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1. 发明申请

US20140078513A1 METHOD OF MEASURING A SHAPE OF AN OPTICAL SURFACE BASED ON COMPUTATIONALLY COMBINED SURFACE REGION MEASUREMENTS AND INTERFEROMETRIC MEASURING DEVICE 审中-公开
标题翻译：基于计算的组合表面区域测量和干涉测量装置测量光学表面形状的方法
公开(公告)号：US20140078513A1
公开(公告)日：2014-03-20
申请号：US14087997
申请日：2013-11-22
申请人： CARL ZEISS SMT GmbH
发明人： Rolf FREIMANN , Bernd DOERBAND , Stefan SCHULTE , Albrecht HOF , Frank RIEPENHAUSEN , Matthias MANGER , Dietmar NEUGEBAUER , Helmut ISSLER , Armin BICH
IPC分类号： G01B11/24 , G02B5/10 , G02B3/02
CPC分类号： G01B11/2441 , B29D11/0098 , G01B9/02027 , G01B9/02039 , G01B9/02057 , G01B9/02072 , G01B2290/15 , G01M11/005 , G01M11/025 , G01M11/0271 , G02B3/02 , G02B5/10
摘要： Measuring a shape of an optical surface (14) of a test object (12) includes: providing an interferometric measuring device (16) generating a measurement wave (18); arranging the measuring device (16) and the test object (12) consecutively at different measurement positions relative to each other, such that different regions (20) of the optical surface (14) are illuminated by the measurement wave (18); measuring positional coordinates of the measuring device (16) at the different measurement positions in relation to the test object (12); obtaining surface region measurements by interferometrically measuring the wavefront of the measurement wave (18) after interaction with the respective region (20) of the optical surface (14) using the measuring device (16) in each of the measurement positions; and determining the actual shape of the optical surface (14) by computationally combining the sub-surface measurements based on the measured positional coordinates of the measuring device (16) at each of the measurement positions.
摘要翻译：测量被测物体（12）的光学表面（14）的形状包括：提供产生测量波（18）的干涉测量装置（16）; 使测量装置（16）和测试对象（12）相对于彼此的不同测量位置连续布置，使得光学表面（14）的不同区域（20）被测量波（18）照亮; 测量所述测量装置（16）在与所述测试对象（12）相关的不同测量位置处的位置坐标; 通过在每个测量位置中使用测量装置（16）在与光学表面（14）的相应区域（20）相互作用之后干涉测量测量波（18）的波前来获得表面区域测量; 以及通过基于在每个测量位置处测量的测量装置（16）的测量的位置坐标计算地组合子表面测量来确定光学表面（14）的实际形状。

2. 发明申请

US20160266501A1 PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY AND METHOD OF MONITORING A LATERAL IMAGING STABILITY 有权
标题翻译：用于微观计算的投影曝光系统和监测横向成像稳定性的方法
公开(公告)号：US20160266501A1
公开(公告)日：2016-09-15
申请号：US14992702
申请日：2016-01-11
申请人： Carl Zeiss SMT GmbH
发明人： Matthias MANGER , Armin SCHOECH , Ulrich MUELLER
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70258 , G03F7/70591 , G03F7/7085
摘要： A projection exposure system (10) for microlithography. The system includes projection optics (12) configured to image mask structures into a substrate plane (16), an input diffraction element (28) which is configured to convert irradiated measurement radiation (21) into at least two test waves (30) directed onto the projection optics (12) with differing propagation directions, a detection diffraction element (34; 28) which is disposed in the optical path of the test waves (30) after the latter have passed through the projection optics (12) and is configured to produce a detection beam (36) from the test waves (30) which has a mixture of radiation portions of both test waves (30), a photo detector (38) disposed in the optical path of the detection beam (36) which is configured to record the radiation intensity of the detection beam (36), time resolved, and an evaluation unit which is configured to determine the lateral imaging stability of the projection optics (12) from the radiation intensity recorded.
摘要翻译：一种用于微光刻的投影曝光系统（10）。该系统包括被配置成将掩模结构成像到衬底平面（16）中的投影光学器件（12），被配置为将照射的测量辐射（21）转换成至少两个测试波（30）的输入衍射元件（28）具有不同传播方向的投影光学器件（12），检测衍射元件（34; 28），其被布置在经过投影光学器件（12）的测试波（30）的光路中，并被配置为从具有两个测试波的辐射部分的混合物的测试波（30）产生检测光束（36），设置在检测光束（36）的光路中的光电检测器（38）记录检测光束（36）的辐射强度，时间分辨率和被配置为根据记录的辐射强度确定投影光学器件（12）的横向成像稳定性的评估单元。

