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1. 发明授权

US11150544B2 Automatic microform carrier systems and methods 有权
公开(公告)号：US11150544B2
公开(公告)日：2021-10-19
申请号：US16393170
申请日：2019-04-24
申请人： e-ImageData Corp.
发明人： Todd Kahle , Grant Taylor
IPC分类号： G03B21/11 , G03B27/53 , H04N1/00 , H04N1/028 , H04N1/195 , G02B7/09 , G03B27/34 , H04N1/024 , G02B7/182 , G03B17/02 , G02B7/18 , G03B11/02
摘要： A digital microform imaging apparatus includes a bracket movably coupled to a chassis. A microform media support is coupled to the bracket and includes a frame and a window supported by the frame. An illumination source is provided to direct light through the window of the microform media support along an optical axis. An optical sensor is positioned along the optical axis. A motor is operatively engaged with the microform media support to move the bracket and frame relative to the chassis along an axis perpendicular to the optical axis.

2. 发明申请

US20190324354A1 AUTOMATIC MICROFORM CARRIER SYSTEMS AND METHODS 审中-公开
公开(公告)号：US20190324354A1
公开(公告)日：2019-10-24
申请号：US16393170
申请日：2019-04-24
申请人： e-lmageData Corp.
发明人： Todd Kahle , Grant Taylor
IPC分类号： G03B21/11 , G02B7/09 , G02B7/182 , G03B27/34 , G03B27/53 , G03B17/02 , H04N1/00 , H04N1/024 , H04N1/028 , H04N1/195
摘要： A digital microform imaging apparatus includes a bracket movably coupled to a chassis. A microform media support is coupled to the bracket and includes a frame and a window supported by the frame. An illumination source is provided to direct light through the window of the microform media support along an optical axis. An optical sensor is positioned along the optical axis. A motor is operatively engaged with the microform media support to move the bracket and frame relative to the chassis along an axis perpendicular to the optical axis.

3. 发明授权

US09229312B2 Exposure apparatus, measurement method, stabilization method, and device fabrication method 有权
标题翻译：曝光装置，测量方法，稳定方法和装置制造方法
公开(公告)号：US09229312B2
公开(公告)日：2016-01-05
申请号：US13102739
申请日：2011-05-06
申请人： Nobuhiko Yabu
发明人： Nobuhiko Yabu
IPC分类号： G03B27/53 , G03B27/68 , G03B27/32 , G03B27/42 , G03F7/20
CPC分类号： G03B27/32 , G03B27/42 , G03F7/70425 , G03F7/70941
摘要： The present invention provides an exposure apparatus including a projection optical system configured to project a reticle pattern onto a wafer, a selector configured to select a dummy wafer to be placed near an image plane of the projection optical system, from a plurality of dummy wafers having the same shape as that of the wafer and different reflectance with each other, a transfer unit configured to place the dummy wafer selected by the selector near the image plane of the projection optical system, and a controller configured to perform control such that dummy exposure is performed by irradiating the dummy wafer, which is placed near the image plane of the projection optical system by the transfer unit, with light via the projection optical system.
摘要翻译：本发明提供了一种曝光装置，包括：投影光学系统，其配置为将光罩图案投影到晶片上;选择器，被配置为从多个伪晶片中选择待放置在投影光学系统的像面附近的虚设晶片，与晶片相同的形状和彼此的反射率不同的传送单元，被配置为将由选择器选择的伪晶片放置在投影光学系统的像面附近的传送单元，以及控制器，被配置为执行控制，使得虚拟曝光是通过经由投影光学系统的光照射通过转印单元放置在投影光学系统的像面附近的伪晶片。

