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1. 发明申请

US20160203737A1 HYBRID PHYSICAL-VIRTUAL REALITY SIMULATION FOR CLINICAL TRAINING CAPABLE OF PROVIDING FEEDBACK TO A PHYSICAL ANATOMIC MODEL 有权
公开(公告)号：US20160203737A1
公开(公告)日：2016-07-14
申请号：US15075971
申请日：2016-03-21
申请人： Joseph T. Samosky , Robert Weaver
发明人： Joseph T. Samosky , Robert Weaver
IPC分类号： G09B23/28 , G09B9/00 , G09B23/32
摘要： Systems and methods facilitating training in clinical procedures via mixed reality simulations are disclosed. Such a system can comprise a physical model and a virtual model of an anatomic region associated with the procedure, wherein the virtual model associates tissue types with locations in the physical model. The system can include a tracking component that tracks locations of at least one clinical instrument relative to the models, and an anatomic feedback component that can produce perceptible changes in the physical model based on the interaction between the instrument and virtual model. A clinical device interface can detect outputs of clinical devices like electrical signals, pressure or flow, wherein feedback to the physical model depends on the tracked position of a clinical device and output from the same or different clinical device. Another component can generate feedback effects to the clinical device. Aspects can simulate anesthesiology procedures like local nerve blockade.

2. 发明申请

US20130314751A1 METHOD OF PRINTING A PRODUCT CODE WITH A MODIFIED CHARACTER 审中-公开
标题翻译：用修改后的字符打印产品代码的方法
公开(公告)号：US20130314751A1
公开(公告)日：2013-11-28
申请号：US13983959
申请日：2012-02-08
申请人： Robert Weaver
发明人： Robert Weaver
IPC分类号： G06K15/02 , G06K15/00
CPC分类号： G06K15/4095 , B42D25/00 , B42D25/405 , B42D2035/08 , G06K15/1827 , G07D7/0047
摘要： A method of printing a modified product code includes providing a printer and a substrate. An initial product code is determined. The initial product code includes a plurality of unmodified characters. A modified product code is determined. The modified product code includes at least one modified character that is different from a corresponding one of the plurality of unmodified characters of the initial product code. The modified character is a function at least in part by of initial product code. The printer is controlled to print the modified product code on the substrate.
摘要翻译：打印修改后的产品代码的方法包括提供打印机和基板。确定初始产品代码。初始产品代码包括多个未修改的字符。确定修改后的产品代码。经修改的产品代码包括与初始产品代码的多个未修改字符中的相应一个不同的至少一个修改字符。修改后的字符至少部分是初始产品代码的函数。控制打印机在基板上打印修改后的产品代码。

3. 发明申请

US20070089991A1 Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece 审中-公开
标题翻译：用于电化学处理微电子工件的反应器中的调谐电极
公开(公告)号：US20070089991A1
公开(公告)日：2007-04-26
申请号：US11639733
申请日：2006-12-14
申请人： Gregory Wilson , Paul McHugh , Robert Weaver , Thomas Ritzdorf
发明人： Gregory Wilson , Paul McHugh , Robert Weaver , Thomas Ritzdorf
IPC分类号： C25D21/12
CPC分类号： C25D21/12 , C25D17/001 , C25F3/30
摘要： A facility for selecting and refining electrical parameters for processing a microelectronic workpiece in a processing chamber is described. The facility initially configures the electrical parameters in accordance with either a mathematical model of the processing chamber or experimental data derived from operating the actual processing chamber. After a workpiece is processed with the initial parameter configuration, the results are measured and a sensitivity matrix based upon the mathematical model of the processing chamber is used to select new parameters that correct for any deficiencies measured in the processing of the first workpiece. These parameters are then used in processing a second workpiece, which may be similarly measured, and the results used to further refine the parameters. In some embodiments, the facility analyzes a profile of the seed layer applied to a workpiece, and determines and communicates to a material deposition tool a set of control parameters designed to deposit material on the workpiece in a manner that compensates for deficiencies in the seed layer.
摘要翻译：描述了一种用于选择和精炼用于在处理室中处理微电子工件的电参数的设备。该设备最初根据处理室的数学模型或从操作实际处理室得到的实验数据来初始配置电参数。在用初始参数配置处理工件之后，测量结果，并且使用基于处理室的数学模型的灵敏度矩阵来选择校正在第一工件的处理中测量的任何缺陷的新参数。然后将这些参数用于处理可以类似地测量的第二工件，并且用于进一步改进参数的结果。在一些实施例中，设备分析施加到工件的种子层的轮廓，并且确定并传送材料沉积工具一组控制参数，这些控制参数被设计成以补偿种子层中的缺陷的方式在工件上沉积材料。

