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1. 发明申请

US20100085518A1 PHOTO-SENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX PRODUCED BY THE COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE BLACK MATRIX 审中-公开
标题翻译：用于黑色矩阵的黑敏矩阵的组合物和由黑色矩阵组成的液晶显示器产生的黑色矩阵的光敏树脂组合物
公开(公告)号：US20100085518A1
公开(公告)日：2010-04-08
申请号：US12449660
申请日：2008-02-21
申请人： Kyung-Soo Choi , Yoon-Hee Heo , Dong-Chang Choi , Ho-Chan Ji , Geun-Young Cha , Dae-Hyun Kim
发明人： Kyung-Soo Choi , Yoon-Hee Heo , Dong-Chang Choi , Ho-Chan Ji , Geun-Young Cha , Dae-Hyun Kim
IPC分类号： G02F1/1333 , G03F7/004 , G03F1/00
CPC分类号： G03F7/032 , G03F7/0007
摘要： The present invention relates to a photosensitive resin composition for a black matrix, a black matrix produced by the composition and a liquid crystal display including the black matrix. The resin composition for a black matrix comprising a fluorene-based resin polymer as a resin binder has high sensitivity and optical density, and excellent development adherence.
摘要翻译：本发明涉及一种用于黑色矩阵的感光性树脂组合物，通过该组合物制造的黑色矩阵和包括黑色矩阵的液晶显示器。包含芴基树脂聚合物作为树脂粘合剂的黑色矩阵用树脂组合物具有高灵敏度和光密度，并且显影粘附性优异。

2. 发明授权

US08822127B2 Photosensitive resin composition for black matrix 有权
标题翻译：用于黑色矩阵的光敏树脂组合物
公开(公告)号：US08822127B2
公开(公告)日：2014-09-02
申请号：US12997224
申请日：2009-09-28
申请人： Dong Chang Choi , Kyung Soo Choi , Ho Chan Ji , Geun Young Cha , Sung-Hyun Kim
发明人： Dong Chang Choi , Kyung Soo Choi , Ho Chan Ji , Geun Young Cha , Sung-Hyun Kim
IPC分类号： G03F7/004 , G03F7/027 , G02F1/13
CPC分类号： G03F7/0007 , G02F1/133512 , G03F7/0048 , G03F7/032
摘要： A photosensitive resin composition for a black matrix and a black matrix formed with the same are provided. The photosensitive resin composition for a black matrix includes a solvent consisting of 5-30 weight % of a first solvent having a boiling point of 110-159° C., 55-90 weight % of a second solvent having a boiling point of 160-200° C., and 3-15 weight % of a third solvent having a boiling point of 201-280° C., and the first solvent, the second solvent, and the third solvent are an aliphatic compound and use at least one solvent composition selected from a group consisting of alkyl ester, alkyl ketone, alkyl ether, and alkyl alcohol, and thus a uniform thin film having no surface defect can be obtained, and the photosensitive resin composition has an excellent process property while securing a high light shielding property and thus a black matrix pattern having a few defect can be obtained, and is thus useful for a liquid crystal display.
摘要翻译：提供了一种用于黑矩阵和由其形成的黑矩阵的光敏树脂组合物。用于黑色基质的感光性树脂组合物包括由5-30重量％的沸点为110-159℃的第一溶剂，55-90重量％的沸点为160〜 200℃和3-15重量％的沸点为201-280℃的第三溶剂，第一溶剂，第二溶剂和第三溶剂是脂族化合物，并且使用至少一种溶剂选自烷基酯，烷基酮，烷基醚和烷基醇的组合物，因此可以获得没有表面缺陷的均匀的薄膜，并且感光性树脂组合物具有优异的加工性能，同时确保高的遮光性因此可以获得具有少量缺陷的黑矩阵图案，因此可用于液晶显示器。

