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1. 发明申请

US20170166524A1 N,N-SUBSTITUTED 3-AMINOPYRROLIDINE COMPOUNDS USEFUL AS MONOAMINES REUPTAKE INHIBITORS 审中-公开
公开(公告)号：US20170166524A1
公开(公告)日：2017-06-15
申请号：US15435084
申请日：2017-02-16
申请人： Muneaki KURIMURA , Shinichi TAIRA , Takahiro TOMOYASU , Nobuaki ITO , Kuninori TAI , Noriaki TAKEMURA , Takayuki MATSUZAKI , Yasuhiro MENJO , Shin MIYAMURA , Yohji SAKURAI , Akihito WATANABE , Yasuyo SAKATA , Takumi MASUMOTO , Kohei AKAZAWA , Haruhiko SUGINO , Naoki AMADA , Satoshi OHASHI , Tomoichi SHINOHARA , Hirofumi SASAKI , Chisako MORITA , Junko YAMASHITA , Satoko NAKAJIMA
发明人： Muneaki KURIMURA , Shinichi TAIRA , Takahiro TOMOYASU , Nobuaki ITO , Kuninori TAI , Noriaki TAKEMURA , Takayuki MATSUZAKI , Yasuhiro MENJO , Shin MIYAMURA , Yohji SAKURAI , Akihito WATANABE , Yasuyo SAKATA , Takumi MASUMOTO , Kohei AKAZAWA , Haruhiko SUGINO , Naoki AMADA , Satoshi OHASHI , Tomoichi SHINOHARA , Hirofumi SASAKI , Chisako MORITA , Junko YAMASHITA , Satoko NAKAJIMA
IPC分类号： C07D205/04 , C07D413/12 , C07D409/12 , C07D405/12 , C07D471/04 , C07D417/12 , C07D495/04 , C07D409/14 , C07D405/14 , C07D401/14 , C07D401/12 , C07D403/12
CPC分类号： C07D205/04 , C07D207/14 , C07D401/12 , C07D401/14 , C07D403/12 , C07D405/12 , C07D405/14 , C07D409/12 , C07D409/14 , C07D413/12 , C07D413/14 , C07D417/12 , C07D471/04 , C07D495/04 , C07F7/10
摘要： The present invention provides a pyrrolidine compound of General Formula (1) or a salt thereof, wherein R101 and R102 are each independently a phenyl group or a pyridyl group, the phenyl group or the pyridyl group may have one or more substituents selected from halogen atoms and lower alkyl groups optionally substituted with one or more halogen atoms, etc. The pyrrolidine compound or a salt thereof of the present invention is usable to produce a pharmaceutical preparation having a wider therapeutic spectrum and being capable of exhibiting sufficient therapeutic effects after short-term administration.

