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1. 发明授权

US08015511B2 Adjustment of mask shapes for improving printability of dense integrated circuit layout 有权
标题翻译：调整面罩形状，提高密集集成电路布局的可印刷性
公开(公告)号：US08015511B2
公开(公告)日：2011-09-06
申请号：US12348331
申请日：2009-01-05
申请人： Azalia Krasnoperova , Ian P Stobert , Klaus Herold
发明人： Azalia Krasnoperova , Ian P Stobert , Klaus Herold
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： Embodiments of the present invention provide a method for making mask shape adjustment The method includes creating a first mask shape; identifying one or more mask segments of the first mask shape as candidate mask segments of needing segment adjustment; applying an optical proximity correction (OPC) process to the first mask shape, the OPC process identifying at least one of the candidate mask segments as a constrained mask segment; applying a rotational adjustment to the constrained mask segment; and creating a second mask shape having the constrained mask segment being rotationally adjusted. A system and a machine-readable medium for performing the above method are also provided.
摘要翻译：本发明的实施例提供一种用于制作掩模形状调整的方法。该方法包括产生第一掩模形状; 识别第一掩模形状的一个或多个掩模段作为需要段调整的候选掩码段; 将光学邻近校正（OPC）处理应用于所述第一掩模形状，所述OPC处理将所述候选掩模段中的至少一个识别为约束掩模段; 对受约束的掩模段施加旋转调节; 以及创建具有被约束的掩模段被旋转地调节的第二掩模形状。还提供了用于执行上述方法的系统和机器可读介质。

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