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    • 2. 发明申请
    • TOOL EXCHANGE DEVICE AND TOOL
    • 工具交换设备和工具
    • US20080058186A1
    • 2008-03-06
    • US11933738
    • 2007-11-01
    • Kanji HATAShoriki NARITA
    • Kanji HATAShoriki NARITA
    • B23Q15/00
    • B25J15/0491H05K13/0409Y10T483/16Y10T483/17Y10T483/18Y10T483/1809
    • Step portions with an L-shaped section each having a vertical restriction surface and a horizontal engagement surface are provided on both sides of a main body portion of a tool. On one side of a holding portion placing and holding a mounted tool to be exchanged, a first engagement member has a first engagement projection piece that opposes the engagement surface of one of the step portions, and has an end surface in abutment against the restriction surface. On the other side of the holding portion, a second engagement member has a second engagement projection piece having its intermediate part opposed to the engagement surface of the other of the step portions, and end surfaces on both sides are in abutment against the outer periphery of the main both portion on both sides thereof. The first and second engagement members are movable between an engagement position and a withdrawal position with respect to the step portions.
    • 具有垂直限制表面和水平接合表面的L形截面的台阶部分设置在工具主体部分的两侧。 在放置并保持待更换的被安装工具的保持部的一侧,第一接合构件具有与台阶部之一的接合面相对的第一接合突起片,并且具有抵靠限制面的端面 。 在保持部的另一侧,第二卡合构件具有第二卡合突片,该第二卡合突片的中间部分与另一个台阶部的卡合面相对,两侧的端面与外周面抵接 其两侧的主要部分。 第一和第二接合构件能够在接合位置和相对于台阶部分的取出位置之间移动。
    • 5. 发明授权
    • Heating apparatus for bump bonding, bump bonding method and bump forming apparatus, and semiconductor wafer
    • 用于凸块焊接的加热装置,凸块接合方法和凸块形成装置以及半导体晶片
    • US06329640B1
    • 2001-12-11
    • US09690746
    • 2000-10-18
    • Shoriki NaritaMakoto ImanishiTakaharu MaeNobuhisa WatanabeShinji Kanayama
    • Shoriki NaritaMakoto ImanishiTakaharu MaeNobuhisa WatanabeShinji Kanayama
    • F27B514
    • H01L21/67103H01L21/68
    • An object of the present invention is to provide a bump-bonding heating apparatus, a bump bonding method and a bump forming apparatus which do not involve large-sized apparatus configuration and which are easy to handle, and a semiconductor wafer in which bumps are formed by using the bump bonding method. The bump-bonding heating apparatus has a wafer turning member, a turning unit and a wafer heating unit. The turning member is turned by the turning unit without turning the wafer heating unit, whereby a semiconductor wafer mounted on the turning member is turned. Like this, since the wafer heating unit is not turned, the apparatus configuration can be made compact. Since the turning member is turned directly by the turning unit, the turning angle of the semiconductor wafer can be implemented with higher precision as compared with the conventional gas floating type turning method.
    • 本发明的目的是提供一种不涉及大型装置结构并易于处理的凸块焊接加热装置,凸块接合方法和凸块形成装置以及形成凸块的半导体晶片 通过使用凸块接合方法。 凸点焊接加热装置具有晶片转动部件,转动部件和晶片加热部件。 转动构件在不转动晶片加热单元的情况下由转动单元转动,从而转动安装在转动构件上的半导体晶片。 像这样,由于晶片加热单元没有转动,所以可以使装置结构紧凑。 由于转动构件直接由转动单元转动,与常规气浮式转动方法相比,可以以更高的精度实现半导体晶片的转动角度。