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1. 发明申请

US20080121505A1 Switch apparatus 审中-公开
标题翻译：开关装置
公开(公告)号：US20080121505A1
公开(公告)日：2008-05-29
申请号：US11984497
申请日：2007-11-19
申请人： Isao Maeda , Hiroshi Kusama , Hideki Matsumura , Norikazu Yoshida , Fumitaka Hayase
发明人： Isao Maeda , Hiroshi Kusama , Hideki Matsumura , Norikazu Yoshida , Fumitaka Hayase
IPC分类号： H01H1/00
CPC分类号： H01H1/28 , B60Q1/1469 , H01H3/42 , H01H25/04 , H01H2001/265
摘要： In an arrangement of carrying out a switch operation of operating a driven mechanism by an operating member operated by a user and bringing and detaching contacts provided to movable contact pieces into contact with and from fixed contacts by deforming and recovering the movable contact by the operated driven mechanism, the contacts of the movable contact pieces are formed by carrying out mechanical working of projecting portions of the movable contact pieces.
摘要翻译：在通过由用户操作的操作构件进行操作从动机构的开关操作的布置中，并且通过由所操作的驱动器使可动触点变形和恢复来使提供给可动触头的触点与固定触点相接触和分离通过进行可动接点的突出部的机械加工，形成可动接触片的接点。

2. 发明申请

US20060055864A1 Pixel control element selection transfer method, pixel control device mounting device used for pixel control element selection transfer method, wiring formation method after pixel control element transfer, and planar display substrate 失效
标题翻译：像素控制元件选择传送方法，用于像素控制元件选择传输方法的像素控制装置安装装置，像素控制元件传送之后的布线形成方法以及平面显示基板
公开(公告)号：US20060055864A1
公开(公告)日：2006-03-16
申请号：US10535182
申请日：2003-11-19
申请人： Hideki Matsumura , Kenichiro Kida , Shigehira Minami
发明人： Hideki Matsumura , Kenichiro Kida , Shigehira Minami
IPC分类号： G02F1/13
CPC分类号： H01L27/14603 , G02F1/1362 , H01L27/12 , H01L27/3255 , H01L27/3276 , H01L51/5281 , H01L51/56
摘要： There is provided a method for selectively transferring pixel control devices onto a planar display substrate, which method enables prepared pixel control devices to be easily, reliably and inexpensively mounted without inducing any loss of pixel control devices. The pixel control devices (1) are formed in a large number at pitches (5, 6) obtained respectively by dividing pitches (105, 106) on the planar display substrate (100) by natural numbers. The pixel control devices corresponding to the number of the pitches (105, 106) on the planar display substrate (100) are picked up, retained on a transparent thermoplastic resin film (101) formed on the planar display substrate (100) utilizing the plastic deformation of the film and fixed at the peripheries thereof with a transparent ultraviolet curing resin film (104).
摘要翻译：提供了一种用于将像素控制装置选择性地转移到平面显示基板上的方法，该方法使准备好的像素控制装置能够容易，可靠且廉价地安装，而不会引起像素控制装置的任何损失。像素控制装置（1）通过以平面显示基板（100）上的间距（105,106）分割自然数而获得的间距（5,6）大量地形成。对应于平面显示基板（100）上的间距（105,106）的数量的像素控制装置被拾取，保持在形成在平面显示基板（100）上的透明热塑性树脂膜（101）上，利用塑料膜的变形并在其周围用透明紫外线固化树脂膜（104）固定。

