专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08816712B2 Inspection device 有权
标题翻译：检查装置
公开(公告)号：US08816712B2
公开(公告)日：2014-08-26
申请号：US13058158
申请日：2009-07-29
申请人： Mitsuhiro Nakamura , Hiroshi Toyama , Yasuhiko Nara , Katsuo Oki , Tomoharu Obuki , Masahiro Sasajima
发明人： Mitsuhiro Nakamura , Hiroshi Toyama , Yasuhiko Nara , Katsuo Oki , Tomoharu Obuki , Masahiro Sasajima
IPC分类号： G01R31/00 , H01J37/20 , G01R31/307 , H01J37/28 , G01R31/28
CPC分类号： G01R31/307 , G01R31/2853 , H01J37/20 , H01J37/28 , H01J2237/2008 , H01J2237/24564
摘要： An object of the invention is to provide an inspection device which has a function of preventing electric discharge so that an absorbed current is detected more efficiently.In the invention, absorbed current detectors are mounted in a vacuum specimen chamber and capacitance of a signal wire from each probe to corresponding one of the absorbed current detectors is reduced to the order of pF so that even an absorbed current signal with a high frequency of tens of kHz or higher can be detected. Moreover, signal selectors are operated by a signal selection controller so that signal lines of a semiconductor parameters analyzer are electrically connected to the probes brought into contact with a sample. Accordingly, electrical characteristics of the sample can be measured without limitation of signal paths connected to the probes to transmission of an absorbed current. In addition, a resistance for slow leakage of electric charge is provided in each probe stage or a sample stage.
摘要翻译：本发明的目的是提供一种检测装置，其具有防止放电的功能，从而更有效地检测吸收的电流。在本发明中，将吸收电流检测器安装在真空试样室中，并将来自每个探针的信号线的电容与吸收的电流检测器中的相应一个电容器的电容降低到pF的顺序，使得甚至具有高频率的吸收电流信号可以检测几十kHz或更高。此外，信号选择器由信号选择控制器操作，使得半导体参数分析仪的信号线电连接到与样品接触的探针。因此，可以测量样品的电特性，而不限制连接到探针的信号路径以传输吸收的电流。此外，在每个探针级或样品台中提供电荷缓慢泄漏的电阻。

2. 发明授权

US08067752B2 Semiconductor testing method and semiconductor tester 有权
标题翻译：半导体测试方法和半导体测试仪
公开(公告)号：US08067752B2
公开(公告)日：2011-11-29
申请号：US12764992
申请日：2010-04-22
申请人： Tohru Ando , Yasuhiko Nara , Tsutomu Saito , Shinichi Kato , Takeshi Sunaoshi
发明人： Tohru Ando , Yasuhiko Nara , Tsutomu Saito , Shinichi Kato , Takeshi Sunaoshi
IPC分类号： H01J49/00 , G06K9/00 , G06K9/62
CPC分类号： G01N23/225 , H01J2237/2817 , H01J2237/2826
摘要： A semiconductor testing method capable of quickly counting semiconductor cells in which a seemingly horizontal or vertical line is drawn with a mouse, and raster rotation is performed in alignment with the closer axis. After that, the stage is horizontally moved, pattern matching is performed on an image on a position where the image should be disposed, and an angle is adjusted. The stage is moved evenly along the X-axis and the Y-axis, achieving a movement to a destination like a straight line. In synchronization with the smooth movement of the stage, a cell is surrounded in a rectangular frame by a ruler, and the number of cells is displayed with a numeric value.
摘要翻译：一种半导体测试方法，其能够快速计算其中用鼠标绘制看似水平或垂直线的半导体单元，并且执行与较近轴线对准的光栅旋转。之后，水平移动台，对应该设置图像的位置上的图像执行图案匹配，并且调整角度。舞台沿着X轴和Y轴均匀移动，实现了像直线一样的目的地移动。与舞台的平滑移动同步，通过标尺将单元围成矩形框，并且以数值显示单元数。

3. 发明授权

US07855363B2 Inspection method and apparatus using an electron beam 失效
标题翻译：使用电子束的检查方法和装置
公开(公告)号：US07855363B2
公开(公告)日：2010-12-21
申请号：US12222606
申请日：2008-08-12
申请人： Hiroshi Miyai , Ryuichi Funatsu , Taku Ninomiya , Yasuhiko Nara
发明人： Hiroshi Miyai , Ryuichi Funatsu , Taku Ninomiya , Yasuhiko Nara
IPC分类号： G01N23/225
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/2817
摘要： An inspection method and apparatus irradiates a sample on which a pattern is formed with an electron beam, so that an inspection image and a reference image can be generated on the basis of a secondary electron or a reflected electron emitted by the sample. An abnormal pattern is determined based on a difference in halftone values of each pixel between the inspection image and the reference image. A plurality of feature quantities of the abnormal pattern are obtained from an image of the abnormal pattern, and, based on the distribution of the plurality of feature quantities of the abnormal pattern, a range for classifying the type of the abnormal pattern is designated. Thus, a desired defect can be extracted from many defects extracted by inspection.
摘要翻译：检查方法和装置用电子束照射其上形成有图案的样品，使得可以基于样品发射的二次电子或反射电子产生检查图像和参考图像。基于检查图像和参考图像之间的每个像素的半色调值的差异来确定异常图案。从异常图案的图像获得异常图案的多个特征量，并且基于异常图案的多个特征量的分布，指定用于对异常图案的类型进行分类的范围。因此，可以从通过检查提取的许多缺陷中提取期望的缺陷。

