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1. 发明授权

US09996012B2 Facet mirror for use in a projection exposure apparatus for microlithography 有权
公开(公告)号：US09996012B2
公开(公告)日：2018-06-12
申请号：US15202104
申请日：2016-07-05
申请人： Carl Zeiss SMT GmbH
发明人： Udo Dinger , Martin Endres , Armin Werber , Norbert Muehlberger , Florian Bach
IPC分类号： G03B27/54 , G03B27/42 , G03F7/20 , G02B26/06 , G02B26/08 , G02B5/09 , G02B27/09
CPC分类号： G03F7/702 , G02B5/09 , G02B26/06 , G02B26/0816 , G02B26/0833 , G02B27/0927 , G03F7/70075 , G03F7/70116
摘要： A facet mirror is to be used as a bundle-guiding optical component in a projection exposure apparatus for microlithography. The facet mirror has a plurality of separate mirrors. For individual deflection of incident illumination light, the separate mirrors are in each case connected to an actuator in such a way that they are separately tiltable about at least one tilt axis. A control device, which is connected to the actuators, is configured in such a way that a given grouping of the separate mirrors can be grouped into separate mirror groups that include in each case at least two separate mirrors. The result is a facet mirror which, when installed in the projection exposure apparatus, increases the variability for setting various illumination geometries of an object field to be illuminated by the projection exposure apparatus. Various embodiments of separate mirrors for forming the facet mirrors are described.

2. 发明授权

US09513562B2 Projection exposure apparatus for microlithography for the production of semiconductor components 有权
标题翻译：用于生产半导体元件的微光刻的投影曝光装置
公开(公告)号：US09513562B2
公开(公告)日：2016-12-06
申请号：US14499790
申请日：2014-09-29
申请人： Carl Zeiss SMT GmbH
发明人： Juergen Fischer , Armin Schoeppach , Matthias Orth , Norbert Muehlberger , Thorsten Rassel , Armin Werber , Juergen Huber
IPC分类号： G02B7/182 , G03B27/32 , G03B27/54 , G03F7/20
CPC分类号： G03F7/7015 , G03F7/70266 , G03F7/70825 , G03F7/70883 , G03F7/709 , G03F7/70991
摘要： A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus.
摘要翻译：用于生产半导体部件的用于微光刻的投影曝光装置包括至少一个光学组件，其具有可以以机械控制的方式被致动的至少一个光学元件安装在结构中。为了执行机械致动，至少在投影曝光设备的特定操作状态期间，提供控制信号传输装置和/或能量传输装置，其将光学组件中没有寄生机械效应引入到光学组件中。

3. 发明授权

US09341807B2 Gravitation compensation for optical elements in projection exposure apparatuses 有权
标题翻译：投影曝光装置中的光学元件的重力补偿
公开(公告)号：US09341807B2
公开(公告)日：2016-05-17
申请号：US14484696
申请日：2014-09-12
申请人： Carl Zeiss SMT GmbH
发明人： Norbert Muehlberger , Thorsten Rassel , Armin Schoeppach , Juergen Fischer , Matthias Orth
IPC分类号： G03B27/42 , G03B27/54 , G02B7/00 , G03F7/20 , G02B13/14 , G02B13/16
CPC分类号： G02B7/001 , G02B13/143 , G02B13/16 , G03F7/70825
摘要： A gravitation compensator for mounting optical elements in a projection exposure apparatus and a corresponding projection exposure apparatus are disclosed. The gravitation compensator at least partly compensates for the weight force of a mounted optical element and simultaneously enables a change in the position of the optical element without the compensated weight force being altered in an impermissible manner during the change in position. This applies, in particular, to high weight forces which are to be compensated. Furthermore, the gravitation compensator enables use in different atmospheres and the compensation of corresponding aging effects.
摘要翻译：公开了一种用于在投影曝光设备和相应的投影曝光设备中安装光学元件的引力补偿器。重力补偿器至少部分地补偿安装的光学元件的重量，并且同时能够改变光学元件的位置，而不会在位置改变期间以不允许的方式改变补偿的重量。这尤其适用于要补偿的高重量力。此外，引力补偿器可以在不同的环境中使用，并补偿相应的老化效应。

