专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US09123832B2 Fabricating method of nano structure for antireflection and fabricating method of photo device integrated with antireflection nano structure 有权
标题翻译：抗反射纳米结构的制造方法和抗反射纳米结构的光器件制造方法
公开(公告)号：US09123832B2
公开(公告)日：2015-09-01
申请号：US13702172
申请日：2010-11-30
申请人： Chan Il Yeo , Yong Tak Lee , Young Min Song
发明人： Chan Il Yeo , Yong Tak Lee , Young Min Song
IPC分类号： H01L21/00 , H01L33/00 , B81C1/00 , H01L33/22
CPC分类号： H01L33/005 , B81C1/00031 , H01L33/22
摘要： A method of fabricating nanostructure for antireflection and a method of fabricating a photo device integrated with the nanostructure for antireflection are provided. The fabrication of the nanostructure for antireflection includes coating a solution containing a combination of metal ions with organic or inorganic ions on a substrate, sintering the coated solution using an annealing process to grow nanoscale metal particles, and chemically etching the substrate using the metal particles as mask or accelerator to form a subwavelength nanostructure on the surface of the substrate, thereby manufacturing the nanostructure for antireflection without an apparatus requiring a vacuum state using a simple method for a short amount of time to minimize reflection of light at an interface between a semiconductor material and the air, and producing a photo device having good luminous efficiency and performance at low cost in large quantities by applying it to the photo device.
摘要翻译：提供一种制造用于抗反射的纳米结构的方法，以及制造与纳米结构集成的光反射装置的方法。用于抗反射的纳米结构的制造包括将包含金属离子与有机或无机离子的组合的溶液涂布在基板上，使用退火工艺烧结涂覆的溶液以生长纳米级金属颗粒，以及使用金属颗粒化学蚀刻基板作为掩模或加速剂以在衬底的表面上形成亚波长纳米结构，由此制造用于抗反射的纳米结构，而无需使用简单方法在短时间内需要真空状态的装置，以使半导体材料之间的界面处的光的反射最小化和空气，并且通过将其应用于照相装置，以大量的方式生产具有良好的发光效率和性能的照相装置。

2. 发明申请

US20130078750A1 FABRICATING METHOD OF NANO STRUCTURE FOR ANTIREFLECTION AND FABRICATING METHOD OF PHOTO DEVICE INTEGRATED WITH ANTIREFLECTION NANO STRUCTURE 有权
标题翻译：纳米结构抗逆选择和制造方法的制备方法与抗反射纳米结构集成的照相装置
公开(公告)号：US20130078750A1
公开(公告)日：2013-03-28
申请号：US13702172
申请日：2010-11-30
申请人： Chan Il Yeo , Yong Tak Lee , Young Min Song
发明人： Chan Il Yeo , Yong Tak Lee , Young Min Song
IPC分类号： H01L33/00
CPC分类号： H01L33/005 , B81C1/00031 , H01L33/22
摘要： A method of fabricating nanostructure for antireflection and a method of fabricating a photo device integrated with the nanostructure for antireflection are provided. The fabrication of the nanostructure for antireflection includes coating a solution containing a combination of metal ions with organic or inorganic ions on a substrate, sintering the coated solution using an annealing process to grow nanoscale metal particles, and chemically etching the substrate using the metal particles as mask or accelerator to form a subwavelength nanostructure on the surface of the substrate, thereby manufacturing the nanostructure for antireflection without an apparatus requiring a vacuum state using a simple method for a short amount of time to minimize reflection of light at an interface between a semiconductor material and the air, and producing a photo device having good luminous efficiency and performance at low cost in large quantities by applying it to the photo device.
摘要翻译：提供一种制造用于抗反射的纳米结构的方法，以及制造与纳米结构集成的光反射装置的方法。用于抗反射的纳米结构的制造包括将包含金属离子与有机或无机离子的组合的溶液涂布在基板上，使用退火工艺烧结涂覆的溶液以生长纳米级金属颗粒，以及使用金属颗粒化学蚀刻基板作为掩模或加速剂以在衬底的表面上形成亚波长纳米结构，由此制造用于抗反射的纳米结构，而无需使用简单方法在短时间内需要真空状态的装置，以使半导体材料之间的界面处的光的反射最小化和空气，并且通过将其应用于照相装置，以大量的方式生产具有良好的发光效率和性能的照相装置。

