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    • 1. 发明申请
    • METHOD OF MANUFACTURING TFT SUBSTRATE AND TFT SUBSTRATE
    • 制造TFT基板和TFT基板的方法
    • US20100006839A1
    • 2010-01-14
    • US12499209
    • 2009-07-08
    • Yasuyoshi ItohYuichi MasutaniEiji ShibataKenichi Miyamoto
    • Yasuyoshi ItohYuichi MasutaniEiji ShibataKenichi Miyamoto
    • H01L23/00H01L21/336
    • H01L27/1288H01L27/1214H01L29/66765
    • In a method of manufacturing a TFT substrate in accordance with an exemplary aspect of the present invention, an intrinsic semiconductor film, an impurity semiconductor film, and a conductive film for source lines are formed in succession, and a resist having a thin-film portion and a thick-film portions is formed on the conductive film for source lines. Then, etching is performed by using the resist as a mask, and after that, a part of the conductive film for source lines is exposed by removing the thin-film portion of the resist. Next, the exposed conductive film for source lines is etched by using the thick-film portions of the resist a mask, so that the impurity semiconductor film is exposed. Then, by etching the exposed impurity semiconductor film, a back channel region of a TFT 108 is formed. Further, a dummy back channel region 18a, which is irrelevant to the operation of the finished product, is also formed in a portion other than the TFT 108 region.
    • 在根据本发明的示例性方面的制造TFT基板的方法中,依次形成本征半导体膜,杂质半导体膜和源极线用导电膜,并且具有薄膜部分的抗蚀剂 并且在用于源极线的导电膜上形成厚膜部分。 然后,通过使用抗蚀剂作为掩模进行蚀刻,之后,通过去除抗蚀剂的薄膜部分来露出用于源极线的导电膜的一部分。 接下来,通过使用抗蚀剂的掩膜的厚膜部分来蚀刻用于源极线的暴露的导电膜,使得杂质半导体膜暴露。 然后,通过蚀刻暴露的杂质半导体膜,形成TFT 108的背沟道区域。 此外,与TFT 108区域以外的部分也形成与成品的操作无关的虚拟背沟道区域18a。
    • 4. 发明授权
    • Noise reducing apparatus
    • 降噪装置
    • US5426704A
    • 1995-06-20
    • US94449
    • 1993-07-21
    • Manpei TamamuraEiji ShibataHiroshi IidakaManabu Nohara
    • Manpei TamamuraEiji ShibataHiroshi IidakaManabu Nohara
    • G10K11/178A61F11/06
    • G10K11/1784G10K2210/121G10K2210/1282G10K2210/3031G10K2210/3032G10K2210/3045G10K2210/3053G10K2210/3214G10K2210/3217G10K2210/512
    • A noise reducing apparatus which is particularly effective to reduce periodic noise with the construction simplified very much is disclosed. The noise reducing apparatus comprises a microphone, an adaptive filter for generating a signal to reduce noise inputted to the microphone, transfer characteristic compensation means for generating a signal to compensate for a transfer characteristic when the signal generated from the adaptive filter comes the microphone, a synchronizing pulse generation circuit for generating a pulse signal synchronized with the period of the noise, a pulse interval detection circuit for detecting the interval between pulses of the pulse signal, tap number changeover means for changing over the number of taps of the adaptive filter to a number with which the delay amount of a tapped delay line of the adaptive filter is equal to the interval detected by the pulse interval detection circuit, and a loudspeaker for generating sounds in response to the signal from the adaptive filter. Also a noise reducing apparatus suitable for with an automobile.
    • 公开了一种噪声降低装置,其特别有效地减少周期性噪声,同时非常简化。 降噪装置包括麦克风,用于产生信号以减少输入到麦克风的噪声的自适应滤波器,用于当从自适应滤波器产生的信号到达麦克风时产生信号以补偿传送特性的传输特性补偿装置, 同步脉冲发生电路,用于产生与噪声周期同步的脉冲信号;脉冲间隔检测电路,用于检测脉冲信号的脉冲间隔;抽头数转换装置,用于将自适应滤波器的抽头数转换为 自适应滤波器的抽头延迟线的延迟量等于由脉冲间隔检测电路检测的间隔的数字,以及响应于来自自适应滤波器的信号产生声音的扬声器。 还有一种适用于汽车的降噪装置。
    • 5. 发明授权
    • Automatic winding mechanism for a continuous sheet and the like
    • 自动上链机构连续片和类似
    • US5131592A
    • 1992-07-21
    • US471633
    • 1990-01-29
    • Eiji ShibataMotoshi Ohno
    • Eiji ShibataMotoshi Ohno
    • B65H19/28B65H19/29G03B27/32
    • G03B27/32B65H19/28B65H19/29G03B2227/325
    • An automatic winding mechanism which includes a rotatable winding shaft, a first guide including a circular first guide portion and a second guide including a substantially U-shaped second guide portion is disclosed. A leader portion of a continuous sheet fed by a pair of feed rollers is introduced along a circumferential surface of the winding shaft by the first and second guide portions which are disposed so as to enclose the winding shaft in cooperation with each other. The continuous sheet is then automatically wound on the winding shaft since the circumferential velocity of the winding shaft is set higher than the feeding speed of the feed rollers. The winding mechanism also includes a first sensor for sensing whether the winding shaft is in place. The winding mechanism is started if the winding shaft is sensed and the winding mechanism is prevented from starting if the winding shaft is not sensed. A second sensor for sensing that a leader portion of the continuous sheet is disposed between the feed rollers and the winding shaft is also provided. When the second sensor is provided, tapered flanges are formed on both ends of the winding shaft and are tapered toward its center. A nip of the sheet by the feed rollers is cancelled by a nip cancelling mechanism when a leader portion of the continuous sheet is sensed by the second sensor. As a result, the leader portion is permitted to move freely to a proper centered position on the winding shaft.