4. 发明授权

US09448384B2 Arrangement for mounting an optical element 有权
标题翻译：用于安装光学元件的布置
公开(公告)号：US09448384B2
公开(公告)日：2016-09-20
申请号：US13903563
申请日：2013-05-28
申请人： Carl Zeiss SMT GmbH
发明人： Michael Erath , Florian Bach , Ulrich Schoenhoff , Rodolfo Rabe , Norbert Muehlberger , Dirk Eicher , Jasper Wesselingh
IPC分类号： G02B7/182 , G02B7/02 , G03F7/20 , G02B3/00 , G02B5/08
CPC分类号： G02B7/1828 , G02B3/00 , G02B5/08 , G02B7/023 , G03F7/70141 , G03F7/708 , G03F7/70825
摘要： The invention relates to an arrangement for mounting an optical element, in particular in an EUV projection exposure apparatus, comprising a weight force compensation device for exerting a compensation force on the optical element, wherein the compensation force at least partly compensates for the weight force acting on the optical element, wherein the weight force compensation device has a passive magnetic circuit for generating a force component of the compensation force acting on the optical element, and wherein at least one adjustment element is provided via which the force component generated by the passive magnetic circuit is continuously adjustable.
摘要翻译：本发明涉及一种用于安装光学元件的装置，特别是在EUV投影曝光装置中，包括用于对光学元件施加补偿力的重力补偿装置，其中补偿力至少部分地补偿作用的重量在所述光学元件上，其中所述重力补偿装置具有用于产生作用在所述光学元件上的补偿力的力分量的无源磁路，并且其中提供至少一个调节元件，由所述被动磁体产生的力分量电路连续可调。

5. 发明申请

US20150015864A1 PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY FOR THE PRODUCTION OF SEMICONDUCTOR COMPONENTS 有权
标题翻译：投影曝光装置用于生产半导体元件的微电影
公开(公告)号：US20150015864A1
公开(公告)日：2015-01-15
申请号：US14499790
申请日：2014-09-29
申请人： Carl Zeiss SMT GmbH
发明人： Juergen Fischer , Armin Schoeppach , Matthias Orth , Norbert Muehlberger , Thorsten Rassel , Armin Werber , Juergen Huber
IPC分类号： G03F7/20
CPC分类号： G03F7/7015 , G03F7/70266 , G03F7/70825 , G03F7/70883 , G03F7/709 , G03F7/70991
摘要： A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus.
摘要翻译：用于生产半导体部件的用于微光刻的投影曝光装置包括至少一个光学组件，其具有可以以机械控制的方式被致动的至少一个光学元件安装在结构中。为了执行机械致动，至少在投影曝光设备的特定操作状态期间，提供控制信号传输装置和/或能量传输装置，其将光学组件中没有寄生机械效应引入到光学组件中。

6. 发明申请

US20130314681A1 ARRANGEMENT FOR MOUNTING AN OPTICAL ELEMENT 有权
标题翻译：安装光学元件的安排
公开(公告)号：US20130314681A1
公开(公告)日：2013-11-28
申请号：US13903563
申请日：2013-05-28
申请人： Carl Zeiss SMT GmbH
发明人： Michael Erath , Florian Bach , Ulrich Schoenhoff , Rodolfo Rabe , Norbert Muehlberger , Dirk Eicher , Jasper Wesselingh
IPC分类号： G03F7/20 , G02B5/08 , G02B3/00
CPC分类号： G02B7/1828 , G02B3/00 , G02B5/08 , G02B7/023 , G03F7/70141 , G03F7/708 , G03F7/70825
摘要： The invention relates to an arrangement for mounting an optical element, in particular in an EUV projection exposure apparatus, comprising a weight force compensation device (103) for exerting a compensation force on the optical element (101), wherein said compensation force at least partly compensates for the weight force acting on the optical element (101), wherein the weight force compensation device (103) has a passive magnetic circuit for generating a force component of the compensation force acting on the optical element (101), and wherein at least one adjustment element (880) is provided by means of which the force component generated by the passive magnetic circuit is continuously adjustable.
摘要翻译：本发明涉及一种用于安装光学元件的装置，特别是在EUV投影曝光装置中，包括用于对光学元件（101）施加补偿力的重力补偿装置（103），其中所述补偿力至少部分地补偿作用在光学元件（101）上的重量，其中重力补偿装置（103）具有用于产生作用在光学元件（101）上的补偿力的力分量的无源磁路，并且其中至少提供一个调节元件（880），通过该调节元件，被动磁路产生的力分量可连续调节。

