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1. 发明申请

US20170362710A1 Dual-Direction Chemical Delivery System For ALD/CVD Chambers 审中-公开
公开(公告)号：US20170362710A1
公开(公告)日：2017-12-21
申请号：US15696969
申请日：2017-09-06
申请人： Applied Materials, Inc.
发明人： Zhenbin Ge , Chien-Teh Kao , Joel M. Huston , Mei Chang
IPC分类号： C23C16/455 , B08B9/032 , C23C14/22 , C23C16/52 , C23C16/44
CPC分类号： C23C16/45565 , B08B9/0325 , C23C14/22 , C23C16/4412 , C23C16/45574 , C23C16/45578 , C23C16/52 , Y10T137/4259
摘要： Provided are gas distribution apparatus with a delivery channel having an inlet end, an outlet end and a plurality of apertures spaced along the length. The inlet end is connectable to an inlet gas source and the outlet end is connectible with a vacuum source. Also provided are gas distribution apparatus with spiral delivery channels, intertwined spiral delivery channels, splitting delivery channels, merging delivery channels and shaped delivery channels in which an inlet end and outlet end are configured for rapid exchange of gas within the delivery channels.

2. 发明申请

US20150176126A1 Dual-Direction Chemical Delivery System for ALD/CVD Chambers 有权
标题翻译：用于ALD / CVD室的双向化学物质输送系统
公开(公告)号：US20150176126A1
公开(公告)日：2015-06-25
申请号：US14137007
申请日：2013-12-20
申请人： Applied Materials, Inc.
发明人： Zhenbin Ge , Chien-Teh Kao , Joel M. Huston , Mei Chang
IPC分类号： C23C16/455 , B08B9/032
CPC分类号： C23C16/45565 , B08B9/0325 , C23C14/22 , C23C16/4412 , C23C16/45574 , C23C16/45578 , C23C16/52 , Y10T137/4259
摘要： Provided are gas distribution apparatus with a delivery channel having an inlet end, an outlet end and a plurality of apertures spaced along the length. The inlet end is connectable to an inlet gas source and the outlet end is connectible with a vacuum source. Also provided are gas distribution apparatus with spiral delivery channels, intertwined spiral delivery channels, splitting delivery channels, merging delivery channels and shaped delivery channels in which an inlet end and outlet end are configured for rapid exchange of gas within the delivery channels.
摘要翻译：提供了具有输送通道的气体分配设备，其具有入口端，出口端和沿着该长度间隔开的多个孔。入口端可连接到入口气体源，出口端可与真空源连接。还提供了具有螺旋输送通道的气体分配设备，缠绕在一起的螺旋输送通道，分流输送通道，合并输送通道和成形输送通道，其中入口端和出口端构造成用于在输送通道内快速交换气体。

3. 发明授权

US11598003B2 Substrate processing chamber having heated showerhead assembly 有权
公开(公告)号：US11598003B2
公开(公告)日：2023-03-07
申请号：US15702234
申请日：2017-09-12
申请人： APPLIED MATERIALS, INC.
发明人： Faruk Gungor , Dien-Yeh Wu , Joel M. Huston , Mei Chang , Xiaoxiong Yuan , Kazuya Daito , Avgerinos V. Gelatos , Takashi Kuratomi , Yu Chang , Bin Cao
IPC分类号： C23C16/455 , C23C16/505 , C23C16/46 , C23C16/458
摘要： Apparatus for processing a substrate are provided herein. In some embodiments a showerhead assembly includes a gas distribution plate having a plurality of apertures; a holder having a wall, an radially inwardly extending flange extending from a lower portion of the wall and coupled to the gas distribution plate, and a radially outwardly extending flange extending from an upper portion of the wall, wherein the wall has a thickness between about 0.015 inches and about 0.2 inches; and a heating apparatus disposed above and spaced apart from the gas distribution plate, wherein the heating apparatus includes a heater configured to heat the gas distribution plate.

