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    • 1. 发明授权
    • Method and apparatus for performing model-based layout conversion for use with dipole illumination
    • 用于与偶极照明一起使用的基于模型的布局转换的方法和装置
    • US07138212B2
    • 2006-11-21
    • US10705231
    • 2003-11-12
    • Duan-Fu Stephen HsuKurt E. WamplerMarkus Franciscus Antonius EurlingsJang Fung ChenNoel Corcoran
    • Duan-Fu Stephen HsuKurt E. WamplerMarkus Franciscus Antonius EurlingsJang Fung ChenNoel Corcoran
    • G01F9/00
    • G03F7/705G03F1/36G03F1/70G03F7/70125G03F7/70441G03F7/70466
    • A method of generating complementary masks for use in a multiple-exposure lithographic imaging process. The method includes the steps of: identifying a target pattern having a plurality of features comprising horizontal and vertical edges; generating a horizontal mask based on the target pattern; generating a vertical mask based on the target pattern; performing a shielding step in which at least one of the vertical edges of the plurality of features in the target pattern is replaced by a shield in the horizontal mask, and in which at least one of the horizontal edges of the plurality of features in the target pattern is replaced by a shield in the vertical mask, where the shields have a width which is greater that the width of the corresponding feature in the target pattern; performing an assist feature placement step in which sub-resolution assist features are disposed parallel to at least one of the horizontal edges of the plurality of features in the horizontal mask, and are disposed parallel to at least one of the vertical edges of the plurality of features in the vertical mask, and performing a feature biasing step in which at least one of the horizontal edges of the plurality of features in the horizontal mask are adjusted such that the resulting feature accurately reproduces the target pattern, and at least one of the vertical edges of the plurality of features in the vertical mask are adjusted such that the resulting feature accurately reproduces the target pattern.
    • 一种产生用于多次曝光光刻成像过程的互补掩模的方法。 该方法包括以下步骤:识别具有包括水平和垂直边缘的多个特征的目标图案; 基于目标图案生成水平掩模; 基于目标图案生成垂直掩模; 执行屏蔽步骤,其中目标图案中的多个特征的至少一个垂直边缘被水平掩模中的屏蔽替换,并且其中目标中的多个特征中的至少一个水平边缘 图案由垂直掩模中的屏蔽代替,其中屏蔽具有大于目标图案中相应特征的宽度的宽度; 执行辅助特征放置步骤,其中副分辨率辅助特征平行于水平掩模中的多个特征中的至少一个水平边缘设置,并且平行于多个垂直边缘中的至少一个垂直边缘 特征,并且执行特征偏置步骤,其中水平掩模中的多个特征的水平边缘中的至少一个被调整,使得所得到的特征精确地再现目标图案,并且垂直屏蔽中的至少一个垂直 调整垂直掩模中的多个特征的边缘,使得所得到的特征精确地再现目标图案。
    • 2. 发明授权
    • Method and apparatus for performing model-based layout conversion for use with dipole illumination
    • 用于与偶极照明一起使用的基于模型的布局转换的方法和装置
    • US07666554B2
    • 2010-02-23
    • US11588326
    • 2006-10-27
    • Duan-Fu Stephen HsuKurt E. WamplerMarkus Franciscus Antonius EurlingsJang Fung ChenNoel Corcoran
    • Duan-Fu Stephen HsuKurt E. WamplerMarkus Franciscus Antonius EurlingsJang Fung ChenNoel Corcoran
    • G03F1/00
    • G03F7/705G03F1/36G03F1/70G03F7/70125G03F7/70441G03F7/70466
    • A method of generating complementary masks for use in a multiple-exposure lithographic imaging process. The method includes the steps of: identifying a target pattern having a plurality of features comprising horizontal and vertical edges; generating a horizontal mask based on the target pattern; generating a vertical mask based on the target pattern; performing a shielding step in which at least one of the vertical edges of the plurality of features in the target pattern is replaced by a shield in the horizontal mask, and in which at least one of the horizontal edges of the plurality of features in the target pattern is replaced by a shield in the vertical mask, where the shields have a width which is greater that the width of the corresponding feature in the target pattern; performing an assist feature placement step in which sub-resolution assist features are disposed parallel to at least one of the horizontal edges of the plurality of features in the horizontal mask, and are disposed parallel to at least one of the vertical edges of the plurality of features in the vertical mask, and performing a feature biasing step in which at least one of the horizontal edges of the plurality of features in the horizontal mask are adjusted such that the resulting feature accurately reproduces the target pattern, and at least one of the vertical edges of the plurality of features in the vertical mask are adjusted such that the resulting feature accurately reproduces the target pattern.
