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1. 发明授权

US08721803B2 Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method 有权
标题翻译：清洗液，清洗方法，液体发生装置，曝光装置和装置制造方法
公开(公告)号：US08721803B2
公开(公告)日：2014-05-13
申请号：US13307773
申请日：2011-11-30
申请人： Hiroyuki Nagasaka , Hiroshi Morita , Hiroto Tokoshima
发明人： Hiroyuki Nagasaka , Hiroshi Morita , Hiroto Tokoshima
IPC分类号： B08B3/04
CPC分类号： G03F7/70925 , G03F7/70341 , Y10T137/0318
摘要： An exposure apparatus exposes a substrate through an exposure liquid with exposure light. A cleaning liquid is provided to the exposure apparatus, in order to clean at least part of the exposure apparatus. In the cleaning liquid, a prescribed gas of an amount that is greater than or equal to the saturation concentration is dissolved.
摘要翻译：曝光装置通过具有曝光光的曝光液体曝光基板。为了清洁曝光装置的至少一部分，向曝光装置提供清洁液。在清洗液中，溶解了大于或等于饱和浓度的规定气体。

2. 发明申请

US20130068260A1 METHOD OF CLEANING ELECTRONIC MATERIAL AND CLEANING SYSTEM 审中-公开
标题翻译：清洁电子材料和清洁系统的方法
公开(公告)号：US20130068260A1
公开(公告)日：2013-03-21
申请号：US13634567
申请日：2011-03-02
申请人： Haruyoshi Yamakawa , Hiroto Tokoshima
发明人： Haruyoshi Yamakawa , Hiroto Tokoshima
IPC分类号： B08B3/04
CPC分类号： B08B3/04 , G03F7/423 , H01L21/31133 , H01L21/67051
摘要： An electronic material cleaning system includes a chemical cleaning means, a wet cleaning means and a single-wafer cleaning apparatus. The chemical cleaning means comprises a functional chemical storage tank and an electrolytic reaction apparatus connected to the functional chemical storage tank via a concentrated sulfuric acid electrolysis line. The functional chemical storage tank can supply a functional chemical to the single-wafer cleaning apparatus via a functional chemical supply line. The wet cleaning means comprises a pure water supply line, a nitrogen gas supply line connected to a nitrogen gas source and an internal mixing type two-fluid nozzle connected respectively to the pure water supply line and the nitrogen gas supply line. Droplets generated from a nitrogen gas and ultrapure water can be sprayed from the tip of the two-fluid nozzle.
摘要翻译：电子材料清洁系统包括化学清洁装置，湿式清洁装置和单晶片清洁装置。化学清洗装置包括通过浓硫酸电解线连接到功能化学品储罐的功能化学品储存罐和电解反应装置。功能化学品储罐可以通过功能性化学品供应管线向单晶片清洁装置提供功能化学品。湿式清洗装置包括纯水供应管线，连接到氮气源的氮气供应管线和分别连接到纯水供应管线和氮气供应管线的内部混合型双流体喷嘴。从氮气和超纯水产生的液滴可以从双流体喷嘴的尖端喷射。

3. 发明申请

US20090165829A1 Process for Producing Gas-Containing Cleaning Water, Apparatus for Producing the Cleaning Water and Cleaning Apparatus 失效
标题翻译：用于生产含气体清洁水的方法，用于生产清洁水和清洁设备的设备
公开(公告)号：US20090165829A1
公开(公告)日：2009-07-02
申请号：US12225038
申请日：2007-03-12
申请人： Hiroshi Morita , Hiroto Tokoshima
发明人： Hiroshi Morita , Hiroto Tokoshima
IPC分类号： B08B3/04 , B01F3/04 , B08B3/10 , B01D19/00 , C02F1/20 , B01D61/14
CPC分类号： C02F1/70 , B01D19/0036 , B01F3/04269 , B01F2003/04404 , B01F2003/04914 , B08B3/12 , B08B9/0321 , C01B3/501 , C01B2203/0405 , C01B2203/0495 , C02F1/444 , C11D3/0052 , H01L21/67057
摘要： A process for producing a gas-containing cleaning water which contains a specific gas dissolved in water, which process comprises dissolving the specific gas into water under an increased pressure exceeding an atmospheric pressure to prepare a gas-containing water having a concentration of the gas exceeding solubility of the gas under an atmospheric pressure and, then, removing a portion of the dissolved gas by decreasing pressure on the gas-containing water; an apparatus for producing a gas-containing cleaning water which comprises an apparatus for dissolving a gas (14) in which a specific gas is dissolved into water under a pressure exceeding the atmospheric pressure and an apparatus for removing a portion of a dissolved gas (15) in which the pressure on the gas-containing water obtained from the apparatus for dissolving a gas is decreased to a pressure lower than the pressure under which the gas has been dissolved so that a portion of the dissolved gas is removed; and a cleaning apparatus using the gas-containing cleaning water. A gas-containing cleaning water having a desired concentration of the gas can be produced safely without using a mechanism for decreasing the pressure such as a vacuum pump. Water and the specific gas in the gas-containing cleaning water after being used can be reused. The process and the apparatuses can be advantageously applied to cleaning electronic members requiring a great degree of cleanliness.
摘要翻译：一种生产含有溶解在水中的特定气体的含气清洗水的方法，该方法包括在超过大气压的压力下将特定气体溶解在水中，以制备浓度超过气体的含气体水气体在大气压下的溶解度，然后通过降低含气水的压力来除去一部分溶解的气体; 一种用于生产含气体清洗水的装置，包括一种在超过大气压力的压力下将特定气体溶解在水中的气体（14）的装置和用于除去溶解气体的一部分的装置（15 ），其中从用于溶解气体的装置获得的含气体水的压力降低到低于已经溶解气体的压力的压力，从而去除部分溶解气体; 以及使用含气体清洗水的清洗装置。可以安全地制造具有期望浓度的气体的含气体清洁水，而不使用用于降低诸如真空泵的压力的机构。使用后的含水清洗水中的水和比气体可以重复使用。该方法和装置可以有利地应用于需要很高清洁度的清洁电子部件。

