专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07665051B2 Method and device for classifying cells in a layout into a same environment and their use for checking the layout of an electronic circuit 失效
标题翻译：将布局中的单元格分类到相同环境中的方法和设备及其用于检查电子电路布局的用途
公开(公告)号：US07665051B2
公开(公告)日：2010-02-16
申请号：US11832465
申请日：2007-08-01
申请人： Burkhard Ludwig , Uwe Mueller
发明人： Burkhard Ludwig , Uwe Mueller
IPC分类号： G06F17/50 , G06F9/45
CPC分类号： G06F17/5081
摘要： A method and a device can be used for checking the layout of an electronic circuit of a semiconductor component. For example, the method includes an automatic classification of cells in at least one layout into a cell database, and an automatic layout checker comparing the cell database to a layout to be checked.
摘要翻译：可以使用方法和装置来检查半导体部件的电子电路的布局。例如，该方法包括将至少一个布局中的单元格自动分类为单元数据库，以及将单元数据库与要检查的布局进行比较的自动布局检查器。

2. 发明申请

US20080059927A1 Method and Device and Their Use for Checking the Layout of an Electronic Circuit 失效
标题翻译：方法和装置及其用于检查电子电路布局的用途
公开(公告)号：US20080059927A1
公开(公告)日：2008-03-06
申请号：US11832465
申请日：2007-08-01
申请人： Burkhard Ludwig , Uwe Mueller
发明人： Burkhard Ludwig , Uwe Mueller
IPC分类号： G06F17/50
CPC分类号： G06F17/5081
摘要： A method and a device can be used for checking the layout of an electronic circuit of a semiconductor component. For example, the method includes an automatic classification of cells in at least one layout into a cell database, and an automatic layout checker comparing the cell database to a layout to be checked.
摘要翻译：可以使用方法和装置来检查半导体部件的电子电路的布局。例如，该方法包括将至少一个布局中的单元格自动分类为单元数据库，以及将单元数据库与要检查的布局进行比较的自动布局检查器。

3. 发明申请

US20090127722A1 Method for Processing a Spacer Structure, Method of Manufacturing an Integrated Circuit, Semiconductor Device and Intermediate Structure with at Least One Spacer Structure 审中-公开
标题翻译：用于处理间隔结构的方法，制造集成电路的方法，具有至少一个间隔结构的半导体器件和中间结构
公开(公告)号：US20090127722A1
公开(公告)日：2009-05-21
申请号：US11943445
申请日：2007-11-20
申请人： Christoph Noelscher , Ulrich Egger , Rolf Weis , Stephan Wege , Burkhard Ludwig
发明人： Christoph Noelscher , Ulrich Egger , Rolf Weis , Stephan Wege , Burkhard Ludwig
IPC分类号： H01L23/544 , H01L21/306
CPC分类号： H01L21/0337 , B81C1/00111 , H01L21/0334 , H01L21/31144
摘要： Method for processing at least one spacer structure in a manufacturing process of a semiconductor device, wherein the at least one spacer structure is subjected to at least one etch process step with an isotropic component and the spacer structure comprises at least one point on the surface with a large solid angle opening towards the environment. Method of manufacturing an integrated circuit, including a regional removal of a spacer structure, wherein the removal is determined by a pattern density in the vicinity of the spacer structure.
摘要翻译：用于在半导体器件的制造工艺中处理至少一个间隔结构的方法，其中所述至少一个间隔结构经受至少一个具有各向同性组分的蚀刻工艺步骤，并且所述间隔物结构包括在所述表面上的至少一个点，朝向环境开放的大立体角。制造集成电路的方法，包括间隔结构的局部去除，其中去除由间隔结构附近的图案密度确定。

4. 发明授权

US06660437B2 Alternating phase mask 有权
标题翻译：交替相位掩模
公开(公告)号：US06660437B2
公开(公告)日：2003-12-09
申请号：US10158733
申请日：2002-05-30
申请人： Christoph Friedrich , Uwe Griesinger , Michael Heissmeier , Burkhard Ludwig , Molela Moukara , Rainer Pforr
发明人： Christoph Friedrich , Uwe Griesinger , Michael Heissmeier , Burkhard Ludwig , Molela Moukara , Rainer Pforr
IPC分类号： G03F900
CPC分类号： G03F1/30
摘要： An alternating phase mask having a branched structure containing two opaque segments is described. Two transparent surface segments are disposed on both sides of the segments or the components thereof, respectively. The surface segments are provided with phases that are displaced by 180°±&Dgr; &agr;, whereby &Dgr; &agr; a is not more than 25°. The surface segments are separated by at least one transparent surface boundary segment whose phase is situated between the phases of the adjacent surface segments.
摘要翻译：描述具有包含两个不透明段的分支结构的交替相位掩模。两个透明表面片分别设置在片段的两侧或其部件上。表面段设置有被偏移180°±Δα的相位，由此Δaa不大于25°。表面段由相位位于相邻表面段的相位之间的至少一个透明表面边界段分开。