    • 一种产生用于多次曝光光刻成像过程的互补掩模的方法。 该方法包括以下步骤:识别具有包括水平和垂直边缘的多个特征的目标图案; 基于目标图案生成水平掩模; 基于目标图案生成垂直掩模; 执行屏蔽步骤,其中目标图案中的多个特征的至少一个垂直边缘被水平掩模中的屏蔽替换,并且其中目标中的多个特征中的至少一个水平边缘 图案由垂直掩模中的屏蔽代替,其中屏蔽具有大于目标图案中相应特征的宽度的宽度; 执行辅助特征放置步骤,其中副分辨率辅助特征平行于水平掩模中的多个特征中的至少一个水平边缘设置,并且平行于多个垂直边缘中的至少一个垂直边缘 特征,并且执行特征偏置步骤,其中水平掩模中的多个特征的水平边缘中的至少一个被调整,使得所得到的特征精确地再现目标图案,并且垂直屏蔽中的至少一个垂直 调整垂直掩模中的多个特征的边缘,使得所得到的特征精确地再现目标图案。
    • 3. 发明授权
    • Method and apparatus for performing model-based layout conversion for use with dipole illumination
    • 用于与偶极照明一起使用的基于模型的布局转换的方法和装置
    • US07985515B2
    • 2011-07-26
    • US12630280
    • 2009-12-03
    • Duan-Fu Stephen HsuKurt E. WamplerMarkus Franciscus Antonius EurlingsJang Fung ChenNoel Corcoran
    • Duan-Fu Stephen HsuKurt E. WamplerMarkus Franciscus Antonius EurlingsJang Fung ChenNoel Corcoran
    • G03F1/00
    • G03F7/705G03F1/36G03F1/70G03F7/70125G03F7/70441G03F7/70466
    • A method of generating complementary masks for use in a multiple-exposure lithographic imaging process. The method includes the steps of: identifying a target pattern having a plurality of features comprising horizontal and vertical edges; generating a horizontal mask based on the target pattern; generating a vertical mask based on the target pattern; performing a shielding step in which at least one of the vertical edges of the plurality of features in the target pattern is replaced by a shield in the horizontal mask, and in which at least one of the horizontal edges of the plurality of features in the target pattern is replaced by a shield in the vertical mask, where the shields have a width which is greater that the width of the corresponding feature in the target pattern; performing an assist feature placement step in which sub-resolution assist features are disposed parallel to at least one of the horizontal edges of the plurality of features in the horizontal mask, and are disposed parallel to at least one of the vertical edges of the plurality of features in the vertical mask, and performing a feature biasing step in which at least one of the horizontal edges of the plurality of features in the horizontal mask are adjusted such that the resulting feature accurately reproduces the target pattern, and at least one of the vertical edges of the plurality of features in the vertical mask are adjusted such that the resulting feature accurately reproduces the target pattern.
    • 一种产生用于多次曝光光刻成像过程的互补掩模的方法。 该方法包括以下步骤:识别具有包括水平和垂直边缘的多个特征的目标图案; 基于目标图案生成水平掩模; 基于目标图案生成垂直掩模; 执行屏蔽步骤,其中目标图案中的多个特征的至少一个垂直边缘被水平掩模中的屏蔽替换,并且其中目标中的多个特征中的至少一个水平边缘 图案由垂直掩模中的屏蔽代替,其中屏蔽具有大于目标图案中相应特征的宽度的宽度; 执行辅助特征放置步骤,其中副分辨率辅助特征平行于水平掩模中的多个特征中的至少一个水平边缘设置,并且平行于多个垂直边缘中的至少一个垂直边缘 特征,并且执行特征偏置步骤,其中水平掩模中的多个特征的水平边缘中的至少一个被调整,使得所得到的特征精确地再现目标图案,并且垂直屏蔽中的至少一个垂直 调整垂直掩模中的多个特征的边缘,使得所得到的特征精确地再现目标图案。
    • 4. 发明申请
    • METHOD AND APPARATUS FOR PERFORMING MODEL-BASED LAYOUT CONVERSION FOR USE WITH DIPOLE ILLUMINATION
    • 用于执行基于模型的布局转换的方法和装置,用于使用DIPOLE ILLUMINATION
    • US20100167183A1
    • 2010-07-01
    • US12630280
    • 2009-12-03
    • Duan-Fu Stephen HSUKurt E. WamplerMarkus Franciscus Antonius EurlingsJang Fung ChenNoel Corcoran
    • Duan-Fu Stephen HSUKurt E. WamplerMarkus Franciscus Antonius EurlingsJang Fung ChenNoel Corcoran
    • G03F1/00G03F7/20G03B27/42
    • G03F7/705G03F1/36G03F1/70G03F7/70125G03F7/70441G03F7/70466
    • A method of generating complementary masks for use in a multiple-exposure lithographic imaging process. The method includes the steps of: identifying a target pattern having a plurality of features comprising horizontal and vertical edges; generating a horizontal mask based on the target pattern; generating a vertical mask based on the target pattern; performing a shielding step in which at least one of the vertical edges of the plurality of features in the target pattern is replaced by a shield in the horizontal mask, and in which at least one of the horizontal edges of the plurality of features in the target pattern is replaced by a shield in the vertical mask, where the shields have a width which is greater that the width of the corresponding feature in the target pattern; performing an assist feature placement step in which sub-resolution assist features are disposed parallel to at least one of the horizontal edges of the plurality of features in the horizontal mask, and are disposed parallel to at least one of the vertical edges of the plurality of features in the vertical mask, and performing a feature biasing step in which at least one of the horizontal edges of the plurality of features in the horizontal mask are adjusted such that the resulting feature accurately reproduces the target pattern, and at least one of the vertical edges of the plurality of features in the vertical mask are adjusted such that the resulting feature accurately reproduces the target pattern.
    • 一种产生用于多次曝光光刻成像过程的互补掩模的方法。 该方法包括以下步骤:识别具有包括水平和垂直边缘的多个特征的目标图案; 基于目标图案生成水平掩模; 基于目标图案生成垂直掩模; 执行屏蔽步骤,其中目标图案中的多个特征的至少一个垂直边缘被水平掩模中的屏蔽替换,并且其中目标中的多个特征中的至少一个水平边缘 图案由垂直掩模中的屏蔽代替,其中屏蔽具有大于目标图案中相应特征的宽度的宽度; 执行辅助特征放置步骤,其中副分辨率辅助特征平行于水平掩模中的多个特征中的至少一个水平边缘设置,并且平行于多个垂直边缘中的至少一个垂直边缘 特征,并且执行特征偏置步骤,其中水平掩模中的多个特征的水平边缘中的至少一个被调整,使得所得到的特征精确地再现目标图案,并且垂直屏蔽中的至少一个垂直 调整垂直掩模中的多个特征的边缘,使得所得到的特征精确地再现目标图案。