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1. 发明授权

US08810902B2 Multi-pass optical apparatus 有权
标题翻译：多路光学仪器
公开(公告)号：US08810902B2
公开(公告)日：2014-08-19
申请号：US12980939
申请日：2010-12-29
申请人： Richard L. Sandstrom
发明人： Richard L. Sandstrom
IPC分类号： G02B5/08 , H01S4/00 , G02B7/182 , G02B17/00 , G02B7/18 , H01S3/07 , H01S3/23
CPC分类号： G02B17/004 , G02B7/1815 , G02B7/1825 , H01S3/076 , H01S3/2325
摘要： An apparatus includes a first plurality of concave reflecting surfaces; a second plurality of reflecting surfaces facing the first plurality of concave reflecting surfaces such that a region is defined between the first and second pluralities; and an input for an optical beam to enter the region and an output for the optical beam to exit the region. The first and second pluralities of reflecting surfaces are arranged relative to each other so that the optical beam is re-imaged at a reflecting surface of one of the pluralities after only one reflection from a reflecting surface of the other of the pluralities and so that overlap of two or more optical beams on each of the reflecting surfaces is avoided.
摘要翻译：一种装置包括：第一多个凹面反射面; 面对所述第一多个凹反射表面的第二多个反射表面，使得在所述第一和第二多个之间限定区域; 以及用于进入该区域的光束的输入和用于使光束离开该区域的输出。第一和第二多个反射表面相对于彼此布置，使得光束在仅一次反射之后的多个反射表面中从多个另一个的反射表面重新成像，并且重叠避免了在每个反射表面上的两个或更多个光束。

2. 再颁专利

USRE42588E1 Control system for a two chamber gas discharge laser system 有权
标题翻译：双室气体放电激光系统控制系统
公开(公告)号：USRE42588E1
公开(公告)日：2011-08-02
申请号：US11352522
申请日：2006-02-10
申请人： John P. Fallon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher , John A. Rule , Robert N. Jacques
发明人： John P. Fallon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher , John A. Rule , Robert N. Jacques
IPC分类号： H01S3/22
CPC分类号： H01S3/2333 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Feedback timing control techniques are provided for controlling the relative timing of the discharges in the two chambers with an accuracy in the range of about 2 to 5 billionths of a second even in burst mode operation. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.
摘要翻译：本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。在优选实施例中，激光器是具有主振荡器的生产线机器，该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。提供了反馈定时控制技术，即使在脉冲串模式操作中，也可以精确地控制两个室中的放电的相对定时，其精确度在大约2至50亿分之一秒的范围内。该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。

3. 发明申请

US20110122901A1 HIGH POWER HIGH PULSE REPETITION RATE GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：高功率高脉冲重复率气体放电激光系统
公开(公告)号：US20110122901A1
公开(公告)日：2011-05-26
申请号：US13020330
申请日：2011-02-03
申请人： Richard L. Sandstrom , William N. Partlo , Daniel J.W. Brown
发明人： Richard L. Sandstrom , William N. Partlo , Daniel J.W. Brown
IPC分类号： H01S3/10
CPC分类号： H01S3/08009 , H01S3/08031 , H01S3/08059 , H01S3/097 , H01S3/1055
摘要： A method of line narrowing for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses includes selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on a dispersive surface of a dispersive wavelength selection optic; changing the curvature of the dispersive surface in a first manner that includes imparting a catenary curvature to the dispersive surface; and changing the curvature of the dispersive surface in a second manner that includes imparting a cylindrical curvature to the dispersive surface.
摘要翻译：窄带DUV高功率高重复率气体放电激光器产生输出激光脉冲束脉冲的脉冲串的方法包括为至少部分地由入射角确定的每个脉冲选择至少一个中心波长，所述激光束在所述分散波长选择光学器件的分散表面上包含相应的脉冲; 以第一种方式改变分散表面的曲率，包括向分散表面施加悬链曲率; 并且以第二种方式改变分散表面的曲率，包括向分散表面施加圆柱形曲率。

