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1. 发明申请

US20120170013A1 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE 有权
标题翻译：照明光学系统，曝光装置和制造装置的方法
公开(公告)号：US20120170013A1
公开(公告)日：2012-07-05
申请号：US13336022
申请日：2011-12-23
申请人： Toshihiko Tsuji
发明人： Toshihiko Tsuji
IPC分类号： G03B27/54
CPC分类号： G03F7/70075 , G03F7/70091 , G03F7/701 , G03F7/70108 , G03F7/702
摘要： An illumination optical system which illuminates an illumination surface with light from a light source, includes a divider which divides light from the light source to generate a plurality of light beams, a first reflective integrator which uniformizes light intensity distributions of the plurality of light beams generated by the divider, a condenser which condenses the light beam from the first reflective integrator, a second reflective integrator which receives the light beam from the condenser and illuminates the illumination surface, and an aperture stop arranged between the second reflective integrator and the illumination surface, wherein the divider generates the plurality of light beams so that light beams each having a cross-sectional shape different from a cross-sectional shape of the light provided from the light source to the divider enter a plane on which the aperture stop is arranged.
摘要翻译：一种利用来自光源的光来照射照明面的照明光学系统，包括：分割器，其分割来自光源的光以产生多个光束;第一反射积分器，其使产生的多个光束的光强度分布均匀; 通过分压器，聚集来自第一反射积分器的光束的聚光器，接收来自聚光器的光束并照亮照明表面的第二反射积分器，以及布置在第二反射积分器和照明表面之间的孔径光阑，其中，所述分割器产生所述多个光束，使得各自具有不同于从所述光源提供给所述分光器的光的横截面形状的横截面形状的光束进入设置有所述孔径光阑的平面。

2. 发明授权

US08035668B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US08035668B2
公开(公告)日：2011-10-11
申请号：US11336754
申请日：2006-01-19
申请人： Mitsuro Sugita , Kazuaki Ohmi , Takao Yonehara , Toshihiko Tsuji , Takaaki Terashi , Tohru Kohda , Shinji Tsutsui
发明人： Mitsuro Sugita , Kazuaki Ohmi , Takao Yonehara , Toshihiko Tsuji , Takaaki Terashi , Tohru Kohda , Shinji Tsutsui
IPC分类号： G03G13/04
CPC分类号： G03F7/70275
摘要： An exposure apparatus which forms a pattern on an object. The apparatus includes an exposure head structure in which a plurality of elemental exposure units are arrayed, each elemental exposure unit including (i) at least one light source for emitting exposure light and (ii) an optical element which forms an image of the at least one light source on the object, for exposing the object. Positions of the images of the at least one light source in a direction perpendicular to a surface of the object include plural positions different from each other. A sensor detects a position of the surface of the object and produces a detection result. A controller receives the detection result and controls the exposure head structure such that a pattern is formed on the object by the exposure is selected to expose the object based on the detection result by the sensor.
摘要翻译：在物体上形成图案的曝光装置。该装置包括其中排列多个元素曝光单元的曝光头结构，每个元素曝光单元包括：（i）至少一个用于发射曝光光的光源;以及（ii）至少形成至少一个图像的光学元件对象上的一个光源，用于暴露对象。至少一个光源的图像在垂直于物体表面的方向上的位置包括彼此不同的多个位置。传感器检测物体表面的位置并产生检测结果。控制器接收检测结果并控制曝光头结构，使得通过曝光在物体上形成图案被选择以基于传感器的检测结果来曝光物体。