3. 发明授权

US6069094A Method for depositing a thin film 失效
标题翻译：沉积薄膜的方法
公开(公告)号：US6069094A
公开(公告)日：2000-05-30
申请号：US924304
申请日：1997-09-05
申请人： Hideki Matsumura , Akira Izumi , Atsushi Masuda , Yasunobu Nashimoto , Yosuke Miyoshi , Shuji Nomura , Kazuo Sakurai , Shouichi Aoshima
发明人： Hideki Matsumura , Akira Izumi , Atsushi Masuda , Yasunobu Nashimoto , Yosuke Miyoshi , Shuji Nomura , Kazuo Sakurai , Shouichi Aoshima
IPC分类号： H01L21/205 , C23C16/02 , C23C16/44 , H01L21/28 , H01L21/31 , H01L21/314 , H01L21/316 , H01L21/318
CPC分类号： C23C16/44 , C23C16/0236 , H01L21/28264 , H01L21/3185
摘要： This invention discloses a method and apparatus where a pre-treatment which reduce interfacial level density is carried out before thin film deposition on a substrate utilizing a catalytic gas phase reaction. The catalytic gas phase reaction is generated with a treatment gas which is supplied with the substrate via a thermal catalysis body provided near the substrate surface. Thin film deposition on the substrate surface is carried out after this pre-treatment. The thermal catalysis body is made of tungsten, molybdenum, tantalum, titanium or vanadium, and is heated by a heater. And, this invention also discloses a semiconductor device having a semiconductor-insulator junction with its interfacial level density is 10.sup.12 eV .sup.-1 cm.sup.-2 or less, which is brought by the above pre-treatment in the insulator film deposition process.
摘要翻译：本发明公开了一种方法和装置，其中在使用催化气相反应的薄膜沉积在基板上之前进行降低界面密度的预处理。催化气相反应是通过设置在基板表面附近的热催化体被提供给基板的处理气体产生的。在该预处理之后进行在基板表面上的薄膜沉积。热催化体由钨，钼，钽，钛或钒制成，并被加热器加热。并且，本发明还公开了一种具有半导体 - 绝缘体结的半导体器件，其界面电平密度为1012eV -1cm-2或更小，这是通过上述绝缘膜沉积工艺中的预处理所带来的。

4. 发明授权

US5120971A Method for reflection-type two-dimensional pattern-reducing-copying using single convergence mirror and equipment thereof 失效
标题翻译：使用单一会聚反射镜的反射型二维图案缩小复印方法及其设备
公开(公告)号：US5120971A
公开(公告)日：1992-06-09
申请号：US636989
申请日：1990-12-26
申请人： Hideki Matsumura , Yoshihide Watanabe
发明人： Hideki Matsumura , Yoshihide Watanabe
IPC分类号： G03F7/20 , G21K7/00 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70233 , G03F7/70283 , G03F7/70358 , G21K7/00
摘要： The invention relates to a method and a device for reflection-type pattern copying, characterized by letting beams of light be incident on a pattern reflection plate on which a pattern to be copied is drawn, converging a pattern figure contained in the light reflected by the pattern reflection plate by means of a concave mirror and copying a two-dimensionally reduced pattern of the above pattern onto a surface of a specimen. Unlike conventional methods, the invention achieves two-dimensional reduced pattern copying by using one concave convergence mirror. A region of copying in which the blur size is not larger than a certain sufficiently small value can be expanded by parallelly arrnaging many concave convergence mirrors having the same shape and combining mechanical sweeping of the pattern reflection plate and the specimen.
摘要翻译：本发明涉及一种用于反射型图案复印的方法和装置，其特征在于，使光束入射到其上绘制待复印图案的图案反射板上，使包含在由图案反射板，并将上述图案的二维缩小图案复制到样品的表面上。与传统方法不同，本发明通过使用一个凹面会聚镜实现二维缩小图案复制。可以通过平行布置具有相同形状的许多凹入会聚反射镜并结合图案反射板和样本的机械扫描来扩大其中模糊尺寸不大于一定的足够小的复印区域。

5. 发明授权

US4110314A Process for preparing an aromatic polymer in the presence of an inert nonpolar aromatic reaction lubricant 失效
标题翻译：在惰性非极性芳族反应润滑剂存在下制备芳族聚合物的方法
公开(公告)号：US4110314A
公开(公告)日：1978-08-29
申请号：US751479
申请日：1976-12-16
申请人： Norio Yagi , Hideki Matsumura , Tatsuhiro Aoyagi , Ikuji Kishi
发明人： Norio Yagi , Hideki Matsumura , Tatsuhiro Aoyagi , Ikuji Kishi
IPC分类号： C08G65/00 , C08G65/40 , C08G75/23
CPC分类号： C08G65/4012 , C08G65/4093 , C08G75/23 , C08L2205/05
摘要： An aromatic polymer is prepared by polymerizing a diphenolate compound, of a dialkali metal salt of a diphenol with a dihalodiphenyl compound, of a dihalogenobenzenoid compound having an electron withdrawing group in at least one of the positions ortho or para to each of the halogen atoms, at 200.degree. C. to 400.degree. C. in the presence of from 0.1 to 30% by weight of an inert nonpolar aromatic reaction lubricant.
摘要翻译：通过在每个卤素原子的邻位或对位中的至少一个位置聚合具有吸电子基团的二卤代苯类化合物的双酚化合物，二酚的二碱金属盐与二卤代二苯基化合物来制备芳族聚合物，在0.1至30重量％的惰性非极性芳香族反应润滑剂的存在下，在200℃至400℃下进行。

