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1. 发明申请

US20080253035A1 Self-aligned full side shield PMR and method to make it 有权
标题翻译：自对准全侧盾PMR及其制作方法
公开(公告)号：US20080253035A1
公开(公告)日：2008-10-16
申请号：US11728910
申请日：2007-03-27
申请人： Cherng-Chyi Han , Min Li , Fenglin Liu , Chen-Jung Chien
发明人： Cherng-Chyi Han , Min Li , Fenglin Liu , Chen-Jung Chien
IPC分类号： G11B5/33 , B44C1/22
CPC分类号： G11B5/1278 , G11B5/112 , G11B5/3146 , G11B5/315 , G11B5/3163 , G11B5/3169 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T428/1193
摘要： A process for forming the write pole of a PMR head is described. This write pole is symmetrically located relative to its side shields, This is accomplished, not through optical alignment, but by coating the pole with a uniform layer of non-magnetic material of a predetermined and precise thickness, followed by the formation of the shield layer around this.
摘要翻译：描述了用于形成PMR头的写入极的过程。该写入极相对于其侧屏对称地定位，这不是通过光学对准而是通过用预定和精确厚度的均匀的非磁性材料层涂覆极，然后形成屏蔽层围绕这一点。

2. 发明授权

US07979978B2 Method for manufacturing a self-aligned full side shield PMR 有权
标题翻译：制造自对准全侧护罩PMR的方法
公开(公告)号：US07979978B2
公开(公告)日：2011-07-19
申请号：US11728910
申请日：2007-03-27
申请人： Cherng-Chyi Han , Min Li , Fenglin Liu , Chen-Jung Chien
发明人： Cherng-Chyi Han , Min Li , Fenglin Liu , Chen-Jung Chien
IPC分类号： G11B5/187
CPC分类号： G11B5/1278 , G11B5/112 , G11B5/3146 , G11B5/315 , G11B5/3163 , G11B5/3169 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T428/1193
摘要： A process for forming the write pole of a PMR head is described. This write pole is symmetrically located relative to its side shields, This is accomplished, not through optical alignment, but by coating the pole with a uniform layer of non-magnetic material of a predetermined and precise thickness, followed by the formation of the shield layer around this.
摘要翻译：描述了用于形成PMR头的写入极的过程。该写入极相对于其侧屏对称地定位，这不是通过光学对准而是通过用预定和精确厚度的均匀的非磁性材料层涂覆极，然后形成屏蔽层围绕这一点。

3. 发明授权

US08472138B2 Self-aligned full side shield PMR and method to make it 有权
标题翻译：自对准全侧盾PMR及其制作方法
公开(公告)号：US08472138B2
公开(公告)日：2013-06-25
申请号：US13135357
申请日：2011-07-01
申请人： Cherng-Chyi Han , Min Li , Fenglin Liu , Chen-Jung Chien
发明人： Cherng-Chyi Han , Min Li , Fenglin Liu , Chen-Jung Chien
IPC分类号： G11B5/127
CPC分类号： G11B5/1278 , G11B5/112 , G11B5/3146 , G11B5/315 , G11B5/3163 , G11B5/3169 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T428/1193
摘要： A magnetic pole suitable for perpendicular magnetic recording is described. This write pole is symmetrically located relative to its side shields and has at least three additional surfaces that are disposed to lie in planes that are normal to the substrate's top surface.
摘要翻译：描述适用于垂直磁记录的磁极。该写入极相对于其侧屏对称地定位，并且具有至少三个额外的表面，其被设置为位于与基板顶表面垂直的平面中。

4. 发明申请

US20110262775A1 Self-aligned full side shield PMR and method to make it 有权
标题翻译：自对准全侧盾PMR及其制作方法
公开(公告)号：US20110262775A1
公开(公告)日：2011-10-27
申请号：US13135357
申请日：2011-07-01
申请人： Cherng-Chyi Han , Min Li , Fenglin Liu , Chen-Jung Chien
发明人： Cherng-Chyi Han , Min Li , Fenglin Liu , Chen-Jung Chien
IPC分类号： G11B5/33
CPC分类号： G11B5/1278 , G11B5/112 , G11B5/3146 , G11B5/315 , G11B5/3163 , G11B5/3169 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T428/1193
摘要： A magnetic pole suitable for perpendicular magnetic recording is described. This write pole is symmetrically located relative to its side shields and has at least three additional surfaces that are disposed to lie in planes that are normal to the substrate's top surface.
摘要翻译：描述适用于垂直磁记录的磁极。该写入极相对于其侧屏对称地定位，并且具有至少三个额外的表面，其被设置为位于与基板顶表面垂直的平面中。