4. 发明申请

US20050189227A1 Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece 审中-公开
公开(公告)号：US20050189227A1
公开(公告)日：2005-09-01
申请号：US11097671
申请日：2005-03-31
申请人： Gregory Wilson , Paul McHugh , Robert Weaver , Thomas Ritzdorf
发明人： Gregory Wilson , Paul McHugh , Robert Weaver , Thomas Ritzdorf
IPC分类号： B23H3/02 , C25B9/00 , C25C3/16 , C25C3/20 , C25D5/00 , C25D5/02 , C25D17/00 , C25D21/12 , C25F7/00 , G06F19/00
CPC分类号： C25D21/12 , C25D17/001 , C25F3/30
摘要： A facility for selecting and refining electrical parameters for processing a microelectronic workpiece in a processing chamber is described. The facility initially configures the electrical parameters in accordance with either a mathematical model of the processing chamber or experimental data derived from operating the actual processing chamber. After a workpiece is processed with the initial parameter configuration, the results are measured and a sensitivity matrix based upon the mathematical model of the processing chamber is used to select new parameters that correct for any deficiencies measured in the processing of the first workpiece. These parameters are then used in processing a second workpiece, which may be similarly measured, and the results used to further refine the parameters. In some embodiments, the facility analyzes a profile of the seed layer applied to a workpiece, and determines and communicates to a material deposition tool a set of control parameters designed to deposit material on the workpiece in a manner that compensates for deficiencies in the seed layer.

5. 发明授权

US06370791B1 Processing machine with lockdown rotor 有权
标题翻译：带锁定转子的加工机
公开(公告)号：US06370791B1
公开(公告)日：2002-04-16
申请号：US09522797
申请日：2000-03-10
申请人： Robert Weaver , Ronald Schlagenhauser
发明人： Robert Weaver , Ronald Schlagenhauser
IPC分类号： F26B1724
CPC分类号： H01L21/67313 , H01L21/67316 , Y10S414/141
摘要： In a machine for processing semiconductor wafers, a rotor includes two pairs of combs. A lock down mechanism has a lock bar, temporarily engaged and moved by a loading/unloading robot, drives a retainer against the edges of the wafers, to better hold them in place during processing. Contamination via generation of particles is reduced. Combs on the rotor have a resilient strip. The lower edges of the wafers compress slightly into or deflect the resilient strip, when urged into place by the lock down mechanism.
摘要翻译：在用于处理半导体晶片的机器中，转子包括两对梳子。锁定机构具有通过装载/卸载机器人临时接合和移动的锁定杆，将保持器驱动抵靠晶片的边缘，以在加工期间更好地将其保持在适当位置。通过产生颗粒的污染减少。转子上的梳子有一个弹性条。当被锁定机构推动就位时，晶片的下边缘稍微压入或偏转弹性带。