2. 发明授权

US09051333B2 6,7-dihydroimidazo [2,1-b] [1,3]oxazine bactericides 有权
标题翻译： 6,7-二氢咪唑并[2,1-b] [1,3]恶嗪类杀菌剂
公开(公告)号：US09051333B2
公开(公告)日：2015-06-09
申请号：US14111262
申请日：2012-04-13
申请人： Yoshikazu Kawano , Yoshikazu Haraguchi , Hirofumi Sasaki , Yukitaka Uematsu , Hidetsugu Tsubouchi , Hiromi Yata , Hiroshi Shimizu , Kazuho Kohashi , Motohiro Itotani , Kuninori Tai , Isao Takemura , Mikayo Hayashi , Hiroyuki Hashizume , Miki Matsuba , Izuru Nakamura , Xiuhao Chen , Makoto Matsumoto
发明人： Yoshikazu Kawano , Yoshikazu Haraguchi , Hirofumi Sasaki , Yukitaka Uematsu , Hidetsugu Tsubouchi , Hiromi Yata , Hiroshi Shimizu , Kazuho Kohashi , Motohiro Itotani , Kuninori Tai , Isao Takemura , Mikayo Hayashi , Hiroyuki Hashizume , Miki Matsuba , Izuru Nakamura , Xiuhao Chen , Makoto Matsumoto
IPC分类号： C07D498/04 , A61K31/5383
CPC分类号： C07D498/04
摘要： The present invention provides a novel 6,7-dihydroimidazo[2,1-b][1,3]oxazine compound that has excellent bactericidal action against tubercle bacilli, multidrug-resistant tubercle bacilli, and atypical acid-fast bacilli. Specifically, the present invention provides a compound represented by Formula (1): or a salt thereof, wherein R1 represents tetrahydroisoquinolyl, tetrahydroquinolyl, tetrahydrobenzoazepinyl, benzoxazolyl, benzothiazolyl, indolyl, isoindolinyl, naphthyl, quinolyl, phenyl, biphenylyl, or pyridyl, these groups being optionally substituted, the phenyl, biphenylyl, and pyridyl represented by R1 each being substituted directly or via a linker with at least one group selected from the group consisting of tetrahydropyridyl, diazepanyl, diazabicycloheptanyl, tetrahydrotriazolopyrazinyl, tetrahydroimidazopyrazinyl, azabicyclooctanyl, oxazolyl, piperazinyl, piperidyl, thiazolyl, and the like, each of these groups being optionally substituted; and R2 represents hydrogen or lower alkyl. The present invention further provides a pharmaceutical composition containing the above.
摘要翻译：本发明提供了对结核杆菌，多重耐药性结核杆菌和非典型抗酸杆菌具有优异的杀菌作用的新型6,7-二氢咪唑并[2,1-b] [1,3]恶嗪化合物。具体地说，本发明提供由式（1）表示的化合物或其盐，其中R1表示四氢异喹啉基，四氢喹啉基，四氢苯并氮杂基，苯并恶唑基，苯并噻唑基，吲哚基，异吲哚啉基，萘基，喹啉基，苯基，联苯基或吡啶基。任选被取代的苯基，联苯基和吡啶基，其各自被直接取代或经由具有至少一个选自四氢吡啶基，二氮杂环庚烷基，二氮杂双环庚烷基，四氢三唑并吡嗪基，四氢咪唑并吡嗪基，氮杂双环辛基，恶唑基，哌嗪基，哌啶基，噻唑基等，这些基团各自任选被取代; 并且R 2表示氢或低级烷基。本发明还提供含有上述物质的药物组合物。

