会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Increased oil and gas production using elastic-wave stimulation
    • 使用弹性波刺激增加油气产量
    • US5950726A
    • 1999-09-14
    • US906585
    • 1997-08-05
    • John C. Roberts
    • John C. Roberts
    • E21B28/00E21B43/00E21B43/25G01V1/137
    • E21B43/003E21B28/00E21B43/25G01V1/137
    • An apparatus and method for increasing subterranean fluid production are disclosed. A downhole stimulation apparatus produces elastic wave energy which propagates into the subterranean strata of nearby fluid fields. The wave energy creates gravity separation of the fluids, altering the phase permeability of subterranean formations and causing the fluid to migrate to wells in the field being stimulated. The stimulation apparatus employs an underground casing which provides a sealed vessel in which is supported a tubing string. The casing and tubing string are filled with a working fluid. A pumping unit reciprocates a plunger within the tubing string to cyclically pressurize and depressurize the working fluid, the depressurization of working fluid creating the elastic wave energy.
    • 公开了一种用于增加地下液体生产的装置和方法。 井下刺激装置产生弹性波能量,其传播到附近流体场的地下层。 波浪能量产生流体的重力分离,改变地下地层的渗透性并使流体迁移到被刺激的场中的井。 刺激装置采用地下壳体,其提供密封容器,其中支撑有油管柱。 套管和管柱填充有工作流体。 泵送单元使管柱内的柱塞往复运动,以循环地对工作流体加压和减压,从而产生弹性波能量的工作流体的减压。
    • 7. 发明申请
    • III-NITRIDE MATERIALS INCLUDING LOW DISLOCATION DENSITIES AND METHODS ASSOCIATED WITH THE SAME
    • 三氮化物材料包括低偏差密度和与之相关的方法
    • US20100295056A1
    • 2010-11-25
    • US12748778
    • 2010-03-29
    • Edwin L. PinerJohn C. RobertsPradeep Rajagopal
    • Edwin L. PinerJohn C. RobertsPradeep Rajagopal
    • H01L29/20H01L21/20
    • C30B29/403C30B25/02H01L21/02381H01L21/02458H01L21/02488H01L21/02505H01L21/0251H01L21/02513H01L21/0254H01L21/02543
    • Semiconductor structures including one, or more, III-nitride material regions (e.g., gallium nitride material region) and methods associated with such structures are provided. The III-nitride material region(s) advantageously have a low dislocation density and, in particular, a low screw dislocation density. In some embodiments, the presence of screw dislocations in the III-nitride material region(s) may be essentially eliminated. The presence of a strain-absorbing layer underlying the III-nitride material region(s) and/or processing conditions can contribute to achieving the low screw dislocation densities. In some embodiments, the III-nitride material region(s) having low dislocation densities include a gallium nitride material region which functions as the active region of the device. The low screw dislocation densities of the active device region (e.g., gallium nitride material region) can lead to improved properties (e.g., electrical and optical) by increasing electron transport, limiting non-radiative recombination, and increasing compositional/growth uniformity, amongst other effects.
    • 提供包括一个或多个III族氮化物材料区域(例如,氮化镓材料区域)的半导体结构以及与这种结构相关联的方法。 III族氮化物材料区域有利地具有低位错密度,特别是低螺旋位错密度。 在一些实施方案中,可以基本上消除III族氮化物材料区域中螺旋位错的存在。 在III族氮化物材料区域和/或加工条件下存在应变吸收层有助于实现低螺旋位错密度。 在一些实施例中,具有低位错密度的III族氮化物材料区域包括用作该器件的有源区域的氮化镓材料区域。 活性器件区域(例如,氮化镓材料区域)的低螺旋位错密度可以通过增加电子传输,限制非辐射复合和增加组成/生长均匀性等而导致改进的性能(例如电和光学) 效果。