5. 发明授权

US07759242B2 Method of fabricating an integrated circuit 失效
标题翻译：制造集成电路的方法
公开(公告)号：US07759242B2
公开(公告)日：2010-07-20
申请号：US11843052
申请日：2007-08-22
申请人： Steffen Meyer , Rolf Weis , Burkhard Ludwig , Christoph Noelscher
发明人： Steffen Meyer , Rolf Weis , Burkhard Ludwig , Christoph Noelscher
IPC分类号： H01L21/20
CPC分类号： H01L21/76816 , G03F1/00 , G03F7/70466 , H01L21/0337 , H01L21/0338 , H01L21/31144 , H01L21/32139 , H01L21/76229
摘要： A method of fabricating an integrated circuit, including the steps of forming a first mask layer in the form of a hard mask layer including a plurality of first openings and a second mask layer with at least one second opening which at least partially overlaps with one of the first openings, wherein the at least one second opening is generated lithographically; and at least two neighboring first openings are distanced from each other with a center to center pitch smaller than the resolution limit of the lithography used for generating the second opening.
摘要翻译：一种制造集成电路的方法，包括以下步骤：形成包括多个第一开口的硬掩模层形式的第一掩模层和具有至少一个第二开口的第二掩模层，所述至少一个第二开口至少部分地与所述第一开口，其中所述至少一个第二开口是光刻地产生的; 并且至少两个相邻的第一开口彼此间隔开，中心至中心节距小于用于产生第二开口的光刻的分辨率极限。

6. 发明申请

US20070283306A1 Layout cells, layout cell arrangement, method of generating a layout cell, method of generating a layout cell arrangement, computer program products 审中-公开
标题翻译：布局单元格，布局单元布置，生成布局单元格的方法，生成布局单元布局的方法，计算机程序产品
公开(公告)号：US20070283306A1
公开(公告)日：2007-12-06
申请号：US11443478
申请日：2006-05-30
申请人： Matthias Koefferlein , Burkhard Ludwig
发明人： Matthias Koefferlein , Burkhard Ludwig
IPC分类号： G06F17/50
CPC分类号： G06F17/5068
摘要： A layout cell includes layout cell information including information about at least one component, and a layout cell identifier identifying the layout cell. The layout cell identifier includes geometrical information about the layout cell.
摘要翻译：布局单元包括布局单元信息，包括关于至少一个组件的信息，以及标识布局单元的布局单元标识符。布局单元标识符包括关于布局单元的几何信息。

7. 发明授权

US06957414B2 Method for determining the ability to project images of integrated semiconductor circuits onto alternating phase masks 失效
标题翻译：确定将集成半导体电路的图像投影到交替相位掩模上的能力的方法
公开(公告)号：US06957414B2
公开(公告)日：2005-10-18
申请号：US10352735
申请日：2003-01-27
申请人： Burkhard Ludwig , Molela Moukara
发明人： Burkhard Ludwig , Molela Moukara
IPC分类号： G03F1/00 , G06F17/50 , G03F9/00
CPC分类号： G03F1/30
摘要： A method is used to check the direct convertibility of integrated semiconductor circuits into alternating phase masks. This is done by explicitly localizing the phase conflicts occurring in the corresponding layout while solely using the technological requirements made of the design. The set of phase conflicts determined with the aid of this formalism is complete and minimal and thus proves to be an optimum starting point for methods for handling conflicts of this type.
摘要翻译：一种方法用于检查集成半导体电路直接可转换成交替相位掩模。这通过明确地定位在相应布局中发生的相位冲突，而仅使用由设计的技术要求。在这种形式主义的帮助下确定的一系列相位冲突是完整和最小的，因此被证明是处理这种冲突的方法的最佳起点。