3. 发明申请

US20140031342A1 6,7-DIHYDROIMIDAZO [2,1-b] [1,3]OXAZINE BACTERICIDES 有权
标题翻译： 6,7-二氢吲哚并[2,1-b] [1,3]氧化物杀菌剂
公开(公告)号：US20140031342A1
公开(公告)日：2014-01-30
申请号：US14111262
申请日：2012-04-13
申请人： Yoshikazu Kawano , Yoshikazu Haraguchi , Hirofumi Sasaki , Yukitaka Uematsu , Hidetsugu Tsubouchi , Hiromi Yata , Hiroshi Shimizu , Kazuho Kohashi , Motohiro Itotani , Kuninori Tai , Isao Takemura , Mikayo Hayashi , Hiroyuki Hashizume , Miki Matsuba , Izuru Nakamura , Xiuhao Chen , Makoto Matsumoto
发明人： Yoshikazu Kawano , Yoshikazu Haraguchi , Hirofumi Sasaki , Yukitaka Uematsu , Hidetsugu Tsubouchi , Hiromi Yata , Hiroshi Shimizu , Kazuho Kohashi , Motohiro Itotani , Kuninori Tai , Isao Takemura , Mikayo Hayashi , Hiroyuki Hashizume , Miki Matsuba , Izuru Nakamura , Xiuhao Chen , Makoto Matsumoto
IPC分类号： C07D498/04
CPC分类号： C07D498/04
摘要： The present invention provides a novel 6,7-dihydroimidazo[2,1-b][1,3]oxazine compound that has excellent bactericidal action against tubercle bacilli, multidrug-resistant tubercle bacilli, and atypical acid-fast bacilli. Specifically, the present invention provides a compound represented by Formula (1): or a salt thereof, wherein R1 represents tetrahydroisoquinolyl, tetrahydroquinolyl, tetrahydrobenzoazepinyl, benzoxazolyl, benzothiazolyl, indolyl, isoindolinyl, naphthyl, quinolyl, phenyl, biphenylyl, or pyridyl, these groups being optionally substituted, the phenyl, biphenylyl, and pyridyl represented by R1 each being substituted directly or via a linker with at least one group selected from the group consisting of tetrahydropyridyl, diazepanyl, diazabicycloheptanyl, tetrahydrotriazolopyrazinyl, tetrahydroimidazopyrazinyl, azabicyclooctanyl, oxazolyl, piperazinyl, piperidyl, thiazolyl, and the like, each of these groups being optionally substituted; and R2 represents hydrogen or lower alkyl. The present invention further provides a pharmaceutical composition containing the above.
摘要翻译：本发明提供了对结核杆菌，多重耐药性结核杆菌和非典型抗酸杆菌具有优异的杀菌作用的新型6,7-二氢咪唑并[2,1-b] [1,3]恶嗪化合物。具体地说，本发明提供由式（1）表示的化合物或其盐，其中R1表示四氢异喹啉基，四氢喹啉基，四氢苯并氮杂基，苯并恶唑基，苯并噻唑基，吲哚基，异吲哚啉基，萘基，喹啉基，苯基，联苯基或吡啶基。任选被取代的苯基，联苯基和吡啶基，其各自被直接取代或经由具有至少一个选自四氢吡啶基，二氮杂环庚烷基，二氮杂双环庚烷基，四氢三唑并吡嗪基，四氢咪唑并吡嗪基，氮杂双环辛基，恶唑基，哌嗪基，哌啶基，噻唑基等，这些基团各自任选被取代; 并且R 2表示氢或低级烷基。本发明还提供含有上述物质的药物组合物。

4. 发明授权

US08455173B2 Photosensitive insulating resin composition, cured product of the composition, and method of producing insulating film 有权
标题翻译：感光性绝缘树脂组合物，组合物的固化物，以及绝缘膜的制造方法
公开(公告)号：US08455173B2
公开(公告)日：2013-06-04
申请号：US12696021
申请日：2010-01-28
申请人： Hirofumi Sasaki , Atsushi Itou
发明人： Hirofumi Sasaki , Atsushi Itou
IPC分类号： G03F7/038 , G03F7/20 , G03F7/004 , G03F7/023 , G03F7/38 , G03F7/40 , C08K5/1525 , C08K5/17
CPC分类号： G03F7/0382 , G03F7/0233 , G03F7/0388 , G03F7/40
摘要： A photosensitive insulating resin composition includes (A) an alkali-soluble resin that contains (a1) a structural unit derived from a crosslinkable monomer and (a2) a structural unit having a phenolic hydroxyl group, (B) a crosslinking agent, (C) a photosensitive compound, and (D) a solvent.
摘要翻译：感光性绝缘性树脂组合物包含（A）含有（a1）来自交联性单体的结构单元和（a2）具有酚性羟基的结构单元的碱溶性树脂，（B）交联剂，（C）光敏性化合物和（D）溶剂。

