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1. 发明申请

US20130177717A1 METHOD FOR PRODUCING WAVELENGTH PLATE 审中-公开
标题翻译：生产波长板的方法
公开(公告)号：US20130177717A1
公开(公告)日：2013-07-11
申请号：US13806960
申请日：2011-06-23
申请人： Nobuyuki Koike , Takatoshi Yamada , Akio Takada , Masatoshi Sasaki
发明人： Nobuyuki Koike , Takatoshi Yamada , Akio Takada , Masatoshi Sasaki
IPC分类号： C23C16/40
CPC分类号： C23C16/40 , C23C14/226 , C23C14/5806 , G02B5/3083
摘要： To produce a wavelength plate that is superior in durability and stability and has a high moisture resistant property. A dielectric material is obliquely vapor deposited on a substrate so as to form a birefringent layer that has columnar portions in each of which fine particles of the dielectric material are stacked in a columnar shape, and interstices that are respectively formed between the columnar portions, and the birefringent layer is subjected to an annealing treatment at a temperature within the range of 100° C. or more to 300° C. or less. Then, a protective film with low moisture permeability is formed on the annealed birefringent layer by forming an inorganic compound on the birefringent layer at high density.
摘要翻译：制造耐久性和稳定性优异且耐湿性高的波长板。将电介质材料倾斜地气相沉积在基片上以形成双折射层，该双折射层具有柱状部分，其中每一个电介质材料的细颗粒以柱状形式堆叠，并且间隔分别形成在柱状部分之间，并且在100℃以上300℃以下的温度下对双折射层进行退火处理。然后，通过在双折射层上以高密度形成无机化合物，在退火的双折射层上形成具有低透湿性的保护膜。

2. 发明授权

US08148441B2 Polishing pad and manufacturing method thereof 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：US08148441B2
公开(公告)日：2012-04-03
申请号：US11794284
申请日：2006-02-27
申请人： Masato Doura , Takeshi Fukuda , Kazuyuki Ogawa , Atsushi Kazuno , Hiroshi Seyanagi , Masahiko Nakamori , Takatoshi Yamada , Tetsuo Shimomura
发明人： Masato Doura , Takeshi Fukuda , Kazuyuki Ogawa , Atsushi Kazuno , Hiroshi Seyanagi , Masahiko Nakamori , Takatoshi Yamada , Tetsuo Shimomura
IPC分类号： C08G18/10
CPC分类号： B24B37/24 , B24D3/28 , C08G18/10 , C08G2101/00 , C08G18/3237 , C08G18/3215
摘要： A method for manufacturing a polishing pad made from a polyurethane resin foam having very uniform, fine cells therein and a polishing pad obtained by that method provides a polishing pad having better polishing characteristics (especially, in planarization) while providing improved dressability while maintaining the planarization characteristics and polishing speed of a conventional polishing pad. The polyurethane resin foam is a cured product obtained by reacting an isocyanate-terminated prepolymer with an aromatic polyamine chain extender having a melting point of 70° C. or lower, for example.
摘要翻译：制造由其中具有非常均匀的细小单元的聚氨酯树脂泡沫制成的抛光垫的方法和通过该方法获得的抛光垫提供了一种抛光垫具有更好的抛光特性（特别是平面化）的同时提供改善的可修整性，同时保持平面化特性和抛光速度。聚氨酯树脂发泡体是通过将异氰酸酯封端的预聚物与熔点为70℃以下的芳香族多胺扩链剂反应得到的固化物。