4. 发明授权

US09195139B2 Apparatus and method of direct writing with photons beyond the diffraction limit using two-color resist 有权
$Apparatus and method of direct writing with photons beyond the diffraction limit using two-color resist$
公开(公告)号：US09195139B2
公开(公告)日：2015-11-24
申请号：US14244942
申请日：2014-04-04
申请人： David A. Markle , John S. Petersen
发明人： David A. Markle , John S. Petersen
IPC分类号： G03F7/20 , G03F7/213 , G03B27/53
CPC分类号： G03F7/26 , G03F7/2022 , G03F7/203 , G03F7/2051 , G03F7/7015 , G03F7/70383 , G03F7/70466
摘要： Methods of and apparatus for performing direct-write lithography in a two-color photoresist layer are disclosed. The method includes exposing the two-color photoresist layer with transducer and inhibition images that respectively define bright spots and dark spots. The transducer image generates excited-state photo-molecules while the inhibition image converts the exited-state photo-molecules to an unexcited state that is not susceptible to conversion to an irreversible exposed state. The dark spots and bright spots are aligned, with the dark spots being smaller than the bright spots so that a portion of the excited-state photo-molecules adjacent the periphery of the bright spots absorb the inhibition radiation and transition to the unexcited state while a portion of the excited photo-molecules at the center of bright spots are not exposed to the inhibition light and transition to an irreversible exposed state. This forms in the two-color photoresist layer a pattern of sub-resolution photoresist pixels.

5. 发明申请

US20120218533A1 METHOD OF CALCULATING MODEL PARAMETERS OF A SUBSTRATE, A LITHOGRAPHIC APPARATUS AND AN APPARATUS FOR CONTROLLING LITHOGRAPHIC PROCESSING BY A LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：计算基板的模型参数的方法，地平面设备和用于通过平面设备控制光刻处理的装置
公开(公告)号：US20120218533A1
公开(公告)日：2012-08-30
申请号：US13403538
申请日：2012-02-23
申请人： Irina LYULINA , Hubertus Johannes Gertrudus Simons , Manfred Gawein Tenner , Pieter Jacob Heres , Marc Van Kemenade , Daan Maurits Slotboom , Stefan Cornelis Theodorus Van Der Sanden
发明人： Irina LYULINA , Hubertus Johannes Gertrudus Simons , Manfred Gawein Tenner , Pieter Jacob Heres , Marc Van Kemenade , Daan Maurits Slotboom , Stefan Cornelis Theodorus Van Der Sanden
IPC分类号： G03B27/53 , G06F17/10
CPC分类号： G03F9/7003 , G03F9/7046
摘要： Estimating model parameters of a lithographic apparatus and controlling lithographic processing by a lithographic apparatus includes performing an exposure using a lithographic apparatus projecting a pattern onto a wafer. A set of predetermined wafer measurement locations is measured. Predetermined and measured locations of the marks are used to generate radial basis functions. Model parameters of said substrate are calculated using the generated radial basis functions as a basis function across said substrate. Finally, the estimated model parameters are used to control the lithographic apparatus in order to expose the substrate.
摘要翻译：估计光刻设备的模型参数并通过光刻设备控制光刻处理包括使用将图案投影到晶片上的光刻设备进行曝光。测量一组预定的晶片测量位置。标记的预定和测量位置用于产生径向基函数。使用生成的径向基函数作为跨越所述基板的基函数来计算所述基板的模型参数。最后，使用估计的模型参数来控制光刻设备以暴露衬底。

6. 发明授权

US08089614B2 Device for changing pitch between light beam axes, and substrate exposure apparatus 有权
标题翻译：用于改变光束轴之间的间距的装置和基板曝光装置
公开(公告)号：US08089614B2
公开(公告)日：2012-01-03
申请号：US11755361
申请日：2007-05-30
申请人： Yoshitada Oshida , Yoshitatsu Naito , Mituhiro Suzuki , Tsuyoshi Yamaguchi , Shigenobu Maruyama
发明人： Yoshitada Oshida , Yoshitatsu Naito , Mituhiro Suzuki , Tsuyoshi Yamaguchi , Shigenobu Maruyama
IPC分类号： G03B27/53
CPC分类号： G03F7/70791 , G02B5/045 , G02B17/04 , G02B26/12 , G03F7/7005 , G03F7/70391 , G03F7/704
摘要： A parallel glass which is a prism having a parallelogram-shaped cross section in an x-y direction, and parallel glasses which are prisms having a parallelogram-shaped cross section in the x-y direction and each include grooves formed in one surface in a z direction perpendicular to the x-y direction, are stacked in direct contact with each other such that the grooves are located on the inside, and light trying to enter the grooves is subjected is total reflection, thereby changing incident parallel beams with a pitch of 13 mm into emergent parallel beams with a pitch of 1 mm.
摘要翻译：在xy方向上具有平行四边形横截面的棱镜的平行玻璃和在xy方向上具有平行四边形横截面的棱镜的平行玻璃，每个平行玻璃包括在垂直于xy方向的az方向的一个表面中形成的凹槽 xy方向彼此直接接触地堆叠，使得凹槽位于内侧，并且试图进入凹槽的光被全反射，从而将具有13mm间距的入射平行光束改变为具有间距为1毫米。

