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    • 4. 发明授权
    • Junction barrier schottky (JBS) with floating islands
    • 交界面肖特基(JBS)与浮岛
    • US09059147B1
    • 2015-06-16
    • US14222614
    • 2014-03-22
    • Ji PanAnup Bhalla
    • Ji PanAnup Bhalla
    • H01L29/47H01L29/872H01L29/78
    • H01L29/47H01L29/0619H01L29/0623H01L29/0649H01L29/66143H01L29/7811H01L29/872
    • A Schottky diode includes a Schottky barrier and a plurality of dopant regions disposed near the Schottky barrier as floating islands to function as PN junctions for preventing a leakage current generated from a reverse voltage. At least a trench opened in a semiconductor substrate with a Schottky barrier material disposed therein constitutes the Schottky barrier. The Schottky barrier material may also be disposed on sidewalls of the trench for constituting the Schottky barrier. The trench may be filled with the Schottky barrier material composed of Ti/TiN or a tungsten metal disposed therein for constituting the Schottky barrier. The trench is opened in a N-type semiconductor substrate and the dopant regions includes P-doped regions disposed under the trench constitute the floating islands. The P-doped floating islands may be formed as vertical arrays under the bottom of the trench.
    • 肖特基二极管包括肖特基势垒和设置在肖特基势垒附近的多个掺杂剂区域,作为浮岛,用作用于防止从反向电压产生的漏电流的PN结。 在其中设置有肖特基势垒材料的半导体衬底中开放的至少一个沟槽构成肖特基势垒。 肖特基势垒材料也可以设置在用于构成肖特基势垒的沟槽的侧壁上。 沟槽可以填充由设置在其中的用于构成肖特基势垒的Ti / TiN或其中的钨金属组成的肖特基势垒材料。 沟槽在N型半导体衬底中打开,并且掺杂区包括设置在沟槽下方的P掺杂区构成浮岛。 P掺杂的浮岛可以在沟槽底部形成为垂直阵列。
    • 7. 发明申请
    • Junction barrier schottky (JBS) with floating islands
    • 交界面肖特基(JBS)与浮岛
    • US20070075392A1
    • 2007-04-05
    • US11607583
    • 2006-12-01
    • Ji PanAnup Bhalla
    • Ji PanAnup Bhalla
    • H01L29/47
    • H01L29/66727H01L29/0623H01L29/1095H01L29/407H01L29/66734H01L29/7811H01L29/782
    • A Schottky diode includes a Schottky barrier and a plurality of dopant regions disposed near the Schottky barrier as floating islands to function as PN junctions for preventing a leakage current generated from a reverse voltage. At least a trench opened in a semiconductor substrate with a Schottky barrier material disposed therein constitutes the Schottky barrier. The Schottky barrier material may also be disposed on sidewalls of the trench for constituting the Schottky barrier. The trench may be filled with the Schottky barrier material composed of Ti/TiN or a tungsten metal disposed therein for constituting the Schottky barrier. The trench is opened in a N-type semiconductor substrate and the dopant regions includes P-doped regions disposed under the trench constitute the floating islands. The P-doped floating islands may be formed as vertical arrays under the bottom of the trench.
    • 肖特基二极管包括肖特基势垒和设置在肖特基势垒附近的多个掺杂区,作为浮岛,用作用于防止从反向电压产生的漏电流的PN结。 在其中设置有肖特基势垒材料的半导体衬底中开放的至少一个沟槽构成肖特基势垒。 肖特基势垒材料也可以设置在用于构成肖特基势垒的沟槽的侧壁上。 沟槽可以填充由设置在其中的用于构成肖特基势垒的Ti / TiN或其中的钨金属组成的肖特基势垒材料。 沟槽在N型半导体衬底中打开,并且掺杂区包括设置在沟槽下方的P掺杂区构成浮岛。 P掺杂的浮岛可以在沟槽底部形成为垂直阵列。