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1. 发明申请

US20100085518A1 PHOTO-SENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX PRODUCED BY THE COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE BLACK MATRIX 审中-公开
标题翻译：用于黑色矩阵的黑敏矩阵的组合物和由黑色矩阵组成的液晶显示器产生的黑色矩阵的光敏树脂组合物
公开(公告)号：US20100085518A1
公开(公告)日：2010-04-08
申请号：US12449660
申请日：2008-02-21
申请人： Kyung-Soo Choi , Yoon-Hee Heo , Dong-Chang Choi , Ho-Chan Ji , Geun-Young Cha , Dae-Hyun Kim
发明人： Kyung-Soo Choi , Yoon-Hee Heo , Dong-Chang Choi , Ho-Chan Ji , Geun-Young Cha , Dae-Hyun Kim
IPC分类号： G02F1/1333 , G03F7/004 , G03F1/00
CPC分类号： G03F7/032 , G03F7/0007
摘要： The present invention relates to a photosensitive resin composition for a black matrix, a black matrix produced by the composition and a liquid crystal display including the black matrix. The resin composition for a black matrix comprising a fluorene-based resin polymer as a resin binder has high sensitivity and optical density, and excellent development adherence.
摘要翻译：本发明涉及一种用于黑色矩阵的感光性树脂组合物，通过该组合物制造的黑色矩阵和包括黑色矩阵的液晶显示器。包含芴基树脂聚合物作为树脂粘合剂的黑色矩阵用树脂组合物具有高灵敏度和光密度，并且显影粘附性优异。

2. 发明授权

US07556910B2 Photosensitive composition comprising triazine-based photoactive compound containing oxime ester 有权
标题翻译：包含含有肟酯的三嗪类光敏化合物的光敏组合物
公开(公告)号：US07556910B2
公开(公告)日：2009-07-07
申请号：US11605329
申请日：2006-11-29
申请人： Sung Hyun Kim , Kyung Jun Kim , Dong Chang Choi , Jeong Ae Yoon , Hee Kwan Park , Geun Young Cha , Keon Woo Lee , Il Eok Kwon , Dong Kung Oh , Jong Hyun Park , Xiang Li Li , Han Soo Kim , Min Young Lim , Chang Ho Cho
发明人： Sung Hyun Kim , Kyung Jun Kim , Dong Chang Choi , Jeong Ae Yoon , Hee Kwan Park , Geun Young Cha , Keon Woo Lee , Il Eok Kwon , Dong Kung Oh , Jong Hyun Park , Xiang Li Li , Han Soo Kim , Min Young Lim , Chang Ho Cho
IPC分类号： G03F7/00 , G03F7/004 , C07D251/24
CPC分类号： G03F7/0007 , G03F7/0295 , Y10S430/106 , Y10S430/114
摘要： The present invention relates to a photosensitive composition comprising a triazine-based photoactive compound containing oxime ester. The photosensitive composition according to the present invention has good sensitivity, retention rate, mechanical strength, heat resistance, chemical resistance and developing durability since it contains, as photopolymerization initiator, a compound having an oxime ester group and a triazine group in one molecule and thus effectively absorbs UV radiation. Therefore, the photosensitive composition according to the present invention is advantageous not only in curing of materials for color filters, resin black matrixes, column spacers, overcoats and passivation films of liquid crystal displays, but also in high temperature process characteristics.
摘要翻译：本发明涉及包含含有肟酯的三嗪系光敏化合物的感光性组合物。本发明的感光性组合物由于在一个分子中含有具有肟酯基和三嗪基的化合物作为光聚合引发剂，因此具有良好的灵敏度，保留率，机械强度，耐热性，耐药品性和显影耐久性，因此有效吸收紫外线。因此，根据本发明的感光性组合物不仅有利于固化用于滤色器，树脂黑矩阵，柱间隔物，外涂层和液晶显示器钝化膜的材料的固化，而且具有高温加工特性。

