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1. 发明授权

US10638193B2 Image processing device, image processing system, and image processing method 有权
公开(公告)号：US10638193B2
公开(公告)日：2020-04-28
申请号：US15647427
申请日：2017-07-12
申请人： Keiji Ohmura , Takeshi Hasegawa
发明人： Keiji Ohmura , Takeshi Hasegawa
IPC分类号： H04N21/00 , H04N21/462 , H04N7/18 , H04N5/232 , H04N19/146 , H04N19/15 , G06K9/00 , H04N19/136
CPC分类号： H04N21/4621 , H04N5/232 , H04N7/18 , H04N7/181 , H04N19/146 , H04N19/15 , G06K9/00771 , H04N19/136
摘要： An image processing device includes: a display unit displaying a first display region displaying a static image being a reference for matching an imaging unit to a predetermined imaging position and a second display region displaying video data imaged by the imaging unit; a determining unit executing a first matching operation of searching for an image coincident with an image of a first reference region set in the first display region, in a frame of the video data, and determining a region of the coincident image as a second reference region; and a correcting unit correcting a position of a determination region being a target of image determination performed with respect to the video data, based on a shift amount between the first reference region and the second reference region, and information representing a positional relationship between the determination region and the first reference region.

2. 发明授权

US08546452B2 S1P3 receptor antagonist 失效
标题翻译： S1P3受体拮抗剂
公开(公告)号：US08546452B2
公开(公告)日：2013-10-01
申请号：US12088861
申请日：2006-10-11
申请人： Shin-ya Ohnuma , Takeshi Hasegawa , Tomoyuki Sada
发明人： Shin-ya Ohnuma , Takeshi Hasegawa , Tomoyuki Sada
IPC分类号： A01N37/52 , A61K31/155 , C07C257/00
CPC分类号： C07C317/34 , C07C257/22 , C07D213/74 , C07D215/04 , C07D217/02 , C07D295/185 , C07D307/46 , C07D333/22
摘要： The present invention relates to arylamidrazone derivatives having an antagonistic action against S1P3 receptors represented by the following formula (1) or a pharmaceutically acceptable salt thereof:
摘要翻译：本发明涉及对由下式（1）表示的S1P3受体或其药学上可接受的盐具有拮抗作用的芳基氨基腙衍生物：

3. 发明授权

US08129544B2 1-substituted-4-nitroimidazole compound and method for preparing the same 有权
标题翻译： 1-取代-4-硝基咪唑化合物及其制备方法
公开(公告)号：US08129544B2
公开(公告)日：2012-03-06
申请号：US11905446
申请日：2007-10-01
申请人： Fumitaka Goto , Noriaki Takemura , Tadaaki Otani , Takeshi Hasegawa , Hidetsugu Tsubouchi , Naoto Utsumi , Shigekazu Fujita , Hideaki Kuroda , Takuya Shitsuta , Hirofumi Sasaki
发明人： Fumitaka Goto , Noriaki Takemura , Tadaaki Otani , Takeshi Hasegawa , Hidetsugu Tsubouchi , Naoto Utsumi , Shigekazu Fujita , Hideaki Kuroda , Takuya Shitsuta , Hirofumi Sasaki
IPC分类号： C07D407/06
CPC分类号： C07D233/92
摘要： The present invention relates to a 1-substituted-4-nitroimidazole compound represented by the general formula (1) or a salt thereof, (wherein R is a hydrogen atom, a lower alkoxy group-substituted lower alkyl group, a phenyl-lower alkoxy group-substituted lower alkyl group, a cyano-substituted lower alkyl group, a phenyl-lower alkyl group which may have lower alkoxy groups as the substituents in the phenyl ring or a group of the formula —CH2RA; X is a halogen atom or a group of the formula —S(O)n-R1) and method for preparing the same. The compound of the formula (1) is a useful compound as an intermediate for synthesis of various pharmaceutical and agricultural chemicals, particularly, as intermediates for antitubercular agents.
摘要翻译：本发明涉及由通式（1）表示的1-取代-4-硝基咪唑化合物或其盐（其中R是氢原子，低级烷氧基取代的低级烷基，苯基 - 低级烷氧基取代基的低级烷基，氰基取代的低级烷基，可以具有低级烷氧基作为苯环中的取代基的苯基 - 低级烷基或式-CH2RA的基团; X是卤素原子或基团-S（O）n -R1）及其制备方法。式（1）的化合物是用作合成各种药用和农药的中间体的有用化合物，特别是作为抗结核剂的中间体。