5. 发明授权

US08189295B2 Perpendicular magnetic recording head with a bottom side shield 有权
标题翻译：垂直磁记录头带底侧屏蔽
公开(公告)号：US08189295B2
公开(公告)日：2012-05-29
申请号：US13135276
申请日：2011-06-30
申请人： Cherng-Chyi Han , Min Li , Fenglin Liu , Lijie Guan
发明人： Cherng-Chyi Han , Min Li , Fenglin Liu , Lijie Guan
IPC分类号： G11B5/127
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3116 , G11B5/315 , Y10T29/49032 , Y10T29/49052
摘要： A perpendicular magnetic recording (PMR) head has a pole tip shielded laterally by a separated pair of bottom side shields and shielded from above by an upper shield. The bottom side shields surround a lower portion of the pole tip while the upper portion of the pole tip is surrounded by non-magnetic layers. The bottom shields and the non-magnetic layer form a wedge-shaped trench in which the pole tip has been formed by a self-aligned plating process. A write gap layer and an upper shield is formed above the side shields and pole. The resulting structure substantially eliminates track overwrite while maintaining good track definition.
摘要翻译：垂直磁记录（PMR）头具有通过分离的一对底侧屏蔽横向屏蔽的极尖，并由上屏蔽从上方屏蔽。底侧屏蔽围绕极尖的下部，而极尖的上部被非磁性层包围。底部屏蔽层和非磁性层形成楔形沟槽，其中极尖已经通过自对准电镀工艺形成。写入间隙层和上屏蔽形成在侧屏蔽和极上。所得到的结构基本上消除了轨道重写，同时保持良好的轨道定义。

6. 发明申请

US20110261486A1 Perpendicular magnetic recording head with a bottom side shield 有权
标题翻译：垂直磁记录头带底侧屏蔽
公开(公告)号：US20110261486A1
公开(公告)日：2011-10-27
申请号：US13135276
申请日：2011-06-30
申请人： Cherng-Chyi Han , Min Li , Fenglin Liu , Lijie Guan
发明人： Cherng-Chyi Han , Min Li , Fenglin Liu , Lijie Guan
IPC分类号： G11B5/187
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3116 , G11B5/315 , Y10T29/49032 , Y10T29/49052
摘要： A perpendicular magnetic recording (PMR) head has a pole tip shielded laterally by a separated pair of bottom side shields and shielded from above by an upper shield. The bottom side shields surround a lower portion of the pole tip while the upper portion of the pole tip is surrounded by non-magnetic layers. The bottom shields and the non-magnetic layer form a wedge-shaped trench in which the pole tip has been formed by a self-aligned plating process. A write gap layer and an upper shield is formed above the side shields and pole. The resulting structure substantially eliminates track overwrite while maintaining good track definition.
摘要翻译：垂直磁记录（PMR）头具有由分离的一对底侧屏蔽物侧向屏蔽的极尖，并由上屏蔽从上方屏蔽。底侧屏蔽围绕极尖的下部，而极尖的上部被非磁性层包围。底部屏蔽层和非磁性层形成楔形沟槽，其中极尖已经通过自对准电镀工艺形成。写入间隙层和上屏蔽形成在侧屏蔽和极上。所得到的结构基本上消除了轨道重写，同时保持良好的轨道定义。