    • 8. 发明授权
    • Method of manufacturing TFT substrate and TFT substrate
    • 制造TFT基板和TFT基板的方法
    • US07960728B2
    • 2011-06-14
    • US12499209
    • 2009-07-08
    • Yasuyoshi ItohYuichi MasutaniEiji ShibataKenichi Miyamoto
    • Yasuyoshi ItohYuichi MasutaniEiji ShibataKenichi Miyamoto
    • H01L23/58H01L29/76H01L31/00H01L31/036H01L31/112
    • H01L27/1288H01L27/1214H01L29/66765
    • In a method of manufacturing a TFT substrate in accordance with an exemplary aspect of the present invention, an intrinsic semiconductor film, an impurity semiconductor film, and a conductive film for source lines are formed in succession, and a resist having a thin-film portion and a thick-film portions is formed on the conductive film for source lines. Then, etching is performed by using the resist as a mask, and after that, a part of the conductive film for source lines is exposed by removing the thin-film portion of the resist. Next, the exposed conductive film for source lines is etched by using the thick-film portions of the resist a mask, so that the impurity semiconductor film is exposed. Then, by etching the exposed impurity semiconductor film, a back channel region of a TFT 108 is formed. Further, a dummy back channel region 18a, which is irrelevant to the operation of the finished product, is also formed in a portion other than the TFT 108 region.
    • 在根据本发明的示例性方面的制造TFT基板的方法中,依次形成本征半导体膜,杂质半导体膜和源极线用导电膜,并且具有薄膜部分的抗蚀剂 并且在用于源极线的导电膜上形成厚膜部分。 然后,通过使用抗蚀剂作为掩模进行蚀刻,之后,通过去除抗蚀剂的薄膜部分来露出用于源极线的导电膜的一部分。 接下来,通过使用抗蚀剂的掩膜的厚膜部分来蚀刻用于源极线的暴露的导电膜,使得杂质半导体膜暴露。 然后,通过蚀刻暴露的杂质半导体膜,形成TFT 108的背沟道区域。 此外,与TFT 108区域以外的部分也形成与成品的操作无关的虚拟背沟道区域18a。
    • 9. 发明授权
    • Electronic device for cable broadcasting system
    • 电缆广播系统电子设备
    • US06640338B1
    • 2003-10-28
    • US09491554
    • 2000-01-26
    • Eiji Shibata
    • Eiji Shibata
    • H04B118
    • H04H20/02G06F11/0757H04H20/12H04H20/76H04H20/79
    • An electronic device for distributing broadcast signals in a cable broadcasting system includes a receiving circuit receiving broadcas signals including command signals and a microcomputer for controlling the electronic device according to the command signals. A watchdog timer counts an output s op period and compares with abnormality determining times. An output stop period is reset by a microcomputer pulse signal generated at constant intervals and representing normal operation of the microcomputer and an input stop period is reset by a periodic command pulse representing normal operation of the input from the receiving circuit to the microcomputer. The timer generates a microcomputer eset signal when a stop period exceeds an abnormality determining time.
    • 一种用于在有线广播系统中分配广播信号的电子设备包括接收电路,其接收包括命令信号的广播信号和用于根据命令信号控制电子设备的微型计算机。 看门狗定时器对输出周期进行计数,并与异常确定时间进行比较。 通过以恒定间隔产​​生的微计算机脉冲信号来复位输出停止时段,并表示微型计算机的正常操作,并且通过表示从接收电路到微计算机的输入的正常操作的周期性指令脉冲复位输入停止时段。 当停止时间超过异常判定时间时,定时器产生微机eset信号。
    • 10. 发明授权
    • Apparatus for treating end portion of sewing thread
    • 缝纫线端部处理装置
    • US5596940A
    • 1997-01-28
    • US572712
    • 1995-12-14
    • Takahiro YamadaMasao OgawaEiji Shibata
    • Takahiro YamadaMasao OgawaEiji Shibata
    • D05B53/00D05B65/00D05B87/02
    • D05B87/02
    • Apparatus for treating an end portion of a sewing thread which is supplied from a thread supplying device and is guided by a guiding device to pass near a sewing needle of a sewing head of a sewing machine, the sewing head having a front surface facing a user who operates the sewing machine, a rear surface opposite to the front surface, and a side surface connecting between the front and rear surfaces, the apparatus including a downstream holding device which holds the end portion of the sewing thread guided by the guiding device, so as to stretch a portion of the sewing thread near the sewing needle, and a cover member which covers the sewing head, the cover member providing the front, rear, and side surfaces of the sewing head, the downstream holding device being provided on a visible portion of the side surface of the cover member which portion is visible from the user facing the front surface of the cover member.
    • 一种用于处理从线供给装置供给并由引导装置引导以通过缝纫机的缝纫头的缝纫针附近的缝纫线的端部的装置,所述缝纫头具有面向使用者的前表面 操作缝纫机的操作者,与前表面相对的后表面和连接在前表面和后表面之间的侧表面,该设备包括保持由引导装置引导的缝合线的端部的下游保持装置,因此 为了拉伸缝纫针附近的缝纫线的一部分,以及覆盖缝合头的盖部件,提供缝纫头的前后侧面的盖部件,下游保持装置设置在可见 盖构件的侧表面的部分从用户面向盖构件的前表面可见。