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1. 发明授权

US08956560B2 Method of manufacturing mold 有权
标题翻译：模具制造方法
公开(公告)号：US08956560B2
公开(公告)日：2015-02-17
申请号：US13423543
申请日：2012-03-19
申请人： Yasuaki Ootera , Yoshiyuki Kamata , Naoko Kihara , Yoshiaki Kawamonzen , Takeshi Okino , Ryosuke Yamamoto , Tomoyuki Maeda , Norikatsu Sasao , Akiko Yuzawa , Takuya Shimada , Hiroyuki Hieda
发明人： Yasuaki Ootera , Yoshiyuki Kamata , Naoko Kihara , Yoshiaki Kawamonzen , Takeshi Okino , Ryosuke Yamamoto , Tomoyuki Maeda , Norikatsu Sasao , Akiko Yuzawa , Takuya Shimada , Hiroyuki Hieda
IPC分类号： H01L21/00 , B29C33/38 , G11B5/855
CPC分类号： B29C33/3857 , G11B5/855
摘要： In one embodiment, a method of manufacturing a mold includes: forming a first layer having an affinity to a second polymer on a substrate having an affinity to a first polymer; forming first and second openings in the first layer; filling a resist in the second openings and hardening the resist to obtain a hardened resist; and forming a second layer containing a block copolymer and causing it to self-assemble.
摘要翻译：在一个实施方案中，制造模具的方法包括：在对第一聚合物具有亲和性的基材上形成对第二聚合物具有亲和性的第一层; 在第一层中形成第一和第二开口; 在第二开口中填充抗蚀剂并使抗蚀剂硬化以获得硬化抗蚀剂; 并形成含有嵌段共聚物并使其自组装的第二层。

2. 发明授权

US08916053B2 Pattern forming method 有权
标题翻译：图案形成方法
公开(公告)号：US08916053B2
公开(公告)日：2014-12-23
申请号：US13528348
申请日：2012-06-20
申请人： Yoshiaki Kawamonzen , Yasuaki Ootera , Akiko Yuzawa , Naoko Kihara , Yoshiyuki Kamata , Hiroyuki Hieda , Norikatsu Sasao , Ryosuke Yamamoto , Takeshi Okino , Tomoyuki Maeda , Takuya Shimada
发明人： Yoshiaki Kawamonzen , Yasuaki Ootera , Akiko Yuzawa , Naoko Kihara , Yoshiyuki Kamata , Hiroyuki Hieda , Norikatsu Sasao , Ryosuke Yamamoto , Takeshi Okino , Tomoyuki Maeda , Takuya Shimada
IPC分类号： C03C15/00 , C03C25/68 , C23F1/00 , B44C3/08 , B44C5/04 , B81C1/00 , B44C1/22 , H01L21/033 , G03F7/00 , B41M5/00
CPC分类号： B44C1/227 , B41M5/00 , B81C1/0046 , B81C2201/0153 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/0337 , Y10T156/1041
摘要： A pattern forming method according to an embodiment includes: forming a pattern film on a first substrate, the pattern film having a concave-convex pattern, the pattern film being made of a material containing a first to-be-imprinted agent; forming a material film on a second substrate, the material film containing a second to-be-imprinted agent having a higher etching rate than an etching rate of the first to-be-imprinted agent; transferring the concave-convex pattern of the pattern film onto the material film by applying pressure between the first substrate and the second substrate, with the pattern film being positioned to face the material film, and by curing the second to-be-imprinted agent; detaching the first substrate from the pattern film; and removing the material film by etching, to leave the pattern film on the second substrate.
摘要翻译：根据实施例的图案形成方法包括：在第一基板上形成图案膜，所述图案膜具有凹凸图案，所述图案膜由包含第一待打印剂的材料制成; 在第二基板上形成材料膜，所述材料膜含有蚀刻速率高于第一待打印剂的蚀刻速率的第二待定印剂; 通过在第一基板和第二基板之间施加压力将图案膜的凹凸图案转印到材料膜上，图案膜定位成面对材料膜，并且通过固化第二待打印剂; 从图案膜分离第一衬底; 并通过蚀刻去除材料膜，以将图案膜留在第二基板上。

3. 发明授权

US07931819B2 Method for pattern formation 有权
标题翻译：图案形成方法
公开(公告)号：US07931819B2
公开(公告)日：2011-04-26
申请号：US11727158
申请日：2007-03-23
申请人： Naoko Kihara , Hiroyuki Hieda
发明人： Naoko Kihara , Hiroyuki Hieda
IPC分类号： H01L21/302
CPC分类号： H01L21/3086 , B82Y10/00 , Y10S438/942
摘要： There is provided a method for pattern formation, including a step of coating a composition comprising a block copolymer, a silicon compound, and a solvent for dissolving these components onto an object to form a layer of the composition on the object, a step of subjecting the layer of the composition to self-organization of the block copolymer to cause phase separation into a first phase, in which the silicon compound is localized, having higher etching resistance by heat treatment or/and oxygen plasma treatment, and a second phase comprising a polymer phase and having lower etching resistance by heat treatment or/and oxygen plasma treatment, and thereby forming a pattern layer with a fine pattern, and a step of etching the object using as a mask the thus formed pattern layer.
摘要翻译：提供了一种形成图案的方法，其包括将包含嵌段共聚物，硅化合物和溶剂的组合物涂布到物体上以形成该物质层的步骤，所述组合物层自组织所述嵌段共聚物以引起相分离成其中所述硅化合物定位的第一相，通过热处理或/和氧等离子体处理具有较高的耐蚀刻性，以及第二相，其包含聚合物相，并且通过热处理或/和氧等离子体处理具有较低的耐腐蚀性，从而形成具有精细图案的图案层，以及使用由此形成的图案层作为掩模蚀刻该物体的步骤。