4. 发明申请

US20120021214A1 FUNCTIONAL FILM AND LAMINATE 审中-公开
标题翻译：功能膜和层压板
公开(公告)号：US20120021214A1
公开(公告)日：2012-01-26
申请号：US13260350
申请日：2010-03-09
申请人： Takeshi Hasegawa , Satoshi Negishi , Susumu Kurishima
发明人： Takeshi Hasegawa , Satoshi Negishi , Susumu Kurishima
IPC分类号： B32B27/00 , C09J7/02 , B32B7/12
CPC分类号： C09J7/29 , C09J2201/622 , C09J2205/31 , Y10T428/2813 , Y10T428/31504
摘要： A functional film that does not show decrease of surface hardness even when an adhesive layer for adhering it to another member is provided, and does not generate separation nor delamination at the time of die cutting, and a laminate thereof are provided. The functional film can include a plastic film having a functional layer constituted by a cured film on one surface and an adhesive layer on the other surface. The adhesive layer contains a curable adhesive that can be cured by irradiation of ionizing radiation or heating, and is constituted so that the adhesive layer after cured by irradiation of ionizing radiation or heating shows a Martens hardness of 260 N/mm2 or lower, and the following relational expression is satisfied. Martens hardness of the adhesive layer after curing≧Martens hardness of the functional layer×0.25
摘要翻译：即使提供粘附到另一个部件上的粘合剂层，也没有显示表面硬度的降低的功能膜，并且在切割时不产生分离或分层，并且提供其层压体。功能膜可以包括具有由一个表面上的固化膜和另一个表面上的粘合剂层构成的功能层的塑料膜。粘合剂层含有可通过电离辐射照射或加热而固化的可固化粘合剂，并且构成为通过照射电离辐射或加热固化后的粘合剂层的马氏体硬度为260N / mm 2以下，满足关系表达式。固化后粘合层的马氏硬度≧功能层的马氏硬度×0.25

5. 发明授权

US07848640B2 Enclosure for electric equipment and imaging device 有权
标题翻译：电气设备和成像设备外壳
公开(公告)号：US07848640B2
公开(公告)日：2010-12-07
申请号：US12237714
申请日：2008-09-25
申请人： Takeshi Hasegawa
发明人： Takeshi Hasegawa
IPC分类号： G03B17/02
CPC分类号： G03B17/02 , H04N5/2252
摘要： According to an enclosure for electric equipment of an aspect of the present invention, the enclosure having the plurality of accommodation portions accommodating separate contents, respectively, can be formed by one molding without assembling a plurality of components, which can reduce the number of assembling processes. Also, formation by one component eliminates a gap which would be generated by assembling components, which can improve enclosure strength and designability and reduce manufacturing costs.
摘要翻译：根据本发明的一个方面的电气设备的外壳，具有分别容纳分开内容物的多个容纳部分的外壳可以通过一个成型而形成，而不需要组装多个部件，这可以减少组装过程的数量。而且，通过一个部件的形成消除了通过组装部件产生的间隙，这可以提高外壳强度和可设计性并降低制造成本。

