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1. 发明授权

US08808793B2 Disc vapor lubrication 有权
标题翻译：圆盘蒸气润滑
公开(公告)号：US08808793B2
公开(公告)日：2014-08-19
申请号：US12905991
申请日：2010-10-15
申请人： Paul Stephen McLeod
发明人： Paul Stephen McLeod
IPC分类号： C23C16/00 , C23C16/448 , C23C16/455 , C23C16/458 , C23C16/54 , C23C14/24 , B05D5/08
CPC分类号： C23C16/4485 , B05D1/60 , B05D5/08 , B05D5/083 , C23C14/243 , C23C16/448 , C23C16/455 , C23C16/45563 , C23C16/45565 , C23C16/458 , C23C16/4582 , C23C16/4587 , C23C16/54 , G11B5/8408 , G11B11/10582 , G11B11/10584
摘要： A method comprising introducing a workpiece support into a chamber of an apparatus. The workpiece support is for supporting thereon a plurality of workpieces. The apparatus comprising: the chamber having an interior space configured to be maintained at a pressure below atmospheric pressure; a vapor source for supplying the interior space of the chamber with a linearly extending stream of lubricant vapor; the workpiece support for supporting thereon a plurality of workpieces with surfaces facing the vapor source; and a conveyor for continuously moving the workpiece support transversely past the linearly extending stream of lubricant vapor from the vapor source. The method also comprising continuously moving the workpiece support with the plurality of workpieces supported thereon transversely past the linearly extending stream of lubricant vapor from the vapor source and depositing a uniform thickness film of the lubricant on at least one surface of each of the plurality of workpieces.
摘要翻译：一种方法，包括将工件支撑件引入装置的室中。工件支撑件用于在其上支撑多个工件。该装置包括：该室具有被配置为保持在低于大气压的压力的内部空间; 用于向腔室的内部空间供应线性延伸的润滑剂蒸汽流的蒸汽源; 用于在其上支撑具有面向蒸气源的表面的多个工件的工件支撑件; 以及用于将工件支撑件横向移动通过来自蒸汽源的线性延伸的润滑剂蒸汽流的输送机。该方法还包括使支撑在其上的多个工件连续移动工件支撑件横向地从蒸气源穿过线性延伸的润滑剂蒸汽流，并将均匀的厚度的润滑剂膜沉积在多个工件中的每一个的至少一个表面上。

2. 发明授权

US06613151B1 Single disc vapor lubrication 有权
标题翻译：单盘蒸汽润滑
公开(公告)号：US06613151B1
公开(公告)日：2003-09-02
申请号：US09798934
申请日：2001-03-06
申请人： Michael Joseph Stirniman , Paul Stephen McLeod
发明人： Michael Joseph Stirniman , Paul Stephen McLeod
IPC分类号： H01L2144
CPC分类号： B05D1/60 , B05D5/083 , G11B5/8408
摘要： Vapor deposition of a uniform thickness thin film of lubricant on at least one surface of a substrate, comprises the steps of: (a) providing an apparatus comprising: (i) a chamber having an interior space maintained below atmospheric pressure; (ii) a substrate loader/unloader for supplying the interior space with at least one substrate and for withdrawing at least one substrate from the interior space; (iii) at least one lubricant vapor source for supplying the interior space with a stream of lubricant vapor; and (iv) a substrate transporter/conveyor for continuously moving at least one substrate past the stream of vapor from the at least one lubricant vapor source; (b) supplying the interior space with a substrate having at least one surface; (c) continuously moving the substrate past the stream of lubricant vapor and depositing a uniform thickness thin film of the lubricant on the at least one surface; and (d) withdrawing the lubricant-coated substrate from the interior space. The invention has particular utility in depositing thin films of polymeric lubricants onto disc-shaped substrates in the manufacture of magnetic and MO recording media.
摘要翻译：均匀厚度的润滑剂薄膜在衬底的至少一个表面上的气相沉积包括以下步骤：（a）提供一种装置，包括：（i）具有保持在大气压以下的内部空间的室;（ii）用于向内部空间供应至少一个基板并用于从内部空间抽出至少一个基板;（iii）至少一个润滑剂蒸汽源，用于向内部空间供应润滑剂蒸汽流; （iv）用于从至少一个润滑剂蒸汽源连续地移动至少一个基板通过蒸汽流的基底输送器/输送器;（b）向内部空间供应具有至少一个表面的基底;（c）连续地将衬底移动通过润滑剂蒸汽流并在该至少一个表面上沉积均匀厚度的润滑剂薄膜; 并且（d）从内部空间中取出润滑剂涂覆的基材。本发明在将磁性和MO记录介质的制造中将聚合物润滑剂的薄膜沉积到盘形基材上具有特别的用途。