4. 发明授权

US08999069B2 Method for producing cleaning water for an electronic material 有权
标题翻译：电子材料清洗用水的制造方法
公开(公告)号：US08999069B2
公开(公告)日：2015-04-07
申请号：US12736487
申请日：2009-03-25
申请人： Junichi Ida , Hiroto Tokoshima
发明人： Junichi Ida , Hiroto Tokoshima
IPC分类号： C11D11/00 , C11D7/02 , C11D3/02 , H01L21/02
CPC分类号： C11D7/02 , C11D3/02 , C11D11/0047 , H01L21/02052
摘要： A method for producing cleaning water for an electronic material, includes obtaining oxygen gas and argon gas from air with a PSA oxygen concentration apparatus, dissolving the oxygen gas and argon gas obtained from the PSA oxygen concentration apparatus in pure water or ultrapure water. A concentration of dissolved oxygen is in a range of 8 to 50 mg/L, and a content of dissolved argon gas is in a range of 2 to 50 volume % of a total amount of dissolved oxygen gas and the dissolved argon gas.
摘要翻译：一种电子材料用清洗水的制造方法，其特征在于，使用PSA氧浓缩装置从空气中获得氧气和氩气，将从所述PSA氧浓缩装置得到的氧气和氩气溶解在纯水或超纯水中。溶解氧的浓度在8〜50mg / L的范围内，溶解的氩气的含量在溶解氧气和溶解的氩气的总量的2〜50体积％的范围内。

5. 发明申请

US20120048383A1 DEVICE FOR SUPPLYING WATER CONTAINING DISSOLVED GAS AND PROCESS FOR PRODUCING WATER CONTAINING DISSOLVED GAS 有权
标题翻译：用于供应含水的气体的装置和用于生产含水的溶解气体的方法
公开(公告)号：US20120048383A1
公开(公告)日：2012-03-01
申请号：US13138655
申请日：2010-03-29
申请人： Hiroto Tokoshima , Keita Seo
发明人： Hiroto Tokoshima , Keita Seo
IPC分类号： F15D1/00
CPC分类号： B08B3/08 , B01F3/04269 , B01F15/0022 , B01F15/00344 , B01F2003/04404 , B01F2215/0096 , Y10T137/0318 , Y10T137/8158 , Y10T137/86083
摘要： A device for,supplying water containing dissolved gas and a process for producing water containing dissolved gas are provided. The device and the process are capable of stably supplying water containing dissolved gas having a low dissolved gas concentration, or low degree of saturation. Oxygen gas is supplied through a gas feeding pipe (31) to a gas phase chamber (13), and a vacuum pump (35) is operated to evacuate the gas phase chamber (13). Raw water is supplied through a raw water pipe (21) to a liquid phase chamber (12). Portion of the oxygen gas in the gas phase chamber (13) permeates a gas permeable film (11) and dissolves in the raw water in the liquid phase chamber (12), and thus water containing dissolved gas is produced. Remaining oxygen gas in the gas phase chamber (13) is sucked by the vacuum pump (35) together with condensed water and is discharged through a discharge pipe (33). Dissolved oxygen concentration of the water containing dissolved gas is measured by a dissolved gas concentration meter (23), and the degree of opening of a gas flow controlling valve (32) is adjusted so that the measured concentration matches a targeted value.
摘要翻译：提供了一种用于供应含有溶解气体的水的装置和一种用于生产含有溶解气体的水的方法。该装置和方法能够稳定地供给含有溶解气体浓度低或饱和度低的溶解气体的水。氧气通过供气管道（31）供给到气相室（13），真空泵（35）被操作以抽空气相室（13）。原水通过原水管（21）供给到液相室（12）。气相室（13）中的氧气的一部分渗透透气膜（11）并溶解在液相室（12）中的原水中，从而产生含有溶解气体的水。气相室（13）中剩余的氧气与冷凝水一起由真空泵（35）吸入，并通过排出管（33）排出。通过溶解气体浓度计（23）测量含有溶解气体的水的溶解氧浓度，调节气体流量调节阀（32）的开度，使得测定浓度与目标值相符。