4. 发明申请

US20100200749A1 Semiconductor Testing Method and Semiconductor Tester 有权
标题翻译：半导体测试方法和半导体测试仪
公开(公告)号：US20100200749A1
公开(公告)日：2010-08-12
申请号：US12764992
申请日：2010-04-22
申请人： Tohru ANDO , Yasuhiko Nara , Tsutomu Saito , Shinichi Kato , Takeshi Sunaoshi
发明人： Tohru ANDO , Yasuhiko Nara , Tsutomu Saito , Shinichi Kato , Takeshi Sunaoshi
IPC分类号： H01J37/26 , G01N23/22 , G06K9/00
CPC分类号： G01N23/225 , H01J2237/2817 , H01J2237/2826
摘要： A semiconductor testing method capable of quickly counting semiconductor cells in which a seemingly horizontal or vertical line is drawn with a mouse, and raster rotation is performed in alignment with the closer axis. After that, the stage is horizontally moved, pattern matching is performed on an image on a position where the image should be disposed, and an angle is adjusted. The stage is moved evenly along the X-axis and the Y-axis, achieving a movement to a destination like a straight line. In synchronization with the smooth movement of the stage, a cell is surrounded in a rectangular frame by a ruler, and the number of cells is displayed with a numeric value.
摘要翻译：一种半导体测试方法，其能够快速计算其中用鼠标绘制看似水平或垂直线的半导体单元，并且执行与较近轴线对准的光栅旋转。之后，水平移动台，对应该设置图像的位置上的图像执行图案匹配，并且调整角度。舞台沿着X轴和Y轴均匀移动，实现了像直线一样的目的地移动。与舞台的平滑移动同步，通过标尺将单元围成矩形框，并且以数值显示单元数。

5. 发明授权

US07700916B2 Logical CAD navigation for device characteristics evaluation system 有权
标题翻译：设备特征评估系统的逻辑CAD导航
公开(公告)号：US07700916B2
公开(公告)日：2010-04-20
申请号：US11583983
申请日：2006-10-20
申请人： Tohru Ando , Tsutomu Saito , Yasuhiko Nara , Mikio Takagi , Koichi Takauchi
发明人： Tohru Ando , Tsutomu Saito , Yasuhiko Nara , Mikio Takagi , Koichi Takauchi
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： G06T7/001 , G06T2200/24 , G06T2207/30148 , H01J37/222 , H01J37/28 , H01J2237/2817 , Y10S715/964
摘要： A navigation system for easily determining defective positions is provided. In the case of CAD navigation to defective positions, logical information for indicating defective positions is created in a CAD format, instead of CAD data of physical information indicating circuit design. Specifically, by attaching marks such as rectangles, characters, or lines, to an electron microscope image with software, quick navigation is performed with required minimum information. By using created CAD data, re-navigation with the same equipment and CAD navigation to heterogeneous equipment are performed.
摘要翻译：提供了用于容易地确定缺陷位置的导航系统。在CAD导航到缺陷位置的情况下，代替用于指示电路设计的物理信息的CAD数据，以CAD格式创建用于指示缺陷位置的逻辑信息。具体地，通过用软件将诸如矩形，字符或线的标记附加到电子显微镜图像上，使用所需的最小信息进行快速导航。通过使用创建的CAD数据，执行使用相同设备和CAD导航到异构设备的重新导航。

6. 发明申请

US20100019148A1 INSPECTION APPARATUS FOR CIRCUIT PATTERN 审中-公开
标题翻译：电路图检查装置
公开(公告)号：US20100019148A1
公开(公告)日：2010-01-28
申请号：US12575961
申请日：2009-10-08
申请人： Yasuhiko NARA , Masaaki Nojiri , Kouichi Hayakawa , Hiroyuki Shinada , Yukio Hagita
发明人： Yasuhiko NARA , Masaaki Nojiri , Kouichi Hayakawa , Hiroyuki Shinada , Yukio Hagita
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , H01J2237/004 , H01J2237/2817
摘要： In a circuit pattern inspection apparatus, while an electron beam is irradiated onto a surface of a substrate having a plurality of chips where circuit patterns have been formed, a signal produced from the irradiated substrate is detected so as to form an image, and then, the formed image is compared with another image in order to detect a defect on the circuit patterns. Before the electron beam is irradiated onto either the chip or the plurality of chips so as to acquire the image for an inspection purpose, an electron beam is previously irradiated onto the region to be irradiated, so that charging conditions of the substrate to be inspected are arbitrarily controlled.
摘要翻译：在电路图案检查装置中，当电子束照射到已经形成电路图案的具有多个芯片的基板的表面上时，检测从照射的基板产生的信号以形成图像，将形成的图像与另一图像进行比较，以便检测电路图案上的缺陷。在将电子束照射到芯片或多个芯片上以获取用于检查目的的图像之前，将电子束预先照射到要照射的区域上，使得要检查的基板的充电条件为任意控制