7. 发明授权

US07889318B2 Methods of characterizing similarity between measurements on entities, computer programs product and data carrier 有权
标题翻译：表征实体，计算机程序产品和数据载体上的测量之间的相似性的方法
公开(公告)号：US07889318B2
公开(公告)日：2011-02-15
申请号：US12233484
申请日：2008-09-18
申请人： Christianus Gerardus Maria De Mol , Maria Elisabeth Reuhman-Huisken
发明人： Christianus Gerardus Maria De Mol , Maria Elisabeth Reuhman-Huisken
IPC分类号： G03B27/53 , G03B27/32
CPC分类号： G06K9/32 , G03F7/705 , G03F7/70633 , G03F7/70783
摘要： A method for characterizing the similarity between measurements on a plurality of entities comprising a first entity and a second entity comprises receiving measurements taken at a plurality of measurement points per entity. A model is defined comprising a stochastic process and a model function having values which depend on a set of parameters and the measurement points. A set (β) of parameters is estimated by fitting the model function to the measurements. Residual data is determined for at least a part of the plurality of measurement points for the first entity and the second entity by subtracting the fitted function from the measurements. A correlation coefficient for the first entity (i′) and the second entity (i″) is estimated based on the determined residual data and the estimated correlation coefficient is used to characterize the similarity between the measurements. The model is defined such that the residual data is expected to have a deterministic component which depends on the measurement points and that dominates the estimate of the correlation coefficient. The correlation coefficient is estimated using an estimate for the entity average residue averaged over the measurement points of the first entity and using an estimate for the entity average residue averaged over the measurement points of the second entity.
摘要翻译：用于表征包括第一实体和第二实体的多个实体上的测量之间的相似性的方法包括接收在每个实体的多个测量点处进行的测量。定义的模型包括随机过程和具有取决于一组参数和测量点的值的模型函数。通过将模型函数拟合到测量中来估计参数的集合（＆bgr）。通过从测量中减去拟合函数，为第一实体和第二实体的多个测量点的至少一部分确定剩余数据。基于所确定的残差数据来估计第一实体（i'）和第二实体（i“）的相关系数，并且使用估计的相关系数来表征测量之间的相似性。定义模型，使得残差数据预期具有取决于测量点的确定性分量，并且支配相关系数的估计。使用对第一实体的测量点平均的实体平均残差的估计并使用在第二实体的测量点上平均的实体平均残差的估计来估计相关系数。

8. 发明授权

US6104469A Automatic trimming/printing apparatus 失效
标题翻译：自动修边/打印设备
公开(公告)号：US6104469A
公开(公告)日：2000-08-15
申请号：US92761
申请日：1998-06-05
申请人： Kazuyoshi Yamamoto
发明人： Kazuyoshi Yamamoto
IPC分类号： G03B27/46 , G03B27/32 , G03B27/52 , G03B27/53 , G03B27/58 , G03B27/62 , G03B29/00
CPC分类号： G03B27/46 , G03B27/53 , G03B27/58 , G03B27/62
摘要： An automatic trimming/printing apparatus for trimming frame images a formed on film and printing the frame images on a photosensitive material. The printing apparatus includes a trimming data input unit for acquiring trimming data of the frame images formed on the film (2), a projecting and exposing station (10) for projecting light from the frame images to the photosensitive material through an exposure lens (14), film transport rollers (33) for transporting the film (2) to the projecting and exposing station (10), and an exposure control unit (42) for effecting exposure based on the trimming data acquired. The exposure control unit (42) has a shift exposure function.
摘要翻译：一种自动修剪/打印装置，用于修整形成在胶片上的框架图像a并将该图像在感光材料上打印。打印装置包括修剪数据输入单元，用于获取在胶片（2）上形成的帧图像的修剪数据;投影和曝光站（10），用于通过曝光透镜（14）将来自帧图像的光投射到感光材料），用于将胶片（2）传送到投影和曝光台（10）的胶片传送辊（33）和用于基于所获取的修剪数据进行曝光的曝光控制单元（42）。曝光控制单元（42）具有移动曝光功能。

