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1. 发明授权

US10209622B2 Exposure method and device manufacturing method having lower scanning speed to expose peripheral shot area 有权
公开(公告)号：US10209622B2
公开(公告)日：2019-02-19
申请号：US13067046
申请日：2011-05-04
申请人： Hiroyuki Nagasaka
发明人： Hiroyuki Nagasaka
IPC分类号： G03F7/20
摘要： An exposure method sequentially exposes a plurality of shot areas of a substrate. The method includes: (i) holding the substrate on a substrate holder such that a gap is formed along an edge of the substrate; (ii) exposing one of the shot areas, located near a center of the substrate, through a liquid of a liquid immersion area which covers only a portion of a surface of the substrate, while moving the substrate at a first scanning speed; and (iii) exposing an other one of the shot areas through the liquid of the liquid immersion area, while moving the substrate at a second scanning speed lower than the first scanning speed. The other one of the shot areas is located near the edge of the substrate and the gap is included in the liquid immersion area during the exposure of the other one of the shot areas.

2. 发明授权

US09256137B2 Exposure apparatus, liquid holding method, and device manufacturing method 有权
标题翻译：曝光装置，液体保持方法和装置制造方法
公开(公告)号：US09256137B2
公开(公告)日：2016-02-09
申请号：US13593079
申请日：2012-08-23
申请人： Hiroyuki Nagasaka
发明人： Hiroyuki Nagasaka
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70341
摘要： An exposure apparatus includes a first member disposed at least in a part of a periphery of an optical path of the exposure light, and has a first face that faces an upper face of the object through a first gap and holds the liquid between the upper face of the object and the first face, a second member disposed at an outer side of the first face with respect to the optical path and has a second face facing the upper face of the object through a second gap, a first supply port disposed at an outer side of the second face and supplies a fluid, and a first suction port disposed between the first face and the second face, and suctions at least part of gas in an outer space of the second member via a gap between the second face and the upper face of the object.
摘要翻译：曝光装置包括至少设置在曝光光的光路的周边的一部分中的第一部件，并且具有通过第一间隙面对物体的上表面的第一面，并将液体保持在上表面所述物体和所述第一面的第二构件相对于所述光路设置在所述第一面的外侧，并且具有通过第二间隙面向所述物体的上表面的第二面;第一供给口，并且提供流体;第一吸入口，设置在第一面和第二面之间，并且通过第二面和第二面之间的间隙吸入第二构件的外部空间中的至少一部分气体，物体的上面。

3. 发明授权

US09239524B2 Exposure condition determination method, exposure method, exposure apparatus, and device manufacturing method involving detection of the situation of a liquid immersion region 有权
标题翻译：曝光条件判定方法，曝光方法，曝光装置以及涉及检测液浸区域的情况的装置制造方法
公开(公告)号：US09239524B2
公开(公告)日：2016-01-19
申请号：US11887344
申请日：2006-03-30
申请人： Yoshiki Kida , Hiroyuki Nagasaka
发明人： Yoshiki Kida , Hiroyuki Nagasaka
IPC分类号： G03F7/20
CPC分类号： G03F7/7055 , G03F7/70341 , G03F7/7085
摘要： The situation of a liquid immersion region (LR) formed on the surface of a substrate (P) is detected while changing at least one of the movement condition of the substrate (P) and the liquid immersion condition when forming the liquid immersion region (LR), and an exposure condition is determined based on the detection results.
摘要翻译：在形成液浸区域（LR）时，在改变基板（P）的移动状态和液浸条件中的至少一个时，检测形成在基板（P）表面上的液浸区域（LR）），并且基于检测结果确定曝光条件。

4. 发明授权

US09063436B2 Exposure apparatus, exposure method, and method for producing device 有权
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US09063436B2
公开(公告)日：2015-06-23
申请号：US13427512
申请日：2012-03-22
申请人： Soichi Owa , Hiroyuki Nagasaka , Ryu Sugawara
发明人： Soichi Owa , Hiroyuki Nagasaka , Ryu Sugawara
IPC分类号： G03F7/20
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70716 , G03F7/70733
摘要： An exposure apparatus is provided with a projection optical system, and the projection optical system includes a first optical element disposed most closely to an image plane of the projection optical system. The exposure apparatus includes a first liquid immersion mechanism which forms a first liquid immersion area of a first liquid between the first optical element and an upper surface of a transparent member provided on a side of the image plane of the projection optical system, and an observation unit which observes a state of the first liquid immersion area. It is possible to grasp the state of the liquid immersion area of the liquid, thereby executing optimum liquid immersion exposure.
摘要翻译：曝光装置设置有投影光学系统，投影光学系统包括最靠近投影光学系统的像面设置的第一光学元件。曝光装置包括：第一浸液机构，其在第一光学元件与设置在投影光学系统的像面侧的透明构件的上表面之间形成第一液体的第一液浸区域;以及观察观察第一液浸区域的状态的单元。可以掌握液体的液浸区域的状态，从而进行最佳的液浸曝光。