4. 发明申请

US20110058580A1 EXTENDABLE ELECTRODE FOR GAS DISCHARGE LASER 有权
标题翻译：用于气体放电激光器的可扩展电极
公开(公告)号：US20110058580A1
公开(公告)日：2011-03-10
申请号：US12945719
申请日：2010-11-12
申请人： Richard L. Sandstrom , Tae (Mark) H. Chung , Richard C. Ujazdowski
发明人： Richard L. Sandstrom , Tae (Mark) H. Chung , Richard C. Ujazdowski
IPC分类号： H01S3/097 , H01S3/00
CPC分类号： H01S3/038 , H01S3/0381 , H01S3/09705 , H01S3/0971 , H01S3/225 , H01S3/2366
摘要： A movable electrode assembly for use in laser system includes a first electrode, a second electrode arranged opposite from the first electrode, the second electrode being spaced apart from the first electrode by a discharge gap and a discharge gap adjuster interfaced with at least one of the second electrode or the first electrode, the discharge gap adjuster configured to adjust the discharge gap. A movable electrode assembly for integration into a housing of a laser system includes a first electrode having a discharge surface, a second electrode having a discharge surface, such that the discharge surface of the first electrode and the discharge surface of the second electrode face each other in a spaced apart setting that defines a desired discharge gap, and a mechanism for moveably adjusting the spaced apart setting toward the desired discharge gap. A method of adjusting a discharge gap is also disclosed.
摘要翻译：用于激光系统的可移动电极组件包括第一电极，与第一电极相对设置的第二电极，第二电极通过放电间隙与第一电极间隔开，放电间隙调节器与至少一个第二电极或第一电极，放电间隙调节器被配置为调节放电间隙。用于集成到激光系统的壳体中的可动电极组件包括具有放电表面的第一电极，具有放电表面的第二电极，使得第一电极的放电表面和第二电极的放电表面彼此面对在间隔开的设置中限定期望的放电间隙，以及用于可移动地将间隔开的设置调节到期望的放电间隙的机构。还公开了一种调节放电间隙的方法。

5. 发明授权

US07838854B2 Method and apparatus for EUV plasma source target delivery 有权
标题翻译：用于EUV等离子体源目标传递的方法和装置
公开(公告)号：US07838854B2
公开(公告)日：2010-11-23
申请号：US12220560
申请日：2008-07-25
申请人： J. Martin Algots , Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Oscar Hemberg , Alexander N. Bykanov , Dennis W. Cobb
发明人： J. Martin Algots , Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Oscar Hemberg , Alexander N. Bykanov , Dennis W. Cobb
IPC分类号： H01J35/20
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006
摘要： An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.
摘要翻译：公开了一种EUV等离子体形成靶递送系统和方法，其可以包括：目标液滴形成机构，其包括磁阻或电子限制材料，终止于输出孔的液体等离子体源材料通道; 将电荷施加到液滴形成喷射流或沿着选定路径离开通道的各个液滴的充电机构; 在输出孔之间的液滴偏转器和等离子体引发位置周期性地偏转来自所选择的路径的液滴;液体靶材料输送机构，包括具有输入开口和输出孔的液体靶材料输送通道; 产生在液体目标材料内的干扰力的电动干扰力产生机构，具有输出孔的液体目标传送液滴形成机构; 和/或围绕输出孔周边的润湿屏障。