5. 发明授权

US08163753B2 2,3-dihydro-6-nitroimidazo (2,1-b) oxazole compounds for the treatment of tuberculosis 有权
标题翻译： 2,3-二氢-6-硝基咪唑并（2,1-b）恶唑化合物，用于治疗结核病
公开(公告)号：US08163753B2
公开(公告)日：2012-04-24
申请号：US10574597
申请日：2004-10-29
申请人： Hidetsugu Tsubouchi , Hirofumi Sasaki , Motohiro Itotani , Yoshikazu Haraguchi , Shin Miyamura , Makoto Matsumoto , Hiroyuki Hashizume , Tatsuo Tomishige , Masanori Kawasaki , Kinue Ohguro , Takumi Sumida , Takeshi Hasegawa , Kazuho Tanaka , Isao Takemura
发明人： Hidetsugu Tsubouchi , Hirofumi Sasaki , Motohiro Itotani , Yoshikazu Haraguchi , Shin Miyamura , Makoto Matsumoto , Hiroyuki Hashizume , Tatsuo Tomishige , Masanori Kawasaki , Kinue Ohguro , Takumi Sumida , Takeshi Hasegawa , Kazuho Tanaka , Isao Takemura
IPC分类号： A61K31/497 , A61K31/47 , A61K31/445 , A61K31/42 , C07D419/06 , C07D215/04 , C07D213/72 , C07D498/04
CPC分类号： C07D498/04
摘要： The present invention provides a 2,3-dihydro-6-nitroimidazo[2,1-b]oxazole compound represented by the following general formula: (1) in the above formula (1), R1 represents a hydrogen atom or C1-C6 alkyl group, n represents an integer of 0 to 6, R1 and —(CH2)nR2 may form a spiro ring represented by the formula (30) below, together with the adjacent carbon atom (in the formula below, RRR represents a piperidyl group which may have substituents on the piperidine ring), (30) and R2 represents a benzothiazolyloxy group, quinolyloxy group, pyridyloxy group or the like. The present compound has an excellent bactericidal action against Mycobacterium tuberculosis, multi-drug-resistant Mycobacterium tuberculosis, and atypical acid-fast bacteria.
摘要翻译：本发明提供由上述通式（1）中的通式（1）表示的2,3-二氢-6-硝基咪唑并[2,1-b]恶唑化合物，R1表示氢原子或C1-C6 烷基，n表示0〜6的整数，R1和 - （CH2）nR2可以与相邻的碳原子一起形成由下式（30）表示的螺环（在下式中，RRR表示哌啶基其可以在哌啶环上具有取代基），（30），R 2表示苯并噻唑氧基，喹啉氧基，吡啶氧基等。本发明化合物对结核分枝杆菌，多药耐药结核分枝杆菌和非典型酸性抗菌细菌具有优异的杀菌作用。

6. 发明授权

US07814960B2 Mold oscillating apparatus 有权
标题翻译：模具摆动装置
公开(公告)号：US07814960B2
公开(公告)日：2010-10-19
申请号：US11972179
申请日：2008-01-10
申请人： Hiroshi Kawaguchi , Hirofumi Sasaki
发明人： Hiroshi Kawaguchi , Hirofumi Sasaki
IPC分类号： B22D11/053
CPC分类号： B22D11/053
摘要： In a mold oscillating apparatus according to the present invention, a connecting plate for interconnecting a moving bearing housing rotated by eccentric rotation of an eccentric shaft and a mold table oscillated by rotation of the moving bearing housing is supported by the mold table from one end of an upper end part thereof to the other end, and supported by the moving bearing housing from one end of a lower end part thereof to the other end. By such a configuration, torsional deformation of the connecting plate is prevented and a stress generated in the connecting plate is eased.
摘要翻译：在根据本发明的模具摆动装置中，用于使通过偏心轴的偏心旋转旋转的移动轴承壳体与通过移动轴承壳体的旋转而摆动的模具台相互连接的连接板由模具台的一端支撑其另一端的上端部分由其移动轴承壳体的下端部分的一端支撑到另一端。通过这样的结构，能够防止连接板的扭转变形，并且能够缓和连接板产生的应力。