3. 发明授权

US08822132B2 Colored dispersion, photoresist composition and black matrix 有权
标题翻译：彩色分散体，光刻胶组合物和黑色矩阵
公开(公告)号：US08822132B2
公开(公告)日：2014-09-02
申请号：US12449524
申请日：2008-11-10
申请人： Dong-Chang Choi , Kyung-Soo Choi , Ho-Chan Ji , Geun-Young Cha , Min-Young Lim , Sung-Hyun Kim , Han-Soo Kim , Yoon-Hee Heo , Ji-Heum Yoo
发明人： Dong-Chang Choi , Kyung-Soo Choi , Ho-Chan Ji , Geun-Young Cha , Min-Young Lim , Sung-Hyun Kim , Han-Soo Kim , Yoon-Hee Heo , Ji-Heum Yoo
IPC分类号： G03F7/033 , C08L37/00 , C08K5/3415 , G03F7/105 , G03F7/00
CPC分类号： G03F7/0007 , G03F7/033 , G03F7/105
摘要： A colored dispersion according to the present invention comprises a resin including monomers of Formulas 1 to 4, as a binder resin.Accordingly, a photoresist composition for a black matrix of a high light shielding property, which has the dispersion stability of the colored dispersion according to the present invention, could be provided, and a black matrix of high sensibility having an uniform process characteristic while maintaining a high light-shielding property could be produced.
摘要翻译：根据本发明的着色分散体包括作为粘合剂树脂的包含式1至4的单体的树脂。因此，可以提供具有高遮光性的黑色矩阵的光致抗蚀剂组合物，其具有根据本发明的着色分散体的分散稳定性，并且可以提供具有均匀工艺特性的高灵敏度的黑色矩阵，同时保持可以产生高的遮光性。

4. 发明授权

US08535874B2 Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same 有权
标题翻译：含有氨基甲酸酯基的芴类聚合物及其制备方法以及含有它们的负型感光性树脂组合物
公开(公告)号：US08535874B2
公开(公告)日：2013-09-17
申请号：US12671348
申请日：2008-09-26
申请人： Han Soo Kim , Sung Hyun Kim , Dong Chang Choi , Kyung Soo Choi , Ho Chan Ji , Min Young Lim , Geun Young Cha , Yoon Hee Heo , Ji Heum Yoo , Sun Hwa Kim
发明人： Han Soo Kim , Sung Hyun Kim , Dong Chang Choi , Kyung Soo Choi , Ho Chan Ji , Min Young Lim , Geun Young Cha , Yoon Hee Heo , Ji Heum Yoo , Sun Hwa Kim
IPC分类号： G03F7/004 , C08L75/04 , C08G61/12
CPC分类号： C08F20/30 , C08G18/10 , C08G18/3215 , C08G18/4879 , C08G18/4887 , C08G18/755 , C08G18/8019 , C09D175/16 , G03F7/0007 , G03F7/035 , G03F7/0388 , C08G18/341
摘要： Provided is a novel fluorene-based polymer having urethane bonds and a method for preparing the fluorene-based polymer. According to the method, a diol compound is condensed with a diisocyanate instead of an acid dianhydride, and then an acid anhydride is reacted with the reaction mixture to introduce desired acid groups into the final polymer. Further provided is a negative-type photosensitive resin composition comprising of the fluorene-based polymer as a binder resin. The composition exhibits improved chemical resistance, good development margin and high sensitivity due to presence of the acid groups despite the low molecular weight of the fluorene-based polymer.
摘要翻译：提供了一种具有氨基甲酸酯键的新型芴基聚合物和制备该芴系聚合物的方法。根据该方法，将二醇化合物与二异氰酸酯代替酸二酐缩合，然后使酸酐与反应混合物反应，将所需的酸基引入最终的聚合物。还提供了一种负型光敏树脂组合物，其包含芴基聚合物作为粘合剂树脂。尽管芴基聚合物的分子量低，但由于存在酸基，该组合物表现出改善的耐化学性，良好的显影边缘和高灵敏度。

