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1. 发明授权

US08492078B2 Patterning process 有权
标题翻译：图案化过程
公开(公告)号：US08492078B2
公开(公告)日：2013-07-23
申请号：US13010318
申请日：2011-01-20
申请人： Jun Hatakeyama , Takeshi Nagata , Koji Hasegawa
发明人： Jun Hatakeyama , Takeshi Nagata , Koji Hasegawa
IPC分类号： G03F7/26
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/11 , G03F7/2041 , G03F7/325
摘要： A pattern is formed by coating a resist composition comprising a polymer comprising recurring units having an optionally acid labile group-substituted naphthol group, an acid generator, and an organic solvent onto a substrate, baking to form a resist film, exposing the resist film to high-energy radiation, baking, and developing the exposed film with an organic solvent developer to form a negative pattern wherein the unexposed region of film is dissolved and the exposed region of film is not dissolved. In the process of image formation via positive/negative reversal by organic solvent development, the resist film has a high dissolution contrast and controlled acid diffusion. By subjecting the resist film to exposure through a mask having a lattice-like pattern and organic solvent development, a fine hole pattern can be formed at a high precision of dimensional control.
摘要翻译：通过将包含含有任选的酸不稳定基取代的萘酚基的重复单元，酸产生剂和有机溶剂的聚合物的抗蚀剂组合物涂布在基材上，烘烤以形成抗蚀剂膜，将抗蚀剂膜暴露于高能辐射，烘烤，并用有机溶剂显影剂显影曝光的薄膜以形成其中未暴露的薄膜区域溶解并且曝光区域不溶解的负图案。在通过有机溶剂显影的正/负反转的图像形成过程中，抗蚀剂膜具有高的溶解对比度和受控的酸扩散。通过使抗蚀剂膜通过具有格子状图案和有机溶剂显影的掩模进行曝光，可以以高精度的尺寸控制形成细孔图案。

2. 发明申请

US20120276485A1 PATTERNING PROCESS 有权
标题翻译：绘图过程
公开(公告)号：US20120276485A1
公开(公告)日：2012-11-01
申请号：US13456705
申请日：2012-04-26
申请人： Tomohiro Kobayashi , Jun Hatakeyama , Takeshi Nagata
发明人： Tomohiro Kobayashi , Jun Hatakeyama , Takeshi Nagata
IPC分类号： G03F7/20
CPC分类号： G03F7/0397
摘要： A negative pattern is formed by applying a resist composition onto a substrate, baking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to selectively dissolve the unexposed region of resist film. The resist composition comprising a hydrogenated ROMP polymer and a (meth)acrylate resin displays a high dissolution contrast in organic solvent development, and exhibits high dry etch resistance even when the acid labile group is deprotected through exposure and PEB.
摘要翻译：通过将抗蚀剂组合物涂布在基材上，烘烤，暴露于高能量辐射，烘烤（PEB）和在有机溶剂显影剂中曝光的抗蚀剂膜显影以选择性地溶解抗蚀剂膜的未曝光区域，形成负型图案。包含氢化ROMP聚合物和（甲基）丙烯酸酯树脂的抗蚀剂组合物在有机溶剂显影中表现出高的溶解对比度，并且即使当酸不稳定基团通过曝光和PEB脱保护时也显示出高的耐干蚀刻性。