3. 发明申请

US20140212812A1 FLUORINE-BASED RESINS AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME 有权
标题翻译：基于氟的树脂和包含其的感光树脂组合物
公开(公告)号：US20140212812A1
公开(公告)日：2014-07-31
申请号：US14237139
申请日：2012-05-31
申请人： Minjung Kim , Han Soo Kim , Kyung Soo Choi
发明人： Minjung Kim , Han Soo Kim , Kyung Soo Choi
IPC分类号： G03F7/038
CPC分类号： G03F7/0388 , C08F14/18 , C08F214/18 , C08F214/182 , C08F220/18 , C08F222/1006 , C09D4/00 , C09D4/06 , G03F7/0007 , G03F7/0046 , G03F7/033 , C08F2220/185 , C08F2220/1883 , C08F220/24 , C08F220/06 , C08F226/02 , C08F212/08
摘要： The present application relates to a fluorine-based resin having a novel structure and a photosensitive resin composition including the same. The photosensitive resin composition including the fluorine-based resin according to an exemplary embodiment of the present application has excellent photosensitivity and developability and can increase a contact angle of a coating film to prevent a water stain. Accordingly, the photosensitive resin composition including the fluorine-based resin according to the exemplary embodiment of the present application may be applied to various photosensitive materials, and particularly, may be preferably applied when a color filter pattern for LCD is manufactured.
摘要翻译：本申请涉及具有新颖结构的氟基树脂和包含其的感光性树脂组合物。包含根据本申请的示例性实施方案的氟基树脂的感光性树脂组合物具有优异的光敏性和显影性，并且可以增加涂膜的接触角以防止水渍。因此，根据本申请的示例性实施方案的包含氟基树脂的感光性树脂组合物可以应用于各种感光材料，特别是当制造用于LCD的滤色器图案时，可以优选应用。

4. 发明授权

US08597861B2 Method for manufacturing color filter and color filter manufactured by using the same 有权
标题翻译：制造使用该滤色器的滤色器和滤色器的方法
公开(公告)号：US08597861B2
公开(公告)日：2013-12-03
申请号：US12450549
申请日：2008-03-06
申请人： Dae-Hyun Kim , Dong-Chang Choi , Kyung-Soo Choi , Ho-Chan Ji , Hyun-Sik Kim , Geun-Young Cha , Sung-Hyun Kim , Jae-Joon Kim , Min-A Yu , Mi-Ae Kim , Mi-Kyoung Kim
发明人： Dae-Hyun Kim , Dong-Chang Choi , Kyung-Soo Choi , Ho-Chan Ji , Hyun-Sik Kim , Geun-Young Cha , Sung-Hyun Kim , Jae-Joon Kim , Min-A Yu , Mi-Ae Kim , Mi-Kyoung Kim
IPC分类号： G02B5/20
CPC分类号： G02B5/201
摘要： The present invention relates to a method for manufacturing a color filter and a color filter manufactured by using the same. More particularly, the present invention pertains to a method for manufacturing a color filter, which includes performing plasma treatment of a black matrix (BM) pattern formed on a substrate to increase a difference in ink repellency of the black matrix pattern and a pixel unit, and a color filter manufactured by using the same. When the production method of the present invention is used, it is possible to provide the color filter in which color mixing does not occur in a pixel unit or between pixel units during discharging of ink by using an inkjet printing process, discoloration due to unfilling does not occur, a surface is uniform, and there is an insignificant step in the pixel unit or between the pixel units.
摘要翻译：本发明涉及一种制造滤色器的方法和使用该滤色器制造的滤色器。更具体地说，本发明涉及一种彩色滤光片的制造方法，其特征在于，对形成在基板上的黑矩阵（BM）图案进行等离子体处理，以增加黑矩阵图案和像素单元的斥墨性差异，以及使用该滤色器制造的滤色片。当使用本发明的制造方法时，可以提供一种滤色器，其中通过使用喷墨印刷方法在墨水排出期间在像素单元中或在墨水排出期间不在像素单元之间进行混色，其中由于不充分而变色不发生，表面是均匀的，并且在像素单元中或像素单元之间存在微不足道的步骤。

