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1. 发明申请

US20110259879A1 Multi-Zone Induction Heating for Improved Temperature Uniformity in MOCVD and HVPE Chambers 审中-公开
标题翻译：多区域感应加热用于改善MOCVD和HVPE室中的温度均匀性
公开(公告)号：US20110259879A1
公开(公告)日：2011-10-27
申请号：US13092800
申请日：2011-04-22
申请人： Hiroji Hanawa , Kyawwin Jason Maung , Karl Brown
发明人： Hiroji Hanawa , Kyawwin Jason Maung , Karl Brown
IPC分类号： H05B6/10 , C23C16/458 , C30B35/00 , C23C16/46
CPC分类号： H05B6/105 , C23C16/4584 , C23C16/46 , C30B25/10
摘要： Embodiments of the invention generally relate to apparatuses and methods for utilizing a plurality of induction heat sources to uniformly heat a plurality of substrates within a processing chamber. By utilizing multiple heating zones that are each separately powered, the temperature distribution across the susceptor, over which the substrates rotate, may be uniform. The heat sources may be disposed outside of the processing chamber. In one embodiment, a processing chamber is provided which includes a susceptor disposed adjacent a first side of a window, a substrate carrier coupled with the susceptor, an inner inductive heating element disposed adjacent a second side of the window opposite the first side, an outer inductive heating element separate from and encompassing the inner inductive heating element and disposed adjacent to the second side of the window, and a parasitic load ring positioned below the outer inductive heating element.
摘要翻译：本发明的实施例一般涉及利用多个感应热源来均匀加热处理室内的多个基板的装置和方法。通过利用各自分别供电的多个加热区，基板旋转的基座上的温度分布可以是均匀的。热源可以设置在处理室的外部。在一个实施例中，提供了处理室，其包括邻近窗口的第一侧设置的基座，与基座耦合的基板载体，与第一侧相对的第二侧附近设置的内部感应加热元件，感应加热元件与内部感应加热元件分离并且包围内部感应加热元件并且邻近窗口的第二侧设置，以及位于外部感应加热元件下方的寄生负载环。

2. 发明申请

US20110308551A1 METHOD AND APPARATUS FOR INDUCING TURBULENT FLOW OF A PROCESSING CHAMBER CLEANING GAS 有权
标题翻译：用于诱导加工室清洁气体的涡流的方法和装置
公开(公告)号：US20110308551A1
公开(公告)日：2011-12-22
申请号：US13041230
申请日：2011-03-04
申请人： Hua Chung , Xizi Dong , Kyawwin Jason Maung , Hiroji Hanawa , Sang Won Kang , David H. Quach , Donald J.K. Olgado , David Bour , Wei-Yung Hsu , Alexander Tam , Anzhong Chang , Sumedh Acharya
发明人： Hua Chung , Xizi Dong , Kyawwin Jason Maung , Hiroji Hanawa , Sang Won Kang , David H. Quach , Donald J.K. Olgado , David Bour , Wei-Yung Hsu , Alexander Tam , Anzhong Chang , Sumedh Acharya
IPC分类号： B08B9/00 , B08B3/04
CPC分类号： B08B5/00 , C23C16/4405 , C23C16/45506 , C23C16/45591 , H01L21/02041 , H01L21/67115 , Y10S438/905
摘要： Embodiments of the invention generally relate to apparatus and methods for cleaning chamber components using a cleaning plate. The cleaning plate is adapted to be positioned on a substrate support during a cleaning process, and includes a plurality of turbulence-inducing structures. The turbulence-inducing structures induce a turbulent flow of cleaning gas while the cleaning plate is rotated during a cleaning process. The cleaning plate increases the retention time of the cleaning gas near the showerhead during cleaning. Additionally, the cleaning plate reduces concentration gradients within the cleaning plate to provide a more effective clean. The method includes positioning a cleaning plate adjacent to a showerhead, and introducing cleaning gas to the space between the showerhead and the cleaning plate. A material deposited on the surface of the showerhead is then heated and vaporized in the presence of the cleaning gas, and then exhausted from the processing chamber.
摘要翻译：本发明的实施例一般涉及使用清洁板清洁腔室部件的设备和方法。清洁板适于在清洁过程期间定位在基板支撑件上，并且包括多个湍流诱导结构。湍流诱导结构在清洁过程中清洁板旋转时引起清洁气体的湍流。在清洁过程中，清洁板增加了喷头附近清洁气体的停留时间。此外，清洁板减少清洁板内的浓度梯度以提供更有效的清洁。该方法包括将清洁板定位在与喷头相邻的位置，并将清洁气体引入到喷头和清洁板之间的空间。然后将沉积在喷头表面上的材料在清洁气体的存在下加热和蒸发，然后从处理室中排出。