3. 发明申请

US20210157244A1 METHOD FOR PRODUCING A REFLECTING OPTICAL ELEMENT OF A PROJECTION EXPOSURE APPARATUS AND REFLECTING OPTICAL ELEMENT FOR A PROJECTION EXPOSURE APPARATUS, PROJECTION LENS AND PROJECTION EXPOSURE APPARATUS 有权
公开(公告)号：US20210157244A1
公开(公告)日：2021-05-27
申请号：US17147293
申请日：2021-01-12
申请人： Carl Zeiss SMT GmbH
发明人： Matthias KAES , Steffen BEZOLD , Matthias MANGER , Christoph PETRI , Pavel ALEXEEV , Walter PAULS
IPC分类号： G03F7/20
摘要： A method for producing a reflecting optical element for a projection exposure apparatus (1). The element has a substrate (30) with a substrate surface (31), a protection layer (38) and a layer partial system (39) suitable for the EUV wavelength range. The method includes: (a) measuring the substrate surface (31), (b) irradiating the substrate (30) with electrons (36), and (c) tempering the substrate (30). Furthermore, an associated reflective optical element for the EUV wavelength range, a projection lens with a mirror (18, 19, 20) as reflective optical element, and a projection exposure apparatus (1) including such a projection lens.

4. 发明申请

US20180039184A1 PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY AND METHOD OF MONITORING A LATERAL IMAGING STABILITY 审中-公开
公开(公告)号：US20180039184A1
公开(公告)日：2018-02-08
申请号：US15652344
申请日：2017-07-18
申请人： Carl Zeiss SMT GmbH
发明人： Matthias MANGER , Armin RAUTHE-SCHOECH , Ulrich MUELLER
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70258 , G03F7/70591 , G03F7/7085
摘要： A projection exposure system (10) for microlithography includes projection optics (12) configured to image mask structures into a substrate plane (16), an input diffraction element (28) configured to convert irradiated measurement radiation (21) into at least two test waves (30) directed onto the projection optics (12) with differing propagation directions, a detection diffraction element (34; 28) disposed in the optical path of the test waves (30) after they have passed through the projection optics (12) and configured to produce a detection beam (36) from the test waves (30) which has a mixture of radiation portions of both test waves (30), a photo detector (38) disposed in the optical path of the detection beam (36) configured to record the radiation intensity of the detection beam (36), time resolved, and an evaluation unit configured to determine the lateral imaging stability of the projection optics (12) from the radiation intensity recorded.

5. 发明申请

US20160341969A1 BEAM PROPAGATION CAMERA AND METHOD FOR LIGHT BEAM ANALYSIS 审中-公开
标题翻译：光束传播摄像机和光束分析方法
公开(公告)号：US20160341969A1
公开(公告)日：2016-11-24
申请号：US15225126
申请日：2016-08-01
申请人： Carl Zeiss SMT GmbH
发明人： Matthias MANGER
IPC分类号： G02B27/10 , G01J1/42 , H05G2/00 , G02B5/18 , G02B27/58
CPC分类号： G02B27/10 , B23K26/705 , G01J1/0407 , G01J1/0411 , G01J1/4257 , G02B5/1814 , G02B27/106 , G02B27/58 , H05G2/008
摘要： A beam propagation camera has at least one beam-splitting optical arrangement (240) configured to split a beam, which is incident on the beam-splitting optical arrangement along an optical axis (OA) of the beam propagation camera, into a multiplicity of sub-beams, and a sensor arrangement (250) configured to detect the sub-beams. The beam-splitting optical arrangement has a diffractive structure (241) configured such that at least two of the sub-beams are spatially separated from one another on the sensor arrangement and have respective foci longitudinally offset from one another along the optical axis.
摘要翻译：光束传播照相机具有至少一个分束光学装置（240），其配置成沿着光束传播照相机的光轴（OA）入射到分束光学装置上的光束分成多个子以及被配置为检测子光束的传感器装置（250）。分束光学装置具有衍射结构（241），其被配置为使得至少两个子光束在传感器装置上在空间上彼此分离，并且具有沿着光轴彼此纵向偏移的相应焦点。

