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1. 发明授权

US08524095B2 Process to make PMR writer with leading edge shield (LES) and leading edge taper (LET) 失效
公开(公告)号：US08524095B2
公开(公告)日：2013-09-03
申请号：US12954485
申请日：2010-11-24
申请人： Liubo Hong , Fenglin Liu , Qiping Zhong , Honglin Zhu
发明人： Liubo Hong , Fenglin Liu , Qiping Zhong , Honglin Zhu
IPC分类号： B44C1/22
CPC分类号： G11B5/315 , G11B5/1278 , G11B5/3116 , G11B5/3146 , G11B5/3163
摘要： Methods for fabrication of leading edge shields and tapered magnetic poles with a tapered leading edge are provided. The leading edge shield may be formed by utilizing a CMP stop layer. The CMP stop layer may aid in preventing over polishing of the magnetic material. For the tapered magnetic poles with a tapered leading edge, a magnetic material is deposited on a planarized surface, a patterned resist material is formed, and exposed magnetic material is etched to form at least one tapered surface of the magnetic material.

2. 发明授权

US08201320B2 Method for manufacturing a magnetic write head having a wrap around shield that is magnetically coupled with a leading magnetic shield 有权
标题翻译：一种用于制造具有与领先磁屏蔽磁耦合的围绕屏蔽的磁性写入头的方法
公开(公告)号：US08201320B2
公开(公告)日：2012-06-19
申请号：US12641242
申请日：2009-12-17
申请人： Donald G. Allen , Yingjian Chen , Andrew Chiu , Liubo Hong , Wen-Chien D. Hsiao , Edward H. P. Lee , Fenglin Liu , Katalin Pentek , Kyusik Shin , Yi Zheng , Qiping Zhong , Honglin Zhu
发明人： Donald G. Allen , Yingjian Chen , Andrew Chiu , Liubo Hong , Wen-Chien D. Hsiao , Edward H. P. Lee , Fenglin Liu , Katalin Pentek , Kyusik Shin , Yi Zheng , Qiping Zhong , Honglin Zhu
IPC分类号： H04R31/00 , G11B5/127
CPC分类号： G11B5/11 , G11B5/1278 , G11B5/3116 , G11B5/3146 , G11B5/315 , G11B5/3163 , Y10T29/49039 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method for manufacturing a magnetic write head having a leading magnetic shield and a trailing magnetic shield that are arranged to prevent the lost of magnetic write field to the trailing magnetic shield. The write head includes a non-magnetic step layer that provides additional spacing between the trailing magnetic shield and the write pole at a region removed from the air bearing surface.
摘要翻译：一种用于制造具有前磁屏蔽和后磁屏蔽的磁写头的方法，该方法被布置为防止向后磁屏蔽的磁写磁场的损失。写头包括非磁性阶梯层，其在从空气轴承表面移除的区域处在后磁屏蔽和写极之间提供额外的间隔。

3. 发明授权

US08189295B2 Perpendicular magnetic recording head with a bottom side shield 有权
标题翻译：垂直磁记录头带底侧屏蔽
公开(公告)号：US08189295B2
公开(公告)日：2012-05-29
申请号：US13135276
申请日：2011-06-30
申请人： Cherng-Chyi Han , Min Li , Fenglin Liu , Lijie Guan
发明人： Cherng-Chyi Han , Min Li , Fenglin Liu , Lijie Guan
IPC分类号： G11B5/127
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3116 , G11B5/315 , Y10T29/49032 , Y10T29/49052
摘要： A perpendicular magnetic recording (PMR) head has a pole tip shielded laterally by a separated pair of bottom side shields and shielded from above by an upper shield. The bottom side shields surround a lower portion of the pole tip while the upper portion of the pole tip is surrounded by non-magnetic layers. The bottom shields and the non-magnetic layer form a wedge-shaped trench in which the pole tip has been formed by a self-aligned plating process. A write gap layer and an upper shield is formed above the side shields and pole. The resulting structure substantially eliminates track overwrite while maintaining good track definition.
摘要翻译：垂直磁记录（PMR）头具有通过分离的一对底侧屏蔽横向屏蔽的极尖，并由上屏蔽从上方屏蔽。底侧屏蔽围绕极尖的下部，而极尖的上部被非磁性层包围。底部屏蔽层和非磁性层形成楔形沟槽，其中极尖已经通过自对准电镀工艺形成。写入间隙层和上屏蔽形成在侧屏蔽和极上。所得到的结构基本上消除了轨道重写，同时保持良好的轨道定义。