3. 发明授权

US07731568B2 Polishing pad and semiconductor device manufacturing method 有权
标题翻译：抛光垫和半导体器件的制造方法
公开(公告)号：US07731568B2
公开(公告)日：2010-06-08
申请号：US10598717
申请日：2004-10-20
申请人： Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Kazuyuki Ogawa , Atsushi Kazuno , Masahiro Watanabe
发明人： Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Kazuyuki Ogawa , Atsushi Kazuno , Masahiro Watanabe
IPC分类号： B24B7/00 , B24B7/19 , B24B5/00 , B24B29/00 , B24D11/00
CPC分类号： B24B37/205 , H01L21/30625
摘要： The object of the invention is to provide a polishing pad capable of maintaining high-precision end-point optical detection over a long period from the start of use to the end of use even if polishing is performed with an alkaline or acid slurry, as well as a method of manufacturing a semiconductor device with this polishing pad. The polishing pad of the invention is used in chemical mechanical polishing and has a polishing region and a light-transmitting region, wherein the light-transmitting region satisfies that the difference ΔT (ΔT=T0−T1) (%) between T0 and T1 is within 10(%) over the whole range of measurement wavelengths of from 400 to 700 nm, wherein T1 is the light transmittance (%) of the light-transmitting region measured at the measurement wavelength λ after dipping for 24 hours in a KOH aqueous solution at pH 11 or an H2O2 aqueous solution at pH 4 and T0 is the light-transmittance (%) measured at the measurement wavelength λ before the dipping.
摘要翻译：本发明的目的是提供一种抛光垫，即使在用碱性或酸性浆料进行研磨的同时，也能够在从使用开始到使用结束的长时间内保持高精度的端点光学检测作为使用该研磨垫的半导体装置的制造方法。本发明的抛光垫用于化学机械抛光，并具有抛光区域和透光区域，其中透光区域满足以下区别：Dgr; T（＆Dgr; T = T0-T1）（％） T0和T1在400〜700nm的测量波长的整个范围内在10（％）以内，其中T1是在浸渍24小时后在测量波长λ测量的透光区域的透光率（％） pH为11的KOH水溶液或pH4的H 2 O 2水溶液，T0为在浸渍前测定的波长λ下测定的透光率（％）。

4. 发明申请

US20100091803A1 Solid-state high-luminance far ultraviolet light emitting element including highly pure hexagonal boron nitride single crystal, solid-state laser, and solid-state light emitting apparatus 失效
标题翻译：包括高纯度六方晶系氮化硼单晶，固体激光器和固态发光装置的固态高亮度远紫外发光元件
公开(公告)号：US20100091803A1
公开(公告)日：2010-04-15
申请号：US12588462
申请日：2009-10-16
申请人： Kenji Watanabe , Takashi Taniguchi , Satoshi Koizumi , Hisao Kanda , Masayuki Katagiri , Takatoshi Yamada , Nesladek Milos
发明人： Kenji Watanabe , Takashi Taniguchi , Satoshi Koizumi , Hisao Kanda , Masayuki Katagiri , Takatoshi Yamada , Nesladek Milos
IPC分类号： H01S3/30 , H01J1/62
CPC分类号： C30B29/38 , B01J3/062 , B01J3/065 , B01J2203/0645 , B01J2203/066 , B01J2203/069 , C09K11/63 , H01S5/32341
摘要： A solid-state far ultraviolet light emitting element is formed by a hexagonal boron nitride single crystal, excited by electron beam irradiation to emit far ultraviolet light having a maximum light emission peak in a far ultraviolet region at a wavelength of 235 nm or shorter.
摘要翻译：固态远紫外线发光元件是通过电子束照射激发的六方氮化硼单晶形成的，以在波长235nm以下的远紫外区域发射具有最大发光峰的远紫外光。