3. 发明授权

US07538856B2 Illumination optical system and exposure apparatus including the same 失效
标题翻译：照明光学系统和包括其的曝光装置
公开(公告)号：US07538856B2
公开(公告)日：2009-05-26
申请号：US12179506
申请日：2008-07-24
申请人： Kazuhiko Kajiyama , Toshihiko Tsuji
发明人： Kazuhiko Kajiyama , Toshihiko Tsuji
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70075 , G03B27/42
摘要： An illumination optical system includes a first optical unit that collects light emitted from a light source; a reflective integrator that has a plurality of cylindrical reflection surfaces, whose generating lines are oriented in a uniform direction, and forms a plurality of linear light sources by using the light emitted from the first optical unit; a pair of flat mirrors that are disposed parallel to the generating lines so as to face each other with the plurality of linear light sources residing therebetween; an aperture stop that is disposed perpendicular to the generating lines and has an opening for allowing the light emitted from the plurality of linear light sources to pass therethrough; and a second optical unit that integrates beams of the light emitted from the plurality of linear light sources that have passed through the opening one on top of another in an illumination target plane.
摘要翻译：照明光学系统包括：第一光学单元，其收集从光源发射的光; 反射积分器，其具有多个圆筒反射面，其发生线沿均匀方向取向，并且通过使用从第一光学单元发射的光形成多个线性光源; 一对平面反射镜，其平行于所述发生线布置成彼此面对，所述多个线性光源位于它们之间; 一个孔径光阑，其垂直于所述生成线设置并具有用于允许从所述多个线性光源发出的光通过的开口; 以及第二光学单元，其将在已经穿过所述开口的多个线性光源发射的光的光束在照明目标平面中积分。

4. 发明授权

US07239375B2 Illumination apparatus, exposure apparatus and device manufacturing method 失效
标题翻译：照明装置，曝光装置及装置的制造方法
公开(公告)号：US07239375B2
公开(公告)日：2007-07-03
申请号：US11457957
申请日：2006-07-17
申请人： Toshihiko Tsuji
发明人： Toshihiko Tsuji
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70125 , G03F7/701 , G03F7/70566
摘要： An illumination apparatus for illuminating a mask having a pattern, using light from a light source, includes a generating section for generating an effective light source distribution for a modified illumination to the mask, a polarization setting section for setting a predetermined polarization state in plural areas in the effective light source distribution, and an adjusting section for commonly controlling a polarization state of each area.
摘要翻译：一种用于照亮具有来自光源的光的具有图案的掩模的照明装置，包括用于产生用于对掩模进行改进照明的有效光源分布的产生部分，用于在多个区域中设置预定极化状态的偏振设置部分在有效光源分布中，以及用于共同控制各区域的偏振状态的调整部。

5. 发明授权

US07130025B2 Illumination apparatus, exposure apparatus and device manufacturing method 有权
标题翻译：照明装置，曝光装置及装置的制造方法
公开(公告)号：US07130025B2
公开(公告)日：2006-10-31
申请号：US11082508
申请日：2005-03-17
申请人： Toshihiko Tsuji
发明人： Toshihiko Tsuji
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70125 , G03F7/701 , G03F7/70566
摘要： An illumination apparatus for illuminating a mask having a pattern, using light from a light source, includes a generating section for generating an effective light source distribution for a modified illumination to the mask, a polarization setting section for setting a predetermined polarization state in plural areas in the effective light source distribution, and an adjusting section for commonly controlling a polarization state of each area.
摘要翻译：一种用于照亮具有来自光源的光的具有图案的掩模的照明装置，包括用于产生用于对掩模进行改进照明的有效光源分布的产生部分，用于在多个区域中设置预定极化状态的偏振设置部分在有效光源分布中，以及用于共同控制各区域的偏振状态的调整部。