5. 发明申请

US20100201925A1 FLUORENE-BASED POLYMER CONTAINING URETHANE GROUPS, PREPARATION METHOD THEREOF AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME 有权
标题翻译：含有脲基的聚合物，其制备方法及包含其的负型类型的感光性树脂组合物
公开(公告)号：US20100201925A1
公开(公告)日：2010-08-12
申请号：US12671348
申请日：2008-09-26
申请人： Han Soo Kim , Sung Hyun Kim , Dong Chang Choi , Kyung Soo Choi , Ho Chan Ji , Min Young Lim , Geun Young Cha , Yoon Hee Heo , Ji Heum Yoo , Sun Hwa Kim
发明人： Han Soo Kim , Sung Hyun Kim , Dong Chang Choi , Kyung Soo Choi , Ho Chan Ji , Min Young Lim , Geun Young Cha , Yoon Hee Heo , Ji Heum Yoo , Sun Hwa Kim
IPC分类号： G02F1/1335 , C08L75/04 , G03F7/004
CPC分类号： C08F20/30 , C08G18/10 , C08G18/3215 , C08G18/4879 , C08G18/4887 , C08G18/755 , C08G18/8019 , C09D175/16 , G03F7/0007 , G03F7/035 , G03F7/0388 , C08G18/341
摘要： Provided is a novel fluorene-based polymer having urethane bonds and a method for preparing the fluorene-based polymer. According to the method, a diol compound is condensed with a diisocyanate instead of an acid dianhydride, and then an acid anhydride is reacted with the reaction mixture to introduce desired acid groups into the final polymer. Further provided is a negative-type photosensitive resin composition comprising of the fluorene-based polymer as a binder resin. The composition exhibits improved chemical resistance, good development margin and high sensitivity due to presence of the acid groups despite the low molecular weight of the fluorene-based polymer.
摘要翻译：提供了一种具有氨基甲酸酯键的新型芴基聚合物和制备该芴系聚合物的方法。根据该方法，将二醇化合物与二异氰酸酯代替酸二酐缩合，然后使酸酐与反应混合物反应，将所需的酸基引入最终的聚合物。还提供了一种负型光敏树脂组合物，其包含芴基聚合物作为粘合剂树脂。尽管芴基聚合物的分子量低，但由于存在酸基，该组合物表现出改善的耐化学性，良好的显影边缘和高灵敏度。

6. 发明授权

US09733563B2 Photosensitive resin composition and photosensitive material comprising the same 有权
公开(公告)号：US09733563B2
公开(公告)日：2017-08-15
申请号：US13353066
申请日：2012-01-18
申请人： Ho Chan Ji , Sunghyun Kim , Dongchang Choi , Kyung Soo Choi , Geun Young Cha , Sang Chul Lee
发明人： Ho Chan Ji , Sunghyun Kim , Dongchang Choi , Kyung Soo Choi , Geun Young Cha , Sang Chul Lee
IPC分类号： G03F7/032 , G03F7/027 , G03F7/00 , G03F7/004
CPC分类号： G03F7/0007 , G03F7/0048 , G03F7/027 , G03F7/032
摘要： The present invention relates to a photosensitive resin composition and a photosensitive material comprising the same. The photosensitive resin composition according to an exemplary embodiment of the present invention may comprise two multi-functional monomers where structures of side chains comprising unsaturated double bonds are different from each other while a composition ratio is changed. Accordingly, in the exemplary embodiment of the present invention, processability is excellent, and it is possible to decrease defects by a rupture when a LCD substrate is sealed and substrate separation defects due to an impact to the LCD products by improving an adhesion property to a lower substrate after a hard baking process.