9. 发明授权

US5675403A Stress-free mount for imaging mask 失效
标题翻译：无压力安装用于成像面罩
公开(公告)号：US5675403A
公开(公告)日：1997-10-07
申请号：US654062
申请日：1996-05-28
申请人： Franco Cerrina , John P. Wallace
发明人： Franco Cerrina , John P. Wallace
IPC分类号： G03F1/00 , G03F1/22 , G03F7/20 , G03B27/53 , G03B27/62
CPC分类号： G03F1/22 , G03F7/707 , Y10T279/11 , Y10T428/24777 , Y10T428/24802
摘要： An imaging mount and apparatus that reduces or eliminates stress induced in an imaging mask mounted thereto. The mount comprises a support block and a trio of mounting pads connected thereto. At least two of the mounting pads are connected to the support block so that their respective positions are adjustable within a predetermined plane which is preferably substantially parallel to a surface of a substrate to be imaged. Each of the mounting pads including means for securing the imaging mask generally parallel to the predetermined plane. The positions the adjustable mounting pads adjust within the predetermined plane responsive to securing of the lithography mask thereto so that the imaging mask is essentially undeflected due to the securing thereof. The absence of deformation (and, as a result, stress) in the imaging mask due to its being secured to the mount reduces the degree of distortion of radiation passing through the mask and to the imprinted surface.
摘要翻译：一种成像装置和装置，其减少或消除了安装在其上的成像面罩中感应的应力。支架包括支撑块和连接到其上的三个安装垫。至少两个安装垫连接到支撑块，使得它们各自的位置在预定平面内是可调节的，该平面优选地基本上平行于待成像的基板的表面。每个安装垫包括用于将成像掩模大致平行于预定平面固定的装置。响应于光刻掩模的固定，可调安装焊盘在预定平面内调整的位置，使得成像掩模由于其固定而基本上未偏转。由于其被固定到安装座上，成像掩模中不存在变形（并且因此应力）减少了通过掩模和压印表面的辐射的变形程度。

10. 发明授权

US5617186A Film carrier of photographic printer with adjustable mask 失效
标题翻译：具有可调节面膜的摄影打印机的胶片载体
公开(公告)号：US5617186A
公开(公告)日：1997-04-01
申请号：US580204
申请日：1995-12-28
申请人： Takekazu Yanagimoto
发明人： Takekazu Yanagimoto
IPC分类号： G03B27/32 , G03B27/62 , G03B27/53
CPC分类号： G03B27/6285
摘要： A film carrier of a photographic printer which is designed so that trimming for each frame can be made by a simple manual operation, and the trimming position can be readily confirmed, and that the photographic film and the film carrier can be readily returned to the original center position. The film carrier has a pair of upper and lower masks (32 and 20) for holding a photographic film (50) to be printed therebetween. The film carrier further has a film guide groove (23) for guiding the photographic film (50) to a position where it is to be held between the lower mask (20) supported by a lower mask support frame (1) and the upper mask (32) supported by an upper mask support frame (2), and a screw mechanism (6 and 7) for moving the upper mask (32) relative to the lower mask (20), which is secured to the photographic printer, in a direction perpendicular to the film feed direction in the film plane, together with the film guide groove (23). The screw mechanism (6 and 7) is provided with a click mechanism.
摘要翻译：照相打印机的胶片载体被设计成可以通过简单的手动操作来制作每个框架的修剪，并且可以容易地确认修整位置，并且可以容易地将照相胶卷和胶片载体返回到原稿中心位置。胶片载体具有一对用于保持印刷在其间的照相胶片（50）的上下掩模（32和20）。胶片载体还具有用于将照相胶片（50）引导到被保持在由下掩模支撑框架（1）支撑的下掩模（20）和上掩模（20）之间的位置的胶片引导槽（23）（32），以及用于使所述上掩模（32）相对于所述下掩模（20）移动的螺钉机构（6和7），所述下掩模被固定到所述照相打印机与膜导向槽（23）一起在膜平面中垂直于胶片输送方向的方向。螺钉机构（6和7）设有咔嗒机构。

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