7. 发明授权

US07978431B2 Method to make a perpendicular magnetic recording head with a bottom side shield 有权
标题翻译：制造具有底侧屏蔽的垂直磁记录头的方法
公开(公告)号：US07978431B2
公开(公告)日：2011-07-12
申请号：US11809346
申请日：2007-05-31
申请人： Cherng-Chyi Han , Min Li , Fenglin Liu , Lijie Guan
发明人： Cherng-Chyi Han , Min Li , Fenglin Liu , Lijie Guan
IPC分类号： G11B5/127
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3116 , G11B5/315 , Y10T29/49032 , Y10T29/49052
摘要： A perpendicular magnetic recording (PMR) head is fabricated with a pole tip shielded laterally by a separated pair of bottom side shields and shielded from above by an upper shield. The bottom side shields surround a lower portion of the pole tip while the upper portion of the pole tip is surrounded by non-magnetic layers. The bottom shields and the non-magnetic layer form wedge-shaped trench in which the pole tip is formed by a self-aligned plating process. The wedge shape is formed by a RIE process using specific gases applied through a masking layer formed of material that has a slower etch rate than the non-magnetic material or the shield material. A masking layer of Ta, Ru/Ta, TaN or Ti, formed on a non-magnetic layer of alumina that is formed on a shield layer of NiFe and using RIE gases of CH3OH, CO or NH3 or their combinations, produces the desired result. A write gap layer and an upper shield is then formed above the side shields and pole. The resulting structure substantially eliminates track overwrite while maintaining good track definition.
摘要翻译：垂直磁记录（PMR）头被制造成具有通过分离的一对底侧屏蔽横向屏蔽的极尖，并由上屏蔽从上面屏蔽。底侧屏蔽围绕极尖的下部，而极尖的上部被非磁性层包围。底部屏蔽层和非磁性层形成楔形沟槽，其中极尖通过自对准电镀工艺形成。楔形形状通过RIE工艺形成，其使用通过由比非磁性材料或屏蔽材料具有较慢蚀刻速率的材料形成的掩模层施加的特定气体。形成在NiFe的屏蔽层上并使用CH 3 OH，CO或NH 3的RIE气体或其组合的形成在氧化铝的非磁性层上的Ta，Ru / Ta，TaN或Ti的掩蔽层产生期望的结果。然后在侧屏和极上方形成写间隙层和上屏蔽。所得到的结构基本上消除了轨道重写，同时保持良好的轨道定义。

8. 发明申请

US20070177301A1 Method to make a perpendicular magnetic recording head with a side write shield 有权
标题翻译：制作具有侧面写入屏蔽层的垂直磁记录头的方法
公开(公告)号：US20070177301A1
公开(公告)日：2007-08-02
申请号：US11345892
申请日：2006-02-02
申请人： Cherng-Chyi Han , Min Li , Fenglin Liu , Jiun-Ting Lee
发明人： Cherng-Chyi Han , Min Li , Fenglin Liu , Jiun-Ting Lee
IPC分类号： G11B5/147
CPC分类号： G11B5/3163 , G11B5/11 , G11B5/1278 , G11B5/3116 , G11B5/3146 , G11B5/315 , Y10T29/49032 , Y10T29/49039 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A perpendicular magnetic recording (PMR) head is fabricated with a pole tip shielded laterally by a separated pair of side shields and shielded from above by an upper shield. The side shields are formed by a RIE process using specific gases applied to a shield layer through a masking layer formed of material that has a slower etch rate than the shield material. A masking layer of Ta, Ru/Ta, TaN or Ti, formed on a shield layer of NiFe and using RIE gases of CH3OH, CO or NH3 or their combinations, produces the desired result. The differential in etch rates maintains the opening dimension within the mask and allows the formation of a wedge-shaped trench within the shield layer that separates the layer into two shields. The pole tip is then plated within the trench and, being aligned by the trench, acquires the wedge-shaped cross-section of the trench. An upper shield is then formed above the side shields and pole.
摘要翻译：垂直磁记录（PMR）头被制造成具有通过分离的一对侧屏蔽横向屏蔽的极尖并且被上屏蔽从上面屏蔽。侧面屏蔽是通过RIE工艺形成的，其使用通过掩模层施加到屏蔽层上的特定气体，该屏蔽层由具有比屏蔽材料更慢的蚀刻速率的材料形成。在NiFe的屏蔽层上形成的Ta，Ru / Ta，TaN或Ti的掩蔽层，并使用CH 3 3 OH，CO或NH 3的RIE气体或它们的组合，产生所需的结果。蚀刻速率的差异保持了掩模内的开口尺寸，并且允许在屏蔽层内形成将该层分成两个屏蔽层的楔形沟槽。然后将磁极尖端电镀在沟槽内，并且通过沟槽对准，获得沟槽的楔形横截面。然后在侧屏和极上方形成上屏蔽。