3. 发明授权

US08455374B2 Radiation heating efficiency by increasing optical absorption of a silicon containing material 有权
标题翻译：通过增加含硅材料的光吸收来实现辐射加热效率
公开(公告)号：US08455374B2
公开(公告)日：2013-06-04
申请号：US13093584
申请日：2011-04-25
申请人： Hiroji Hanawa , Kyawwin Jason Maung
发明人： Hiroji Hanawa , Kyawwin Jason Maung
IPC分类号： H01L21/00
CPC分类号： H01L21/67115 , H01L21/68771
摘要： Embodiments of the present invention generally provide a process and apparatus for increasing the absorption coefficient of a chamber component disposed in a thermal process chamber. In one embodiment, a method generally includes providing a substrate carrier having a first surface and a second surface, the first surface is configured to support a substrate and being parallel and opposite to the second surface, subjecting the second surface of the substrate carrier to a surface treatment process to roughen the second surface of the substrate carrier, wherein the substrate carrier contains a material comprising silicon carbide, and forming an oxide-containing layer on the roughened second surface of the substrate carrier. The formed oxide-containing layer has optical absorption properties at wavelengths close to the radiation delivered from one or more energy sources used to heat the chamber component.
摘要翻译：本发明的实施例通常提供一种用于增加设置在热处理室中的腔室部件的吸收系数的方法和装置。在一个实施例中，一种方法通常包括提供具有第一表面和第二表面的衬底载体，所述第一表面被配置为支撑衬底并且与第二表面平行且相对，使衬底载体的第二表面经受使基底载体的第二表面粗糙化的表面处理工艺，其中基底载体含有包含碳化硅的材料，并在基底载体的粗糙化的第二表面上形成含氧化物层。形成的含氧化物层在接近从用于加热室部件的一个或多个能量源递送的辐射的波长处具有光学吸收特性。

4. 发明申请

US20110272709A1 RADIATION HEATING EFFICIENCY BY INCREASING OPTICAL ABSORPTION OF A SILICON CONTAINING MATERIAL 有权
标题翻译：通过增加光学吸收含硅材料的辐射加热效率
公开(公告)号：US20110272709A1
公开(公告)日：2011-11-10
申请号：US13093584
申请日：2011-04-25
申请人： HIROJI HANAWA , Kyawwin Jason Maung
发明人： HIROJI HANAWA , Kyawwin Jason Maung
IPC分类号： H01L33/60
CPC分类号： H01L21/67115 , H01L21/68771
摘要： Embodiments of the present invention generally provide a process and apparatus for increasing the absorption coefficient of a chamber component disposed in a thermal process chamber. In one embodiment, a method generally includes providing a substrate carrier having a first surface and a second surface, the first surface is configured to support a substrate and being parallel and opposite to the second surface, subjecting the second surface of the substrate carrier to a surface treatment process to roughen the second surface of the substrate carrier, wherein the substrate carrier contains a material comprising silicon carbide, and forming an oxide-containing layer on the roughened second surface of the substrate carrier. The formed oxide-containing layer has optical absorption properties at wavelengths close to the radiation delivered from one or more energy sources used to heat the chamber component.
摘要翻译：本发明的实施例通常提供一种用于增加设置在热处理室中的腔室部件的吸收系数的方法和装置。在一个实施例中，一种方法通常包括提供具有第一表面和第二表面的衬底载体，所述第一表面被配置为支撑衬底并且与第二表面平行且相对，使衬底载体的第二表面经受使基底载体的第二表面粗糙化的表面处理工艺，其中基底载体含有包含碳化硅的材料，并在基底载体的粗糙化的第二表面上形成含氧化物层。形成的含氧化物层在接近从用于加热室部件的一个或多个能量源递送的辐射的波长处具有光学吸收特性。

