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    • 8. 发明授权
    • Method for screening arrays of magnetic memories
    • 磁记录阵列的方法
    • US09349427B2
    • 2016-05-24
    • US13969250
    • 2013-08-16
    • Avalanche Technology Inc.
    • Yuchen ZhouEbrahim AbedifardYiming Huai
    • G11C11/16H01L43/08H01L27/22
    • G11C11/16G11C11/165H01L27/222H01L43/08
    • A testing method is described that applies a sequence external magnetic fields of varying strength to MRAM cells (such as those with MTJ memory elements) in chips or wafers to selectively screen out cells with low or high thermal stability factor. The coercivity (Hc) is used as a proxy for thermal stability factor (delta). In the various embodiments the sequence, direction and strength of the external magnetic fields is used to determine the high coercivity cells that are not switched by a normal field and the low coercivity cells that are switched by a selected low field. In some embodiment the MRAM's standard internal electric current can be used to switch the cells. Standard circuit-based resistance read operations can be used to determine the response of each cell to these magnetic fields and identify the abnormal high and low coercivity cells.
    • 描述了一种测试方法,其将具有不同强度的序列外部磁场施加到芯片或晶片中的MRAM单元(例如具有MTJ存储元件的那些),以选择性地筛选具有低或高热稳定性因子的单元。 矫顽力(Hc)用作热稳定因子(delta)的代表。 在各种实施例中,外部磁场的顺序,方向和强度用于确定不被正常场切换的高矫顽力单元以及通过选定的低场切换的低矫顽力单元。 在一些实施例中,MRAM的标准内部电流可用于切换电池。 可以使用标准的基于电路的电阻读取操作来确定每个单元对这些磁场的响应并识别异常的高和低矫顽力单元。
    • 10. 发明授权
    • Devices and methods for measurement of magnetic characteristics of MRAM wafers using magnetoresistive test strips
    • 使用磁阻测试条测量MRAM晶片的磁特性的装置和方法
    • US09252187B2
    • 2016-02-02
    • US14195473
    • 2014-03-03
    • Avalanche Technology Inc.
    • Zihui WangYuchen ZhouYiming Huai
    • H01L27/00H01L27/22H01L21/66G11C29/50G01R31/26G11C11/16
    • H01L27/222G01R31/2648G11C11/16G11C29/50008G11C2029/5002H01L22/34
    • Methods for testing magnetoresistance of test devices with layer stacks, such as MTJs, fabricated on a wafer are described. The test devices can be fabricated along with arrays of similarly structured memory cells on a production wafer to allow in-process testing. The test devices with contact pads at opposite ends of the bottom electrode allow resistance across the bottom electrode to be measured as a surrogate for measuring resistance between the top and bottom electrodes. An MTJ test device according to the invention has a measurable magnetoresistance (MR) between the two contact pads that is a function of the magnetic orientation of the free layer and varies with the length and width of the MTJ strip in each test device. The set of test MTJs can include a selected range of lengths to allow the tunnel magnetoresistance (TMR) and resistance area product (RA) to be estimated or predicted.
    • 描述了在晶片上制造的具有层堆叠(例如MTJ)的测试装置的磁阻测试方法。 测试装置可以与生产晶片上的类似结构的存储器单元的阵列一起制造,以允许进行中的测试。 具有在底部电极的相对端的接触焊盘的测试装置允许要测量的底部电极的电阻作为用于测量顶部和底部电极之间的电阻的替代。 根据本发明的MTJ测试装置在两个接触焊盘之间具有可测量的磁阻(MR),其是自由层的磁性取向的函数,并且随每个测试装置中的MTJ条的长度和宽度而变化。 测试MTJ的集合可以包括所选择的长度范围,以允许估计或预测隧道磁阻(TMR)和电阻面积积(RA)。