9. 发明申请

US20110146060A1 Method to make a perpendicular magnetic recording head with a side write shield 有权
标题翻译：制作具有侧面写入屏蔽层的垂直磁记录头的方法
公开(公告)号：US20110146060A1
公开(公告)日：2011-06-23
申请号：US12932552
申请日：2011-02-28
申请人： Cherng-Chyi Han , Min Li , Fenglin Liu , Jiun-Ting Lee
发明人： Cherng-Chyi Han , Min Li , Fenglin Liu , Jiun-Ting Lee
IPC分类号： G11B5/127
CPC分类号： G11B5/3163 , G11B5/11 , G11B5/1278 , G11B5/3116 , G11B5/3146 , G11B5/315 , Y10T29/49032 , Y10T29/49039 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A perpendicular magnetic recording (PMR) head is fabricated with a pole tip shielded laterally by a separated pair of side shields and shielded from above by an upper shield. The side shields are formed by a RIE process using specific gases applied to a shield layer through a masking layer formed of material that has a slower etch rate than the shield material. A masking layer of Ta, Ru/Ta, TaN or Ti, formed on a shield layer of NiFe and using RIE gases of CH3OH, CO or NH3 or their combinations, produces the desired result. The differential in etch rates maintains the opening dimension within the mask and allows the formation of a wedge-shaped trench within the shield layer that separates the layer into two shields. The pole tip is then plated within the trench and, being aligned by the trench, acquires the wedge-shaped cross-section of the trench. An upper shield is then formed above the side shields and pole.
摘要翻译：垂直磁记录（PMR）头被制造成具有通过分离的一对侧屏蔽横向屏蔽的极尖并且被上屏蔽从上面屏蔽。侧面屏蔽是通过RIE工艺形成的，其使用通过掩模层施加到屏蔽层上的特定气体，该屏蔽层由具有比屏蔽材料更慢的蚀刻速率的材料形成。形成在NiFe的屏蔽层上并使用CH 3 OH，CO或NH 3的RIE气体或其组合的Ta，Ru / Ta，TaN或Ti的掩蔽层产生期望的结果。蚀刻速率的差异保持了掩模内的开口尺寸，并且允许在屏蔽层内形成将该层分成两个屏蔽层的楔形沟槽。然后将磁极尖端电镀在沟槽内，并且通过沟槽对准，获得沟槽的楔形横截面。然后在侧屏和极上方形成上屏蔽。

10. 发明授权

US07898773B2 Perpendicular magnetic recording head with a side write shield 有权
标题翻译：垂直磁记录头带有侧写屏蔽
公开(公告)号：US07898773B2
公开(公告)日：2011-03-01
申请号：US11345892
申请日：2006-02-02
申请人： Cherng-Chyi Han , Min Li , Fenglin Liu , Jiun-Ting Lee
发明人： Cherng-Chyi Han , Min Li , Fenglin Liu , Jiun-Ting Lee
IPC分类号： G11B5/127
CPC分类号： G11B5/3163 , G11B5/11 , G11B5/1278 , G11B5/3116 , G11B5/3146 , G11B5/315 , Y10T29/49032 , Y10T29/49039 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A perpendicular magnetic recording (PMR) head is fabricated with a pole tip shielded laterally by a separated pair of side shields and shielded from above by an upper shield. The side shields are formed by a RIE process using specific gases applied to a shield layer through a masking layer formed of material that has a slower etch rate than the shield material. A masking layer of Ta, Ru/Ta, TaN or Ti, formed on a shield layer of NiFe and using RIE gases of CH3OH, CO or NH3 or their combinations, produces the desired result. The differential in etch rates maintains the opening dimension within the mask and allows the formation of a wedge-shaped trench within the shield layer that separates the layer into two shields. The pole tip is then plated within the trench and, being aligned by the trench, acquires the wedge-shaped cross-section of the trench. An upper shield is then formed above the side shields and pole.
摘要翻译：垂直磁记录（PMR）头被制造成具有通过分离的一对侧屏蔽横向屏蔽的极尖并且被上屏蔽从上面屏蔽。侧面屏蔽是通过RIE工艺形成的，其使用通过掩模层施加到屏蔽层上的特定气体，该屏蔽层由具有比屏蔽材料更慢的蚀刻速率的材料形成。形成在NiFe的屏蔽层上并使用CH 3 OH，CO或NH 3的RIE气体或其组合的Ta，Ru / Ta，TaN或Ti的掩蔽层产生期望的结果。蚀刻速率的差异保持了掩模内的开口尺寸，并且允许在屏蔽层内形成将该层分成两个屏蔽层的楔形沟槽。然后将磁极尖端电镀在沟槽内，并且通过沟槽对准，获得沟槽的楔形横截面。然后在侧屏和极上方形成上屏蔽。

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