5. 发明授权

US08910644B2 Method and apparatus for inducing turbulent flow of a processing chamber cleaning gas 有权
标题翻译：用于引起处理室清洁气体的紊流的方法和装置
公开(公告)号：US08910644B2
公开(公告)日：2014-12-16
申请号：US13041230
申请日：2011-03-04
申请人： Hua Chung , Xizi Dong , Kyawwin Jason Maung , Hiroji Hanawa , Sang Won Kang , David H. Quach , Donald J. K. Olgado , David Bour , Wei-Yung Hsu , Alexander Tam , Anzhong Chang , Sumedh Acharya
发明人： Hua Chung , Xizi Dong , Kyawwin Jason Maung , Hiroji Hanawa , Sang Won Kang , David H. Quach , Donald J. K. Olgado , David Bour , Wei-Yung Hsu , Alexander Tam , Anzhong Chang , Sumedh Acharya
IPC分类号： B08B3/02 , B08B5/00 , C23C16/44 , C23C16/455 , H01L21/02 , H01L21/67
CPC分类号： B08B5/00 , C23C16/4405 , C23C16/45506 , C23C16/45591 , H01L21/02041 , H01L21/67115 , Y10S438/905
摘要： Embodiments of the invention generally relate to apparatus and methods for cleaning chamber components using a cleaning plate. The cleaning plate is adapted to be positioned on a substrate support during a cleaning process, and includes a plurality of turbulence-inducing structures. The turbulence-inducing structures induce a turbulent flow of cleaning gas while the cleaning plate is rotated during a cleaning process. The cleaning plate increases the retention time of the cleaning gas near the showerhead during cleaning. Additionally, the cleaning plate reduces concentration gradients within the cleaning plate to provide a more effective clean. The method includes positioning a cleaning plate adjacent to a showerhead, and introducing cleaning gas to the space between the showerhead and the cleaning plate. A material deposited on the surface of the showerhead is then heated and vaporized in the presence of the cleaning gas, and then exhausted from the processing chamber.
摘要翻译：本发明的实施例一般涉及使用清洁板清洁腔室部件的设备和方法。清洁板适于在清洁过程期间定位在基板支撑件上，并且包括多个湍流诱导结构。湍流诱导结构在清洁过程中清洁板旋转时引起清洁气体的湍流。在清洁过程中，清洁板增加了喷头附近清洁气体的停留时间。此外，清洁板减少清洁板内的浓度梯度以提供更有效的清洁。该方法包括将清洁板定位在与喷头相邻的位置，并将清洁气体引入到喷头和清洁板之间的空间。然后将沉积在喷头表面上的材料在清洁气体的存在下加热和蒸发，然后从处理室中排出。

6. 外观设计

USD664170S1 Cleaning plate for inducing turbulent flow of a processing chamber cleaning glass 有权
标题翻译：用于引起处理室清洁玻璃的湍流的清洁板
公开(公告)号：USD664170S1
公开(公告)日：2012-07-24
申请号：US29386850
申请日：2011-03-04
申请人： Hua Chung , Xizi Dong , Kyawwin Jason Maung , Hiroji Hanawa , Sang Won Kang , David H. Quach , Donald J. K. Olgado , David Bour , Wei-Yung Hsu , Alexander Tam , Anzhong Chang , Sumedh Acharya
设计人： Hua Chung , Xizi Dong , Kyawwin Jason Maung , Hiroji Hanawa , Sang Won Kang , David H. Quach , Donald J. K. Olgado , David Bour , Wei-Yung Hsu , Alexander Tam , Anzhong Chang , Sumedh Acharya

7. 发明申请

US20120052216A1 GAS DISTRIBUTION SHOWERHEAD WITH HIGH EMISSIVITY SURFACE 审中-公开
标题翻译：具有高功率表面的气体分配淋浴
公开(公告)号：US20120052216A1
公开(公告)日：2012-03-01
申请号：US13154060
申请日：2011-06-06
申请人： Hiroji Hanawa , Kyawwin Jason Maung , Hua Chung , Jie Cui , David Bour , Wei-Yung Hsu , Liang-Yuh Chen
发明人： Hiroji Hanawa , Kyawwin Jason Maung , Hua Chung , Jie Cui , David Bour , Wei-Yung Hsu , Liang-Yuh Chen
IPC分类号： C23C16/48
CPC分类号： C23C16/45565 , C23C16/45574 , C23C16/481 , C23C16/52
摘要： Embodiments of the present invention provide methods and apparatus for surface coatings applied to process chamber components utilized in chemical vapor deposition processes. In one embodiment, the apparatus provides a showerhead apparatus comprising a body, a plurality of conduits extending through the body, each of the plurality of conduits having an opening extending to a processing surface of the body, and a coating disposed on the processing surface, the coating being about 50 microns to about 200 microns thick and comprising a coefficient of emissivity of about 0.8, an average surface roughness of about 180 micro-inches to about 220 micro-inches, and a porosity of about 15% or less.
摘要翻译：本发明的实施例提供了应用于化学气相沉积工艺中使用的处理腔室部件的表面涂层的方法和装置。在一个实施例中，该装置提供一种喷头装置，其包括主体，延伸穿过主体的多个导管，多个导管中的每一个具有延伸到主体的处理表面的开口，以及设置在处理表面上的涂层，该涂层为约50微米至约200微米厚，并且包括约0.8的发射率系数，约180微英寸至约220微英寸的平均表面粗糙度，以及约15％或更小的孔隙率。

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