6. 发明申请

US20220368104A1 CONTROL DEVICE, CONTROL SYSTEM, METHOD FOR OPERATING A CONTROL SYSTEM 有权
公开(公告)号：US20220368104A1
公开(公告)日：2022-11-17
申请号：US17876860
申请日：2022-07-29
申请人： CARL ZEISS SMT GMBH
发明人： Arian KRIESCH , Matthias MANGER , Claudius WEIMANN , Ulrich VOGL
IPC分类号： H01S5/0687 , H01S3/13 , H01S5/02 , H01S3/08
摘要： A control system for frequency control of a laser module, comprising at least one laser module for generating laser radiation, at least one control device coupled or configured to couple to the laser module, and at least one optical resonator coupled or configured to couple to the control device, wherein the control device comprises a semiconductor substrate, a first Pound-Drever-Hall system arranged on the semiconductor substrate and at least one second Pound-Drever-Hall system arranged on the semiconductor substrate, wherein the laser module is coupled to the first Pound-Drever-Hall system of the control device and is configured to couple to the at least second Pound-Drever-Hall system of the control device, wherein the first Pound-Drever-Hall system is coupled to the optical resonator and wherein the second Pound-Drever-Hall system is configured to couple to the optical resonator, and wherein the number of Pound-Drever-Hall systems is greater than the number of laser modules or optical resonators.

7. 发明申请

US20210080244A1 MEASURING ASSEMBLY FOR THE FREQUENCY-BASED DETERMINATION OF THE POSITION OF A COMPONENT 有权
公开(公告)号：US20210080244A1
公开(公告)日：2021-03-18
申请号：US17102503
申请日：2020-11-24
申请人： Carl Zeiss SMT GmbH
发明人： Matthias MANGER , Andreas KOENIGER , Alexander VOGLER
IPC分类号： G01B9/02 , G03F7/20
摘要： A measuring assembly for the frequency-based determination of the position of a component, in particular in an optical system for microlithography, includes at least one optical resonator, which has a stationary first resonator mirror, a movable measurement target assigned to the component, and a stationary second resonator mirror. The second resonator mirror is formed by an inverting mirror (130, 330, 430, 530), which reflects back on itself a measurement beam coming from the measurement target.

8. 发明申请

US20170122803A1 SYSTEM AND METHOD FOR ANALYZING A LIGHT BEAM GUIDED BY A BEAM GUIDING OPTICAL UNIT 有权
公开(公告)号：US20170122803A1
公开(公告)日：2017-05-04
申请号：US15347348
申请日：2016-11-09
申请人： Carl Zeiss SMT GmbH
发明人： Matthias MANGER , Florian BAUMER
IPC分类号： G01J1/42 , G02B5/20 , H05G2/00 , G01J1/04
CPC分类号： G01J1/4257 , B23K26/705 , G01J1/0418 , G02B5/205 , H05G2/005 , H05G2/008
摘要： A system and a method for analyzing a light beam guided by a beam guiding optical unit. The system has a graduated neutral density filter arrangement (120, 520), which is arranged in a far field plane of the beam guiding optical unit and has at least one graduated neutral density filter (121, 521, 522, 523) having a spatially varying transmission, and a light intensity sensor arrangement having at least one light intensity sensor (140, 540), which is arranged in a near field plane of the beam guiding optical unit and is configured to measure (141, 541, 542, 543), for each graduated neutral density filter (121, 521, 522, 523) of the graduated neutral density filter arrangement (120, 520), a light intensity transmitted by each graduated neutral density filter.

