会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明授权
    • System and method for monitoring wafer stress
    • 用于监测晶片应力的系统和方法
    • US08293023B2
    • 2012-10-23
    • US12616415
    • 2009-11-11
    • John ValcoreMark KawaguchiCristian Paduraru
    • John ValcoreMark KawaguchiCristian Paduraru
    • B08B7/04
    • H01L21/67253H01L21/67051
    • A method of using a processing system that is operable to deposit liquid and to remove liquid by way of negative pressure. The method includes arranging a device to have at least one of the liquid deposited thereon by the processing system and the liquid removed therefrom by the processing system. The device has a sensor portion disposed thereon. The sensor portion can provide a sensor signal based on pressure related to the at least one of the liquid being deposited thereon by the processing system and the liquid being removed therefrom by the processing system. The method further includes performing at least one of depositing, by the processing system, the liquid onto the device and removing the liquid, by the processing system, from the device. The method still further includes providing the sensor signal, by the sensor portion, based on the pressure related to the at least one of the liquid being deposited onto the device and the liquid being removed from the device.
    • 一种使用可操作以沉积液体并通过负压去除液体的处理系统的方法。 该方法包括将装置设置成具有通过处理系统沉积在其上的液体中的至少一种,以及由处理系统从其中移出的液体。 该装置具有设置在其上的传感器部分。 传感器部分可以基于与由处理系统沉积在其上的液体中的至少一种相关的压力提供传感器信号,并且由处理系统从其中除去的液体。 该方法还包括执行由处理系统将液体沉积到装置上并且由处理系统从装置中去除液体中的至少一种。 该方法还包括通过传感器部分基于与被沉积到装置上的液体中的至少一种相关的压力和从装置移除的液体来提供传感器信号。
    • 5. 发明申请
    • SYSTEM AND METHOD FOR MONITORING WAFER STRESS
    • 用于监测波浪应力的系统和方法
    • US20110094538A1
    • 2011-04-28
    • US12616415
    • 2009-11-11
    • John ValcoreMark KawaguchiCristian Paduraru
    • John ValcoreMark KawaguchiCristian Paduraru
    • B08B3/04G05D16/00G01L19/12
    • H01L21/67253H01L21/67051
    • A method of using a processing system that is operable to deposit liquid and to remove liquid by way of negative pressure. The method includes arranging a device to have at least one of the liquid deposited thereon by the processing system and the liquid removed therefrom by the processing system. The device has a sensor portion disposed thereon. The sensor portion can provide a sensor signal based on pressure related to the at least one of the liquid being deposited thereon by the processing system and the liquid being removed therefrom by the processing system. The method further includes performing at least one of depositing, by the processing system, the liquid onto the device and removing the liquid, by the processing system, from the device. The method still further includes providing the sensor signal, by the sensor portion, based on the pressure related to the at least one of the liquid being deposited onto the device and the liquid being removed from the device.
    • 一种使用可操作以沉积液体并通过负压去除液体的处理系统的方法。 该方法包括将装置设置成具有通过处理系统沉积在其上的液体中的至少一种,以及由处理系统从其中移出的液体。 该装置具有设置在其上的传感器部分。 传感器部分可以基于与由处理系统沉积在其上的液体中的至少一种相关的压力提供传感器信号,并且由处理系统从其中除去的液体。 该方法还包括执行由处理系统将液体沉积到装置上并且由处理系统从装置中去除液体中的至少一种。 该方法还包括通过传感器部分基于与被沉积到装置上的液体中的至少一种相关的压力和从装置移除的液体来提供传感器信号。
    • 6. 发明申请
    • NON-DESTRUCTIVE SIGNAL PROPAGATION SYSTEM AND METHOD TO DETERMINE SUBSTRATE INTEGRITY
    • 非破坏性信号传播系统和确定基板完整性的方法
    • US20100283482A1
    • 2010-11-11
    • US12435934
    • 2009-05-05
    • John Valcore
    • John Valcore
    • G01R23/20
    • G01N29/11G01N29/075G01N29/2475G01N2291/044G01N2291/106G01N2291/2697H01L22/12
    • In various exemplary embodiments described herein, a system and associated method relate to non-destructive signal propagation to detect one or more defects in a substrate. The system can be built into a semiconductor process tool such as a substrate handling mechanism. The system comprises a transducer configured to convert one or more frequencies from an electrical signal into at least one mechanical pulse. The mechanical pulse is coupled to the substrate through the substrate handling mechanism. A plurality of sensors is positioned distal to the transducer and configured to be coupled, acoustically or mechanically, to the substrate. The plurality of distal sensors is further configured to detect both the mechanical pulse and any distortions to the pulse. A signal analyzer is coupled to the plurality of distal sensors to compare the detected pulse and any distortions to the pulse with a baseline response.
    • 在本文描述的各种示例性实施例中,系统和相关联的方法涉及非破坏性信号传播以检测衬底中的一个或多个缺陷。 该系统可以内置在诸如基板处理机构的半导体处理工具中。 该系统包括被配置为将一个或多个频率从电信号转换成至少一个机械脉冲的换能器。 机械脉冲通过基板处理机构耦合到基板。 多个传感器位于换能器的远侧并且被配置为与声学或机械地耦合到基底。 多个远端传感器还被配置为检测机械脉冲和对脉冲的任何失真。 信号分析器耦合到多个远端传感器,以将检测到的脉冲和具有基线响应的脉冲的任何失真进行比较。
    • 8. 发明申请
    • SYSTEM AND METHOD FOR WAFER CARRIER VIBRATION REDUCTION
    • 用于减少载波振幅的系统和方法
    • US20110094546A1
    • 2011-04-28
    • US12620338
    • 2009-11-17
    • John ValcoreValeriy LitvakChristine Cyterski
    • John ValcoreValeriy LitvakChristine Cyterski
    • B08B3/00
    • H01L21/67259H01L21/67028H01L21/67253
    • An aspect of the present invention provides a system and method for controlling a wafer cleaning system having a wafer carrier and a driving portion. The wafer carrier can move along a path in a first direction and a second direction. The driving portion can controllably move the wafer carrier in the first direction and the second direction. The control system includes a vibration sensor portion and a wafer carrier position controller. The vibration sensor portion can detect vibration of the wafer carrier and can output a vibration signal based on the detected vibration. The wafer carrier position controller can instruct the driving portion to modify motion of the wafer carrier based on the vibration signal to reduce the detected vibration.
    • 本发明的一个方面提供一种用于控制具有晶片载体和驱动部分的晶片清洁系统的系统和方法。 晶片载体可沿第一方向和第二方向的路径移动。 驱动部分可以在第一方向和第二方向上可控地移动晶片载体。 控制系统包括振动传感器部分和晶片载体位置控制器。 振动传感器部分可以检测晶片载体的振动,并且可以基于检测到的振动输出振动信号。 晶片载体位置控制器可以指示驱动部分基于振动信号修改晶片载体的运动,以减少检测到的振动。