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    • 9. 发明授权
    • High-performance one-transistor floating-body DRAM cell device
    • 高性能单晶体体浮体DRAM单元器件
    • US08947932B2
    • 2015-02-03
    • US12708342
    • 2010-02-18
    • Jong-Ho Lee
    • Jong-Ho Lee
    • H01L27/108H01L29/78
    • H01L29/7841H01L27/108H01L27/10802
    • Provided is a one-transistor (1T) floating-body DRAM cell device including a substrate; a gate stack which is formed on the substrate; a control electrode which is disposed on the substrate and of which some or entire portion is surrounded by the gate stack; a semiconductor layer which is formed on the gate stack; a source and a drain which are formed in the surface of the semiconductor layer and of which lower surfaces are not in contact with the gate stack; a gate insulating layer which is formed on the semiconductor layer; and a gate electrode which is formed on the gate insulating layer, wherein the remaining portion of the semiconductor layer excluding the source and the drain is configured as a floating body. The miniaturization characteristic and performance of a MOS-based DRAM cell device can be improved, and a memory capacity can be increased.
    • 提供了一种包括衬底的单晶体管(1T)浮体DRAM单元器件; 形成在基板上的栅极堆叠; 控制电极,其设置在所述基板上,并且其一些或全部部分被所述栅极堆叠包围; 形成在栅叠层上的半导体层; 源极和漏极,其形成在半导体层的表面中并且其下表面不与栅极堆叠接触; 形成在半导体层上的栅极绝缘层; 以及形成在所述栅极绝缘层上的栅极,其中,除了所述源极和漏极之外的所述半导体层的剩余部分被构造为浮体。 可以提高基于MOS的DRAM单元装置的小型化特性和性能,并且可以提高存储容量。