6. 发明申请

US20110180491A1 METHOD AND APPARATUS FOR TREATING ORGANIC MATTER-CONTAINING WATER 有权
标题翻译：用于处理含有机含水的方法和装置
公开(公告)号：US20110180491A1
公开(公告)日：2011-07-28
申请号：US12737554
申请日：2009-07-27
申请人： Hiroto Tokoshima
发明人： Hiroto Tokoshima
IPC分类号： C02F1/68
CPC分类号： C02F1/725 , B01D19/0031 , B01D2311/13 , B01J23/42 , B01J35/0013 , B01J37/16 , C02F1/20 , C02F1/70 , C02F1/727 , C02F2001/422 , C02F2001/425 , C02F2101/30 , C02F2103/04 , C02F2305/08
摘要： Raw water is made to pass through a raw water supply pipe 1 by opening on-off valves 1a and 5a, and by closing on-off valves 3a and 12a. Oxygen is supplied to the raw water in the raw water supply pipe 1 by opening an on-off valve 2a of an oxygen supply pipe 2. The resulting raw water containing organic matter and oxygen passes through the raw water supply pipe 1 and enters a catalyst-packed column 4, thereby contacting a platinum-group metal catalyst 4a onto which hydrogen is adsorbed. This causes the organic matter in the raw water to contact the platinum-group metal catalyst 4a under the presence of dissolved oxygen and hydrogen which is adsorbed onto the metal catalyst. Accordingly, the organic matter in the water to be treated can be easily removed at high efficiency and with low energy consumption.
摘要翻译：通过打开开关阀1a和5a，并通过关闭开关阀3a和12a，使原水通过原水供应管1。通过打开供氧管2的开关阀2a，将氧气供给到原水供给管1中的原水。得到的含有有机物和氧气的原水通过原水供给管1并进入催化剂由此使吸附有氢的铂族金属催化剂4a接触。这导致原水中的有机物在溶解氧和吸附在金属催化剂上的氢的存在下与铂族金属催化剂4a接触。因此，能够以高效率，低能耗地容易地除去被处理水中的有机物质。

7. 发明申请

US20110030722A1 CLEANING WATER FOR ELECTRONIC MATERIAL, METHOD FOR CLEANING ELECTRONIC MATERIAL AND SYSTEM FOR SUPPLYING WATER CONTAINING DISSOLVED GAS 有权
标题翻译：清洗水用于电子材料，清洗电子材料的方法和系统用于供水的气体溶解
公开(公告)号：US20110030722A1
公开(公告)日：2011-02-10
申请号：US12736487
申请日：2009-03-25
申请人： Junichi Ida , Hiroto Tokoshima
发明人： Junichi Ida , Hiroto Tokoshima
IPC分类号： C11D7/04 , G03F7/42 , B08B3/12 , B08B3/08
CPC分类号： C11D7/02 , C11D3/02 , C11D11/0047 , H01L21/02052
摘要： Cleaning water for an electronic material which exhibits a remarkably improved cleaning effect in comparison with conventional waters containing dissolved gas is provided. The cleaning water for an electronic material comprises water containing dissolved gas containing oxygen and argon as dissolved gases, and has a concentration of dissolved oxygen being equal to or more than 8 mg/L, and a content of dissolved argon gas being equal to or more than 2 volume % of the total amount of dissolved oxygen gas and dissolved argon gas. A method for cleaning an electronic material with the cleaning water for an electronic material. The cleaning water for an electronic material of the present invention, which comprises water containing dissolved oxygen/argon gas, contains a smaller amount of dissolved gas, can obtain an improved cleaning effect even when a small amount of a chemical is used, and therefore, can be produced safely and easily at a low cost.
摘要翻译：提供了与含有溶解气体的常规水相比显示出显着改善的清洁效果的电子材料的清洁水。的清洗水的用于电子材料包括含有包含氧和氩作为溶解的气体的气体溶解水，且具有的溶解氧是浓度等于或超过8毫克/升，并溶解氩气的等于或多个内容超过溶解氧气和溶解氩气的总量的2体积％。一种电子材料清洗用电子材料清洗方法。清洁水用于本发明的的电子材料，其包含含有溶解氧/氩气的水，含有溶解气体的量较小，能够获得改进的清洁效果即使在使用一种化学品的量小，并且因此，可以以低成本安全，容易地生产。