6. 发明授权

US07564888B2 High power excimer laser with a pulse stretcher 有权
标题翻译：具有脉冲担架的大功率准分子激光器
公开(公告)号：US07564888B2
公开(公告)日：2009-07-21
申请号：US11805583
申请日：2007-05-23
申请人： Alexander I. Ershov , James J. Ferrell , Thomas Hofmann , Daniel J. Reiley , Christopher R. Remen , Richard L. Sandstrom
发明人： Alexander I. Ershov , James J. Ferrell , Thomas Hofmann , Daniel J. Reiley , Christopher R. Remen , Richard L. Sandstrom
IPC分类号： H01S3/22 , H01S3/10
CPC分类号： H01S3/225 , H01S3/0057 , H01S3/03 , H01S3/034
摘要： An apparatus and method is disclosed which may comprise a high power excimer or molecular fluorine gas discharge laser DUV light source system which may comprise: a pulse stretcher which may comprise: an optical delay path mirror, an optical delay path mirror gas purging assembly which may comprise: a purging gas supply system directing purging gas across a face of the optical delay line mirror. The optical delay path mirror may comprise a plurality of optical delay path mirrors; the purging gas supply system may direct purging gas across a face of each of the plurality of optical delay line mirrors. The purging gas supply system may comprise: a purging gas supply line; a purging gas distributing and directing mechanism which may direct purging gas across the face of the respective optical delay path mirror.
摘要翻译：公开了一种装置和方法，其可以包括高功率准分子或分子氟气体放电激光DUV光源系统，其可以包括：脉冲展宽器，其可以包括：光学延迟路径反射镜，光学延迟路径镜气体清洗组件，其可以包括：吹扫气体供应系统，其引导净化气体穿过光学延迟线反射镜的表面。光学延迟路径镜可以包括多个光学延迟路径镜; 净化气体供应系统可以引导净化气体穿过多个光学延迟线反射镜中的每一个的表面。净化气体供应系统可以包括：净化气体供应管线; 吹扫气体分配和引导机构，其可以将吹扫气体引导通过相应的光学延迟路径反射镜的表面。

7. 发明申请

US20090080476A1 Immersion lithography laser light source with pulse stretcher 有权
标题翻译：浸没光刻激光光源带脉冲担架
公开(公告)号：US20090080476A1
公开(公告)日：2009-03-26
申请号：US11973671
申请日：2007-10-10
申请人： William N. Partlo , Alexander I. Ershov , German Rylov , Igor V. Fomenkov , Daniel J.W. Brown , Christian J. Wittak , Rajasekhar M. Rao , Robert A. Bergstedt , John Fitzgerald , Richard L. Sandstrom , Vladimir B. Fleurov , Robert N. Jacques , Ed Danielewicz , Robin Swain , Edward Arriola , Mike Wyatt , Walter Crosby
发明人： William N. Partlo , Alexander I. Ershov , German Rylov , Igor V. Fomenkov , Daniel J.W. Brown , Christian J. Wittak , Rajasekhar M. Rao , Robert A. Bergstedt , John Fitzgerald , Richard L. Sandstrom , Vladimir B. Fleurov , Robert N. Jacques , Ed Danielewicz , Robin Swain , Edward Arriola , Mike Wyatt , Walter Crosby
IPC分类号： H01S3/139 , H01S3/083
CPC分类号： H01S3/0057 , G03F7/70341 , G03F7/70583
摘要： An apparatus and method which may comprise a pulsed gas discharge laser which may comprise a seed laser portion; an amplifier portion receiving the seed laser output and amplifying the optical intensity of each seed pulse; a pulse stretcher which may comprise: a first beam splitter operatively connected with the first delay path and a second pulse stretcher operatively connected with the second delay path; a first optical delay path tower containing the first beam splitter; a second optical delay path tower containing the second beam splitter; one of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors located in the first tower and in the second tower; the other of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors only in one of the first tower and the second tower.
摘要翻译：一种可包括可包括种子激光器部分的脉冲气体放电激光器的装置和方法; 接收种子激光输出并放大每个种子脉冲的光强度的放大器部分; 脉冲展开器，其可以包括：与第一延迟路径可操作地连接的第一分束器和与第二延迟路径可操作地连接的第二脉冲展开器; 包含第一分束器的第一光学延迟路径塔; 包含第二分束器的第二光学延迟路径塔; 第一和第二光学延迟路径中的一个可以包括：多个反射镜，其限定相应的光学延迟路径，包括位于第一塔架和第二塔架中的反射镜; 第一和第二光学延迟路径中的另一个可以包括：多个反射镜限定相应的光学延迟路径，其仅包括在第一塔架和第二塔架之一中的镜子。

8. 发明申请

US20080283776A1 Method and apparatus for EUV plasma source target delivery 有权
公开(公告)号：US20080283776A1
公开(公告)日：2008-11-20
申请号：US12220560
申请日：2008-07-25
申请人： J. Martin Algots , Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Oscar Hemberg , Alexander N. Bykanov , Dennis W. Cobb
发明人： J. Martin Algots , Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Oscar Hemberg , Alexander N. Bykanov , Dennis W. Cobb
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006
摘要： An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.