6. 发明授权

US07472071B2 Interactive system for managing questions and answers among users and experts 有权
标题翻译：交互式系统，用于管理用户和专家之间的问题和答案
公开(公告)号：US07472071B2
公开(公告)日：2008-12-30
申请号：US09447259
申请日：1999-11-23
申请人： James D. Marks , Robert Weaver , Jeremy Shao
发明人： James D. Marks , Robert Weaver , Jeremy Shao
IPC分类号： G06F9/44
CPC分类号： G06Q10/10 , G06Q10/06311 , G06Q40/08 , G09B7/00
摘要： A method, executed by a server, for providing answers on one or more topics from a set of experts on each topic to questions posed by users. Users can direct questions to one or more specific experts, who in turn can answer the questions, refer the questions to other experts, or both. The server automatically organizes and stores questions and answers in various fora. An administrator can take advantage of the design of the system to create or change a forum without having to write or change low-level code.
摘要翻译：由服务器执行的用于从关于每个主题的一组专家提供关于用户提出的问题的一个或多个主题的答案的方法。用户可以向一个或多个特定专家提出问题，反过来可以回答问题，将问题转交给其他专家或两者。服务器自动组织和存储各种论坛的问题和答案。管理员可以利用系统的设计来创建或更改论坛，而无需编写或更改低级代码。

7. 发明申请

US20070221502A1 TUNING ELECTRODES USED IN A REACTOR FOR ELECTROCHEMICALLY PROCESSING A MICROELECTRONIC WORKPIECE 审中-公开
标题翻译：用于电化学处理微电子工作的反应器中的调谐电极
公开(公告)号：US20070221502A1
公开(公告)日：2007-09-27
申请号：US11739553
申请日：2007-04-24
申请人： Gregory Wilson , Paul McHugh , Robert Weaver , Thomas Ritzdorf
发明人： Gregory Wilson , Paul McHugh , Robert Weaver , Thomas Ritzdorf
IPC分类号： C25D21/12
CPC分类号： G05B19/41875 , C25D7/123 , C25D17/001 , C25D21/12 , G05B2219/32182 , G05B2219/32216 , G05B2219/45031 , Y02P90/22 , Y02P90/265
摘要： A facility for selecting and refining electrical parameters for processing a microelectronic workpiece in a processing chamber is described. The facility initially configures the electrical parameters in accordance with either a numerical of the processing chamber or experimental data derived from operating the actual processing chamber. After a workpiece is processed with the initial parameter configuration, the results are measured and a sensitivity matrix based upon the numerical model of the processing chamber is used to select new parameters that correct for any deficiencies measured in the processing of the first workpiece. These parameters are then used in processing a second workpiece, which may be similarly measured, and the results used to further refine the parameters.
摘要翻译：描述了一种用于选择和精炼用于在处理室中处理微电子工件的电参数的设备。该设施最初根据处理室的数值或从操作实际处理室得到的实验数据来配置电参数。在用初始参数配置处理工件之后，测量结果，并且使用基于处理室的数值模型的灵敏度矩阵来选择校正在第一工件的处理中测量的任何缺陷的新参数。然后将这些参数用于处理可以类似地测量的第二工件，并且用于进一步改进参数的结果。

8. 发明申请

US20070193993A1 Stick electrode 有权
标题翻译：棒电极
公开(公告)号：US20070193993A1
公开(公告)日：2007-08-23
申请号：US11357862
申请日：2006-02-21
申请人： Randall Burt , Jon Chiappone , Craig Dallam , Robert Weaver
发明人： Randall Burt , Jon Chiappone , Craig Dallam , Robert Weaver
IPC分类号： B23K35/22
CPC分类号： B23K9/02 , B23K35/3053 , B23K35/368
摘要： A stick electrode for depositing an high strength weld metal bead on a workpiece where the yield strength of the weld metal is between 85 ksi and 125 ksi irrespective of the cooling rate. The electrode deposits weld metal having 0.80-1.85% by weight manganese, 0.25-0.50% by weight molybdenum, 1.25-2.50% by weight nickel, and less than 0.07% by weight carbon, wherein the ratios of the carbon, manganese and molybdenum are adjusted to provide a carbon equivalent in deposited weld metal in the range of 0.17 to 0.30 and preferably less than 0.22.
摘要翻译：用于在工件上沉积高强度焊接金属珠的棒状电极，其中焊接金属的屈服强度在85ksi和125ksi之间，而与冷却速度无关。电极沉积焊接金属，其具有0.80-1.85重量％的锰，0.25-0.50重量％的钼，1.25-2.50重量％的镍和小于0.07重量％的碳，其中碳，锰和钼的比例为调整为在0.17至0.30，优选小于0.22的范围内提供沉积焊接金属中的碳当量。