4. 发明申请

US20210225640A1 SUPPORT ASSEMBLY 有权
公开(公告)号：US20210225640A1
公开(公告)日：2021-07-22
申请号：US17225311
申请日：2021-04-08
申请人： Applied Materials, Inc.
发明人： Chien-Teh Kao , Joel M. Huston , Mei Chang , Xiaoxiong Yuan
IPC分类号： H01L21/02 , H01J37/32 , H01L21/67 , C23C14/54 , C23C14/50 , C23C14/02
摘要： A method and apparatus for removing native oxides from a substrate surface is provided. In one aspect, the apparatus comprises a support assembly. In one embodiment, the support assembly includes a shaft coupled to a disk-shaped body. The shaft has a vacuum conduit, a heat transfer fluid conduit and a gas conduit formed therein. The disk-shaped body includes an upper surface, a lower surface and a cylindrical outer surface. A thermocouple is embedded in the disk-shaped body. A flange extends radially outward from the cylindrical outer surface, wherein the lower surface of the disk-shaped body comprises one side of the flange. A fluid channel is formed in the disk-shaped body proximate the flange and lower surface. The fluid channel is coupled to the heat transfer fluid conduit of the shaft. A plurality of grooves are formed in the upper surface of the disk-shaped body, and are coupled by a hole in the disk-shaped body to the vacuum conduit of the shaft. A gas conduit is formed through the disk-shaped body and couples the gas conduit of the shaft to the cylindrical outer surface of the disk-shaped body. The gas conduit in the disk-shaped body has an orientation substantially perpendicular to a centerline of the disk-shaped body.

5. 发明授权

US10400335B2 Dual-direction chemical delivery system for ALD/CVD chambers 有权
公开(公告)号：US10400335B2
公开(公告)日：2019-09-03
申请号：US15696969
申请日：2017-09-06
申请人： Applied Materials, Inc.
发明人： Zhenbin Ge , Chien-Teh Kao , Joel M. Huston , Mei Chang
IPC分类号： C23C16/455 , C23C16/44 , B08B9/032 , C23C14/22 , C23C16/52
摘要： Provided are gas distribution apparatus with a delivery channel having an inlet end, an outlet end and a plurality of apertures spaced along the length. The inlet end is connectable to an inlet gas source and the outlet end is connectible with a vacuum source. Also provided are gas distribution apparatus with spiral delivery channels, intertwined spiral delivery channels, splitting delivery channels, merging delivery channels and shaped delivery channels in which an inlet end and outlet end are configured for rapid exchange of gas within the delivery channels.

6. 发明授权

US09627185B2 Methods and apparatus for in-situ cleaning of a process chamber 有权
公开(公告)号：US09627185B2
公开(公告)日：2017-04-18
申请号：US14557671
申请日：2014-12-02
申请人： APPLIED MATERIALS, INC.
发明人： Joel M. Huston , Nicholas R. Denny , Chien-Teh Kao
IPC分类号： B08B7/00 , H01J37/32
CPC分类号： H01J37/32862 , H01J37/32449 , H01J37/32834
摘要： Methods and apparatus for in-situ cleaning of substrate processing chambers are provided herein. A substrate processing chamber may include a chamber body enclosing an inner volume; a chamber lid removably coupled to the chamber body and including a first flow channel fluidly coupled to the inner volume to selectively open or seal the inner volume to or from a first outlet; a chamber floor including a second flow channel fluidly coupled to the inner volume to selectively open or seal the inner volume to or from a first inlet; and a pump ring disposed in and in fluid communication with the inner volume, the pump ring comprising an upper chamber fluidly coupled to a lower chamber, and a second outlet fluidly coupled to the lower chamber to selectively open or seal the inner volume to or from the second outlet.