4. 发明申请

US20110261486A1 Perpendicular magnetic recording head with a bottom side shield 有权
标题翻译：垂直磁记录头带底侧屏蔽
公开(公告)号：US20110261486A1
公开(公告)日：2011-10-27
申请号：US13135276
申请日：2011-06-30
申请人： Cherng-Chyi Han , Min Li , Fenglin Liu , Lijie Guan
发明人： Cherng-Chyi Han , Min Li , Fenglin Liu , Lijie Guan
IPC分类号： G11B5/187
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3116 , G11B5/315 , Y10T29/49032 , Y10T29/49052
摘要： A perpendicular magnetic recording (PMR) head has a pole tip shielded laterally by a separated pair of bottom side shields and shielded from above by an upper shield. The bottom side shields surround a lower portion of the pole tip while the upper portion of the pole tip is surrounded by non-magnetic layers. The bottom shields and the non-magnetic layer form a wedge-shaped trench in which the pole tip has been formed by a self-aligned plating process. A write gap layer and an upper shield is formed above the side shields and pole. The resulting structure substantially eliminates track overwrite while maintaining good track definition.
摘要翻译：垂直磁记录（PMR）头具有由分离的一对底侧屏蔽物侧向屏蔽的极尖，并由上屏蔽从上方屏蔽。底侧屏蔽围绕极尖的下部，而极尖的上部被非磁性层包围。底部屏蔽层和非磁性层形成楔形沟槽，其中极尖已经通过自对准电镀工艺形成。写入间隙层和上屏蔽形成在侧屏蔽和极上。所得到的结构基本上消除了轨道重写，同时保持良好的轨道定义。

5. 发明授权

US07978431B2 Method to make a perpendicular magnetic recording head with a bottom side shield 有权
标题翻译：制造具有底侧屏蔽的垂直磁记录头的方法
公开(公告)号：US07978431B2
公开(公告)日：2011-07-12
申请号：US11809346
申请日：2007-05-31
申请人： Cherng-Chyi Han , Min Li , Fenglin Liu , Lijie Guan
发明人： Cherng-Chyi Han , Min Li , Fenglin Liu , Lijie Guan
IPC分类号： G11B5/127
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3116 , G11B5/315 , Y10T29/49032 , Y10T29/49052
摘要： A perpendicular magnetic recording (PMR) head is fabricated with a pole tip shielded laterally by a separated pair of bottom side shields and shielded from above by an upper shield. The bottom side shields surround a lower portion of the pole tip while the upper portion of the pole tip is surrounded by non-magnetic layers. The bottom shields and the non-magnetic layer form wedge-shaped trench in which the pole tip is formed by a self-aligned plating process. The wedge shape is formed by a RIE process using specific gases applied through a masking layer formed of material that has a slower etch rate than the non-magnetic material or the shield material. A masking layer of Ta, Ru/Ta, TaN or Ti, formed on a non-magnetic layer of alumina that is formed on a shield layer of NiFe and using RIE gases of CH3OH, CO or NH3 or their combinations, produces the desired result. A write gap layer and an upper shield is then formed above the side shields and pole. The resulting structure substantially eliminates track overwrite while maintaining good track definition.
摘要翻译：垂直磁记录（PMR）头被制造成具有通过分离的一对底侧屏蔽横向屏蔽的极尖，并由上屏蔽从上面屏蔽。底侧屏蔽围绕极尖的下部，而极尖的上部被非磁性层包围。底部屏蔽层和非磁性层形成楔形沟槽，其中极尖通过自对准电镀工艺形成。楔形形状通过RIE工艺形成，其使用通过由比非磁性材料或屏蔽材料具有较慢蚀刻速率的材料形成的掩模层施加的特定气体。形成在NiFe的屏蔽层上并使用CH 3 OH，CO或NH 3的RIE气体或其组合的形成在氧化铝的非磁性层上的Ta，Ru / Ta，TaN或Ti的掩蔽层产生期望的结果。然后在侧屏和极上方形成写间隙层和上屏蔽。所得到的结构基本上消除了轨道重写，同时保持良好的轨道定义。