8. 发明申请

US20080156356A1 Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method 审中-公开
标题翻译：清洗液，清洗方法，液体发生装置，曝光装置和装置制造方法
公开(公告)号：US20080156356A1
公开(公告)日：2008-07-03
申请号：US11987633
申请日：2007-12-03
申请人： Hiroyuki Nagasaka , Hiroshi Morita , Hiroto Tokoshima
发明人： Hiroyuki Nagasaka , Hiroshi Morita , Hiroto Tokoshima
IPC分类号： B08B13/00 , C11D10/00 , G03B27/52
CPC分类号： G03F7/70925 , G03F7/70341 , Y10T137/0318
摘要： An exposure apparatus exposes a substrate through an exposure liquid with exposure light. A cleaning liquid is provided to the exposure apparatus, in order to clean at least part of the exposure apparatus. In the clearing liquid, a prescribed gas of an amount that is greater than or equal to the saturation concentration is dissolved.
摘要翻译：曝光装置通过具有曝光光的曝光液体曝光基板。为了清洁曝光装置的至少一部分，向曝光装置提供清洁液。在清液中，溶解了大于或等于饱和浓度的规定气体。

9. 发明授权

US09302298B2 Device for supplying water containing dissolved gas and process for producing water containing dissolved gas 有权
标题翻译：用于供给含有溶解气体的水的装置和用于生产含有溶解气体的水的方法
公开(公告)号：US09302298B2
公开(公告)日：2016-04-05
申请号：US13138655
申请日：2010-03-29
申请人： Hiroto Tokoshima , Keita Seo
发明人： Hiroto Tokoshima , Keita Seo
IPC分类号： B01F3/04 , B08B3/08 , B01F15/00
CPC分类号： B08B3/08 , B01F3/04269 , B01F15/0022 , B01F15/00344 , B01F2003/04404 , B01F2215/0096 , Y10T137/0318 , Y10T137/8158 , Y10T137/86083
摘要： A device for supplying water containing dissolved gas includes a gas permeable film module that is partitioned into a gas phase chamber having a connection port at a bottom part and a liquid phase chamber by a gas permeable film, a feed unit feeding water to be treated to the liquid phase chamber, a gas supply unit supplying gas to the gas phase chamber, and a vacuum evacuation unit, connected with the gas phase chamber with the connection port, so that the gas is supplied to the gas phase chamber by the gas supply unit while the gas phase chamber is evacuated by the vacuum evacuation unit.
摘要翻译：用于供给含有溶解气体的水的装置包括透气膜模块，其被分隔成具有底部连接口的气相室和通过透气膜的液相室，供给被处理水的进料单元液相室，向气相室供给气体的气体供给单元以及与气相室与连接口连接的真空排出单元，由此，气体供给单元向气相室供给气体而气相室由真空排气单元抽真空。

10. 发明授权

US09129797B2 Cleaning method 有权
标题翻译：清洗方法
公开(公告)号：US09129797B2
公开(公告)日：2015-09-08
申请号：US13518583
申请日：2010-12-21
申请人： Hiroto Tokoshima , Hiroshi Morita
发明人： Hiroto Tokoshima , Hiroshi Morita
IPC分类号： H01L21/02 , H01L21/67
CPC分类号： H01L21/0206 , H01L21/02052 , H01L21/67051
摘要： Disclosed is a low-cost and resource-saving cleaning method wherein high cleaning effects are obtained by high-pressure jet cleaning or two-fluid cleaning using a gas-dissolved water. In the high-pressure jet cleaning method or the two-fluid cleaning method, a cleaning liquid or a mixed fluid of the cleaning liquid and a gas is jetted from a cleaning fluid jetting nozzle toward a subject to be cleaned, and the subject is cleaned. The cleaning liquid introduced into the cleaning fluid jetting nozzle contains the dissolved gas in a quantity equal to or more than the saturation solubility at the liquid temperature of the cleaning liquid.
摘要翻译：公开了一种低成本且节省资源的清洗方法，其中通过高压喷射清洗或使用溶解气体的水进行双流体清洗获得高清洗效果。在高压喷射清洗方法或双液清洗方法中，将清洗液和气体的清洗液或清洗液喷射到被清洗对象物上，从而清洗被检体。引入清洗流体喷射喷嘴的清洗液含有等于或大于在清洗液体的液体温度下的饱和溶解度的溶解气体。

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