9. 发明申请

US20060000716A1 Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece 审中-公开
公开(公告)号：US20060000716A1
公开(公告)日：2006-01-05
申请号：US11038455
申请日：2005-01-18
申请人： Gregory Wilson , Paul McHugh , Robert Weaver , Thomas Ritzdorf
发明人： Gregory Wilson , Paul McHugh , Robert Weaver , Thomas Ritzdorf
IPC分类号： C25D21/12 , C25D5/00
CPC分类号： C25D5/08 , C25D7/123 , C25D17/001 , C25D17/12 , C25D21/12 , Y10S204/07
摘要： A facility for selecting and refining electrical parameters for processing a microelectronic workpiece in a processing chamber is described. The facility initially configures the electrical parameters in accordance with either a mathematical model of the processing chamber or experimental data derived from operating the actual processing chamber. After a workpiece is processed with the initial parameter configuration, the results are measured and a sensitivity matrix based upon the mathematical model of the processing chamber is used to select new parameters that correct for any deficiencies measured in the processing of the first workpiece. These parameters are then used in processing a second workpiece, which may be similarly measured, and the results used to further refine the parameters.

10. 发明申请

US20050183959A1 Tuning electrodes used in a reactor for electrochemically processing a microelectric workpiece 审中-公开
标题翻译：用于电化学处理微电子工件的反应器中的调谐电极
公开(公告)号：US20050183959A1
公开(公告)日：2005-08-25
申请号：US11097508
申请日：2005-03-31
申请人： Gregory Wilson , Paul McHugh , Robert Weaver , Thomas Ritzdorf
发明人： Gregory Wilson , Paul McHugh , Robert Weaver , Thomas Ritzdorf
IPC分类号： C23C14/54 , C23C16/52 , C25D7/12 , C25D21/12 , C25D5/02
CPC分类号： C23C16/52 , C23C14/545 , C25D7/123 , C25D21/12
摘要： A facility for selecting and refining electrical parameters for processing a microelectronic workpiece in a processing chamber is described. The facility initially configures the electrical parameters in accordance with either a mathematical model of the processing chamber or experimental data derived from operating the actual processing chamber. After a workpiece is processed with the initial parameter configuration, the results are measured and a sensitivity matrix based upon the mathematical model of the processing chamber is used to select new parameters that correct for any deficiencies measured in the processing of the first workpiece. These parameters are then used in processing a second workpiece, which may be similarly measured, and the results used to further refine the parameters. In some embodiments, the facility analyzes a profile of the seed layer applied to a workpiece, and determines and communicates to a material deposition tool a set of control parameters designed to deposit material on the workpiece in a manner that compensates for deficiencies in the seed layer.
摘要翻译：描述了一种用于选择和精炼用于在处理室中处理微电子工件的电参数的设备。该设备最初根据处理室的数学模型或从操作实际处理室得到的实验数据来初始配置电参数。在用初始参数配置处理工件之后，测量结果，并且使用基于处理室的数学模型的灵敏度矩阵来选择校正在第一工件的处理中测量的任何缺陷的新参数。然后将这些参数用于处理可以类似地测量的第二工件，并且用于进一步改进参数的结果。在一些实施例中，设备分析施加到工件的种子层的轮廓，并且确定并传送材料沉积工具一组控制参数，这些控制参数被设计成以补偿种子层中的缺陷的方式在工件上沉积材料。

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