6. 发明申请

US20090263911A1 End point detection method , end point detection device, and gas phase reaction processing apparatus equipped with end point detection device 失效
标题翻译：端点检测方法，终点检测装置和装有端点检测装置的气相反应处理装置
公开(公告)号：US20090263911A1
公开(公告)日：2009-10-22
申请号：US11991278
申请日：2006-08-22
申请人： Kazuhisa Takao , Hiroshi Ikeda , Hideki Matsumura , Atsushi Masuda , Hironobu Umemoto
发明人： Kazuhisa Takao , Hiroshi Ikeda , Hideki Matsumura , Atsushi Masuda , Hironobu Umemoto
IPC分类号： G01N27/00 , G01N33/00
CPC分类号： H01J37/32963 , H01J37/3244 , H01J37/32935 , H01L22/26 , H01L2924/0002 , H01L2924/00
摘要： The object of the present invention is to provide an end point detection method in a gas phase reaction processing apparatus.An end point detection method in the case where a catalyst 9 arranged in a treatment chamber is heated at high temperature by supplying electric power thereto and the treatment is carried out by cracking a reaction gas by the catalyst 9 heated at high temperature, comprises the steps of supplying the electric power to the catalyst 9 from a constant current source 10, detecting electric potential difference between both ends of the catalyst 9, performing primary differentiation of the detected electric potential difference, and determining an end point of the treatment based on obtained primary differential value.
摘要翻译：本发明的目的是提供一种气相反应处理装置中的终点检测方法。在布置在处理室中的催化剂9通过向其供给电力而在高温下加热并且通过在高温下加热的催化剂9裂解反应气体来进行处理的情况下的终点检测方法包括以下步骤从恒定电流源10向催化剂9供给电力，检测催化剂9的两端之间的电位差，进行检测出的电位差的一次微分，并根据获得的主电极确定治疗的终点差分值。

7. 发明申请

US20080121500A1 Vehicular lever switch apparatus 审中-公开
标题翻译：车用杠杆开关装置
公开(公告)号：US20080121500A1
公开(公告)日：2008-05-29
申请号：US11984626
申请日：2007-11-20
申请人： Hideki Matsumura , Isao Maeda , Hiroshi Kusama , Norikazu Yoshida , Fumitaka Hayase
发明人： Hideki Matsumura , Isao Maeda , Hiroshi Kusama , Norikazu Yoshida , Fumitaka Hayase
IPC分类号： H01H21/04
CPC分类号： B60Q1/1469
摘要： A slider operated to slide by a lever for light is constructed by an arrangement capable of being integrated by inserting a portion thereof to a cylindrical portion of a slide guide portion provided at an insulator. Thereby, an integrating performance can be promoted in comparison with that of a structure of squeezing the slider by 2 parts. Further, a clearance in a height direction of the slider can be controlled by one part of the insulator, and therefore, a variation thereof can be reduced in comparison with that of the case of controlling the clearance by 2 parts.
摘要翻译：用于通过光杆操纵以滑动的滑块由能够通过将其一部分插入到设置在绝缘体上的滑动引导部的圆柱形部分而被整合的装置构成。因此，与将滑块挤压2次的结构相比，可以促进整体性能。此外，滑块的高度方向上的间隙可以由绝缘体的一部分控制，因此与将间隙控制2个部分的情况相比，可以减小其变化。

8. 发明授权

US07211152B2 Heating element CVD system and connection structure between heating element and electric power supply mechanism in the heating element CVD system 有权
标题翻译：加热元件CVD系统和加热元件CVD系统中的加热元件与供电机构之间的连接结构
公开(公告)号：US07211152B2
公开(公告)日：2007-05-01
申请号：US10673238
申请日：2003-09-30
申请人： Keiji Ishibashi , Masahiko Tanaka , Minoru Karasawa , Hideki Sunayama , Kazutaka Yamada , Hideki Matsumura , Atsushi Masuda
发明人： Keiji Ishibashi , Masahiko Tanaka , Minoru Karasawa , Hideki Sunayama , Kazutaka Yamada , Hideki Matsumura , Atsushi Masuda
IPC分类号： C23C16/00 , F27B5/14 , F27D11/00
CPC分类号： C23C16/45519 , C23C16/4401 , C23C16/46 , H01L21/67109
摘要： A heating element CVD system wherein one or a plurality of connection terminal holders is placed in the processing container, and each of the connection terminal holders holds a plurality of connection terminals. Each of the connection terminals connects the heating element to the electric power supply mechanism electrically such that a connection region of the heating element connected to the connection terminal is not exposed to a space in the processing container.
摘要翻译：一种加热元件CVD系统，其中一个或多个连接端子保持器被放置在处理容器中，并且每个连接端子保持器保持多个连接端子。每个连接端子将加热元件电连接到电力供应机构，使得连接到连接端子的加热元件的连接区域不暴露于处理容器中的空间。

