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1. 发明授权

US07116396B2 Exposure device, exposure method and device manufacturing method 失效
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US07116396B2
公开(公告)日：2006-10-03
申请号：US10944783
申请日：2004-09-21
申请人： Toshihiko Tsuji , Takaaki Kimura , Yoshitomo Nagahashi
发明人： Toshihiko Tsuji , Takaaki Kimura , Yoshitomo Nagahashi
IPC分类号： G03B27/53
CPC分类号： G03F7/70858 , G03F7/70875 , G03F7/70891
摘要： An exposure device, where circulating systems and for controlling a temperature varied by the driving of a linear motor are connected to a reticle stage and wafer stage, a controller sets the temperature of refrigerant circulating through the circulating system by driving heater, circulating system is connected to a projection optical system and a controller sets the temperature of refrigerant circulating through a circulating system by driving heater by a feedforward control to control the temperature of the refrigerant circulating through the circulating system.
摘要翻译：一种曝光装置，其中循环系统和用于通过线性电动机的驱动控制温度变化的曝光装置连接到标线片台和晶片台，控制器通过驱动加热器设定通过循环系统循环的制冷剂的温度，循环系统被连接投影光学系统和控制器通过前馈控制器通过驱动加热器来设定通过循环系统循环的制冷剂的温度，以控制通过循环系统循环的制冷剂的温度。

2. 发明授权

US06784972B2 Exposure apparatus, device manufacturing method and environmental control method of exposure apparatus 失效
标题翻译：曝光装置，装置制造方法和曝光装置的环境控制方法
公开(公告)号：US06784972B2
公开(公告)日：2004-08-31
申请号：US09994053
申请日：2001-11-27
申请人： Yoshitomo Nagahashi , Saburo Kamiya , Koichi Katsura
发明人： Yoshitomo Nagahashi , Saburo Kamiya , Koichi Katsura
IPC分类号： G03B2752
CPC分类号： G03F7/70858 , G03F7/70875 , G03F7/70883 , G03F7/70891
摘要： An air conditioner arranged in a machine chamber supplies gas for air conditioning into an exposure chamber via a supply path, and performs air conditioning of the exposure chamber. Then, the gas for air conditioning that has performed air conditioning returns to the machine chamber via an exhaust path. A chemical filter is provided in part of the exhaust path returning to the machine chamber from the exposure chamber. This filter securely removes contaminants that are introduced by outgassing and the like in an exposure apparatus main body and that are contained in the gas for air conditioning returning to the machine chamber from the exposure chamber. Accordingly, the inside of the exposure chamber can be kept chemically clean. Therefore, highly accurate exposure quantity control and thus highly accurate exposure can be performed for a long period of time, and high throughput can be maintained for a long period of time.
摘要翻译：布置在机器室中的空调机通过供给路径将用于空调的气体供给到曝光室，并进行曝光室的空调。然后，进行空调的空调用气体经由排气路返回到机械室。在从曝光室返回到机器室的排气路径的一部分中设置有化学过滤器。该过滤器可靠地清除在曝光装置主体中通过除气等引入的污染物，并且被包含在从曝光室返回机器室的用于空调的气体中。因此，可以使曝光室的内部保持化学清洁。因此，可以长时间地进行高精度的曝光量控制，从而高度准确的曝光，并且可以长时间保持高通量。

3. 发明授权

US06753942B2 Environmental control chamber 失效
标题翻译：环境控制室
公开(公告)号：US06753942B2
公开(公告)日：2004-06-22
申请号：US10289296
申请日：2002-11-07
申请人： Yoshitomo Nagahashi
发明人： Yoshitomo Nagahashi
IPC分类号： G03B2752
CPC分类号： G03F7/70858 , G03F7/70866 , G03F7/70875 , G03F7/70883
摘要： This invention is an exposure apparatus with an environmental control chamber for forming a closed space. An air conditioning device for circulating air in the closed space along a predetermined course of flow path. A main body of an exposure device which is disposed in a closed space formed by the environmental control chamber at a predetermined position along the predetermined course of flow path from the air conditioning device and exposes a substrate with a predetermined pattern. A heat-discharging box disposed in the environmental control chamber at least on the downstream side of the flow path from the main body of the exposure device and accommodating a first heat source which is detachable from the main body of the device.
摘要翻译：本发明是具有用于形成封闭空间的环境控制室的曝光装置。一种空气调节装置，用于沿着预定的流动路径使封闭空间中的空气循环。一种曝光装置的主体，其设置在由环境控制室形成的封闭空间中，该预定位置沿着来自空调装置的预定流路的预定位置，并以预定图案露出基板。一种排放箱，其至少在距离曝光装置的主体的流路的下游侧设置在环境控制室中，并容纳可从该装置主体拆卸的第一热源。