6. 发明申请

US20110146062A1 METHOD FOR MANUFACTURING A MAGNETIC WRITE HEAD HAVING A WRAP AROUND SHIELD THAT IS MAGNETICALLY COUPLED WITH A LEADING MAGNETIC SHIELD 有权
标题翻译：用于制造磁性写头的方法，该磁头具有与磁带的磁屏蔽磁耦合的磁带
公开(公告)号：US20110146062A1
公开(公告)日：2011-06-23
申请号：US12641242
申请日：2009-12-17
申请人： Donald G. Allen , Yingjian Chen , Andrew Chiu , Liubo Hong , Wen-Chien D. Hsiao , Edward H.P. Lee , Fenglin Liu , Katalin Pentek , Kyusik Shin , Yi Zheng , Qiping Zhong , Honglin Zhu
发明人： Donald G. Allen , Yingjian Chen , Andrew Chiu , Liubo Hong , Wen-Chien D. Hsiao , Edward H.P. Lee , Fenglin Liu , Katalin Pentek , Kyusik Shin , Yi Zheng , Qiping Zhong , Honglin Zhu
IPC分类号： G11B5/127
CPC分类号： G11B5/11 , G11B5/1278 , G11B5/3116 , G11B5/3146 , G11B5/315 , G11B5/3163 , Y10T29/49039 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method for manufacturing a magnetic write head having a leading magnetic shield and a trailing magnetic shield that are arranged to prevent the lost of magnetic write field to the trailing magnetic shield. The write head includes a non-magnetic step layer that provides additional spacing between the trailing magnetic shield and the write pole at a region removed from the air bearing surface.
摘要翻译：一种用于制造具有前磁屏蔽和后磁屏蔽的磁写头的方法，该方法被布置为防止向后磁屏蔽的磁写磁场的损失。写头包括非磁性阶梯层，其在从空气轴承表面移除的区域处在后磁屏蔽和写极之间提供额外的间隔。

7. 发明申请

US20080253035A1 Self-aligned full side shield PMR and method to make it 有权
标题翻译：自对准全侧盾PMR及其制作方法
公开(公告)号：US20080253035A1
公开(公告)日：2008-10-16
申请号：US11728910
申请日：2007-03-27
申请人： Cherng-Chyi Han , Min Li , Fenglin Liu , Chen-Jung Chien
发明人： Cherng-Chyi Han , Min Li , Fenglin Liu , Chen-Jung Chien
IPC分类号： G11B5/33 , B44C1/22
CPC分类号： G11B5/1278 , G11B5/112 , G11B5/3146 , G11B5/315 , G11B5/3163 , G11B5/3169 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T428/1193
摘要： A process for forming the write pole of a PMR head is described. This write pole is symmetrically located relative to its side shields, This is accomplished, not through optical alignment, but by coating the pole with a uniform layer of non-magnetic material of a predetermined and precise thickness, followed by the formation of the shield layer around this.
摘要翻译：描述了用于形成PMR头的写入极的过程。该写入极相对于其侧屏对称地定位，这不是通过光学对准而是通过用预定和精确厚度的均匀的非磁性材料层涂覆极，然后形成屏蔽层围绕这一点。

8. 发明申请

US20070177301A1 Method to make a perpendicular magnetic recording head with a side write shield 有权
标题翻译：制作具有侧面写入屏蔽层的垂直磁记录头的方法
公开(公告)号：US20070177301A1
公开(公告)日：2007-08-02
申请号：US11345892
申请日：2006-02-02
申请人： Cherng-Chyi Han , Min Li , Fenglin Liu , Jiun-Ting Lee
发明人： Cherng-Chyi Han , Min Li , Fenglin Liu , Jiun-Ting Lee
IPC分类号： G11B5/147
CPC分类号： G11B5/3163 , G11B5/11 , G11B5/1278 , G11B5/3116 , G11B5/3146 , G11B5/315 , Y10T29/49032 , Y10T29/49039 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A perpendicular magnetic recording (PMR) head is fabricated with a pole tip shielded laterally by a separated pair of side shields and shielded from above by an upper shield. The side shields are formed by a RIE process using specific gases applied to a shield layer through a masking layer formed of material that has a slower etch rate than the shield material. A masking layer of Ta, Ru/Ta, TaN or Ti, formed on a shield layer of NiFe and using RIE gases of CH3OH, CO or NH3 or their combinations, produces the desired result. The differential in etch rates maintains the opening dimension within the mask and allows the formation of a wedge-shaped trench within the shield layer that separates the layer into two shields. The pole tip is then plated within the trench and, being aligned by the trench, acquires the wedge-shaped cross-section of the trench. An upper shield is then formed above the side shields and pole.
摘要翻译：垂直磁记录（PMR）头被制造成具有通过分离的一对侧屏蔽横向屏蔽的极尖并且被上屏蔽从上面屏蔽。侧面屏蔽是通过RIE工艺形成的，其使用通过掩模层施加到屏蔽层上的特定气体，该屏蔽层由具有比屏蔽材料更慢的蚀刻速率的材料形成。在NiFe的屏蔽层上形成的Ta，Ru / Ta，TaN或Ti的掩蔽层，并使用CH 3 3 OH，CO或NH 3的RIE气体或它们的组合，产生所需的结果。蚀刻速率的差异保持了掩模内的开口尺寸，并且允许在屏蔽层内形成将该层分成两个屏蔽层的楔形沟槽。然后将磁极尖端电镀在沟槽内，并且通过沟槽对准，获得沟槽的楔形横截面。然后在侧屏和极上方形成上屏蔽。