9. 发明授权

US07317179B2 Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate 有权
标题翻译：将激光形成为均匀线束以与沉积在基底上的膜相互作用的系统和方法
公开(公告)号：US07317179B2
公开(公告)日：2008-01-08
申请号：US11261845
申请日：2005-10-28
申请人： Robert P. Akins , Richard L. Sandstrom
发明人： Robert P. Akins , Richard L. Sandstrom
IPC分类号： G01B9/02
CPC分类号： B23K26/0604 , B23K26/0608 , B23K26/066 , B23K26/067 , B23K26/0738 , G02B27/0966 , G02B27/0988 , G02B27/46
摘要： Systems and methods are disclosed for shaping and homogenizing a laser beam for interaction with a film. The shaping and homogenizing system may include a lens array and a lens that is positioned to receive laser light from the lens array and produce a respective elongated image in a plane for each lens in the lens array. In addition, the system may include a beam stop having an edge that is positioned in the plane, and a moveable mount rotating a lens of the lens array to vary an alignment between one of the elongated images and the beam stop edge.
摘要翻译：公开了用于使激光束成形和均匀化以与膜相互作用的系统和方法。成形和均质系统可以包括透镜阵列和透镜，其被定位成从透镜阵列接收激光，并且在透镜阵列中的每个透镜的平面中产生相应的细长图像。此外，该系统可以包括具有位于平面中的边缘的光束停止器，以及可移动的安装件，其旋转透镜阵列的透镜以改变其中一个细长图像与光束停止边缘之间的对准。

10. 发明授权

US07230964B2 Lithography laser with beam delivery and beam pointing control 失效
标题翻译：光束激光器具有光束传递和光束指向控制
公开(公告)号：US07230964B2
公开(公告)日：2007-06-12
申请号：US10425361
申请日：2003-04-29
申请人： Plash P. Das , R. Kyle Webb , Marco Giovanardi , Gregory Francis , Huckleberry B. Dorn , Kyle P. Erlandsen , John W. Nelson , Richard L. Sandstrom , Alexander I. Ershov
发明人： Plash P. Das , R. Kyle Webb , Marco Giovanardi , Gregory Francis , Huckleberry B. Dorn , Kyle P. Erlandsen , John W. Nelson , Richard L. Sandstrom , Alexander I. Ershov
IPC分类号： H01S3/22 , G21G5/00
CPC分类号： G03F7/7055 , G02B26/0816 , G02B27/0972 , G03F7/70025 , G03F7/70041 , G03F7/70058 , H01S3/005 , H01S3/0057 , H01S3/036 , H01S3/041 , H01S3/0971 , H01S3/136 , H01S3/137 , H01S3/225 , H01S3/2333 , H01S3/2366
摘要： The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source with a beam delivery to a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam to a desired location such as the entrance port of the production line machine. Preferred embodiments include equipment for beam attenuation, equipment for automatic feedback beam alignment and equipment for accurate optics module positioning at installation and during maintenance. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable of providing illumination at a lithography system wafer plane which is approximately constant throughout the operating life of the lithography system, despite substantial degradation of optical components.
摘要翻译：本发明提供了一种向生产线机器输送光束的模块化高重复率紫外线气体放电激光光源。该系统包括具有光束指向控制的封闭和清除的光束路径，用于将激光束传送到期望的位置，例如生产线机器的入口。优选实施例包括用于光束衰减的设备，用于自动反馈光束对准的设备和用于在安装和维护期间精确的光学模块定位的设备。在优选实施例中，生产线机器是光刻机，并且提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。与现有技术的激光系统相比，脉冲放大器使输出脉冲长度加倍，导致脉冲功率（mJ / ns）的降低。该优选实施例能够在光刻系统晶片平面处提供照明，其在光刻系统的整个使用寿命期间大致恒定，尽管光学部件的实质性劣化。

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