8. 发明授权

US06834377B2 Method for checking an integrated electrical circuit 失效
标题翻译：检查集成电路的方法
公开(公告)号：US06834377B2
公开(公告)日：2004-12-21
申请号：US10368334
申请日：2003-02-18
申请人： Peter Baader , Burkhard Ludwig
发明人： Peter Baader , Burkhard Ludwig
IPC分类号： G06F1750
CPC分类号： G06F8/44 , G06F17/5081
摘要： A layout of an integrated electrical circuit on a memory unit of a computer system includes one or more instantiations of at least one circuit network description as well as information about the instantiations. A raw data structure represents the logical configuration of the layout and associates each instantiation with one, and only one, polygon data structure. A modified data structure is produced to represent the layout, which associates a circuit network description with one, and only one, polygon data structure, wherein the geometrical differences between the instantiations of this circuit network description are taken into account by variants in the polygon data structure.
摘要翻译：在计算机系统的存储器单元上的集成电路的布局包括至少一个电路网络描述的一个或多个实例以及关于该实例的信息。原始数据结构表示布局的逻辑配置，并将每个实例化与一个且仅一个多边形数据结构相关联。生成修改的数据结构以表示布局，其将电路网络描述与一个且仅一个多边形数据结构相关联，其中通过多边形数据中的变体来考虑该电路网络描述的实例之间的几何差异结构体。

9. 发明授权

US06680151B2 Alternating phase mask 有权
标题翻译：交替相位掩模
公开(公告)号：US06680151B2
公开(公告)日：2004-01-20
申请号：US10174646
申请日：2002-06-18
申请人： Michael Heissmeier , Markus Hofsäss , Burkhard Ludwig , Molela Moukara , Christoph Nölscher
发明人： Michael Heissmeier , Markus Hofsäss , Burkhard Ludwig , Molela Moukara , Christoph Nölscher
IPC分类号： G03F900
CPC分类号： G03F1/30
摘要： An alternating phase mask is described in which a propagation of a T phase conflict which occurs in the case of a T pattern structure is avoided by producing a phase jump at one of the 90° corners of the T pattern structure. First and second transparent area segments, which produce a mutual phase difference of 180°, are separated by a narrow slot running approximately at 45° toward the corner of the T pattern structure. The structure containing the transparent area segments, which are separated by the slot running at 45°, can also be provided at the other corner of the T structure providing a solution for each T conflict. The trimming mask for eliminating the dark line artificially produced by the 180° phase jump is a conventional mask and requires no additional coloration. Moreover, alignment errors are minimal on account of the small number of trimming openings.
摘要翻译：描述了一种交替相位掩模，其中通过在T图案结构的90°角之一处产生相位跳跃来避免在T图案结构的情况下发生的T相冲突的传播。产生180°相互相位差的第一透明区域和第二透明区域段通过大致45度向T图案结构的拐角延伸的窄槽分隔开。包含由45°运行的槽隔开的透明区域段的结构也可以设置在T结构的另一个角上，为每个T冲突提供解决方案。用于消除由180°相位跳跃人为产生的暗线的修剪掩模是常规的掩模，并且不需要额外的着色。此外，由于修剪开口的数量少，对准误差最小。

10. 发明授权

US07354683B2 Lithography mask for imaging of convex structures 失效
标题翻译：用于凸结构成像的平版印刷掩模
公开(公告)号：US07354683B2
公开(公告)日：2008-04-08
申请号：US10928759
申请日：2004-08-27
申请人： Molela Moukara , Burkhard Ludwig , Jörg Thiele , Marco Ahrens , Roderick Köhle , Rainer Pforr , Nicolo Morgana
发明人： Molela Moukara , Burkhard Ludwig , Jörg Thiele , Marco Ahrens , Roderick Köhle , Rainer Pforr , Nicolo Morgana
IPC分类号： G03F1/00
CPC分类号： G03F7/70441 , G03F1/30 , G03F1/36 , G03F7/70466
摘要： A lithography mask has an angled structure element (O) formed by a first opaque segment (O1) and by a second opaque segment (O2). The structure element has at least one reflex angle (α). The angled structure element (O) includes at least one convex section (A) facing the reflex angle (α). At least one transparent structure (T) adjacent to the angled structure element (O) is provided at the convex section (A) of the angled structure element (O). The transparent structure (T) is formed in separated fashion at the convex section (A) of the angled structure element (O) and thus comprises two distinguishable transparent segments (T1, T2) formed at least in sections essentially axially symmetrically with respect to the angle bisector (WH) of the reflex angle.
摘要翻译：光刻掩模具有由第一不透明部分（O 1）和第二不透明部分（O 2）形成的成角度的结构元件（O）。结构元件具有至少一个反射角（α）。倾斜结构元件（O）包括面向反射角（α）的至少一个凸部（A）。与成角度的结构元件（O）相邻的至少一个透明结构（T）设置在倾斜结构元件（O）的凸部（A）处。透明结构（T）以分开的方式形成在成角度的结构元件（O）的凸部（A）处，并且因此包括两个可区分的透明段（T 1，T 2），其至少形成在主要轴向对称的部分到角度平分线（WH）的反射角度。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式