7. 发明申请

US20120189961A1 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE MATERIAL COMPRISING THE SAME 有权
标题翻译：感光树脂组合物和包含它的感光材料
公开(公告)号：US20120189961A1
公开(公告)日：2012-07-26
申请号：US13353066
申请日：2012-01-18
申请人： Ho Chan JI , Sunghyun KIM , Dongchang CHOI , Kyung Soo CHOI , Geun Young CHA , Sang Chul LEE
发明人： Ho Chan JI , Sunghyun KIM , Dongchang CHOI , Kyung Soo CHOI , Geun Young CHA , Sang Chul LEE
IPC分类号： G03F7/20 , G03F7/032
CPC分类号： G03F7/0007 , G03F7/0048 , G03F7/027 , G03F7/032
摘要： The present invention relates to a photosensitive resin composition and a photosensitive material comprising the same. The photosensitive resin composition according to an exemplary embodiment of the present invention may comprise two multi-functional monomers where structures of side chains comprising unsaturated double bonds are different from each other while a composition ratio is changed. Accordingly, in the exemplary embodiment of the present invention, processability is excellent, and it is possible to decrease defects by a rupture when a LCD substrate is sealed and substrate separation defects due to an impact to the LCD products by improving an adhesion property to a lower substrate after a hard baking process.
摘要翻译：本发明涉及感光性树脂组合物及含有该感光性树脂组合物的感光性物质。根据本发明的示例性实施方案的感光性树脂组合物可以包含两种多官能单体，其中包含不饱和双键的侧链的结构在组成比改变的同时彼此不同。因此，在本发明的示例性实施例中，加工性优异，并且可以通过在LCD基板被密封时由于破裂而导致的缺陷以及由于通过改善对LCD产品的粘附性而对LCD产品的冲击造成的基板分离缺陷经过硬烘焙处理后的下基板。

8. 发明申请

US20110101268A1 PHOTOSENSITIVE RESIN COMPOSITION FOR BLACK MATRIX 有权
标题翻译：黑色矩阵的光敏树脂组合物
公开(公告)号：US20110101268A1
公开(公告)日：2011-05-05
申请号：US12997224
申请日：2009-09-28
申请人： Dong Chang Choi , Kyung Soo Choi , Ho Chan Ji , Geun Young Cha , Sung-Hyun Kim
发明人： Dong Chang Choi , Kyung Soo Choi , Ho Chan Ji , Geun Young Cha , Sung-Hyun Kim
IPC分类号： C09K19/52
CPC分类号： G03F7/0007 , G02F1/133512 , G03F7/0048 , G03F7/032
摘要： A photosensitive resin composition for a black matrix and a black matrix formed with the same are provided. The photosensitive resin composition for a black matrix includes a solvent consisting of 5-30 weight % of a first solvent having a boiling point of 110-159° C., 55-90 weight % of a second solvent having a boiling point of 160-200° C., and 3-15 weight % of a third solvent having a boiling point of 201-280° C., and the first solvent, the second solvent, and the third solvent are an aliphatic compound and use at least one solvent composition selected from a group consisting of alkyl ester, alkyl ketone, alkyl ether, and alkyl alcohol, and thus a uniform thin film having no surface defect can be obtained, and the photosensitive resin composition has an excellent process property while securing a high light shielding property and thus a black matrix pattern having a few defect can be obtained, and is thus useful for a liquid crystal display.
摘要翻译：提供了一种用于黑矩阵和由其形成的黑矩阵的光敏树脂组合物。用于黑色基质的感光性树脂组合物包括由5-30重量％的沸点为110-159℃的第一溶剂，55-90重量％的沸点为160〜 200℃和3-15重量％的沸点为201-280℃的第三溶剂，第一溶剂，第二溶剂和第三溶剂是脂族化合物，并且使用至少一种溶剂选自烷基酯，烷基酮，烷基醚和烷基醇的组合物，因此可以获得没有表面缺陷的均匀的薄膜，并且感光性树脂组合物具有优异的加工性能，同时确保高的遮光性因此可以获得具有少量缺陷的黑矩阵图案，因此可用于液晶显示器。