6. 发明授权

US07807843B2 1-substituted-4-nitroimidazole compound and method for preparing the same 失效
标题翻译： 1-取代-4-硝基咪唑化合物及其制备方法
公开(公告)号：US07807843B2
公开(公告)日：2010-10-05
申请号：US12007776
申请日：2008-01-15
申请人： Fumitaka Goto , Noriaki Takemura , Tadaaki Otani , Takeshi Hasegawa , Hidetsugu Tsubouchi , Naoto Utsumi , Shigekazu Fujita , Hideaki Kuroda , Takuya Shitsuta , Hirofumi Sasaki
发明人： Fumitaka Goto , Noriaki Takemura , Tadaaki Otani , Takeshi Hasegawa , Hidetsugu Tsubouchi , Naoto Utsumi , Shigekazu Fujita , Hideaki Kuroda , Takuya Shitsuta , Hirofumi Sasaki
IPC分类号： C07D407/06
CPC分类号： C07D233/92
摘要： The present invention relates to a 1-substituted-4-nitroimidazole compound represented by the general formula (1) or a salt thereof, (wherein R is a hydrogen atom, a lower alkoxy group-substituted lower alkyl group, a phenyl-lower alkoxy group-substituted lower alkyl group, a cyano-substituted lower alkyl group, a phenyl-lower alkyl group which may have lower alkoxy groups as the substituents in the phenyl ring or a group of the formula —CH2RA; X is a halogen atom or a group of the formula —S(O)n-R1) and method for preparing the same. The compound of the formula (1) is a useful compound as an intermediate for synthesis of various pharmaceutical and agricultural chemicals, particularly, as intermediates for antitubercular agents.
摘要翻译：本发明涉及由通式（1）表示的1-取代-4-硝基咪唑化合物或其盐（其中R是氢原子，低级烷氧基取代的低级烷基，苯基 - 低级烷氧基取代基的低级烷基，氰基取代的低级烷基，可以具有低级烷氧基作为苯环中的取代基的苯基 - 低级烷基或式-CH2RA的基团; X是卤素原子或基团-S（O）n -R1）及其制备方法。式（1）的化合物是用作合成各种药用和农药的中间体的有用化合物，特别是作为抗结核剂的中间体。

7. 发明授权

US07632349B2 Silicon wafer surface defect evaluation method 有权
标题翻译：硅晶片表面缺陷评估方法
公开(公告)号：US07632349B2
公开(公告)日：2009-12-15
申请号：US11467411
申请日：2006-08-25
申请人： Wataru Itou , Takeshi Hasegawa , Takaaki Shiota
发明人： Wataru Itou , Takeshi Hasegawa , Takaaki Shiota
IPC分类号： C30B33/00
CPC分类号： H01L22/12
摘要： There is provided a silicon wafer surface defect evaluation method capable of readily detecting a region where small crystal defects exist, the evaluation method comprising: a rapid heat treatment step of a silicon wafer from a silicon single-crystal ingot in an atmosphere which can nitride silicon at a temperature elevating speed of 10 to 150° C./second from a room temperature to temperatures between not lower than 1170° C. and less than a silicon melting point, holding the silicon wafer at the processing temperature for 1 to 120 seconds and then cooling the silicon wafer to the room temperature at a temperature lowering speed of 10 to 100° C./second; and a step of using a surface photo voltage method to calculate a minority carrier diffusion length on the wafer surface, thereby detecting a region on the wafer surface in which small COP's which cannot be detected at least by a particle counter exist.
摘要翻译：提供一种能够容易地检测出存在小晶体缺陷的区域的硅晶片表面缺陷评估方法，该评估方法包括：在能够将氮化硅的气氛中的硅单晶锭的硅晶片的快速热处理步骤以10〜150℃/秒的温度升温速度从室温升温至不低于1170℃，低于硅熔点，将硅晶片在处理温度下保持1〜120秒，然后以10〜100℃/秒的降温速度将硅晶片冷却至室温; 以及使用表面光电压法来计算晶片表面上的少数载流子扩散长度的步骤，从而检测晶片表面上至少存在无法检测到的小的COP的区域。

8. 发明申请

US20090086417A1 ENCLOSURE FOR ELECTRIC EQUIPMENT AND IMAGING DEVICE 有权
标题翻译：电气设备和成像装置的外壳
公开(公告)号：US20090086417A1
公开(公告)日：2009-04-02
申请号：US12237714
申请日：2008-09-25
申请人： Takeshi Hasegawa
发明人： Takeshi Hasegawa
IPC分类号： H04N5/225 , H05K5/00 , G03B17/02 , H02B1/00
CPC分类号： G03B17/02 , H04N5/2252
摘要： According to an enclosure for electric equipment of an aspect of the present invention, the enclosure having the plurality of accommodation portions accommodating separate contents, respectively, can be formed by one molding without assembling a plurality of components, which can reduce the number of assembling processes. Also, formation by one component eliminates a gap which would be generated by assembling components, which can improve enclosure strength and designability and reduce manufacturing costs.
摘要翻译：根据本发明的一个方面的电气设备的外壳，具有分别容纳分开内容物的多个容纳部分的外壳可以通过一个成型而形成，而不需要组装多个部件，这可以减少组装过程的数量。而且，通过一个部件的形成消除了通过组装部件产生的间隙，这可以提高外壳强度和可设计性并降低制造成本。