9. 发明申请

US20160350935A1 MEASURING ARRANGEMENT FOR USE WHEN DETERMINING TRAJECTORIES OF FLYING OBJECTS 审中-公开
标题翻译：用于确定飞行物体的轨迹时使用的测量装置
公开(公告)号：US20160350935A1
公开(公告)日：2016-12-01
申请号：US15169104
申请日：2016-05-31
申请人： Carl Zeiss SMT GmbH
发明人： Matthias MANGER
IPC分类号： G06T7/20 , H04N5/225 , H04N7/18 , G03F7/20 , H05G2/00
CPC分类号： G06T7/20 , G01P3/68 , G03F7/70033 , G03F7/7085 , G06T2207/30241 , H04N5/2252 , H04N5/2254 , H04N7/18 , H05G2/003 , H05G2/008
摘要： A measuring arrangement for use when determining trajectories of flying objects, wherein the measuring arrangement comprises at least one photodetector arrangement (411, 412, 421, 422, 780, 785, 880, 980) comprising a plurality of photodetector cells in a monolithic construction, wherein the photodetector arrangement is assigned exactly one imaging system (700, 750, 800, 900). During the operation of the measuring arrangement, images in each case a flying object situated in an object plane (OP) of the imaging system onto the photodetector arrangement situated in an image plane (IP) of the imaging system, and a time measuring device for measuring transit instants, wherein each of the transit instants corresponds to an instant at which an image of a flying object, generated in the image plane (IP) of the imaging system, respectively crosses a cell boundary between mutually adjacent photodetector cells in the photodetector arrangement.
摘要翻译：一种在确定飞行物体的轨迹时使用的测量装置，其中所述测量装置包括至少一个光电检测器装置（411,412,421,422,780,785,880,980），其包括整体结构中的多个光电探测器单元，其中光电检测器装置被精确地分配一个成像系统（700,700,800,900）。在测量装置的操作期间，每种情况下的图像是位于成像系统的物体平面（OP）中的飞行物体到位于成像系统的图像平面（IP）中的光电检测器装置上，以及用于测量传输时刻，其中每个传输瞬间对应于在成像系统的图像平面（IP）中生成的飞行对象的图像分别跨越光电检测器装置中相互相邻的光电检测器单元之间的单元边界的瞬间。

10. 发明申请

US20130271749A1 METHOD FOR MEASURING AN OPTICAL SYSTEM 有权
标题翻译：测量光学系统的方法
公开(公告)号：US20130271749A1
公开(公告)日：2013-10-17
申请号：US13913212
申请日：2013-06-07
申请人： CARL ZEISS SMT GmbH
发明人： Thomas KORB , Christian HETTICH , Michael LAYH , Ulrich WEGMANN , Karl-Heinz SCHUSTER , Matthias MANGER
IPC分类号： G01M11/02
CPC分类号： G01N21/94 , G01M11/02 , G01N21/9501 , G03F7/70483 , G03F7/708 , G03F7/7085
摘要： First test beams (464a-d), after passing through an optical system on optical paths that differ in pairs, impinge on a first measurement region (461) at angles that differ in pairs with respect to the measurement plane. Second test beams (465a-d), after passing through the optical system on optical paths that differ in pairs, impinge on a second measurement region (462) at angles that differ in pairs, wherein the second region differs from the first. A value of a first measurement variable of the test beam at the first region is detected for each of the first test beams, and comparably for a second measurement variable at the second region for the second test beams. Impingement regions (467a-d) on reference surface(s) (466, 471) of the optical system are determined and a spatial diagnosis distribution of a property of the reference surface(s) for each test beam is calculated.
摘要翻译：第一测试光束（464a-d）在通过成对不同的光路上的光学系统之后，以相对于测量平面成对不同的角度照射在第一测量区域（461）上。第二测试光束（465a-d）在穿过成对不同的光路上的光学系统之后，以成对不同的角度撞击第二测量区域（462），其中第二区域与第一区域不同。对于第一测试光束中的每一个检测第一区域处的测试光束的第一测量变量的值，并且针对第二测试光束的第二测量变量的第二测量变量进行比较。确定光学系统的参考表面（466,471）上的冲击区域（467a-d），并且计算每个测试光束的参考表面的属性的空间诊断分布。

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