5. 发明申请

US20090167139A1 PHOSPHORUS-DOPED DIAMOND FILM ALLOWING SIGNIFICANTLY REDUCED ELECTRON EMISSION VOLTAGE, METHOD FOR PRODUCING THE SAME, AND ELECTRON SOURCE USING THE SAME 有权
标题翻译：具有显着降低电子发射电压的磷光体金刚石膜，其制造方法和使用该电极的电子源
公开(公告)号：US20090167139A1
公开(公告)日：2009-07-02
申请号：US12066976
申请日：2006-08-28
申请人： Takatoshi Yamada , Shinichi Shikata
发明人： Takatoshi Yamada , Shinichi Shikata
IPC分类号： H01J19/02 , C30B23/02 , H01B1/00
CPC分类号： H01J9/025 , C23C16/274 , C23C16/278 , H01J1/304 , H01J2201/30457
摘要： According to the present invention, a phosphorus-doped diamond film allowing a significantly reduced electron emission voltage, a method for producing the same, and a diamond electron source using the same, such diamond electron source exerting stable and excellent electron emission characteristics, which can be used for a cold cathode surface structure operable with low voltage, are provided. Also, a method for producing a phosphorus-doped diamond film, comprising growing a diamond film on a diamond substrate by a microwave CVD method in an atmosphere containing gases (methane and hydrogen) and phosphorus with the use of tertiary butyl phosphorus as a source of addition of phosphorous, such diamond film containing phosphorus at a concentration of 1015 cm−3 or more, having a resistivity of 107 Ωcm or less, and allowing a voltage for initiation of electron emission to be 30 V or less, and a diamond electron source using the same are provided. In such diamond film, the electron emission voltage is significantly reduced.
摘要翻译：根据本发明，能够显着降低电子发射电压的磷掺杂金刚石薄膜，其制造方法和使用该方法的金刚石电子源，具有稳定和优异的电子发射特性的金刚石电子源，其可以用于可低压操作的冷阴极表面结构。另外，一种磷掺杂金刚石膜的制造方法，其特征在于，在含有气体（甲烷和氢）和磷的气氛中，通过微波CVD法在金刚石基板上生长金刚石膜，使用叔丁基磷作为加入磷，这种金刚石膜含有浓度为1015cm-3或更高的磷，具有107Ω·米或更小的电阻率，并允许电子发射的电压为30V或更小，金刚石电子源提供使用它们。在这种金刚石膜中，电子发射电压显着降低。

6. 发明申请

US20090104850A1 POLISHING PAD 有权
标题翻译：抛光垫
公开(公告)号：US20090104850A1
公开(公告)日：2009-04-23
申请号：US12065219
申请日：2006-08-22
申请人： Kazuyuki Ogawa , Tetsuo Shimomura , Yoshiyuki Nakai , Masahiko Nakamori , Takatoshi Yamada
发明人： Kazuyuki Ogawa , Tetsuo Shimomura , Yoshiyuki Nakai , Masahiko Nakamori , Takatoshi Yamada
IPC分类号： B24B1/00 , B24B7/20
CPC分类号： B24B37/24 , B24D3/32 , C08G18/36 , C08G2101/00 , Y10T428/24 , Y10T428/249953
摘要： An object of the present invention is to provide a polishing pad excellent in polishing rate and superior in longevity without generating center slow. Another object of the present invention is to provide a method of manufacturing a semiconductor device with the polishing pad. Disclosed is a polishing pad having a polishing layer consisting of a polyurethane foam having fine cells, wherein a high-molecular-weight polyol component that is a starting component of the polyurethane foam contains a hydrophobic high-molecular-weight polyol A having a number-average molecular weight of 550 to 800 and a hydrophobic high-molecular-weight polyol B having a number-average molecular weight of 950 to 1300 in an A/B ratio of from 10/90 to 50/50 by weight.
摘要翻译：本发明的目的是提供一种抛光速度优异且寿命长的抛光垫，而不产生中心慢。本发明的另一个目的是提供一种用抛光垫制造半导体器件的方法。公开了一种抛光垫，其具有由具有细孔的聚氨酯泡沫构成的抛光层，其中作为聚氨酯泡沫的起始组分的高分子量多元醇成分含有数均分子量的疏水性高分子量多元醇A，平均分子量为550〜800的疏水性高分子量多元醇B，A / B比为10/90〜50/50的数均分子量为950〜1300的疏水性高分子量多元醇B.