3. 发明授权

US06582572B2 Target fabrication method for cylindrical cathodes 失效
标题翻译：圆柱形阴极的目标制造方法
公开(公告)号：US06582572B2
公开(公告)日：2003-06-24
申请号：US09871051
申请日：2001-05-31
申请人： Paul Stephen McLeod
发明人： Paul Stephen McLeod
IPC分类号： C23C1434
CPC分类号： C23C14/3407 , Y10T29/49 , Y10T29/49826 , Y10T29/49885 , Y10T29/49906
摘要： A method for fabricating cylindrical sputter targets for rotary cylindrical cathodes used in depositing a dielectric layer of desired alloy on non-planar substrates during sputtering is disclosed. The method includes forming a cooling tube having a passage within to receive a cooling medium, then fabricating multiple annular rings including each of the basic metal constituents of the desired alloy and attaching the annular rings to the cooling tube such that the exposed outer portions of the annular rings provide a homogeneous layer of the desired alloy on the non-planar substrates during sputtering.
摘要翻译：公开了一种用于制造用于在溅射期间在非平面基板上沉积所需合金的电介质层的旋转圆柱形阴极的圆柱形溅射靶的方法。该方法包括形成具有通道以便接收冷却介质的冷却管，然后制造包括所需合金的每个基本金属成分的多个环形环，并将环形环附接到冷却管，使得暴露的外部部分环形环在溅射期间在非平面基板上提供所需合金的均匀层。

4. 发明授权

US06482301B1 Target shields for improved magnetic properties of a recording medium 有权
标题翻译：用于提高记录介质的磁性能的目标屏蔽
公开(公告)号：US06482301B1
公开(公告)日：2002-11-19
申请号：US09326245
申请日：1999-06-04
申请人： Qixu Chen , Charles Leu , Mark Anthony Shows , Paul Stephen McLeod , Rajiv Yadav Ranjan
发明人： Qixu Chen , Charles Leu , Mark Anthony Shows , Paul Stephen McLeod , Rajiv Yadav Ranjan
IPC分类号： C23C1432
CPC分类号： G11B5/851 , C23C14/34 , H01J37/34 , H01J37/3447
摘要： A collimator system is disclosed for use in an in-line pass-by sputtering system during the fabrication of recording media to improve the data storage density and read/write performance characteristics of the media. The collimator system includes a collimator shield and a collimator honeycomb. The shield includes a rectangular tube having a flange and a frame at inner and outer ends, respectively. The various components of the shield in part serve to prevent possible contamination of substrates due to target atom accumulation on the chamber walls during the sputtering process. The collimator honeycomb is provided for blocking target atoms from contacting the substrate at low incident angles. The collimator honeycomb is comprised of a plurality of collimators which are identical to each other. In a preferred embodiment, the collimators have a hexagonal cross-section taken from a perspective perpendicular to the substrate. The collimators may also have other geometric shapes. It is also contemplated that more than one collimator honeycomb level be used in alternative embodiments.
摘要翻译：在制造记录介质期间公开了一种用于在线传递溅射系统的准直器系统，以改善数据存储密度和读/写性能特性。准直仪系统包括准直器屏蔽和准直器蜂窝。护罩包括分别在内端和外端具有凸缘和框架的矩形管。屏蔽件的各种部件部分地用于防止在溅射过程期间由于靶室原子在室壁上的积聚而引起的基板的可能污染。提供准直器蜂窝用于阻止目标原子以低入射角接触基板。准直器蜂窝体由多个彼此相同的准直器构成。在优选实施例中，准直器具有垂直于衬底的透视图的六边形截面。准直器也可以具有其他几何形状。还可以想到，在替代实施例中可以使用多于一个准直器蜂窝等级。