3. 发明申请

US20110092007A1 Method of Fabricating Antireflective Grating Pattern and Method of Fabricating Optical Device Integrated with Antireflective Grating Pattern 有权
标题翻译：制造防反射光栅图案的方法和与抗反射光栅图案集成的光学器件的制造方法
公开(公告)号：US20110092007A1
公开(公告)日：2011-04-21
申请号：US12999148
申请日：2009-12-22
申请人： Yong Tak Lee , Young Min Song
发明人： Yong Tak Lee , Young Min Song
IPC分类号： H01L33/44 , G03F7/00
CPC分类号： G02B5/1857 , G03F7/0005
摘要： A method of fabricating an antireflective grating pattern and a method of fabricating an optical device integrated with an antireflective grating pattern are provided. The method of fabricating the antireflective grating pattern includes forming a photoresist (PR) pattern on a substrate using a hologram lithography process, forming a PR lens pattern having a predetermined radius of curvature by reflowing the PR pattern, and etching the entire surface of the substrate including the PR lens pattern to form a wedge-type or parabola-type antireflective subwavelength grating (SWG) pattern having a pointed tip on a top surface of the substrate. In this method, a fabrication process is simplified, the reflection of light caused by a difference in refractive index between the air and a semiconductor material can be minimized, and the antireflective grating pattern can be easily applied to optical devices.
摘要翻译：提供了制造抗反射光栅图案的方法和制造与抗反射光栅图案集成的光学器件的方法。制造抗反射光栅图案的方法包括使用全息光刻工艺在基板上形成光致抗蚀剂（PR）图案，通过回流PR图案形成具有预定曲率半径的PR透镜图案，并蚀刻基板的整个表面包括PR透镜图案以形成在基板的顶表面上具有尖尖的楔形或抛物线型抗反射亚波长光栅（SWG）图案。在该方法中，简化了制造工艺，可以将由空气和半导体材料之间的折射率差引起的光的反射最小化，并且可以将抗反射光栅图案容易地应用于光学器件。

4. 发明申请

US20130128362A1 MICRO/NANO COMBINED STRUCTURE, MANUFACTURING METHOD OF MICRO/NANO COMBINED STRUCTURE, AND MANUFACTURING METHOD OF AN OPTICAL DEVICE HAVING A MICRO/NANO COMBINED STRUCTURE INTEGRATED THEREWITH 审中-公开
标题翻译： MICRO / NANO组合结构，MICRO / NANO组合结构的制造方法和具有集成的微/纳米组合结构的光学器件的制造方法
公开(公告)号：US20130128362A1
公开(公告)日：2013-05-23
申请号：US13813063
申请日：2011-07-29
申请人： Young Min Song , Yong Tak Lee
发明人： Young Min Song , Yong Tak Lee
IPC分类号： G02B1/11 , H01L21/302 , H01L33/44
CPC分类号： G02B1/11 , B82Y20/00 , G02B1/118 , H01L21/302 , H01L33/44
摘要： A micro/nano combined structure, a manufacturing method of a micro/nano combined structure, and a manufacturing method of an optical device having a micro/nano combined structure integrated therewith, the method comprising: forming a micro structure on a substrate; depositing a metal thin film on the substrate on which the micro structure is formed; heat treating and transforming the metal thin film into metal particles; and using the metal particles as a mask to form a non-reflective nanostructure having a frequency below that of light wavelengths and a sharp wedge-shaped end, on the top surface of the substrate on which the micro structure is formed, and etching the front surface of the substrate on which the micro structure is formed. The manufacturing process is simple, light reflectivity that occurs wherein a difference in refractive indices of air and semiconductor material can be minimized, and is easily applied to the optical device field.
摘要翻译：微/纳组合结构，微/纳组合结构的制造方法和与其结合的微/纳组合结构的光学器件的制造方法，所述方法包括：在衬底上形成微结构; 在其上形成有微结构的基板上沉积金属薄膜; 将金属薄膜热处理和转化为金属颗粒; 并且在其上形成微结构的基板的顶表面上使用金属颗粒作为掩模以形成具有低于光波长和尖锐楔形端的频率的非反射纳米结构，并且蚀刻前面其上形成有微结构的基板的表面。制造工艺简单，发生光反射率，其中空气和半导体材料的折射率差可以最小化，并且容易应用于光学器件领域。

