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    • 9. 发明申请
    • Novel monomer and a polymer obtained therefrom
    • 新型单体和由其获得的聚合物
    • US20020042531A1
    • 2002-04-11
    • US09977364
    • 2001-10-16
    • WAKO PURE CHEMICAL INDUSTRIES, LTD.
    • Motoshige Sumino
    • C07F007/04C07C057/26C07C059/46
    • C07C69/708C07C69/734C07D317/30C07D319/06C07D319/08C08F32/08C08G61/04G03F7/039
    • This invention relates to a monomer shown by the general formula null1null 1 (wherein Xnull is a cyclic hydrocarbon residue containing polymerizable double bond(s), which may have a substituent, Z is a spacer or a direct bond and R is a substituted alkyl or alkenyl group having one or two protected hydroxyl groups as substituent) and a polymer containing a segment derived from the above monomer. The said polymer is useful for a resist composition, etc. utilized in the production of semiconductor elements, etc. and the said monomer is useful as a starting material for the polymer, and a resist composition using the said polymer can remarkably advantageously be used as a resist material for ArF excimer laser beams which has been considered to be a valuable technology for exposure belonging to the coming generation.
    • 本发明涉及由通式[1]表示的单体(其中X'为含有可聚合双键的环状烃残基,可以具有取代基,Z为间隔基或直接键,R为取代基 具有一个或两个保护的羟基作为取代基的烷基或烯基)和含有源自上述单体的链段的聚合物。 所述聚合物可用于制备半导体元件等中使用的抗蚀剂组合物等,并且所述单体可用作聚合物的起始材料,并且使用所述聚合物的抗蚀剂组合物可显着有利地用作 用于ArF准分子激光束的抗蚀材料,被认为是属于下一代的有意义的曝光技术。