3. 发明申请

US20080103158A1 METHODS FOR TREATING DELAYING THE PROGRESSION OF ALZHEIMER'S DISEASE WITH HETEROCYCLIC COMPOUNDS 审中-公开
标题翻译：用异源化合物延缓阿尔茨海默病发展的方法
公开(公告)号：US20080103158A1
公开(公告)日：2008-05-01
申请号：US11872418
申请日：2007-10-15
申请人： Yoshimasa Yamaguchi , Ryogo Yui , Toshiyuki Matsuno , Kenichi Saitoh , Hitoshi Miyashita , Takeshi Nagata
发明人： Yoshimasa Yamaguchi , Ryogo Yui , Toshiyuki Matsuno , Kenichi Saitoh , Hitoshi Miyashita , Takeshi Nagata
IPC分类号： A61K31/519 , A61K31/4375 , A61P25/28
CPC分类号： A61K31/437 , A61K31/40 , A61K31/4015 , A61K31/425 , A61K31/426 , A61K31/429 , A61K31/438 , A61K31/444 , A61K31/4745 , A61K31/495 , A61K31/519 , C07D471/04 , C07D471/10 , C07D487/04 , C07D487/10 , C07D513/04 , C07D513/20
摘要： Disclosed is an antidepressant, neuroprotectant, amyloid β deposition inhibitor, or age retardant composition containing a heterocyclic compound having the general formula (I):
摘要翻译：公开了一种抗抑郁药，神经保护剂，淀粉样蛋白β沉积抑制剂或含有通式（I）的杂环化合物的阻燃剂组合物：

4. 发明申请

US20060187589A1 Magnetic recording medium 审中-公开
标题翻译：磁记录介质
公开(公告)号：US20060187589A1
公开(公告)日：2006-08-24
申请号：US11358123
申请日：2006-02-22
申请人： Takeshi Harasawa , Naoto Abe , Takeshi Nagata
发明人： Takeshi Harasawa , Naoto Abe , Takeshi Nagata
IPC分类号： G11B5/33
CPC分类号： G11B5/70 , G11B5/842
摘要： Provided is a magnetic recording medium capable of achieving high reproduction output in a short wavelength region. The magnetic recording medium comprises a nonmagnetic layer comprising a nonmagnetic powder and a binder and a magnetic layer comprising a ferromagnetic powder and a binder in this order on a nonmagnetic support. The magnetic layer has a squareness ranging from 0.6 to 1.0 in a perpendicular direction, and the magnetic recording medium is employed for recording a magnetic signal on the medium in a longitudinal direction at a linear recording density of equal to or greater than 300 Kbpi using a recording head with a gap length of equal to or less than 0.3 micrometer, and reproducing the magnetic signal using a magnetoresistive head with a shield spacing of equal to or less than 0.2 micrometer.
摘要翻译：提供了能够在短波长区域中实现高再现输出的磁记录介质。该磁记录介质包括非磁性层，其包含非磁性粉末和粘合剂，以及磁性层，其包含铁磁粉末和粘合剂，其顺序为非磁性载体。磁性层在垂直方向上具有0.6至1.0的正方形，并且磁记录介质用于以等于或大于300Kbpi的线性记录密度在纵向方向上在介质上记录磁信号，使用记录头的间隙长度等于或小于0.3微米，并且使用屏蔽间距等于或小于0.2微米的磁阻头再现磁信号。

5. 发明申请

US20050225888A1 Reproducing method, reproducing apparatus, recording and reproducing apparatus, and magnetic recording medium 失效
公开(公告)号：US20050225888A1
公开(公告)日：2005-10-13
申请号：US11146025
申请日：2005-06-07
申请人： Takeshi Nagata , Naoto Abe , Hisashi Osawa , Yoshihiro Okamoto
发明人： Takeshi Nagata , Naoto Abe , Hisashi Osawa , Yoshihiro Okamoto
IPC分类号： G11B5/706 , G11B5/02 , G11B5/035 , G11B20/10
CPC分类号： G11B20/10333 , G11B5/035 , G11B5/70678 , G11B20/10009 , G11B20/10046 , G11B20/10055
摘要： The reproducing method and apparatus, and recording and reproducing apparatus equalize and demodulate an information signal under a condition that coefficient terms (1, a1, a2, . . . , am (m: 2n or 2n+1; n, an integer not less than 1)) of a partial response satisfy any of equations (1) and (2) in a case that γ comprises a waveform of γ>0 and indicates an asymmetry of an isolated reversion producing waveform reproduced from the magnetic recording medium; and under a condition that the coefficient items of the partial response satisfy any of equations (3) and (4) in a case that the γ comprises a waveform of γ  ∑ k = n + 1 2 ⁢ n ⁢ a k  ( 3 ) in a case of PR (1, a1, a2, . . . , a2n+1), 1 +  ∑ k = 1 n ⁢ a k  >  ∑ k = n + 1 2 ⁢ n + 1 ⁢ a k  . ( 4 )

