • US07480317B2
    • 2009-01-20
    • US11526988
    • 2006-09-26
    • Martin Hai HuDaniel Ohen RickettsChung-En Zah
    • Martin Hai HuDaniel Ohen RickettsChung-En Zah
    • H01S3/10H01S3/04
    • H01S5/06804H01S5/0612H01S5/06256
    • The present invention relates to relates generally to semiconductor lasers and, more particularly, to schemes for measuring and controlling the temperature of semiconductor lasers and schemes for wavelength stabilization of semiconductor lasers. According to one embodiment of the present invention, a method of driving a temperature control mechanism in a semiconductor laser is provided. According to the method, signals representing an operating temperature of the semiconductor laser and ambient temperature are generated and a target laser operating temperature that is a function of the ambient temperature signal is established. A temperature control mechanism of the semiconductor laser is then driven to increase a degree of correlation between the operating temperature signal and the target laser operating temperature. Additional embodiments are disclosed and claimed.
    • 本发明一般涉及半导体激光器,更具体地,涉及用于测量和控制半导体激光器的温度和半导体激光器的波长稳定化方案的方案。 根据本发明的一个实施例,提供了一种驱动半导体激光器中的温度控制机构的方法。 根据该方法,产生表示半导体激光器的工作温度和环境温度的信号,建立作为环境温度信号的函数的目标激光器工作温度。 然后驱动半导体激光器的温度控制机构以增加工作温度信号和目标激光器工作温度之间的相关程度。 公开并要求保护附加实施例。
    • 7. 发明申请
    • Methods of fabricating metal contact structures for laser diodes using backside UV exposure
    • 使用背面UV曝光制造激光二极管的金属接触结构的方法
    • US20080299495A1
    • 2008-12-04
    • US11809117
    • 2007-05-31
    • Jingqun XiChung-En Zah
    • Jingqun XiChung-En Zah
    • G03C5/00
    • G03F7/20H01S5/0425
    • Methods of fabricating a metal contact structure for a laser diodes are provided, wherein the method comprises providing a UV transparent semiconductor substrate, a UV transparent semiconductor epilayer defining a ridge disposed between etched epilayer edges, the epilayer being disposed over the UV transparent semiconductor substrate, and a UV opaque metal layer disposed over the epilayer ridge, applying at least one photoresist layer (positive photoresist, image reversal photoresist, or negative photoresist) over the opaque metal layer and epilayer edges, and selectively developing regions of the photoresist layer via backside exposure to UV light with the opaque metal layer used as a photolithographic mask.
    • 提供了制造用于激光二极管的金属接触结构的方法,其中所述方法包括提供UV透明半导体衬底,UV透明半导体外延层,限定设置在蚀刻的外延层边缘之间的脊,所述外延层设置在所述UV透明半导体衬底上, 以及设置在所述外延层脊上的UV不透明金属层,在所述不透明金属层和外延层边缘上施加至少一个光致抗蚀剂层(正性光致抗蚀剂,图像反转光致抗蚀剂或负性光刻胶),以及通过背面曝光选择性地显影所述光致抗蚀剂层的区域 以不透明金属层作为光刻掩模使用UV光。
    • 8. 发明授权
    • Method of manufacturing an InP based vertical cavity surface emitting laser and device produced therefrom
    • 制造基于InP的垂直腔表面发射激光器的方法及其制造的装置
    • US07072376B2
    • 2006-07-04
    • US10944649
    • 2004-09-16
    • Catherine G CaneauBenjamin L HallNobuhiko NishiyamaChung-En Zah
    • Catherine G CaneauBenjamin L HallNobuhiko NishiyamaChung-En Zah
    • H01S3/08H01S5/00
    • H01S5/183B82Y20/00H01S5/34306H01S5/34313
    • A method of fabricating an indium phosphide-based vertical cavity surface emitting laser (VCSEL) having a high reflectivity distributed Bragg reflector (DBR) that is particularly adapted for emitting a light having a center wavelength of around 1.30 micrometers. The method includes the steps of selecting a specific operating wavelength, determining the photon energy corresponding to the selected operating wavelength, selecting a maximum operating temperature in degrees Centigrade, and fabricating at least half of the high index layers of the distributed Bragg reflector (DBR) of the VCSEL from AlGaInAs or other material that can be epitaxially grown on the InP substrate to have a band gap equal to or greater than the sum of the photon energy (in milli-electron volts) plus the sum of the maximum operating temperature plus 110 divided by 1.96. The manufacture of the high index layers with such a band gap creates a sufficient difference in the indices of refraction of the alternating layers in the DBR, while keeping optical absorption low to maintain the reflectivity at least up to the desired maximum temperature, and obviates the need for using a DBR either bonded to the InP substrate, or grown metamorphically on it.