9. 发明授权

US07142236B2 Digital zoom apparatus to perform zoom during successive changes in zoom magnification 有权
标题翻译：数字变焦装置在变焦倍率的连续变化期间进行变焦
公开(公告)号：US07142236B2
公开(公告)日：2006-11-28
申请号：US10124266
申请日：2002-04-18
申请人： Hideki Matsumura
发明人： Hideki Matsumura
IPC分类号： H04N5/262
CPC分类号： H04N5/2628
摘要： A digital zoom apparatus includes an SDRAM. The SDRAM is stored with YUV data so that horizontal 4 pixels are assigned to each of addresses. A zoom start pixel is specified by a CPU on the basis of a zoom magnification. A memory control circuit transfers two lines of YUV data to a line memory with reference to an address to which the zoom start pixel is assigned, and furthermore, transfers part of the YUV data to a register. The line memory and the register are stored with the YUV data so that one pixel is assigned to each of addresses. The YUV data held in the register is subject to a zoom process with reference to the zoom start pixel, whereby, a through image subjected to an enlargement zooming process is displayed on a display.
摘要翻译：数字变焦装置包括SDRAM。使用YUV数据存储SDRAM，以便将水平的4个像素分配给每个地址。缩放开始像素由CPU根据缩放倍率来指定。存储器控制电路根据分配了变焦开始像素的地址将两行YUV数据传送到行存储器，此外，将YUV数据的一部分传送到寄存器。行存储器和寄存器与YUV数据一起存储，使得每个地址分配一个像素。保存在寄存器中的YUV数据参照变焦开始像素进行变焦处理，由此在显示器上显示经过放大变焦处理的直通图像。

10. 发明授权

US06593548B2 Heating element CVD system 有权
标题翻译：加热元件CVD系统
公开(公告)号：US06593548B2
公开(公告)日：2003-07-15
申请号：US10130207
申请日：2002-05-14
申请人： Hideki Matsumura , Atsushi Masuda , Keiji Ishibashi , Masahiko Tanaka , Minoru Karasawa
发明人： Hideki Matsumura , Atsushi Masuda , Keiji Ishibashi , Masahiko Tanaka , Minoru Karasawa
IPC分类号： F27B514
CPC分类号： C23C16/45519 , C23C16/24 , C23C16/345 , C23C16/44 , C23C16/452
摘要： A heating element CVD device capable of providing a high productivity and decomposing and/or activating the material gas led into a processing container by a heating element and stacking film on a substrate disposed in the processing container, wherein the connection part area of the heating element to a connection terminal for connecting the hearing element to a power supply mechanism is not exposed to a space inside the processing container, specifically, the connection part area is covered by a cylindrical body or a platy body covering the connection part area while providing a space part thereof from the hearing element, or the connection part area allows the space part to be present in a space thereof from the connection terminal and is covered by the cylindrical body or platy body covering the connection part area while providing the space part in a space thereof from the heating element, and hydrogen gas is led from the connection terminal side into the processing container through the space part, whereby the portion of the heating element near the connection part to the power supply mechanism can be prevented from being deteriorated by the material gas, the material gas can be prevented from reacting with cleaning gas during the cleaning for removing the film adhered to the inside of the processing container, the service life of the heating element can be increased, and a film forming environment can be stabilized.
摘要翻译：一种加热元件CVD装置，其能够提供高生产率并且分解和/或激活通过加热元件引导到处理容器中的材料气体，并且在设置在处理容器中的基板上堆叠膜，其中加热元件的连接部分区域将用于将听力元件连接到电源机构的连接端子不暴露于处理容器内部的空间，具体地，连接部分区域被覆盖在连接部分区域上的圆柱体或板状体覆盖，同时提供空间或者连接部分区域可以使空间部分从连接端子出现在其空间中，并且被覆盖在连接部分区域上的圆柱体或板状体覆盖，同时在空间中提供空间部分来自加热元件，并且氢气从连接端子侧被引导到处理容器中由于空间部分，由此可以防止靠近供电机构的连接部分附近的加热元件的部分被材料气体劣化，因此可以防止材料气体在清洁期间与清洁气体反应以除去膜附着在加工容器的内部，能够提高加热元件的使用寿命，能够使成膜环境稳定。

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