9. 发明申请

US20050168871A1 Self-aligned trimmed pole 失效
标题翻译：自对准修边杆
公开(公告)号：US20050168871A1
公开(公告)日：2005-08-04
申请号：US11091160
申请日：2005-03-28
申请人： Cherng-Chyi Han , Mao-Min Chen , Fenglin Liu
发明人： Cherng-Chyi Han , Mao-Min Chen , Fenglin Liu
IPC分类号： G11B5/31 , G11B5/147
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/23 , G11B5/3163
摘要： A method for forming a trimmed upper pole piece for a magnetic write head, said pole piece having a uniform width above and below a write gap layer. Prior art methods of trimming pole pieces to a final width using ion-beam etches produce pole pieces with thickness differentials due to the etch resistant nature of the alumina write-gap filling material. The present method uses NiCr, NiFeCr or Ru as write gap filling materials which have an etch rate which is substantially equal to the etch rate of the other layers forming the pole piece and are highly corrosion resistant.
摘要翻译：一种用于形成用于磁性写入头的修整的上极片的方法，所述极片在写间隙层上方和下方具有均匀的宽度。使用离子束蚀刻将极片修剪到最终宽度的现有技术方法由于氧化铝写入间隙填充材料的耐蚀刻性质而产生具有厚度差异的极片。本方法使用NiCr，NiFeCr或Ru作为写入间隙填充材料，其蚀刻速率基本上等于形成极片的其它层的蚀刻速率，并且具有高度耐腐蚀性。

10. 发明申请

US20130026131A1 Method For Manufacturing Wraparound Shield Write Head Using Hard Masks 有权
标题翻译：使用硬掩模制造绕组屏蔽写头的方法
公开(公告)号：US20130026131A1
公开(公告)日：2013-01-31
申请号：US13193520
申请日：2011-07-28
申请人： Shiwen Huang , Fenglin Liu , Qiping Zhong , Kyusik Shin , Yingjian Chen
发明人： Shiwen Huang , Fenglin Liu , Qiping Zhong , Kyusik Shin , Yingjian Chen
IPC分类号： G11B5/127
CPC分类号： G11B5/3116 , G11B5/3163
摘要： The present disclosure describes a method for manufacturing a full wraparound shield damascene write head through the implementation of a three layered (tri-layered) hard mask. According to an embodiment of the invention, the various layers of hard mask are used for different purposes during the formation of a write head. The wraparound shield head of the present invention exhibits improved physical characteristics that further result in improved performance characteristics. Use of the hard mask layers according to the present invention allows for use of manufacturing processes that can be more closely controlled than those processes used in other processes. For example, smaller dimension lithographic techniques can be used. Also, reliance on certain CMP processes is not necessary where the use of CMP processes is not as well-controlled as deposition or lithographic techniques as is possible using the present invention.
摘要翻译：本公开描述了通过实施三层（三层）硬掩模制造全封装屏蔽镶嵌写头的方法。根据本发明的实施例，在形成写入头期间，各种硬掩模层用于不同的目的。本发明的环绕式屏蔽头表现出改进的物理特性，进一步导致改善的性能特征。根据本发明的硬掩模层的使用允许使用可以比其它工艺中使用的那些方法更加严格地控制的制造工艺。例如，可以使用较小尺寸的光刻技术。此外，在使用CMP工艺不如使用本发明可能的沉积或光刻技术那样不受控制的情况下，对某些CMP工艺的依赖是不必要的。

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