6. 发明申请

US20060158504A1 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20060158504A1
公开(公告)日：2006-07-20
申请号：US11336754
申请日：2006-01-19
申请人： Mitsuro Sugita , Kazuaki Ohmi , Takao Yonehara , Toshihiko Tsuji , Takaaki Terashi , Tohru Kohda , Shinji Tsutsui
发明人： Mitsuro Sugita , Kazuaki Ohmi , Takao Yonehara , Toshihiko Tsuji , Takaaki Terashi , Tohru Kohda , Shinji Tsutsui
IPC分类号： B41J2/385
CPC分类号： G03F7/70275
摘要： An exposure apparatus which forms a pattern on an object includes an exposure head structure in which a plurality of elemental exposure units each including at least one light source and an optical element which forms an image of the light source on the object are arrayed, a sensor which detects the surface position of the object, and a controller which controls exposure by the exposure head structure based on the detection result by the sensor. The controller forms a pattern on the object while selectively operating one of the plurality of elemental exposure units, which satisfies a predetermined condition.
摘要翻译：在物体上形成图案的曝光装置包括曝光头结构，其中排列有多个元件曝光单元，每个元素曝光单元包括至少一个光源和形成物体上光源的图像的光学元件，传感器其检测物体的表面位置，以及控制器，其基于传感器的检测结果来控制曝光头结构的曝光。控制器在选择性地操作满足预定条件的多个元素曝光单元中的一个的同时，在物体上形成图案。

7. 发明授权

US07064806B2 Illumination optical system and exposure apparatus 失效
标题翻译：照明光学系统和曝光装置
公开(公告)号：US07064806B2
公开(公告)日：2006-06-20
申请号：US10768896
申请日：2004-01-30
申请人： Toshihiko Tsuji
发明人： Toshihiko Tsuji
IPC分类号： G03B27/54 , G03B27/72
CPC分类号： G03F7/702 , G21K2201/06
摘要： An exposure apparatus includes an illumination optical system for illuminating a reflection mask that forms a pattern, by using light from a light source, wherein the illumination optical system includes a field stop that defines an illuminated area on the reflection mask, and has an opening, and an imaging system for introducing the light from the opening in the field stop into the reflection mask, the imaging system being a coaxial optical system, wherein a principal ray of the imaging system at a side of the reflection mask forming an inclination angle to a common axis of the coaxial optical system, the inclination angle being approximately equal to an angle between a principal ray of the projection optical system at the side of the reflection mask and a normal to a surface of the reflection mask.
摘要翻译：曝光装置包括：照明光学系统，用于通过使用来自光源的光照射形成图案的反射掩模，其中所述照明光学系统包括限定所述反射掩模上的照明区域的场停止件，并且具有开口，以及成像系统，用于将来自所述场停止件中的开口的光引入所述反射掩模中，所述成像系统是同轴光学系统，其中，所述成像系统在所述反射掩模侧的主光线形成与所述反射掩模的倾斜角度同轴光学系统的公共轴，倾斜角度近似等于投影光学系统在反射掩模侧面的主光线与反射掩模表面法线之间的角度。

8. 发明申请

US20050140946A1 Exposure system and method for manufacturing device 失效
标题翻译：曝光系统及其制造方法
公开(公告)号：US20050140946A1
公开(公告)日：2005-06-30
申请号：US10969971
申请日：2004-10-22
申请人： Toshihiko Tsuji , Yoshitomo Nagahashi , Manabu Fujii , Hironori Murakami
发明人： Toshihiko Tsuji , Yoshitomo Nagahashi , Manabu Fujii , Hironori Murakami
IPC分类号： G03F7/20 , G03B27/52
CPC分类号： G03F7/70991 , G03F7/70858 , G03F7/70875 , G03F7/70891 , G03F7/709
摘要： An exposure system is provided which can maintain a predetermined performance of the exposure apparatus stably by maintaining a cooling capacity by preventing a negative pressure from being generated in a circulation path of the liquid and preventing the back pressure from increasing even if at least a part of a temperature adjusting device is disposed under a disposition surface of the exposure apparatus due to the disposition area. A sealed tank which stores the cooling agent which is circulated in the circuiting systems and a pump, etc., which circulates the cooling agent are disposed under the disposition surface FL of the exposure system. The reticle stage and the wafer stage which are objects of which the temperature is supposed to be controlled are disposed above the disposition surface FL. A tank which open to air is provided so as to prevent the negative pressure from being generated in the reticle stage, etc. such that the tank and the tank are connected by a connecting piping arrangement. Also, the piping arrangement which eliminates the bubbles which are contained in the cooling agent which is circulated in the circulating systems are connected to the circulating systems.
摘要翻译：提供一种曝光系统，其可以通过防止在液体的循环路径中产生负压并通过保持冷却能力来稳定地保持曝光装置的预定性能，并且即使在至少一部分温度调节装置由于配置区域而设置在曝光装置的配置表面下。储存在循环系统中循环的冷却剂的密封罐和循环冷却剂的泵等设置在曝光系统的配置面FL的下方。作为温度被控制的对象的标线片台和晶片台设置在配置面FL上方。设置有开放空气的罐，以防止在标线片等中产生负压，使得罐和罐通过连接配管装置连接。此外，消除在循环系统中循环的冷却剂中包含的气泡的管道装置连接到循环系统。