9. 发明申请

US20080097107A1 1-substituted-4-nitroimidazole compound and method for preparing the same 有权
标题翻译： 1-取代-4-硝基咪唑化合物及其制备方法
公开(公告)号：US20080097107A1
公开(公告)日：2008-04-24
申请号：US11905446
申请日：2007-10-01
申请人： Fumitaka Goto , Noriaki Takemura , Tadaaki Otani , Takeshi Hasegawa , Hidetsugu Tsubouchi , Naoto Utsumi , Shigekazu Fujita , Hideaki Kuroda , Takuya Shitsuta , Hirofumi Sasaki
发明人： Fumitaka Goto , Noriaki Takemura , Tadaaki Otani , Takeshi Hasegawa , Hidetsugu Tsubouchi , Naoto Utsumi , Shigekazu Fujita , Hideaki Kuroda , Takuya Shitsuta , Hirofumi Sasaki
IPC分类号： C07D233/92
CPC分类号： C07D233/92
摘要： The present invention relates to a 1-substituted-4-nitroimidazole compound represented by the general formula (1) or a salt thereof, (wherein R is a hydrogen atom, a lower alkoxy group-substituted lower alkyl group, a phenyl-lower alkoxy group-substituted lower alkyl group, a cyano-substituted lower alkyl group, a phenyl-lower alkyl group which may have lower alkoxy groups as the substituents in the phenyl ring or a group of the formula —CH2RA; X is a halogen atom or a group of the formula —S(O)n-R1) and method for preparing the same. The compound of the formula (1) is a useful compound as an intermediate for synthesis of various pharmaceutical and agricultural chemicals, particularly, as intermediates for antitubercular agents.
摘要翻译：本发明涉及由通式（1）表示的1-取代-4-硝基咪唑化合物或其盐（其中R是氢原子，低级烷氧基取代的低级烷基，苯基 - 低级烷氧基取代基的低级烷基，氰基取代的低级烷基，可以具有低级烷氧基作为苯环中的取代基的苯基 - 低级烷基或式-CH 2的基团， X是卤素原子或式-S（O）n R 1）的基团）及其制备方法。式（1）的化合物是用作合成各种药用和农药的中间体的有用化合物，特别是作为抗结核剂的中间体。

10. 发明授权

US07165578B2 Method for laying a rehabilitating pipe 失效
标题翻译：铺设修复管道的方法
公开(公告)号：US07165578B2
公开(公告)日：2007-01-23
申请号：US11048961
申请日：2005-02-02
申请人： Takao Kamiyama , Koji Kaneta , Kenji Fujii , Takeshi Hasegawa
发明人： Takao Kamiyama , Koji Kaneta , Kenji Fujii , Takeshi Hasegawa
IPC分类号： F16L55/16
CPC分类号： E03F3/06 , E03F2003/065 , F16L55/1657
摘要： A rehabilitating pipe is laid inside an existing pipe to rehabilitate the existing pipe. Support members are intergrally connected to an inner wall surface of the existing pipe so that loop portions of the respective support members extend from the inner wall surface of the existing pipe. The rehabilitating pipe is assembled inside of the existing pipe by mutually coupling segments of the rehabilitating pipe in a longitudinal direction of the existing pipe by inserting coupling members through connecting through-holes of the segments and through the loop portions of the respective support members to thereby support the assembled rehabilitating pipe so that the rehabilitating pipe remains inside of the existing pipe after assembly to rehabilitate the existing pipe.
摘要翻译：在现有的管道内放置一个修复管道，以恢复现有的管道。支撑构件与现有管的内壁表面共同连接，使得各个支撑构件的环部从现有管的内壁表面延伸。通过将连接构件通过连接部分的通孔和相应的支撑构件的环部分插入联接构件，将修复管组装在现有管道的内部，通过使现有管道的纵向方向相互连接，支持组装的修复管，使得修复管在组装后保持在现有管内，以恢复现有管。

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