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    • 6. 发明申请
    • Enhanced P-Contacts For Light Emitting Devices
    • 用于发光设备的增强型P触点
    • US20110049469A1
    • 2011-03-03
    • US12553288
    • 2009-09-03
    • Rajaram BhatJerome NapieralaDmitry SizovJingqun XiChung-En Zah
    • Rajaram BhatJerome NapieralaDmitry SizovJingqun XiChung-En Zah
    • H01L33/00
    • H01L33/02H01L33/32H01L33/40
    • An optoelectronic light emitting semiconductor device is provided comprising an active region, a p-type Group III nitride layer, an n-type Group III nitride layer, a p-side metal contact layer, an n-side metal contact layer, and an undoped tunneling enhancement layer. The p-side metal contact layer is characterized by a work function W satisfying the following relation: W≦e−AFF±0.025 eV where e−AFF is the electron affinity of the undoped tunneling enhancement layer. The undoped tunneling enhancement layer and the p-type Group III nitride layer comprise conduction and valence energy bands. The top of the valence band V1 of the undoped tunneling enhancement layer is above the top of the valence band V2 of the p-type Group III nitride layer at the band offset interface to generate a capacity for a relatively high concentration of holes in the undoped tunneling enhancement layer at the band offset interface. Additional embodiments are disclosed and claimed.
    • 提供了一种光电子发光半导体器件,其包括有源区,p型III族氮化物层,n型III族氮化物层,p侧金属接触层,n侧金属接触层和未掺杂的 隧道增强层。 p侧金属接触层的特征在于满足以下关系的功函数W:W≦̸ e-AFF±0.025eV其中e-AFF是未掺杂的隧道增强层的电子亲和力。 未掺杂的隧道增强层和p型III族氮化物层包括导电和价态能带。 未掺杂的隧道增强层的价带V1的顶部在带偏移界面处高于p型III族氮化物层的价带V2的顶部,以产生未掺杂的较高浓度的孔的能力 隧道增强层在带偏移接口。 公开并要求保护附加实施例。