4. 发明授权

US07686972B2 Method for manufacturing magnetic recording medium 有权
标题翻译：磁记录介质的制造方法
公开(公告)号：US07686972B2
公开(公告)日：2010-03-30
申请号：US11705037
申请日：2007-02-12
申请人： Hiroyuki Hieda , Yoshiyuki Kamata , Satoshi Shirotori
发明人： Hiroyuki Hieda , Yoshiyuki Kamata , Satoshi Shirotori
IPC分类号： B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00
CPC分类号： G11B5/855 , G11B5/85
摘要： It is made possible to manufacturing a magnetic recording medium capable of high-density recording at low cost. A method for manufacturing a magnetic recording medium, includes: forming a magnetic film on a substrate; and forming a pattern transfer film, into which a concavo-convex pattern of a magnetic recording medium is to be transferred by imprinting, by vapor-depositing a material for forming the pattern transfer film onto the magnetic film while heating the material at a temperature of 100° C. to 400° C. in a vacuum of 1×10−3 Torr or less.
摘要翻译：能够以低成本制造能够高密度记录的磁记录介质。一种制造磁记录介质的方法，包括：在基板上形成磁膜; 并且通过在形成图案转印膜的材料上气相沉积到磁性膜上形成图案转印膜，通过压印将磁记录介质的凹凸图案转印到该图案转印膜中，同时在在1×10 -3 Torr或更低的真空中为100℃至400℃。

5. 发明申请

US20090135519A1 Magnetic recording medium, method and apparatus for manufacturing magnetic recording apparatus 有权
标题翻译：磁记录介质，制造磁记录装置的方法和装置
公开(公告)号：US20090135519A1
公开(公告)日：2009-05-28
申请号：US12292564
申请日：2008-11-20
申请人： Hiroyuki Hieda , Kazuto Kashiwagi , Akira Kikitsu , Yousuke Isowaki , Yoshiyuki Kamata
发明人： Hiroyuki Hieda , Kazuto Kashiwagi , Akira Kikitsu , Yousuke Isowaki , Yoshiyuki Kamata
IPC分类号： G11B5/33 , G11B5/82 , C23C14/34
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/743 , G11B5/746 , G11B5/855 , G11B5/865 , G11B2005/0029
摘要： A magnetic recording medium includes a disk substrate, and recording cells arrayed on the disk substrate in a track direction, the recording cells includes a ferromagnetic pattern and a magnetic pattern formed on one of two sidewalls of the ferromagnetic pattern in the track direction and having a lower crystalline magnetic anisotropy constant Ku than that of the ferromagnetic pattern.
摘要翻译：磁记录介质包括磁盘基板和磁道基板上沿轨道方向排列的记录单元，记录单元包括铁磁图案和形成在轨道方向的铁磁图案的两个侧壁中的一个侧壁上的磁性图案，并且具有比铁磁性图案低的结晶磁各向异性常数Ku。

6. 发明申请

US20070065683A1 Magnetic recording medium, method of manufacturing the same, and magnetic recording/reproducing apparatus 审中-公开
标题翻译：磁记录介质及其制造方法以及磁记录/重放装置
公开(公告)号：US20070065683A1
公开(公告)日：2007-03-22
申请号：US11520653
申请日：2006-09-14
申请人： Koji Sonoda , Hiroyuki Hieda
发明人： Koji Sonoda , Hiroyuki Hieda
IPC分类号： G11B5/72 , B05D5/12
CPC分类号： G11B5/8408 , G11B5/72
摘要： According to one embodiment, a magnetic recording medium includes a protective layer having a plurality of projections on its surface. These projections are formed by forming an etching mask including a mask underlayer and a mask pattern layer having an island structure on the protective layer, and performing dry etching after that.
摘要翻译：根据一个实施例，磁记录介质包括在其表面上具有多个突起的保护层。这些突起通过在保护层上形成包括掩模底层和具有岛状结构的掩模图案层的蚀刻掩模形成，然后进行干蚀刻。