7. 发明授权

US07034298B2 Inspection method and apparatus using an electron beam 失效
公开(公告)号：US07034298B2
公开(公告)日：2006-04-25
申请号：US10669253
申请日：2003-09-25
申请人： Hiroshi Miyai , Ryuichi Funatsu , Taku Ninomiya , Yasuhiko Nara
发明人： Hiroshi Miyai , Ryuichi Funatsu , Taku Ninomiya , Yasuhiko Nara
IPC分类号： G01N13/16 , G06K9/00
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/2817
摘要： An inspection method and apparatus irradiates a sample on which a pattern is formed with an electron beam, so that an inspection image and a reference image can be generated on the basis of a secondary electron or a reflected electron emitted by the sample. An abnormal pattern is determined based on a difference in halftone values of each pixel between the inspection image and the reference image. A plurality of feature quantities of the abnormal pattern are obtained from an image of the abnormal pattern, and, based on the distribution of the plurality of feature quantities of the abnormal pattern, a range for classifying the type of the abnormal pattern is designated. Thus, a desired defect can be extracted from many defects extracted by inspection.

8. 发明申请

US20050043903A1 Circuit-pattern inspection apparatus 失效
标题翻译：电路图形检查装置
公开(公告)号：US20050043903A1
公开(公告)日：2005-02-24
申请号：US10896895
申请日：2004-07-23
申请人： Yasuhiko Nara , Masaaki Nojiri , Kouichi Hayakawa , Takashi Hiroi
发明人： Yasuhiko Nara , Masaaki Nojiri , Kouichi Hayakawa , Takashi Hiroi
IPC分类号： G01N21/956 , G03F1/84 , G03F1/86 , G06F19/00 , G06T1/00 , G06T7/00 , H01L21/027 , H01L21/66
CPC分类号： G06T7/001 , G01N2021/95615 , G06T2207/30148
摘要： The disclosed subject matter is related to a circuit pattern inspection apparatus for detecting a gradual changing of defect expanding over a large area of the semiconductor wafer. In order to detect a gradual changing of a defect related condition expanding over a large area of the semiconductor wafer, comparison is made between dies on a wafer that are separated from each other by a distance of at least one die width. For example, when a value according to a difference between such dies exceeds a pre-determined value, an existence of the gradual changing can be confirmed.
摘要翻译：所公开的主题涉及用于检测半导体晶片的大面积上的缺陷扩展的逐渐变化的电路图案检查装置。为了检测在半导体晶片的大面积上扩展的缺陷相关状态的逐渐变化，在晶片上相互间隔至少一个管芯宽度的距离的晶片之间进行比较。例如，当根据这种模具之间的差异的值超过预定值时，可以确认逐渐变化的存在。

9. 发明授权

US06759655B2 Inspection method, apparatus and system for circuit pattern 失效
标题翻译：检查方法，电路图案的装置和系统
公开(公告)号：US06759655B2
公开(公告)日：2004-07-06
申请号：US09832220
申请日：2001-04-11
申请人： Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi , Kohichi Hayakawa
发明人： Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi , Kohichi Hayakawa
IPC分类号： G01N23225
CPC分类号： G03F7/70616 , G03F1/84 , G03F7/7065 , G06T7/001 , G06T2207/30141 , H01J37/226 , H01J2237/082 , H01J2237/2817 , H01L22/12
摘要： Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents. When a desired item name is clicked, the picture plane is switched and the contents corresponding to the clicked item name are displayed.
摘要翻译：设置用于电路图案的检查方法，装置和系统，其中当通过使用通过照射白光形成的图像，激光束或带电粒子束来检查精细电路图案的情况下需要各种条件时，其运行效率可以提高。显示检查对象基板的检查对象区域，并且指定区域的指定地图画面和光学显微镜或电子束显微镜的图像并行显示，从而能够将缺陷分布和缺陷图像同时看到。检查条件的项目名称和显示，输入或指示检查条件内容的画面被整合，这些内容与图像平面重叠，层叠显示，并且所有项目名称均以选项卡格式在内容的图片平面的上部。当点击所需的项目名称时，切换画面并显示与点击的项目名称对应的内容。

10. 发明授权

US06493082B2 Inspection method, apparatus and system for circuit pattern 失效
公开(公告)号：US06493082B2
公开(公告)日：2002-12-10
申请号：US10116134
申请日：2002-04-05
申请人： Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi , Kohichi Hayakawa , Maki Ito
发明人： Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi , Kohichi Hayakawa , Maki Ito
IPC分类号： G01B1100
CPC分类号： G03F7/70616 , G03F1/84 , G03F7/7065 , G06T7/001 , G06T2207/30141 , H01J37/226 , H01J2237/082 , H01J2237/2817 , H01L22/12
摘要： Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents. When a desired item name is clicked, the picture plane is switched and the contents corresponding to the clicked item name are displayed.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式