7. 发明申请

US20100147789A1 METHOD FOR MANUFACTURING PIEZOELECTRIC ELEMENT 有权
标题翻译：制造压电元件的方法
公开(公告)号：US20100147789A1
公开(公告)日：2010-06-17
申请号：US12617337
申请日：2009-11-12
申请人： Katsuyuki KURACHI , Hirofumi SASAKI
发明人： Katsuyuki KURACHI , Hirofumi SASAKI
IPC分类号： B44C1/22
CPC分类号： H01L41/332 , H01L41/313
摘要： A manufacturing method of the present invention comprises the step of epitaxially growing a PZT layer on a first electrode layer, and the step of processing the PZT layer to a desired shape using an etching solution after the growing step. The etching solution contains at least one acid from among hydrochloric acid and nitric acid in a concentration CHCl+3.3CHNO3 ranging from 1 wt % to 10 wt %, CHCl and CHNO3 denoting, respectively, a weight concentration of the hydrochloric acid and nitric acid relative to a weight of the etching solution; and at least one fluorine compound from among ammonium fluoride and hydrogen fluoride, such that a weight concentration of fluorine derived from ammonium fluoride and hydrogen fluoride ranges from 0.1 wt % to 1 wt % relative to the weight of the etching solution.
摘要翻译：本发明的制造方法包括在第一电极层上外延生长PZT层的步骤，以及在生长步骤之后使用蚀刻溶液将PZT层加工成所需形状的步骤。蚀刻溶液含有盐酸和硝酸中至少一种浓度为1重量％至10重量％CHCl + 3.3CHNO 3的酸，CHCl和CHNO 3分别表示盐酸和硝酸的相对重量浓度达到蚀刻溶液的重量; 和来自氟化铵和氟化氢的至少一种氟化合物，使得源自氟化铵和氟化氢的氟的重量浓度相对于蚀刻溶液的重量为0.1重量％至1重量％。

8. 发明授权

US07714033B2 Photosensitive insulating resin composition, cured product thereof and electronic component comprising the same 有权
标题翻译：感光性绝缘树脂组合物及其固化物和包含该组合物的电子部件
公开(公告)号：US07714033B2
公开(公告)日：2010-05-11
申请号：US11831258
申请日：2007-07-31
申请人： Atsushi Ito , Hirofumi Goto , Hirofumi Sasaki , Ryuichi Okuda
发明人： Atsushi Ito , Hirofumi Goto , Hirofumi Sasaki , Ryuichi Okuda
IPC分类号： G03F7/004 , C08G59/68 , C08G65/10
CPC分类号： G03F7/0382 , G03F7/0045
摘要： The objective of the present invention is to provide a photosensitive insulating resin composition which is highly sensitive to g-line and h-line and enables to form a surface-protecting film, an interlayer insulation film and a planarized film that are excellent in various properties including resolution, electrical insulation property and thermal shock resistance, a cured product and an electronic component having the cured product. The present photosensitive insulating resin composition comprises an alkali-soluble resin having a phenolic hydroxyl group, a radiation sensitive acid generator comprising an s-triazine derivative represented by the following general formula (1), and a crosslinking agent. [In the formula (1), R is hydrogen atom, an alkyl group having 1 to 4 carbon atoms or an alkoxyl group having 1 to 4 carbon atoms, X is a halogen atom and Y is oxygen atom or sulfur atom.]
摘要翻译：本发明的目的是提供对g线和h线高度敏感的感光性绝缘树脂组合物，能够形成各种性能优异的表面保护膜，层间绝缘膜和平坦化膜包括分辨率，电绝缘性和耐热冲击性，固化产物和具有固化产物的电子部件。本发明的感光性绝缘性树脂组合物含有具有酚性羟基的碱溶性树脂，含有下述通式（1）表示的s-三嗪衍生物的辐射敏感性酸发生剂和交联剂。 [式（1）中，R为氢原子，碳原子数1〜4的烷基或碳原子数1〜4的烷氧基，X为卤素原子，Y为氧原子或硫原子。