9. 发明申请

US20050110972A1 Illumination system and exposure apparatus 有权
标题翻译：照明系统和曝光装置
公开(公告)号：US20050110972A1
公开(公告)日：2005-05-26
申请号：US10956614
申请日：2004-10-01
申请人： Toshihiko Tsuji , Akira Yabuki
发明人： Toshihiko Tsuji , Akira Yabuki
IPC分类号： G03F7/20 , G03B27/54 , H01L21/027
CPC分类号： G03F7/7085 , G03B27/54 , G03F7/70066 , G03F7/70091
摘要： Disclosed is an illumination optical system and an exposure apparatus having the same, and specifically, as an aspect of the invention, an illumination optical system for illuminating a surface to be illuminated, that includes an aperture stop for defining an effective light source distribution upon a predetermined plane which is substantially in a Fourier transform relation with the surface to be illuminated, and a detector disposed adjacent an opening of the aperture stop.
摘要翻译：本发明公开了一种照明光学系统和曝光装置，具体而言，作为本发明的一个方面，照明光学系统用于照亮被照射的表面，该照明光学系统包括用于限定有效光源分布的孔径光阑与被照射的表面基本上是傅里叶变换关系的预定平面以及邻近孔径光阑的开口设置的检测器。

10. 发明申请

US20050057737A1 Illumination optical system and exposure apparatus 失效
标题翻译：照明光学系统和曝光装置
公开(公告)号：US20050057737A1
公开(公告)日：2005-03-17
申请号：US10768896
申请日：2004-01-30
申请人： Toshihiko Tsuji
发明人： Toshihiko Tsuji
IPC分类号： G03B27/54 , G03F7/20 , G21K1/00 , H01L21/027
CPC分类号： G03F7/702 , G21K2201/06
摘要： An exposure apparatus includes an illumination optical system for illuminating a reflection mask that forms a pattern, by using light from a light source, wherein the illumination optical system includes a field stop that defines an illuminated area on the reflection mask, and has an opening, and an imaging system for introducing the light from the opening in the field stop into the reflection mask, the imaging system being a coaxial optical system, wherein a principal ray of the imaging system at a side of the reflection mask forming an inclination angle to a common axis of the coaxial optical system, the inclination angle being approximately equal to an angle between a principal ray of the projection optical system at the side of the reflection mask and a normal to a surface of the reflection mask.
摘要翻译：曝光装置包括：照明光学系统，用于通过使用来自光源的光照射形成图案的反射掩模，其中所述照明光学系统包括限定所述反射掩模上的照明区域的场停止件，并且具有开口，以及成像系统，用于将来自所述场停止件中的开口的光引入所述反射掩模中，所述成像系统是同轴光学系统，其中，所述成像系统在所述反射掩模侧的主光线形成与所述反射掩模的倾斜角度同轴光学系统的公共轴，倾斜角度近似等于投影光学系统在反射掩模侧面的主光线与反射掩模表面法线之间的角度。

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