5. 发明授权

US08647903B2 Method of fabricating antireflective grating pattern and method of fabricating optical device integrated with antireflective grating pattern 有权
标题翻译：制造抗反射光栅图案的方法和制造与抗反射光栅图案集成的光学装置的方法
公开(公告)号：US08647903B2
公开(公告)日：2014-02-11
申请号：US12999148
申请日：2009-12-22
申请人： Yong Tak Lee , Young Min Song
发明人： Yong Tak Lee , Young Min Song
IPC分类号： H01L21/00
CPC分类号： G02B5/1857 , G03F7/0005
摘要： A method of fabricating an antireflective grating pattern and a method of fabricating an optical device integrated with an antireflective grating pattern are provided. The method of fabricating the antireflective grating pattern includes forming a photoresist (PR) pattern on a substrate using a hologram lithography process, forming a PR lens pattern having a predetermined radius of curvature by reflowing the PR pattern, and etching the entire surface of the substrate including the PR lens pattern to form a wedge-type or parabola-type antireflective subwavelength grating (SWG) pattern having a pointed tip on a top surface of the substrate. In this method, a fabrication process is simplified, the reflection of light caused by a difference in refractive index between the air and a semiconductor material can be minimized, and the antireflective grating pattern can be easily applied to optical devices.
摘要翻译：提供了制造抗反射光栅图案的方法和制造与抗反射光栅图案集成的光学器件的方法。制造抗反射光栅图案的方法包括使用全息光刻工艺在基板上形成光致抗蚀剂（PR）图案，通过回流PR图案形成具有预定曲率半径的PR透镜图案，并蚀刻基板的整个表面包括PR透镜图案以形成在基板的顶表面上具有尖尖的楔形或抛物线型抗反射亚波长光栅（SWG）图案。在该方法中，简化了制造工艺，可以将由空气和半导体材料之间的折射率差引起的光的反射最小化，并且可以将抗反射光栅图案容易地应用于光学器件。

6. 发明申请

US20130087194A1 SILICON MULTILAYER ANTI-REFLECTIVE FILM WITH GRADUALLY VARYING REFRACTIVE INDEX AND MANUFACTURING METHOD THEREFOR, AND SOLAR CELL HAVING SAME AND MANUFACTURING METHOD THEREFOR 审中-公开
标题翻译：具有等级变化指标的硅多层抗反射膜及其制造方法及其制造方法及其制造方法
公开(公告)号：US20130087194A1
公开(公告)日：2013-04-11
申请号：US13703702
申请日：2011-07-29
申请人： Sung Jun Jang , Yong Tak Lee , Young Min Song
发明人： Sung Jun Jang , Yong Tak Lee , Young Min Song
IPC分类号： G02B1/11 , H01L31/028 , H01L31/18 , H01L31/032 , H01L31/0272 , H01L31/0296 , H01L31/0216 , H01L31/0368
CPC分类号： G02B1/11 , G02B1/115 , H01L31/0216 , H01L31/02168 , H01L31/0272 , H01L31/0284 , H01L31/0296 , H01L31/0322 , H01L31/03685 , H01L31/075 , H01L31/18 , Y02E10/548
摘要： The present invention relates to a silicon multilayer anti-reflective film with a gradually varying refractive index and a manufacturing method therefor, and a solar cell having the same and a manufacturing method therefor, wherein: the refractive index of a silicon thin film is adjusted by depositing silicon on a semiconductor or glass substrate with a slight tilt; and an anti-reflective film with a gradually varying refractive index is implemented using a silicon multi-layer film in which multi-layer film are stacked with different tilt angles. In addition, the silicon multilayer anti-reflective film according to the present invention is applied to a silicon solar cell, thereby suppressing reflection in the inside of the solar cell and providing an excellent heat radiation characteristic using a high heat transfer coefficient.
摘要翻译：本发明涉及一种具有逐渐变化的折射率的硅多层抗反射膜及其制造方法及其制造方法及其制造方法，其特征在于：将硅薄膜的折射率调整为在半导体或玻璃基板上以轻微的倾斜沉积硅; 并且使用其中多层膜以不同的倾斜角度层叠的硅多层膜来实现具有逐渐变化的折射率的抗反射膜。此外，将本发明的硅多层抗反射膜应用于硅太阳能电池，由此抑制太阳能电池内部的反射，并且使用高的传热系数提供优异的散热特性。

7. 发明申请

US20110176765A1 OPTICAL INTERCONNECTION APPARATUS AND METHOD 审中-公开
标题翻译：光学互连装置和方法
公开(公告)号：US20110176765A1
公开(公告)日：2011-07-21
申请号：US13121409
申请日：2009-09-29
申请人： Yong Tak Lee
发明人： Yong Tak Lee
IPC分类号： G02B6/12 , G02B6/36
CPC分类号： G02B6/4249 , G02B6/4202 , G02B6/423 , G02B6/4239 , Y10T29/49117
摘要： The present invention relates to the apparatus and method for optical interconnection. The present invention provides an optical interconnection structure comprising: a substrate on which double side perforated multi-hole through a predetermined region is formed; bottom hole which is etched and tapered for optical fiber array is bigger than upper hole which is etched for the optical devices. The present invention provides the optical interconnection structure that can facilitate the optical interconnection between the active optoelectronic devices that transmit/receive the optical signals and the optical fiber array, making it possible to align easily and acutely between the optical devices and optical fiber array.
摘要翻译：本发明涉及光互连的装置和方法。本发明提供一种光学互连结构，包括：基板，其上形成有穿过预定区域的双面穿孔多孔; 针对光纤阵列蚀刻和锥形的底孔大于蚀刻用于光学器件的上孔。本发明提供了可以促进发送/接收光信号的有源光电子器件与光纤阵列之间的光学互连的光学互连结构，使得可以在光学器件和光纤阵列之间容易且锐利地对准。