9. 发明授权

US07636994B2 Method of making a piezoelectric device 有权
标题翻译：制造压电元件的方法
公开(公告)号：US07636994B2
公开(公告)日：2009-12-29
申请号：US11360394
申请日：2006-02-24
申请人： Kenichi Tochi , Masahiro Miyazaki , Takao Noguchi , Hiroshi Yamazaki , Ken Unno , Hirofumi Sasaki
发明人： Kenichi Tochi , Masahiro Miyazaki , Takao Noguchi , Hiroshi Yamazaki , Ken Unno , Hirofumi Sasaki
IPC分类号： H01L41/22 , H01L41/00 , H03H9/00
CPC分类号： H01L41/332 , Y10T29/42 , Y10T29/43 , Y10T29/435 , Y10T29/49126 , Y10T29/49155
摘要： The present invention provides an electronic device with improved characteristics and a method of making the electronic device. In a method of making an electronic device (piezoelectric device) 74 according to the present invention, an outer edge R1 of a piezoelectric film 52A formed on an electrode film 46A of a laminate 60 is located inside an outer edge R2 of the electrode film 46A. For this reason, in removal of a monocrystalline Si substrate 14 from a multilayer board 61, where an etching solution permeates between polyimide 72 and laminate 60, the etching solution circumvents the electrode film 46A before it reaches the piezoelectric film 52A. Namely, a route A of the etching solution to the piezoelectric film 52A is significantly extended by the electrode film 46A. In the method of making the electronic device 74, therefore, the etching solution is less likely to reach the piezoelectric film 52A. It significantly suppresses a situation of dissolution of the piezoelectric film 52A and realizes improvement in characteristics of the piezoelectric device 74 made.
摘要翻译：本发明提供了具有改进特性的电子设备和制造该电子设备的方法。在制造根据本发明的电子设备（压电器件）74的方法中，形成在层压体60的电极膜46A上的压电膜52A的外边缘R1位于电极膜46A的外边缘R2的内侧。因此，从蚀刻液在聚酰亚胺72和层叠体60之间渗透的多层基板61去除单晶Si基板14时，蚀刻液在其到达压电膜52A之前就绕过电极膜46A。也就是说，通过电极膜46A显着地延长到压电膜52A的蚀刻溶液的路线A. 因此，在制造电子设备74的方法中，蚀刻溶液不太可能到达压电膜52A。这显着地抑制了压电膜52A的溶解情况，并且实现了所制作的压电装置74的特性的改善。

10. 发明申请

US20080045621A1 PHOTOSENSITIVE INSULATING RESIN COMPOSITION, CURED PRODUCT THEREOF AND ELECTRONIC COMPONENT COMPRISING THE SAME 有权
标题翻译：光敏绝缘树脂组合物，其固化产物和包含其的电子组分
公开(公告)号：US20080045621A1
公开(公告)日：2008-02-21
申请号：US11831258
申请日：2007-07-31
申请人： Atsushi Ito , Hirofumi Goto , Hirofumi Sasaki , Ryuichi Okuda
发明人： Atsushi Ito , Hirofumi Goto , Hirofumi Sasaki , Ryuichi Okuda
IPC分类号： G03C1/73
CPC分类号： G03F7/0382 , G03F7/0045
摘要： The objective of the present invention is to provide a photosensitive insulating resin composition which is highly sensitive to g-line and h-line and enables to form a surface-protecting film, an interlayer insulation film and a planarized film that are excellent in various properties including resolution, electrical insulation property and thermal shock resistance, a cured product and an electronic component having the cured product. The present photosensitive insulating resin composition comprises an alkali-soluble resin having a phenolic hydroxyl group, a radiation sensitive acid generator comprising an s-triazine derivative represented by the following general formula (1), and a crosslinking agent. [In the formula (1), R is hydrogen atom, an alkyl group having 1 to 4 carbon atoms or an alkoxyl group having 1 to 4 carbon atoms, X is a halogen atom and Y is oxygen atom or sulfur atom.]
摘要翻译：本发明的目的是提供对g线和h线高度敏感的感光性绝缘树脂组合物，能够形成各种性能优异的表面保护膜，层间绝缘膜和平坦化膜包括分辨率，电绝缘性和耐热冲击性，固化产物和具有固化产物的电子部件。本发明的感光性绝缘性树脂组合物含有具有酚性羟基的碱溶性树脂，含有下述通式（1）表示的s-三嗪衍生物的辐射敏感性酸发生剂和交联剂。 [式（1）中，R为氢原子，碳原子数1〜4的烷基或碳原子数1〜4的烷氧基，X为卤素原子，Y为氧原子或硫原子。

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