9. 发明申请

US20100062377A1 METHOD FOR MANUFACTURING COLOR FILTER AND COLOR FILTER MANUFACTURED BY USING THE SAME 有权
标题翻译：制造彩色滤光片的方法及使用其制造的彩色滤光片
公开(公告)号：US20100062377A1
公开(公告)日：2010-03-11
申请号：US12450549
申请日：2008-03-06
申请人： Dae-Hyun Kim , Dong-Chang Choi , Kyung-Soo Choi , Ho-Chan Ji , Hyun-Sik Kim , Geun-Young Cha , Sung-Hyun Kim , Jae-Joon Kim , Min-A Yu , Mi-Ae Kim , Mi-Kyoung Kim
发明人： Dae-Hyun Kim , Dong-Chang Choi , Kyung-Soo Choi , Ho-Chan Ji , Hyun-Sik Kim , Geun-Young Cha , Sung-Hyun Kim , Jae-Joon Kim , Min-A Yu , Mi-Ae Kim , Mi-Kyoung Kim
IPC分类号： G03F7/00 , G02B5/20
CPC分类号： G02B5/201
摘要： The present invention relates to a method for manufacturing a color filter and a color filter manufactured by using the same. More particularly, the present invention pertains to a method for manufacturing a color filter, which includes performing plasma treatment of a black matrix (BM) pattern formed on a substrate to increase a difference in ink repellency of the black matrix pattern and a pixel unit, and a color filter manufactured by using the same. When the production method of the present invention is used, it is possible to provide the color filter in which color mixing does not occur in a pixel unit or between pixel units during discharging of ink by using an inkjet printing process, discoloration due to unfilling does not occur, a surface is uniform, and there is an insignificant step in the pixel unit or between the pixel units.
摘要翻译：本发明涉及一种制造滤色器的方法和使用该滤色器制造的滤色器。更具体地说，本发明涉及一种彩色滤光片的制造方法，其特征在于，对形成在基板上的黑矩阵（BM）图案进行等离子体处理，以增加黑矩阵图案和像素单元的斥墨性差异，以及使用该滤色器制造的滤色片。当使用本发明的制造方法时，可以提供一种滤色器，其中通过使用喷墨印刷方法在墨水排出期间在像素单元中或在墨水排出期间不在像素单元之间进行混色，其中由于不充分而变色不发生，表面是均匀的，并且在像素单元中或像素单元之间存在微不足道的步骤。

10. 发明授权

US08822127B2 Photosensitive resin composition for black matrix 有权
标题翻译：用于黑色矩阵的光敏树脂组合物
公开(公告)号：US08822127B2
公开(公告)日：2014-09-02
申请号：US12997224
申请日：2009-09-28
申请人： Dong Chang Choi , Kyung Soo Choi , Ho Chan Ji , Geun Young Cha , Sung-Hyun Kim
发明人： Dong Chang Choi , Kyung Soo Choi , Ho Chan Ji , Geun Young Cha , Sung-Hyun Kim
IPC分类号： G03F7/004 , G03F7/027 , G02F1/13
CPC分类号： G03F7/0007 , G02F1/133512 , G03F7/0048 , G03F7/032
摘要： A photosensitive resin composition for a black matrix and a black matrix formed with the same are provided. The photosensitive resin composition for a black matrix includes a solvent consisting of 5-30 weight % of a first solvent having a boiling point of 110-159° C., 55-90 weight % of a second solvent having a boiling point of 160-200° C., and 3-15 weight % of a third solvent having a boiling point of 201-280° C., and the first solvent, the second solvent, and the third solvent are an aliphatic compound and use at least one solvent composition selected from a group consisting of alkyl ester, alkyl ketone, alkyl ether, and alkyl alcohol, and thus a uniform thin film having no surface defect can be obtained, and the photosensitive resin composition has an excellent process property while securing a high light shielding property and thus a black matrix pattern having a few defect can be obtained, and is thus useful for a liquid crystal display.
摘要翻译：提供了一种用于黑矩阵和由其形成的黑矩阵的光敏树脂组合物。用于黑色基质的感光性树脂组合物包括由5-30重量％的沸点为110-159℃的第一溶剂，55-90重量％的沸点为160〜 200℃和3-15重量％的沸点为201-280℃的第三溶剂，第一溶剂，第二溶剂和第三溶剂是脂族化合物，并且使用至少一种溶剂选自烷基酯，烷基酮，烷基醚和烷基醇的组合物，因此可以获得没有表面缺陷的均匀的薄膜，并且感光性树脂组合物具有优异的加工性能，同时确保高的遮光性因此可以获得具有少量缺陷的黑矩阵图案，因此可用于液晶显示器。

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