4. 发明授权

US08797502B2 Exposure apparatus, exposure method, and method for producing device with electricity removal device by adding additive to liquid 有权
标题翻译：曝光装置，曝光方法以及通过向液体添加添加剂来制造具有除电装置的装置的方法
公开(公告)号：US08797502B2
公开(公告)日：2014-08-05
申请号：US12929503
申请日：2011-01-28
申请人： Yoshitomo Nagahashi
发明人： Yoshitomo Nagahashi
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A projection exposure apparatus transfers a pattern formed on a mask onto a substrate through a liquid. The projection exposure apparatus includes an optical member which projects an image of the pattern onto the substrate and an electricity removal device which removes electricity from the liquid to be supplied to a space between the optical member and a surface of the substrate by adding an additive to the liquid to suppress the liquid from being charged.
摘要翻译：投影曝光装置通过液体将形成在掩模上的图案转印到基板上。投影曝光装置包括将图案的图像投影到基板上的光学部件和通过向基板的表面之间的空间中提供给液体的电力除去电力的除电装置，液体以抑制液体的充电。

5. 发明申请

US20110235006A1 Exposure apparatus, exposure method, method for manufacturing device 有权
标题翻译：曝光装置，曝光方法，制造装置的方法
公开(公告)号：US20110235006A1
公开(公告)日：2011-09-29
申请号：US13067463
申请日：2011-06-02
申请人： Yoshitomo Nagahashi
发明人： Yoshitomo Nagahashi
IPC分类号： G03B27/52
CPC分类号： G03F7/70866 , G03F7/70341
摘要： An exposure method and apparatus exposes a substrate via a projection optical system and a liquid. The liquid is circulated in a circulation path. At least a part of the liquid in the circulation path is supplied through a discharge path to a space below the projection optical system, the discharge path being connected to the circulation path. The substrate is exposed via the projection optical system and the liquid.
摘要翻译：曝光方法和装置通过投影光学系统和液体曝光基板。液体在循环路径中循环。循环路径中的液体的至少一部分通过排出路径供给到投影光学系统下方的空间，排出路径与循环路径连接。基板通过投影光学系统和液体曝光。

6. 发明授权

US07973906B2 Exposure apparatus, exposure method, method for manufacturing device 有权
标题翻译：曝光装置，曝光方法，制造装置的方法
公开(公告)号：US07973906B2
公开(公告)日：2011-07-05
申请号：US11902437
申请日：2007-09-21
申请人： Yoshitomo Nagahashi
发明人： Yoshitomo Nagahashi
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70866 , G03F7/70341
摘要： An exposure apparatus has a projection optical system configured to project a pattern of a reticle onto a substrate, and exposes the substrate to light via the reticle and the projection optical system with a space between the projection optical system and the substrate filled with liquid. The apparatus includes a supply nozzle configured to supply liquid to the space, a supply path configured to supply the liquid to the supply nozzle, a bypass which branches from the supply path, and a supply control valve configured to change a flow rate of the liquid supplied from the supply path to the supply nozzle and a flow rate of the liquid supplied from the supply path to the bypass.
摘要翻译：曝光装置具有投影光学系统，其配置为将掩模版图案投影到基板上，并且通过投影光学系统和填充有液体的基板之间的空间经由掩模版和投影光学系统将基板曝光。该装置包括：供给喷嘴，其构造成向该空间供给液体;供给路径，被配置为将液体供给到供给喷嘴;旁路，其从供给路径分支;以及供给控制阀，其配置为改变液体的流量从供给路径供给到供给喷嘴以及从供给路径向旁路供给的液体的流量。

7. 发明授权

US07643129B2 Exposure apparatus, exposure method, method for manufacturing device 有权
标题翻译：曝光装置，曝光方法，制造装置的方法
公开(公告)号：US07643129B2
公开(公告)日：2010-01-05
申请号：US11407126
申请日：2006-04-20
申请人： Yoshitomo Nagahashi
发明人： Yoshitomo Nagahashi
IPC分类号： G03B27/32 , G03B27/58
CPC分类号： G03F7/70866 , G03F7/70341
摘要： An exposure apparatus that: projects pattern images onto a substrate via liquid and a projection optical system, the liquid forming a liquid immersion region between the projection optical system and the substrate; and exposes the substrate. The apparatus has: a liquid-supplying-section that supplies the liquid onto the substrate; a first pipe section that introduces the liquid to the liquid-supplying-section; and a second pipe section, connected to the first pipe section, that collects the liquid not being supplied to the liquid-supplying-section from the first pipe section. By doing this, it is possible to provide a liquid-immersion exposure apparatus having a liquid-supplying-mechanism, exposure method, and a method for manufacturing devices so as to: restrict the temperature of the liquid, supplied between the projection optical system and the substrate, from varying; and prevent contaminants from invading into the liquid.
摘要翻译：曝光装置，其通过液体和投影光学系统将图案图像投影到基板上，所述液体在所述投影光学系统和所述基板之间形成液浸区域; 并曝光底物。该装置具有：将液体供给到基板上的液体供给部; 将液体引导到供液部的第一管部; 以及与第一管部连接的第二管部，其从第一管部收集未供给到供液部的液体。通过这样做，可以提供具有供液机构，曝光方法和制造装置的方法的液浸曝光装置，以便：限制供应到投影光学系统和底物，来自变化; 并防止污染物侵入液体。