5. 发明授权

US08652310B2 Trim magnets to adjust erosion rate of cylindrical sputter targets 有权
标题翻译：调整磁铁以调整圆柱形溅射靶的侵蚀速率
公开(公告)号：US08652310B2
公开(公告)日：2014-02-18
申请号：US12179094
申请日：2008-07-24
申请人： Paul Stephen McLeod
发明人： Paul Stephen McLeod
IPC分类号： C23C14/34
CPC分类号： C23C14/3407 , C23C14/35 , H01J37/3405 , H01J37/342 , H01J37/3455 , H01J37/3461
摘要： A cylindrical magnetron sputtering apparatus includes a rotating cylindrical sputtering target, a non-rotating magnet structure within the cylindrical sputtering target and at least one non-rotating trim magnet adjacent an end of the magnet structure. The trim magnets are manipulated during operation of the apparatus to alter a magnetic field produced by the magnet structure within the cylindrical sputtering cathode. As a result the shape of a racetrack discharge plasma formed at an end of the sputtering target is altered such that the formation of an erosion groove is avoided.
摘要翻译：圆柱形磁控管溅射装置包括旋转圆柱形溅射靶，圆柱形溅射靶内的非旋转磁体结构和与磁体结构的一端相邻的至少一个非旋转镶嵌磁体。在装置的操作期间操纵修剪磁体以改变由圆柱形溅射阴极内的磁体结构产生的磁场。结果，形成在溅射靶的端部处的跑道放电等离子体的形状被改变，从而避免形成侵蚀槽。

6. 发明申请

US20100018854A1 TRIM MAGNETS TO ADJUST EROSION RATE OF CYLINDRICAL SPUTTER TARGETS 有权
标题翻译： TRIM MAGNETS调整圆柱体溅射靶的腐蚀速率
公开(公告)号：US20100018854A1
公开(公告)日：2010-01-28
申请号：US12179094
申请日：2008-07-24
申请人： Paul Stephen McLeod
发明人： Paul Stephen McLeod
IPC分类号： C23C14/00
CPC分类号： C23C14/3407 , C23C14/35 , H01J37/3405 , H01J37/342 , H01J37/3455 , H01J37/3461
摘要： A cylindrical magnetron sputtering apparatus includes a rotating cylindrical sputtering target, a non-rotating magnet structure within the cylindrical sputtering target and at least one non-rotating trim magnet adjacent an end of the magnet structure. The trim magnets are manipulated during operation of the apparatus to alter a magnetic field produced by the magnet structure within the cylindrical sputtering cathode. As a result the shape of a racetrack discharge plasma formed at an end of the sputtering target is altered such that the formation of an erosion groove is avoided.
摘要翻译：圆柱形磁控管溅射装置包括旋转圆柱形溅射靶，圆柱形溅射靶内的非旋转磁体结构和与磁体结构的一端相邻的至少一个非旋转镶嵌磁体。在装置的操作期间操纵修剪磁体以改变由圆柱形溅射阴极内的磁体结构产生的磁场。结果，形成在溅射靶的端部处的跑道放电等离子体的形状被改变，从而避免形成侵蚀槽。

7. 发明授权

US07041202B2 Timing apparatus and method to selectively bias during sputtering 失效
标题翻译：在溅射期间选择性偏置的定时装置和方法
公开(公告)号：US07041202B2
公开(公告)日：2006-05-09
申请号：US10629772
申请日：2003-07-28
申请人： Paul Stephen McLeod
发明人： Paul Stephen McLeod
IPC分类号： C23C14/34
CPC分类号： C23C14/345 , C23C14/3464 , C23C14/352 , C23C14/568 , H01J37/32779 , H01J37/34
摘要： A system and method for sputtering using a plurality of different bias voltages, a plurality of target-cathodes that can be powered at different voltages disposed along said path of travel, and a controller configured to selectively vary the target-cathode voltage and the pallet bias voltage while the pallet moves along the path of travel. The target-cathodes are spaced apart along the path of travel by a distance less than a length of the pallet and on both sides of the path of travel. The controller can include a timing circuit for synchronizing changes in the target-cathode voltages with changes in the pallet bias voltage.
摘要翻译：使用多个不同偏置电压进行溅射的系统和方法，可沿着所述行进路径设置的不同电压供电的多个目标阴极和被配置为选择性地改变目标阴极电压和托盘偏压的控制器而托盘沿着行进路径移动。目标阴极沿着行进路径间隔一段距离小于托盘的长度和行进路径两侧的距离。控制器可以包括用于使目标阴极电压的变化与托盘偏置电压的变化同步的定时电路。