6. 发明授权

US5750309A Chemically amplified positive resist composition 失效
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US5750309A
公开(公告)日：1998-05-12
申请号：US684481
申请日：1996-07-19
申请人： Jun Hatakeyama , Shigehiro Nagura , Kiyoshi Motomi , Takeshi Nagata , Toshinobu Ishihara
发明人： Jun Hatakeyama , Shigehiro Nagura , Kiyoshi Motomi , Takeshi Nagata , Toshinobu Ishihara
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： In a chemical amplification positive resist composition comprising an organic solvent, a resin and a photoacid generator, at least two polymers having different molecular weights selected from polyhydroxystyrenes having some hydroxyl groups protected with acid labile groups are used. Among the polymers, a high molecular weight polymer has a molecular weight dispersity (Mw1/Mn1) of up to 1.5, and a low molecular weight polymer has a dispersity (Mw2/Mn2) of up to 5.0. The weight average molecular weight ratio Mw1/Mw2 is between 1.5/1 and 10.0/1. The resist composition is highly sensitive to actinic radiation, has improved sensitivity and resolution, and is suitable for use in a fine patterning technique and commercially acceptable.
摘要翻译：在包含有机溶剂，树脂和光致酸发生剂的化学放大正性抗蚀剂组合物中，使用至少两种具有不同分子量的聚合物，其选自具有用酸不稳定基保护的一些羟基的多羟基苯乙烯。在聚合物中，高分子量聚合物的分子量分散性（Mw1 / Mn1）高达1.5，低分子量聚合物的分散性（Mw2 / Mn2）高达5.0。重均分子量Mw1 / Mw2在1.5 / 1和10.0 / 1之间。抗蚀剂组合物对光化辐射高度敏感，具有改进的灵敏度和分辨率，并且适用于精细图案化技术和商业上可接受的。

7. 发明申请

US20150256061A1 INVERTER DEVICE, TRANSFORMER, AND TRANSFORMER MANUFACTURING METHOD 有权
标题翻译：逆变器装置，变压器和变压器制造方法
公开(公告)号：US20150256061A1
公开(公告)日：2015-09-10
申请号：US14433540
申请日：2012-10-19
申请人： Yoshinobu KOJI , Takeshi TANAKA , Takeshi NAGATA
发明人： Yoshinobu Koji , Takeshi Tanaka , Takeshi Nagata
IPC分类号： H02M1/44 , H01F27/33 , H01F41/06 , H01F27/30 , H01F41/02 , H02M7/42 , H01F27/24
CPC分类号： H02M1/44 , B60L2200/26 , H01F27/24 , H01F27/30 , H01F27/306 , H01F27/33 , H01F30/12 , H01F41/0233 , H01F41/06 , H02M7/42 , Y10T29/49071
摘要： Provided is an inverter device that can reduce high-frequency noise. The inverter device includes a transformer for converting the voltage of the AC power output from an inverter circuit and outputting the resulting power. Each of first to third coil sections for converting the voltage of the AC power output from the inverter circuit and outputting the resulting power includes an inner coil respectively wound around first to third core sections and an outer coil. The first to third core sections are each column shaped having an axis in the Y direction, and are arranged in the Z direction. Non-magnetic pressing members are provided between the adjacent coil sections and between the adjacent coil sections. The pressing members press against the adjacent coil sections and the adjacent coil sections respectively.
摘要翻译：提供了可以降低高频噪声的逆变器装置。逆变器装置包括用于转换从逆变器电路输出的AC电力的电压并输出所得功率的变压器。用于转换从逆变器电路输出的交流电力的电压并输出所得功率的第一至第三线圈部分包括分别绕第一至第三芯部分和外部线圈缠绕的内部线圈。第一至第三芯部分各自具有在Y方向上具有轴的列成形，并且沿Z方向排列。非磁性按压部件设置在相邻的线圈部之间和相邻的线圈部之间。按压构件分别压靠相邻的线圈部分和相邻的线圈部分。