5. 发明申请

US20110151379A1 BLACK MATRIX COMPOSITION WITH HIGH LIGHT-SHIELDING AND IMPROVED ADHESION PROPERTIES 审中-公开
标题翻译：具有高遮光性和改进粘合性能的黑色矩阵组合物
公开(公告)号：US20110151379A1
公开(公告)日：2011-06-23
申请号：US12965715
申请日：2010-12-10
申请人： Dong Chang Choi , Kyung Soo Choi , Ho Chan Ji , Geun Young Cha , Sang Chul Lee
发明人： Dong Chang Choi , Kyung Soo Choi , Ho Chan Ji , Geun Young Cha , Sang Chul Lee
IPC分类号： G03F7/004
CPC分类号： G03F7/0007 , G02F1/133512 , G03F7/0048 , G03F7/031 , G03F7/032
摘要： The present invention relates to a black matrix photosensitive resin composition having high light-shielding and improved adhesion properties and a black matrix for a liquid crystal display including the same. The black matrix photosensitive resin composition comprises an alkali-soluble binder resin, a multi-functional monomer having an ethylenic unsaturated double bond, a photopolymerization initiator, an adhesion accelerator, a solvent, and a colorant comprising black pigments. A Cardo type binder is mixed in an amount of 10 to 90 wt % and an acryl type binder is mixed in an amount of 10 to 90 wt % based on a total weight of the alkali-soluble binder resin including the Cardo type binder and the acryl type binder.
摘要翻译：本发明涉及一种具有高遮光性和改善粘合性的黑色基质感光性树脂组合物和包含该黑色矩阵的液晶显示器的黑色矩阵。黑色感光性树脂组合物包含碱溶性粘合剂树脂，具有烯属不饱和双键的多官能单体，光聚合引发剂，粘合促进剂，溶剂和包含黑色颜料的着色剂。将Cardo型粘合剂以10〜90重量％的量混合，丙烯酸类粘合剂的混合量相对于包含Cardo型粘合剂的碱溶性粘合剂树脂的总重量为10〜90重量％丙烯酸类粘合剂。

6. 发明申请

US20100126367A1 Method for etching glass or metal substrates using negative photoresist and method for fabricating cliche using the same 审中-公开
标题翻译：使用负性光致抗蚀剂蚀刻玻璃或金属基板的方法以及使用其制造立方体的方法
公开(公告)号：US20100126367A1
公开(公告)日：2010-05-27
申请号：US12451225
申请日：2008-09-22
申请人： Ji-Su Kim , Kyoung-Su Jeon , Kyung-Soo Choi , Gi-Ra Yi , Seung-Heon Lee , Dong-Myung Shin
发明人： Ji-Su Kim , Kyoung-Su Jeon , Kyung-Soo Choi , Gi-Ra Yi , Seung-Heon Lee , Dong-Myung Shin
IPC分类号： B41N1/00 , G03F7/20
CPC分类号： G03F1/34 , C03C15/00 , C03C17/06 , C03C17/23 , C03C17/3665 , C03C2217/219 , C03C2217/26 , C03C2218/355 , G03F1/80
摘要： The present invention relates to a method for etching glass or metal using a negative photoresist and a method for fabricating a cliche using the same. In the method for etching glass or metal according to the present invention, since adhesion strength between the negative photoresist and the metal or the metal oxide is excellent, the photoresist layer is not corroded by the metal or metal oxide etching solution, it is unnecessary to produce an inverse photomask, the fabrication process is simple, and a low resolution light source such as mixed wavelength type light source is capable of being used, thus, economic efficiency is ensured.
摘要翻译：本发明涉及一种使用负性光致抗蚀剂蚀刻玻璃或金属的方法，以及使用该光致抗蚀剂制造方法。在根据本发明的用于蚀刻玻璃或金属的方法中，由于负性光致抗蚀剂和金属或金属氧化物之间的粘合强度优异，因此光致抗蚀剂层不被金属或金属氧化物蚀刻溶液腐蚀，因此不需要产生反光掩模，制造工艺简单，并且能够使用诸如混合波长型光源的低分辨率光源，从而确保经济效率。