    • 一种制造具有高反射率分布布拉格反射器(DBR)的磷化铟基垂直腔表面发射激光器(VCSEL)的方法,其特别适用于发射中心波长约1.30微米的光。 该方法包括以下步骤:选择特定的工作波长,确定对应于所选择的工作波长的光子能量,以摄氏度选择最大工作温度,以及制造分布式布拉格反射器(DBR)的至少一半的高折射率层, 的来自AlGaInAs的VCSEL或可以在InP衬底上外延生长的其它材料,以具有等于或大于光子能量(以毫电子伏特)加上最大工作温度加和110之和的带隙 除以1.96。 具有这种带隙的高折射率层的制造在DBR中的交替层的折射率产生足够的差异,同时保持光吸收低以保持反射率至少达到期望的最高温度,并且消除 需要使用结合到InP底物的DBR,或者在其上变质生长。
    • 9. 发明授权
    • Passivation of semiconductor laser facets
    • 钝化半导体激光刻面
    • US06618409B1
    • 2003-09-09
    • US09564015
    • 2000-05-03
    • Martin (Hai) HuLyle D. KinneyEmmannuel C. OnyiriukaMike X. OuyangChung-en Zah
    • Martin (Hai) HuLyle D. KinneyEmmannuel C. OnyiriukaMike X. OuyangChung-en Zah
    • H01S500
    • H01L33/44H01S5/028H01S5/0282
    • A method of passivating an edge-emitting semiconductor diode laser and the resultant product. Laser bars are cleaved in air from a wafer containing multiple laser bars. The bars are placed into a vacuum processing chamber in which two steps are performed without breaking vacuum. The first step includes cleaning the facets including removing the native oxide by, for example, a low-energy ion beam or by an electron cyclotron resonance (EAR) plasma containing hydrogen and possibly argon or xenon with the bars being negatively biased. The second step includes coating the cleaned facets with a thin passivation layer of hydrogenated amorphous silicon (a-Si:H), whereby the facets are coating by the passivation layer without an intervening oxide. A low oxygen partial pressure of no more than 10−8 Torr is maintained between the cleaning and deposition, both of which preferably are done in the same chamber. Also preferably, anti-reflective or highly reflective coatings are deposited on the facets without returning the laser bars to air.
    • 钝化边缘发射半导体二极管激光器和所得产物的方法。 激光棒在含有多个激光棒的晶片的空气中被切割。 将条放置在真空处理室中,其中执行两个步骤而不破坏真空。 第一步包括清洁小平面,包括通过例如低能离子束或通过电子回旋共振(EAR)等离子体除去天然氧化物,所述等离子体包含氢气和可能的氩或氙气,其中所述条被负偏压。 第二步包括使用氢化非晶硅(a-Si:H)的薄钝化层涂覆清洁的小平面,由此该面被钝化层涂覆而没有中间氧化物。 在清洁和沉积之间保持不超过10-8托的低氧分压,这两者优选在相同的室中进行。 还优选地,防反射或高反射涂层沉积在刻面上,而不将激光条返回到空气中。
    • 10. 发明授权
    • Fiber-optics based micro-photoluminescence system
    • 基于光纤的微光致发光系统
    • US06075592A
    • 2000-06-13
    • US174729
    • 1998-10-19
    • Sonali BanerjeeChung-en Zah
    • Sonali BanerjeeChung-en Zah
    • G01J1/58G01J3/44G01N21/64G01R31/26G01R31/265G01J3/30
    • G01J3/4406G01J1/58G01N21/6489G01R31/2648G01R31/2656
    • Spatially resolved photoluminescence (PL) apparatus is used for the non-destructive characterization of a semiconductor sample. PL excitation from a diode laser is transmitted through a dichroic coupler and, in turn, over a fiber to a fiber collimator wherein the laser light is collimated into a pump beam prior to entering an air path. The air path is composed primarily of an objective lens. The objective lens focuses the pump beam on the sample surface. The photoluminescence signal emitted by the sample travels the same path but in the opposite direction as the pump beam and is collected by the same fiber as a reflected signal. The dichroic fiber coupler is used to separate the return signal from the pump beam with a low insertion loss for each beam. The return PL signal is fed to an optical spectrum analyzer using a single mode fiber connected to the coupler. The sample is placed on a rotational stage capable of x, y and z movement under computer control.
    • 空间分辨光致发光(PL)装置用于半导体样品的非破坏性表征。 来自二极管激光器的PL激发通过二向色耦合器传输,并且依次通过光纤到达光纤准直器,其中激光在进入空气路径之前被准直成泵浦光束。 空气路径主要由物镜组成。 物镜将泵浦光束聚焦在样品表面上。 由样品发射的光致发光信号行进与泵浦光束相同的路径,但是与反射信号相同的光纤收集。 二向色光纤耦合器用于将每个光束的反射信号与泵浦光束分离,具有低插入损耗。 使用连接到耦合器的单模光纤将返回PL信号馈送到光谱分析仪。 将样品放置在能够在计算机控制下进行x,y和z运动的旋转台上。