7. 发明申请

US20070053107A1 Substrate for magnetic recording medium, magnetic recording medium, and magnetic recording apparatus 有权
标题翻译：用于磁记录介质的基板，磁记录介质和磁记录装置
公开(公告)号：US20070053107A1
公开(公告)日：2007-03-08
申请号：US11397892
申请日：2006-04-05
申请人： Kaori Kimura , Masatoshi Sakurai , Akira Kikitsu , Yoshiyuki Kamata , Satoshi Shirotori , Hiroyuki Hieda
发明人： Kaori Kimura , Masatoshi Sakurai , Akira Kikitsu , Yoshiyuki Kamata , Satoshi Shirotori , Hiroyuki Hieda
IPC分类号： G11B5/82
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/667 , G11B5/743 , G11B5/855 , G11B5/865
摘要： It is possible to improve the recording and reproducing S/N ratio, the reproduction signal intensity, and the degree of high density recording. There are provided a plurality of recording tracks formed on a substrate, each recording track being formed of a magnetic material, and non-recording sections formed on the substrate, each non-recording section separating adjacent recording tracks, each recording track including a plurality of recording sections and connecting sections for connecting the recording sections adjacent thereto in a track longitudinal direction, and each connecting section having a cross-sectional area in a track width direction that is smaller than a cross-sectional area in a track width direction of adjacent recording sections.
摘要翻译：可以改善记录和再现S / N比，再现信号强度和高密度记录程度。提供了形成在基板上的多个记录轨道，每个记录磁道由磁性材料形成，而非记录部分形成在基板上，每个非记录部分分隔相邻的记录磁道，每个记录磁道包括多个记录部分和连接部分，用于在轨道纵向方向上连接与其相邻的记录部分，并且每个连接部分在轨道宽度方向上的横截面积小于相邻记录的轨道宽度方向上的横截面积部分。

8. 发明申请

US20060257694A1 Magnetic recording media 有权
标题翻译：磁记录媒体
公开(公告)号：US20060257694A1
公开(公告)日：2006-11-16
申请号：US11434519
申请日：2006-05-16
申请人： Hiroyuki Hieda , Naoko Kihara , Yoshitaka Yanagita
发明人： Hiroyuki Hieda , Naoko Kihara , Yoshitaka Yanagita
IPC分类号： G11B5/64
CPC分类号： G11B5/855
摘要： A magnetic recording media has recording cells formed of two-dimensionally arrayed magnetic material, a nonmagnetic layer surrounding the recording cells, an adhesive film formed on each of the recording cells, and a lubricant directly adhered to the adhesive film.
摘要翻译：磁记录介质具有由二维排列的磁性材料形成的记录单元，围绕记录单元的非磁性层，形成在每个记录单元上的粘合膜，以及直接附着在粘合膜上的润滑剂。

9. 发明申请

US20060078681A1 Pattern forming method and method of processing a structure by use of same 有权
公开(公告)号：US20060078681A1
公开(公告)日：2006-04-13
申请号：US11248587
申请日：2005-10-13
申请人： Hiroyuki Hieda , Naoko Kihara , Katsuyuki Naito
发明人： Hiroyuki Hieda , Naoko Kihara , Katsuyuki Naito
IPC分类号： B05D3/04 , B05D5/12 , B05D3/02
CPC分类号： G11B5/855
摘要： The present invention provides a pattern forming method using phase separation structure of self-assembling block copolymer and minimizing variations in pattern. A substrate having groove structure pre-formed thereon, is coated with a solution of the block copolymer comprising at least one block having a mesogen group. The block copolymer is caused to self-assemble in the groove to form block copolymer assemblies, which are regularly arrayed. The invention also relates to a processing method of processing a substrate by the use of the pattern obtained by the pattern forming method as a template.

10. 发明申请

US20050069732A1 Magnetic recording medium and method for manufacturing the same 有权
标题翻译：磁记录介质及其制造方法
公开(公告)号：US20050069732A1
公开(公告)日：2005-03-31
申请号：US10947132
申请日：2004-09-23
申请人： Yoshiyuki Kamata , Yuichi Ohsawa , Hiroyuki Hieda , Akira Kikitsu
发明人： Yoshiyuki Kamata , Yuichi Ohsawa , Hiroyuki Hieda , Akira Kikitsu
IPC分类号： G11B5/72 , G11B5/00 , G11B5/65 , G11B5/667 , G11B5/74 , G11B5/855 , B32B5/16
CPC分类号： B82Y10/00 , G11B5/74 , G11B5/743 , G11B5/855 , G11B2005/001 , Y10T428/256 , Y10T428/265
摘要： A magnetic recording medium which allows high density recording and has excellent durability can be obtained. A magnetic recording medium includes: a plurality of ferromagnetic material dots arranged on a soft magnetic layer formed on a non-magnetic substrate so as to be separated from one another; and carbon films which are formed on the respective ferromagnetic material dots, each carbon film having a smooth film face shape in a section passing through the center of each ferromagnetic material dot and a film thickness gradually decreasing from the center of the ferromagnetic material dot toward an outer edge thereof.
摘要翻译：可以获得允许高密度记录并具有优异的耐久性的磁记录介质。磁记录介质包括：多个铁磁材料点，其布置在形成在非磁性基板上以便彼此分离的软磁层上; 和形成在各个铁磁材料点上的碳膜，每个碳膜在穿过每个铁磁材料点的中心的部分中具有平滑的薄膜表面形状，并且薄膜厚度从铁磁材料点的中心逐渐减小到的外边缘。

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