7. 发明申请

US20100104981A1 COLORED DISPERSION, PHOTORESIST COMPOSITION AND BLACK MATRIX 有权
标题翻译：彩色分散，光电组合物和黑色矩阵
公开(公告)号：US20100104981A1
公开(公告)日：2010-04-29
申请号：US12449524
申请日：2008-11-10
申请人： Dong Chang Choi , Kyung Soo Choi , Ho Chan Ji , Geun Young Cha , Min Young Lim , Sung Hyun Kim , Han soo Kim , Yoon Hee Heo , Ji Heum Yoo
发明人： Dong Chang Choi , Kyung Soo Choi , Ho Chan Ji , Geun Young Cha , Min Young Lim , Sung Hyun Kim , Han soo Kim , Yoon Hee Heo , Ji Heum Yoo
IPC分类号： G03F7/004 , C08L37/00 , C08K5/3415 , C08K5/3432 , C08K5/17
CPC分类号： G03F7/0007 , G03F7/033 , G03F7/105
摘要： A colored dispersion according to the present invention comprises a resin including monomers of Formulas 1 to 4, as a binder resin.Accordingly, a photoresist composition for a black matrix of a high light shielding property, which has the dispersion stability of the colored dispersion according to the present invention, could be provided, and a black matrix of high sensibility having an uniform process characteristic while maintaining a high light-shielding property could be produced.
摘要翻译：根据本发明的着色分散体包括作为粘合剂树脂的包含式1至4的单体的树脂。因此，可以提供具有高遮光性的黑色矩阵的光致抗蚀剂组合物，其具有根据本发明的着色分散体的分散稳定性，并且可以提供具有均匀工艺特性的高灵敏度的黑色矩阵，同时保持可以产生高的遮光性。

8. 发明申请

US20050119142A1 Cleaning agent composition for a positive or a negative photoresist 有权
标题翻译：用于正性或负性光致抗蚀剂的清洁剂组合物
公开(公告)号：US20050119142A1
公开(公告)日：2005-06-02
申请号：US10500752
申请日：2003-01-09
申请人： Sae-Tae Oh , Doek-Man Kang , Kyung-Soo Choi
发明人： Sae-Tae Oh , Doek-Man Kang , Kyung-Soo Choi
IPC分类号： C11D3/37 , C11D7/26 , C11D7/32 , C11D11/00 , G03F7/16 , G03F7/42 , H01L21/027 , H01L21/304 , C11D1/00
CPC分类号： C11D7/264 , C11D3/3707 , C11D7/263 , C11D7/3263 , C11D7/3281 , C11D11/0047 , G03F7/168
摘要： The present invention relates to a composition for cleaning a photoresist and is to provide a cleaning composition wherein the residue of the photoresist does not remain on the boundary surface between the cleaned area and the not-cleaned area after a negative photoresist containing pigment is cleaned, soft-baked, exposed and developed. The present invention provides a composition for cleaning a positive or negative photoresist which comprises (a) from 0.1 to 20 wt. % of and alkyl oxide polymer with a molecular weight of from 50 to 2000 and (b) from 80 to 99.9 wt. % of an organic solvent comprising: (b−1) from 1 to 20 parts by weight of dipropylene glycol methyl ether (DPGME), from 10 to 50 parts by weight of N-methyl pyrolidone (NMP) and from 50 to 90 parts by weight of methyl isobutyl ketone (MIBK), or (b−2) from 10 to 90 parts by weight of dimethyl formaldehyde (DMF) or dimethylacetamide (DMAc) and from 10 to 50 parts by weight of n-butyl acetate.
摘要翻译：本发明涉及一种用于清洁光致抗蚀剂的组合物，并且提供一种清洁组合物，其中在清洁含有负性光致抗蚀剂的颜料之后，光致抗蚀剂的残留物不残留在清洁区域和未清洁区域之间的边界表面上，软烤，暴露和发达。本发明提供一种用于清洗正性或负性光致抗蚀剂的组合物，其包含（a）0.1-20wt。％和分子量为50至2000的烷基氧化物聚合物和（b）80至99.9重量％％的有机溶剂含有：（b-1）1〜20重量份二丙二醇甲基醚（DPGME），10〜50重量份N-甲基吡咯烷酮（NMP）和50〜90重量份甲基异丁基酮（MIBK）的重量，或（b-2）10至90重量份的二甲基甲醛（DMF）或二甲基乙酰胺（DMAc）和10至50重量份的乙酸正丁酯。