8. 发明申请

US20080018869A1 Exposure apparatus, exposure method, method for manufacturing device 有权
标题翻译：曝光装置，曝光方法，制造装置的方法
公开(公告)号：US20080018869A1
公开(公告)日：2008-01-24
申请号：US11902437
申请日：2007-09-21
申请人： Yoshitomo Nagahashi
发明人： Yoshitomo Nagahashi
IPC分类号： G03B27/42
CPC分类号： G03F7/70866 , G03F7/70341
摘要： An exposure apparatus has a projection optical system configured to project a pattern of a reticle onto a substrate, and exposes the substrate to light via the reticle and the projection optical system with a space between the projection optical system and the substrate filled with liquid. The apparatus includes a supply nozzle configured to supply liquid to the space, a supply path configured to supply the liquid to the supply nozzle, a bypass which branches from the supply path, and a supply control valve configured to change a flow rate of the liquid supplied from the supply path to the supply nozzle and a flow rate of the liquid supplied from the supply path to the bypass.
摘要翻译：曝光装置具有投影光学系统，其配置为将掩模版图案投影到基板上，并且通过投影光学系统和填充有液体的基板之间的空间经由掩模版和投影光学系统将基板曝光。该装置包括：供给喷嘴，其构造成向该空间供给液体;供给路径，被配置为将液体供给到供给喷嘴;旁路，其从供给路径分支;以及供给控制阀，其配置为改变液体的流量从供给路径供给到供给喷嘴以及从供给路径向旁路供给的液体的流量。

9. 发明申请

US20060007415A1 Exposure system and device production process 审中-公开
标题翻译：曝光系统和设备生产过程
公开(公告)号：US20060007415A1
公开(公告)日：2006-01-12
申请号：US11204110
申请日：2005-08-16
申请人： Junichi Kosugi , Tetsuo Taniguchi , Naoyuki Kobayashi , Yoshitomo Nagahashi
发明人： Junichi Kosugi , Tetsuo Taniguchi , Naoyuki Kobayashi , Yoshitomo Nagahashi
IPC分类号： G03B27/52
CPC分类号： G03F7/70991 , G03F7/70716 , G03F7/70875
摘要： The exposure system of the present invention inhibits baseline shift by carrying out temperature control as required by each composite equipment. This exposure system has a first control system that that sets the temperature of a first liquid, and controls the temperature of an object by circulating the first liquid for which the temperature has been set through at least one object of a projection optics and a substrate stage, and a second control system that sets the temperature of a second liquid independent from the first control system, and controls the temperature of a reticle stage by circulating the second liquid for which the temperature has been set through the reticle stage. The first and second control systems have mutually different setting capacities with respect to the size of the temperature range when setting the temperatures of the liquids.
摘要翻译：本发明的曝光系统通过根据每个复合设备的要求进行温度控制来抑制基线偏移。该曝光系统具有第一控制系统，其设定第一液体的温度，并且通过将已经设定了温度的第一液体循环通过投影光学元件和基板台的至少一个物体来控制物体的温度以及与第一控制系统独立地设定第二液体的温度的第二控制系统，并且通过使已经设定了温度的第二液体循环通过标线片台来控制标线片台的温度。当设定液体的温度时，第一和第二控制系统相对于温度范围的尺寸具有相互不同的设定能力。

10. 发明授权

US07948608B2 Exposure apparatus, exposure method, method for manufacturing device 有权
标题翻译：曝光装置，曝光方法，制造装置的方法
公开(公告)号：US07948608B2
公开(公告)日：2011-05-24
申请号：US12379183
申请日：2009-02-13
申请人： Yoshitomo Nagahashi
发明人： Yoshitomo Nagahashi
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70866 , G03F7/70341
摘要： An exposure apparatus that: projects pattern images onto a substrate via liquid and a projection optical system, the liquid forming a liquid immersion region between the projection optical system and the substrate; and exposes the substrate. The apparatus has: a liquid-supplying-section that supplies the liquid onto the substrate; a first pipe section that introduces the liquid to the liquid-supplying-section; and a second pipe section, connected to the first pipe section, that collects the liquid not being supplied to the liquid-supplying-section from the first pipe section. By doing this, it is possible to provide a liquid-immersion exposure apparatus having a liquid-supplying-mechanism, exposure method, and a method for manufacturing devices so as to: restrict the temperature of the liquid, supplied between the projection optical system and the substrate, from varying; and prevent contaminants from invading into the liquid.
摘要翻译：曝光装置，其通过液体和投影光学系统将图案图像投影到基板上，所述液体在所述投影光学系统和所述基板之间形成液浸区域; 并曝光底物。该装置具有：将液体供给到基板上的液体供给部; 将液体引导到供液部的第一管部; 以及与第一管部连接的第二管部，其从第一管部收集未供给到供液部的液体。通过这样做，可以提供具有供液机构，曝光方法和制造装置的方法的液浸曝光装置，以便：限制供应到投影光学系统和底物，来自变化; 并防止污染物侵入液体。

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