8. 发明授权

US06808741B1 In-line, pass-by method for vapor lubrication 失效
标题翻译：在线，蒸汽润滑的通过方法
公开(公告)号：US06808741B1
公开(公告)日：2004-10-26
申请号：US10078495
申请日：2002-02-21
申请人： Paul Stephen McLeod
发明人： Paul Stephen McLeod
IPC分类号： B05D512
CPC分类号： C23C16/4485 , B05D1/60 , B05D5/08 , B05D5/083 , C23C14/243 , C23C16/448 , C23C16/455 , C23C16/45563 , C23C16/45565 , C23C16/458 , C23C16/4582 , C23C16/4587 , C23C16/54 , G11B5/8408 , G11B11/10582 , G11B11/10584
摘要： An apparatus for performing simultaneous pass-by vapor deposition of a uniform thickness thin film of a lubricant on at least one surface of each of a plurality of substrates, comprising: (a) chamber means having an interior space adapted to be maintained at a reduced pressure below atmospheric pressure, including entrance and exit means at opposite ends thereof; (b) at least one linearly extending vapor source means for supplying the interior space of the chamber with at least one linearly extending stream of lubricant vapor; (c) a substrate/workpiece mounting/supporting means adapted for supporting thereon a plurality of substrates/workpieces; and (d) a transporter/conveyor means for continuously moving the substrate/workpiece mounting/supporting means transversely past the at least one linearly extending stream of lubricant vapor for depositing a uniform thickness thin film of lubricant on the surfaces of each of a plurality of substrates/workpieces carried by the substrate/workpiece mounting/supporting means. Embodiments of the method of the invention include depositing lubricant thin films on freshly deposited carbon-containing protective overcoats formed on disc-shaped magnetic and/or magneto-optical recording media.
摘要翻译：一种用于在多个基板中的每一个的至少一个表面上执行均匀厚度的润滑剂薄膜的同时蒸发沉积的装置，包括：（a）腔室装置，其具有适于保持在减小的压力低于大气压力，包括在其相对端处的入口和出口装置;（b）至少一个线性延伸的蒸气源装置，用于向腔室的内部空间提供至少一个线性延伸的润滑剂蒸汽流;（c） /工件安装/支撑装置，适于在其上支撑多个基板/工件; 和（d）用于将衬底/工件安装/支撑装置横向移动通过所述至少一个线性延伸的润滑剂蒸汽流的运输机/输送机装置，用于在多个的每个的表面上沉积均匀的厚度的润滑剂薄膜由基板/工件安装/支撑装置承载的基板/工件。本发明的方法的实施例包括在形成在盘形磁和/或磁光记录介质上的新沉积的含碳保护外涂层上沉积润滑剂薄膜。

9. 发明授权

US06605195B2 Multi-layer deposition process using four ring sputter sources 失效
公开(公告)号：US06605195B2
公开(公告)日：2003-08-12
申请号：US09834102
申请日：2001-04-12
申请人： Paul Stephen McLeod
发明人： Paul Stephen McLeod
IPC分类号： C23C1434
CPC分类号： H01J37/3414 , C23C14/3464 , H01J37/34
摘要： A sputtering apparatus for depositing layers of material onto a substrate includes a vacuum chamber, a first target and a second target positioned within the vacuum chamber. A source of power is placed in electrical communication with the first target and the second target. A switch alternately connects the source of power between the first target and the second target. The first target and the second target are different materials. The switch connects power to the first target when the transport mechanism positions the substrate near the first target and the switch connects power to the second target when the transport mechanism positions the substrate closer to the second target.

10. 发明授权

US06290821B1 Sputter deposition utilizing pulsed cathode and substrate bias power 有权
标题翻译：溅射沉积利用脉冲阴极和衬底偏置功率
公开(公告)号：US06290821B1
公开(公告)日：2001-09-18
申请号：US09533696
申请日：2000-03-23
申请人： Paul Stephen McLeod
发明人： Paul Stephen McLeod
IPC分类号： C23C1434
CPC分类号： C23C14/345 , C23C14/34 , C23C14/568
摘要： A method for depositing on a substrate surface a thin film layer comprising a target material comprises providing a cathode including a target having a sputtering surface comprised of the target material, with the target sputtering surface facing the substrate surface with a space therebetween, and sputtering the target material onto the substrate surface by applying a plurality of negative voltage pulses to the cathode while simultaneously applying a bias voltage to the substrate. Embodiments include depositing thin film layers onto static or moving substrates and application of constant or time-varying substrate bias voltage. The invention finds particular utility in the formation of high purity layers in the automated manufacture of magnetic data/information storage and retrieval media.
摘要翻译：一种在衬底表面上沉积包括目标材料的薄膜层的方法包括提供包括靶的阴极，所述靶具有由靶材料组成的溅射表面，靶溅射表面与衬底表面相对置，并且溅射通过向阴极施加多个负电压脉冲，同时向衬底施加偏置电压，将目标材料涂覆到衬底表面上。实施例包括将薄膜层沉积到静态或移动的衬底上以及施加恒定或随时间变化的衬底偏置电压。本发明在磁数据/信息存储和检索介质的自动制造中形成高纯度层具有特别的用途。

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