7. 发明申请

US20160273108A1 Dual-Direction Chemical Delivery System For ALD/CVD Chambers 有权
标题翻译： ALD / CVD室的双向化学物质输送系统
公开(公告)号：US20160273108A1
公开(公告)日：2016-09-22
申请号：US15152731
申请日：2016-05-12
申请人： Applied Materials, Inc.
发明人： Zhenbin Ge , Chien-Teh Kao , Joel M. Huston , Mei Chang
IPC分类号： C23C16/455 , C23C14/22 , C23C16/52
CPC分类号： C23C16/45565 , B08B9/0325 , C23C14/22 , C23C16/4412 , C23C16/45574 , C23C16/45578 , C23C16/52 , Y10T137/4259
摘要： Provided are gas distribution apparatus with a delivery channel having an inlet end, an outlet end and a plurality of apertures spaced along the length. The inlet end is connectable to an inlet gas source and the outlet end is connectible with a vacuum source. Also provided are gas distribution apparatus with spiral delivery channels, intertwined spiral delivery channels, splitting delivery channels, merging delivery channels and shaped delivery channels in which an inlet end and outlet end are configured for rapid exchange of gas within the delivery channels.
摘要翻译：提供了具有输送通道的气体分配设备，其具有入口端，出口端和沿着该长度间隔开的多个孔。入口端可连接到入口气体源，出口端可与真空源连接。还提供了具有螺旋输送通道的气体分配设备，缠绕在一起的螺旋输送通道，分流输送通道，合并输送通道和成形输送通道，其中入口端和出口端构造成用于在输送通道内快速交换气体。

8. 发明申请

US20180053667A1 High Temperature Process Chamber Lid 审中-公开
公开(公告)号：US20180053667A1
公开(公告)日：2018-02-22
申请号：US15795575
申请日：2017-10-27
申请人： Applied Materials, Inc.
发明人： Ilker Durukan , Joel M. Huston , Dien-Yeh Wu , Chien-Teh Kao , Mei Chang
IPC分类号： H01L21/67
CPC分类号： H01L21/67126 , H01L21/6719
摘要： Lid assemblies for processing chamber and processing chambers including the lid assemblies are described. The lid assemblies include a high temperature lid module and a housing. The high temperature lid module being positioned adjacent a process liner of a processing chamber. The flexible housing positioned around the high temperature lid module and joined to the high temperature lid module with an elastomeric ring.

9. 发明授权

US09837250B2 Hot wall reactor with cooled vacuum containment 有权
公开(公告)号：US09837250B2
公开(公告)日：2017-12-05
申请号：US14332775
申请日：2014-07-16
申请人： APPLIED MATERIALS, INC.
发明人： Joel M. Huston , Olkan Cuvalci , Michael P. Karazim , Joseph Yudovsky
IPC分类号： H01J37/32 , C23C16/44 , C23C16/455 , C23C16/46
CPC分类号： H01J37/32477 , C23C16/4401 , C23C16/4408 , C23C16/4409 , C23C16/45519 , C23C16/45521 , C23C16/46 , H01J37/32513 , H01J37/32522 , H01J37/32724
摘要： Methods and apparatus for processing substrates are provided herein. In some embodiments, an apparatus for processing substrates includes a chamber body enclosing a processing volume, the chamber body comprising a chamber floor, a chamber wall coupled to the chamber floor, and a chamber lid removably coupled to the chamber wall, wherein at least one of the chamber floor, the chamber wall, and the chamber lid comprise passages for a flow of a thermal control media; a heater plate disposed adjacent to and spaced apart from the chamber floor; a sleeve disposed adjacent to and spaced apart from the chamber wall, the sleeve supported by the heater plate; and a first sealing element disposed at a first interface between the chamber wall and the chamber lid.

10. 发明授权

US09765432B2 Dual-direction chemical delivery system for ALD/CVD chambers 有权
公开(公告)号：US09765432B2
公开(公告)日：2017-09-19
申请号：US15152731
申请日：2016-05-12
申请人： Applied Materials, Inc.
发明人： Zhenbin Ge , Chien-Teh Kao , Joel M. Huston , Mei Chang
IPC分类号： C23C16/455 , B08B9/032 , C23C16/44 , C23C14/22 , C23C16/52
CPC分类号： C23C16/45565 , B08B9/0325 , C23C14/22 , C23C16/4412 , C23C16/45574 , C23C16/45578 , C23C16/52 , Y10T137/4259
摘要： Provided are gas distribution apparatus with a delivery channel having an inlet end, an outlet end and a plurality of apertures spaced along the length. The inlet end is connectable to an inlet gas source and the outlet end is connectible with a vacuum source. Also provided are gas distribution apparatus with spiral delivery channels, intertwined spiral delivery channels, splitting delivery channels, merging delivery channels and shaped delivery channels in which an inlet end and outlet end are configured for rapid exchange of gas within the delivery channels.

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