8. 发明申请

US20120120466A1 WAVELENGTH-TUNABLE LASER SYSTEM 有权
标题翻译：波长管激光系统
公开(公告)号：US20120120466A1
公开(公告)日：2012-05-17
申请号：US13384735
申请日：2010-06-04
申请人： Yong Tak Lee , Feng Xiao , Kamal Alameh
发明人： Yong Tak Lee , Feng Xiao , Kamal Alameh
IPC分类号： G03H1/08
CPC分类号： H01S3/086 , G03H1/08 , H01S3/0675 , H01S3/06754 , H01S3/06766 , H01S3/08009 , H01S3/08059 , H01S3/2383
摘要： A wavelength-tunable laser system includes an optical fiber collimator array having at least two ports, an optical amplifier connected to one port of an optical fiber, an optical coupler for coupling light incident from the optical amplifier and transmitting the coupled light to another port, a diffraction grating plate for guiding each wavelength component of light incident from the optical fiber collimator array in a different direction, and an Opto-Very Large Scale Integration (Opto-VLSI) processor.
摘要翻译：波长可调激光系统包括具有至少两个端口的光纤准直器阵列，连接到光纤的一个端口的光学放大器，用于耦合从光学放大器入射的光并将耦合的光传输到另一个端口的光耦合器，衍射光栅板，用于引导从光纤准直器阵列入射的光在不同方向上的每个波长分量，以及光电超大规模集成（Opto-VLSI）处理器。

9. 发明申请

US20120082413A1 AN OPTICAL CONNECTION SYSTEM 审中-公开
标题翻译：光学连接系统
公开(公告)号：US20120082413A1
公开(公告)日：2012-04-05
申请号：US13147560
申请日：2010-02-04
申请人： Kamal Alameh , Yong Tak Lee
发明人： Kamal Alameh , Yong Tak Lee
IPC分类号： G02B6/43 , G02B6/42
CPC分类号： G02B6/43 , G02B6/4204 , G02B6/4249 , H01S5/02288 , H01S5/0262 , H01S5/18341 , H04B10/801
摘要： The present disclosure provides an optical connection system which comprises optical components that include a plurality of vertical cavity surface emitting lasers (VCSELs) for emitting modulated light in response to applied electrical signals and a plurality of receivers for receiving the emitted light. The optical components are arranged in at least two monolithically integrated modules each comprising at least two of the optical components. The optical connection system further comprises at least one light guiding component for guiding the light between the VCSELs and the receivers. The optical connection system also comprises coupling elements for coupling the at least one light guiding component to the monolithically integrated modules such that in use light is transmitted between modules via the at least one light guiding component.
摘要翻译：本公开提供了一种光学连接系统，其包括光学部件，其包括用于响应于所施加的电信号发射调制光的多个垂直腔表面发射激光器（VCSEL）和用于接收发射光的多个接收器。光学部件布置在至少两个单片集成模块中，每个模块包括至少两个光学部件。光学连接系统还包括用于在VCSEL和接收器之间引导光的至少一个导光部件。光学连接系统还包括用于将至少一个导光部件耦合到单片集成模块的耦合元件，使得在使用中，光通过至少一个导光部件在模块之间传输。

10. 发明授权

US08760754B2 Wavelength-tunable laser system 有权
标题翻译：波长可调激光系统
公开(公告)号：US08760754B2
公开(公告)日：2014-06-24
申请号：US13384735
申请日：2010-06-04
申请人： Yong Tak Lee , Feng Xiao , Kamal Alameh
发明人： Yong Tak Lee , Feng Xiao , Kamal Alameh
IPC分类号： H01S3/086 , H01S3/067 , H01S3/08
CPC分类号： H01S3/086 , G03H1/08 , H01S3/0675 , H01S3/06754 , H01S3/06766 , H01S3/08009 , H01S3/08059 , H01S3/2383
摘要： A wavelength-tunable laser system includes an optical fiber collimator array having at least two ports, an optical amplifier connected to one port of an optical fiber, an optical coupler for coupling light incident from the optical amplifier and transmitting the coupled light to another port, a diffraction grating plate for guiding each wavelength component of light incident from the optical fiber collimator array in a different direction, and an Opto-Very Large Scale Integration (Opto-VLSI) processor.
摘要翻译：波长可调激光系统包括具有至少两个端口的光纤准直器阵列，连接到光纤的一个端口的光学放大器，用于耦合从光学放大器入射的光并将耦合的光传输到另一个端口的光耦合器，衍射光栅板，用于引导从光纤准直器阵列入射的光在不同方向上的每个波长分量，以及光电超大规模集成（Opto-VLSI）处理器。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式