7. 发明申请

US20090093201A1 POLISHING PAD 有权
标题翻译：抛光垫
公开(公告)号：US20090093201A1
公开(公告)日：2009-04-09
申请号：US11914547
申请日：2006-05-10
申请人： Atsushi Kazuno , Kazuyuki Ogawa , Masahiko Nakamori , Takatoshi Yamada , Tetsuo Shimomura
发明人： Atsushi Kazuno , Kazuyuki Ogawa , Masahiko Nakamori , Takatoshi Yamada , Tetsuo Shimomura
IPC分类号： B24D11/00 , B24B1/00
CPC分类号： B24B37/24 , B24D3/28 , B24D3/32 , C08G18/12 , C08G18/4238 , C08G18/4854 , C08G18/724 , C08G18/758 , C08G18/7621 , C08G2101/0025 , C08G2101/0066 , C08J9/30 , C08J2375/08 , C08G18/3814 , C08G18/48 , C08G18/3865
摘要： An object of the invention is to provide a polishing pad which hardly generates a scratch on a surface of a polishing object, and is excellent in planarization property. In addition, an object of the invention is to provide a polishing pad which has a high polishing rate and is excellent in planarization property. In addition, an object of the invention is to provide a polishing pad in which a groove is scarcely clogged with abrasive grains or polishing swarf during polishing and, even when continuously used for a long period of time, a polishing rate is scarcely reduced.
摘要翻译：本发明的目的是提供一种在抛光对象的表面上几乎不产生划痕的抛光垫，并且平坦化性能优异。另外，本发明的目的在于提供一种研磨速度快，平坦化性优异的抛光垫。另外，本发明的目的是提供一种抛光垫，其中在抛光期间槽几乎不被磨粒或抛光屑堵塞，并且即使长时间连续使用，抛光速率几乎不降低。

8. 发明授权

US07329170B2 Method of producing polishing pad 有权
标题翻译：抛光垫的生产方法
公开(公告)号：US07329170B2
公开(公告)日：2008-02-12
申请号：US11366238
申请日：2006-03-02
申请人： Koichi Ono , Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Shigeru Komai , Masayuki Tsutsumi
发明人： Koichi Ono , Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Shigeru Komai , Masayuki Tsutsumi
IPC分类号： B24B1/00
CPC分类号： B24B37/26 , B24B37/22 , B24D3/28 , B24D11/001 , B24D11/008
摘要： A method of producing a polishing pad having a polishing layer is characterized in that the polishing layer is produced by a photolithographic method including: forming a sheet molding from a curing composition containing at least an initiator and an energy ray-reactive compound to be cured with energy rays; exposing the sheet molding to energy rays to induce modification thereof, to change the solubility of the sheet molding in a solvent; and developing the sheet molding after irradiation with energy rays, to partially remove the curing composition with a solvent thereby forming a concave and convex pattern at least one surface.
摘要翻译：一种制造具有抛光层的抛光垫的方法的特征在于，抛光层通过光刻法制造，包括：由至少含有引发剂和能量射线反应性化合物的固化组合物形成片状模制品，以使其固化能量射线将片材模制物暴露于能量射线以引起其修饰，以改变片材模制品在溶剂中的溶解度; 并且在用能量射线照射之后显影片材成型体，用溶剂部分地除去固化组合物，从而在至少一个表面上形成凹凸图案。