5. 发明授权

US08982322B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US08982322B2
公开(公告)日：2015-03-17
申请号：US11717748
申请日：2007-03-14
申请人： Hiroyuki Nagasaka
发明人： Hiroyuki Nagasaka
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03B27/42 , G03F7/70283 , G03F7/70466
摘要： An exposure apparatus provided with an optical system that has one optical element to which at least two of three or more exposure lights are guided, and that is capable of irradiating three or more exposure lights onto exposure fields that respectively correspond to the exposure lights, with the exposure apparatus multiply exposing a predetermined field on a substrate with images of a plurality of patterns that are formed based on the three or more exposure lights that are respectively irradiated onto the three or more exposure fields.
摘要翻译：一种具有光学系统的曝光装置，所述光学系统具有一个光学元件，三个或更多个曝光光中的至少两个被引导到该光学元件，并且能够将三个或更多个曝光光照射到分别对应于曝光灯的曝光场上，曝光装置将基于分别照射到三个或更多个曝光场上的三个或更多个曝光光形成的多个图案的图像，将基板上的预定场曝光。

6. 发明授权

US08508713B2 Exposure apparatus, exposure method, and method for producing device 有权
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US08508713B2
公开(公告)日：2013-08-13
申请号：US11878075
申请日：2007-07-20
申请人： Hiroyuki Nagasaka , Takeshi Okuyama
发明人： Hiroyuki Nagasaka , Takeshi Okuyama
IPC分类号： G03B27/42 , G03B27/52 , G03B27/58
CPC分类号： G03F7/70341
摘要： A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent to the substrate. The apparatus includes a liquid diverter in the space to promote liquid flow across the space.
摘要翻译：光刻投影装置被布置成通过限定在与基板相邻的空间的液体将图案从图案形成装置投影到基板上。该装置包括在该空间中的液体转向器，以促进流过空间的液体流动。

7. 发明授权

US08384880B2 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
公开(公告)号：US08384880B2
公开(公告)日：2013-02-26
申请号：US12232064
申请日：2008-09-10
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/58 , G03B27/52 , G03B27/42 , G03B27/32
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

8. 发明授权

US08218127B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US08218127B2
公开(公告)日：2012-07-10
申请号：US12320771
申请日：2009-02-04
申请人： Hiroyuki Nagasaka , Takeshi Okuyama
发明人： Hiroyuki Nagasaka , Takeshi Okuyama
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70883 , G03F7/70341
摘要： An exposure apparatus exposes a substrate by forming a liquid immersion region on the substrate, and projecting a pattern image onto the substrate via a projection optical system and a liquid that forms the liquid immersion region. The exposure apparatus includes a projection optical system having a plurality of optical elements, by which a pattern image is projected onto a substrate via a liquid to expose the substrate and a liquid recovery system that recovers the liquid along with a gas and has a separator that separates the recovered liquid and the recovered gas.
摘要翻译：曝光装置通过在基板上形成液浸区域来露出基板，并通过投影光学系统和形成液浸区域的液体将图案图像投影到基板上。曝光装置包括具有多个光学元件的投影光学系统，通过该投影光学系统，通过液体将图案图像投影到基板上以露出基板，以及与气体一起回收液体的液体回收系统，并且具有分离器分离回收的液体和回收的气体。

9. 发明申请

US20120133912A1 LIQUID RECOVERY SYSTEM, IMMERSION EXPOSURE APPARATUS, IMMERSION EXPOSING METHOD, AND DEVICE FABRICATING METHOD 审中-公开
标题翻译：液体回收系统，浸润曝光装置，浸渍曝光方法和装置制造方法
公开(公告)号：US20120133912A1
公开(公告)日：2012-05-31
申请号：US13364828
申请日：2012-02-02
申请人： Yasufumi NISHII , Hiroyuki NAGASAKA , Takeshi OKUYAMA
发明人： Yasufumi NISHII , Hiroyuki NAGASAKA , Takeshi OKUYAMA
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system comprises: a plate that has a first surface and a second surface on the side opposite the first surface; and a liquid recovery part, at least part of which opposes the second surface with a first gap interposed therebetween. The liquid recovery system recovers the liquid on a movable object that opposes the first surface of the plate via the liquid recovery part.
摘要翻译：液体回收系统由浸渍曝光设备使用。液体回收系统包括：板，其在与第一表面相对的一侧具有第一表面和第二表面; 液体回收部分，其至少一部分与第二表面相对，并且间隔开第一间隙。液体回收系统通过液体回收部分将液体回收到与板的第一表面相对的可移动物体上。

10. 发明申请

US20120067380A1 CLEANING LIQUID, CLEANING METHOD, LIQUID GENERATING APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATING METHOD 有权
标题翻译：清洗液，清洗方法，液体生成装置，曝光装置和装置制造方法
公开(公告)号：US20120067380A1
公开(公告)日：2012-03-22
申请号：US13307773
申请日：2011-11-30
申请人： Hiroyuki Nagasaka , Hiroshi Morita , Hiroto Tokoshima
发明人： Hiroyuki Nagasaka , Hiroshi Morita , Hiroto Tokoshima
IPC分类号： B08B3/08 , B01F3/00 , B08B5/00
CPC分类号： G03F7/70925 , G03F7/70341 , Y10T137/0318
摘要： An exposure apparatus exposes a substrate through an exposure liquid with exposure light. A cleaning liquid is provided to the exposure apparatus, in order to clean at least part of the exposure apparatus. In the cleaning liquid, a prescribed gas of an amount that is greater than or equal to the saturation concentration is dissolved.
摘要翻译：曝光装置通过具有曝光光的曝光液体曝光基板。为了清洁曝光装置的至少一部分，向曝光装置提供清洁液。在清洗液中，溶解了大于或等于饱和浓度的规定气体。

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