7. 发明申请

US20160313646A1 FACET MIRROR FOR USE IN A PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY 有权
标题翻译：用于微型计算机投影曝光装置的FACET MIRROR
公开(公告)号：US20160313646A1
公开(公告)日：2016-10-27
申请号：US15202104
申请日：2016-07-05
申请人： Carl Zeiss SMT GmbH
发明人： Udo Dinger , Martin Endres , Armin Werber , Norbert Muehlberger , Florian Bach
IPC分类号： G03F7/20 , G02B27/09 , G02B5/09 , G02B26/08
CPC分类号： G03F7/702 , G02B5/09 , G02B26/06 , G02B26/0816 , G02B26/0833 , G02B27/0927 , G03F7/70075 , G03F7/70116
摘要： A facet mirror is to be used as a bundle-guiding optical component in a projection exposure apparatus for microlithography. The facet mirror has a plurality of separate mirrors. For individual deflection of incident illumination light, the separate mirrors are in each case connected to an actuator in such a way that they are separately tiltable about at least one tilt axis. A control device, which is connected to the actuators, is configured in such a way that a given grouping of the separate mirrors can be grouped into separate mirror groups that include in each case at least two separate mirrors. The result is a facet mirror which, when installed in the projection exposure apparatus, increases the variability for setting various illumination geometries of an object field to be illuminated by the projection exposure apparatus. Various embodiments of separate mirrors for forming the facet mirrors are described.
摘要翻译：在用于微光刻的投影曝光装置中，将使用小平面镜作为束引导光学部件。小平面镜具有多个独立的反射镜。对于入射照明光的单独偏转，分离的反射镜在每种情况下都以致动器的方式连接，使得它们可以围绕至少一个倾斜轴线单独倾斜。连接到致动器的控制装置被配置成使得可以将分离的反射镜的给定分组分组成分离的反射镜组，每个反射镜组在每种情况下包括至少两个分离的反射镜。其结果是，当安装在投影曝光装置中时，增加了用于设置由投影曝光装置照亮的对象场的各种照明几何形状的可变性的刻面镜。描述了用于形成小平面反射镜的分立反射镜的各种实施例。

8. 发明申请

US20150009557A1 GRAVITATION COMPENSATION FOR OPTICAL ELEMENTS IN PROJECTION EXPOSURE APPARATUSES 有权
标题翻译：投影曝光装置中的光学元件的渲染补偿
公开(公告)号：US20150009557A1
公开(公告)日：2015-01-08
申请号：US14484696
申请日：2014-09-12
申请人： Carl Zeiss SMT GmbH
发明人： Norbert Muehlberger , Thorsten Rassel , Armin Schoeppach , Juergen Fischer , Matthias Orth
IPC分类号： G02B7/00 , G02B13/14 , G02B13/16
CPC分类号： G02B7/001 , G02B13/143 , G02B13/16 , G03F7/70825
摘要： A gravitation compensator for mounting optical elements in a projection exposure apparatus and a corresponding projection exposure apparatus are disclosed. The gravitation compensator at least partly compensates for the weight force of a mounted optical element and simultaneously enables a change in the position of the optical element without the compensated weight force being altered in an impermissible manner during the change in position. This applies, in particular, to high weight forces which are to be compensated. Furthermore, the gravitation compensator enables use in different atmospheres and the compensation of corresponding aging effects.
摘要翻译：公开了一种用于在投影曝光设备和相应的投影曝光设备中安装光学元件的引力补偿器。重力补偿器至少部分地补偿安装的光学元件的重量，并且同时能够改变光学元件的位置，而不会在位置改变期间以不允许的方式改变补偿的重量。这尤其适用于要补偿的高重量力。此外，引力补偿器可以在不同的环境中使用，并补偿相应的老化效应。

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