8. 发明授权

US08770183B2 Glass article 有权
标题翻译：玻璃制品
公开(公告)号：US08770183B2
公开(公告)日：2014-07-08
申请号：US12866333
申请日：2009-01-13
申请人： Akihiro Iritani , Takeshi Nagata
发明人： Akihiro Iritani , Takeshi Nagata
IPC分类号： F24C15/10
CPC分类号： C03C17/02 , C03C2218/113 , C03C2218/32
摘要： Provided is a glass article, including: a crystallized glass plate; and an antifouling film formed on the surface of the crystallized glass plate and containing a multiple oxide of silicon and zirconium or a mixture of a silicon oxide and a zirconium oxide, in which the antifouling film has a β-OH content of 1 to 300/mm.
摘要翻译：提供一种玻璃制品，包括：结晶玻璃板; 和形成在结晶化玻璃板的表面上并含有硅和锆的多重氧化物或氧化硅和氧化锆的混合物的防污膜，其中防污膜的-OH含量为1〜300 / mm。

9. 发明授权

US08514010B2 Reference current generation circuit and power device using the same 有权
标题翻译：参考电流产生电路和功率器件使用相同
公开(公告)号：US08514010B2
公开(公告)日：2013-08-20
申请号：US13446660
申请日：2012-04-13
申请人： Takeshi Nagata
发明人： Takeshi Nagata
IPC分类号： G05F1/10
CPC分类号： G05F1/56 , G05F3/242
摘要： There is provided a reference current generation circuit, including a reference voltage generation unit configured to generate a reference voltage by using a depression type transistor, and a voltage/current conversion unit configured to generate a reference current from the reference voltage.
摘要翻译：提供了一种参考电流产生电路，包括通过使用抑制型晶体管产生参考电压的参考电压产生单元和被配置为从参考电压产生参考电流的电压/电流转换单元。

10. 发明申请

US20120225386A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS 有权
标题翻译：化学稳定组合物和图案化方法
公开(公告)号：US20120225386A1
公开(公告)日：2012-09-06
申请号：US13406684
申请日：2012-02-28
申请人： Takeru Watanabe , Tomohiro Kobayashi , Masayoshi Sagehashi , Takeshi Nagata , Youichi Ohsawa , Ryosuke Taniguchi
发明人： Takeru Watanabe , Tomohiro Kobayashi , Masayoshi Sagehashi , Takeshi Nagata , Youichi Ohsawa , Ryosuke Taniguchi
IPC分类号： G03F7/20 , G03F7/027
CPC分类号： G03F7/2041 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/11
摘要： A chemically amplified resist composition is provided comprising (A) a specific tertiary amine compound, (B) a specific acid generator, (C) a base resin having an acidic functional group protected with an acid labile group, which is substantially insoluble in alkaline developer and turns soluble in alkaline developer upon deprotection of the acid labile group, and (D) an organic solvent. The resist composition has a high resolution, improved defect control in the immersion lithography, and good shelf stability.
摘要翻译：提供一种化学放大抗蚀剂组合物，其包含（A）特定的叔胺化合物，（B）特定的酸发生剂，（C）具有由酸不稳定基团保护的酸性官能团的基础树脂，其基本上不溶于碱性显影剂并且在酸不稳定基团脱保护时变为可溶于碱性显影剂，和（D）有机溶剂。抗蚀剂组合物具有高分辨率，改善浸渍光刻中的缺陷控制，以及良好的储存稳定性。

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