9. 发明申请

US20070247996A1 OPTICAL PICKUP AND OPTICAL DISC APPARATUS 审中-公开
标题翻译：光学拾取和光盘设备
公开(公告)号：US20070247996A1
公开(公告)日：2007-10-25
申请号：US11695801
申请日：2007-04-03
申请人： Satoshi Kawakita , Motoo Aiba , Kyu Kanno , Jin Sato , Takatoshi Yamada
发明人： Satoshi Kawakita , Motoo Aiba , Kyu Kanno , Jin Sato , Takatoshi Yamada
IPC分类号： G11B7/00
CPC分类号： G11B7/1275 , G11B7/1353 , G11B7/13922 , G11B2007/0006
摘要： An optical pickup includes: a light source that emits first, second and third wavelengths of optical beam; and an objective lens unit including a diffraction element whose one surface includes a first diffraction pattern where the first wavelength is diffracted while the second and third wavelengths pass through and whose other surface includes a second diffraction pattern where the second wavelength is diffracted while the first and third wavelengths pass through; and an objective lens that collects the optical beam from the diffraction element, wherein the second and third wavelengths traveling through the objective lens unit are on the optical axis of the objective lens unit while the first wavelength traveling through the objective lens unit have an angle with respect to the optical axis; and the first diffraction pattern is located at a position so as to minimize aberration of the first wavelength of optical beam.
摘要翻译：光拾取器包括：发射第一，第二和第三波长的光束的光源; 以及物镜单元，其包括衍射元件，所述衍射元件的一个表面包括第一波长衍射的第一衍射图案，而第二和第三波长通过，并且其另一个表面包括第二衍射图案，其中第二波长被衍射，第三波长通过; 以及从衍射元件收集光束的物镜，其中通过物镜单元行进的第二和第三波长在物镜单元的光轴上，而穿过物镜单元的第一波长与相对于光轴; 并且第一衍射图案位于使得光束的第一波长的像差最小的位置。

10. 发明申请

US20060280929A1 POLISHING PAD AND METHOD OF PRODUCING THE SAME 有权
标题翻译：抛光垫及其生产方法
公开(公告)号：US20060280929A1
公开(公告)日：2006-12-14
申请号：US11466878
申请日：2006-08-24
申请人： Tetsuo SHIMOMURA , Masahiko NAKAMORI , Takatoshi YAMADA , Takashi MASUI , Shigeru KOMAI , Koichi ONO , Kazuyuki OGAWA , Atsushi KAZUNO , Tsuyoshi KIMURA , Hiroshi SEYANAGI
发明人： Tetsuo SHIMOMURA , Masahiko NAKAMORI , Takatoshi YAMADA , Takashi MASUI , Shigeru KOMAI , Koichi ONO , Kazuyuki OGAWA , Atsushi KAZUNO , Tsuyoshi KIMURA , Hiroshi SEYANAGI
IPC分类号： B32B3/26 , B24B9/00 , B24B7/00
CPC分类号： C08G18/00 , B24B37/24 , B24D3/30 , B24D18/00 , C08G18/10 , C08G18/12 , C08G18/4211 , C08G18/4236 , C08G18/4808 , C08G18/4854 , C08G18/61 , C08G18/664 , C08G18/6674 , C08G18/724 , C08G2101/00 , C08G2101/0066 , C08J9/0061 , C08J2205/052 , C08J2375/04 , C08J2483/00 , C08L83/00 , C09D175/08 , H01L21/30625 , Y10T428/249953 , Y10T428/249976 , C08G18/3814 , C08G18/3243 , C08G18/5096
摘要： The invention provides a polishing pad by which optical materials such as lenses, reflecting mirrors etc., or materials requiring a high degree of surface planarity, as in the polishing of silicone wafers, glass substrates or aluminum substrates for hard disks, or general metal polishing, can be flattened with stability and high polishing efficiency. The invention also provides a polishing pad for semiconductor wafers, which is superior in planarizing characteristic, is free from scratches and can be produced at low cost. There is provided a polishing pad which is free from dechucking error so that neither damage to wafers nor decrease in operating efficiency occurs. There is provided a polishing pad which is satisfactory in planarity, within wafer uniformity, and polishing rate and produces less change in polishing rate. There is provided a polishing pad which can make planarity improvement and scratch decrease compatible.
摘要翻译：本发明提供了抛光垫，通过该抛光垫，诸如透镜，反射镜等的光学材料或需要高度表面平坦度的材料，如在硅树脂晶片，玻璃基板或用于硬盘的铝基板的抛光中，或通常的金属抛光，可平坦化，抛光效率高。本发明还提供一种平面化特性优异的半导体晶片用抛光垫，无磨损，可以低成本地制造。提供了没有脱扣误差的抛光垫，从而不会损坏晶片，也不会降低工作效率。提供了平面性良好，晶片均匀性和抛光速度均匀且抛光速度变化小的抛光垫。提供了可以使平面性改善和划痕减少兼容的抛光垫。

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