9. 发明申请

US20100201925A1 FLUORENE-BASED POLYMER CONTAINING URETHANE GROUPS, PREPARATION METHOD THEREOF AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME 有权
标题翻译：含有脲基的聚合物，其制备方法及包含其的负型类型的感光性树脂组合物
公开(公告)号：US20100201925A1
公开(公告)日：2010-08-12
申请号：US12671348
申请日：2008-09-26
申请人： Han Soo Kim , Sung Hyun Kim , Dong Chang Choi , Kyung Soo Choi , Ho Chan Ji , Min Young Lim , Geun Young Cha , Yoon Hee Heo , Ji Heum Yoo , Sun Hwa Kim
发明人： Han Soo Kim , Sung Hyun Kim , Dong Chang Choi , Kyung Soo Choi , Ho Chan Ji , Min Young Lim , Geun Young Cha , Yoon Hee Heo , Ji Heum Yoo , Sun Hwa Kim
IPC分类号： G02F1/1335 , C08L75/04 , G03F7/004
CPC分类号： C08F20/30 , C08G18/10 , C08G18/3215 , C08G18/4879 , C08G18/4887 , C08G18/755 , C08G18/8019 , C09D175/16 , G03F7/0007 , G03F7/035 , G03F7/0388 , C08G18/341
摘要： Provided is a novel fluorene-based polymer having urethane bonds and a method for preparing the fluorene-based polymer. According to the method, a diol compound is condensed with a diisocyanate instead of an acid dianhydride, and then an acid anhydride is reacted with the reaction mixture to introduce desired acid groups into the final polymer. Further provided is a negative-type photosensitive resin composition comprising of the fluorene-based polymer as a binder resin. The composition exhibits improved chemical resistance, good development margin and high sensitivity due to presence of the acid groups despite the low molecular weight of the fluorene-based polymer.
摘要翻译：提供了一种具有氨基甲酸酯键的新型芴基聚合物和制备该芴系聚合物的方法。根据该方法，将二醇化合物与二异氰酸酯代替酸二酐缩合，然后使酸酐与反应混合物反应，将所需的酸基引入最终的聚合物。还提供了一种负型光敏树脂组合物，其包含芴基聚合物作为粘合剂树脂。尽管芴基聚合物的分子量低，但由于存在酸基，该组合物表现出改善的耐化学性，良好的显影边缘和高灵敏度。

10. 发明申请

US20100029892A1 FLUORENE-BASED RESIN POLYMER AND METHOD FOR PREPARING THEREOF 有权
标题翻译：基于氟的树脂聚合物及其制备方法
公开(公告)号：US20100029892A1
公开(公告)日：2010-02-04
申请号：US12449648
申请日：2008-01-21
申请人： Yoon-Hee Heo , Kyung-Soo Choi , Han-Soo Kim , Min-Young Lim , Ji-Heum Yoo
发明人： Yoon-Hee Heo , Kyung-Soo Choi , Han-Soo Kim , Min-Young Lim , Ji-Heum Yoo
IPC分类号： C08G63/42
CPC分类号： C08G59/186 , C08G63/42 , C08G63/672 , G03F7/0007 , G03F7/032
摘要： The present invention relates to a fluorene-based resin polymer having a repeating unit of Formula 1 and a method for preparing the same. The fluorene-based resin polymer has a high molecular weight and low acid value, and has an excellent developing property, adhesive property, and stability.
摘要翻译：本发明涉及具有式1重复单元的芴系树脂聚合物及其制备方法。芴基树脂聚合物具有高分子量和低酸值，并且具有优异的显影性，粘合性和稳定性。

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