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1. 发明授权

US09468084B2 Plasma generation device assembly, arc mitigation device, and method of assembling a plasma generation device assembly 有权
标题翻译：等离子体发生装置组件，电弧缓解装置以及组装等离子体产生装置组件的方法
公开(公告)号：US09468084B2
公开(公告)日：2016-10-11
申请号：US13663913
申请日：2012-10-30
申请人： General Electric Company
发明人： Ravi Kumar , Srinivas Naga Palvadi , Sudhakar Sambaiah Pachunoori
IPC分类号： B23K10/00 , H05H1/52
CPC分类号： H05H1/52
摘要： A plasma generation device assembly includes a base including a top surface. The plasma generation device assembly also includes a plasma generation device and a plurality of coupling members. The plasma generation device includes a body unitarily formed from an ablative material and a plurality of plasma generation device terminals coupled to the body. The plasma generation device is positioned on the top surface and is configured to emit ablative plasma when the plasma generation device is activated. The plurality of coupling members is configured to couple the plasma generation device to the top surface.
摘要翻译：一种等离子体产生装置组件包括一个包括顶面的基座。等离子体产生装置组件还包括等离子体产生装置和多个耦合构件。等离子体产生装置包括由烧蚀材料一体地形成的主体和耦合到主体的多个等离子体产生装置端子。等离子体产生装置位于顶表面上并且被配置为当等离子体产生装置被激活时发出烧蚀等离子体。多个联接构件被配置为将等离子体产生装置耦合到顶表面。

2. 发明授权

US08993916B2 Variable venting and damping arc mitigation assemblies and methods of assembly 有权
标题翻译：可变排气和阻尼电弧缓解组件和组装方法
公开(公告)号：US08993916B2
公开(公告)日：2015-03-31
申请号：US13707845
申请日：2012-12-07
申请人： General Electric Company
发明人： Srinivas Naga Palvadi , Ravi Kumar , Chandrakanth Gopularam
IPC分类号： H01H3/60 , H01H77/00 , H01H75/00 , H02H3/00 , H02H9/00 , H02H9/06 , H02H1/00 , H01H69/00 , H01H9/50 , H01T4/04 , H01T1/15 , H01T2/02
CPC分类号： H02H1/0015 , H01H9/50 , H01H69/00 , H01T1/15 , H01T2/02 , H01T4/04 , Y10T29/49117
摘要： Equipment protection systems, arc containment devices, and methods of assembling arc containment devices are disclosed. In one example, an electrical isolation structure includes a conductor base, a cover coupled to the conductor base and defining an isolation chamber, a containment shield disposed on the conductor base within the isolation chamber, and a biasing assembly positioned between the cover and the containment shield. The containment shield defines a containment chamber configured to enclose the plurality of electrode assemblies. The containment shield is configured to at least partially contain the arc products within the containment chamber. The biasing assembly is configured to permit the containment shield to move away from the conductor base to thereby define a gap between the conductor base and the containment shield to enable at least some of the arc gases to vent from the containment chamber.
摘要翻译：公开了设备保护系统，电弧遏制装置和组装电弧遏制装置的方法。在一个示例中，电气隔离结构包括导体基座，耦合到导体基座并限定隔离室的盖子，设置在隔离室内的导体基座上的容纳屏蔽件以及定位在盖子和容纳物之间的偏压组件屏蔽。容纳护罩限定了构造成封闭多个电极组件的容纳室。防护罩构造成至少部分地包含容纳室内的电弧产物。偏压组件被配置为允许容纳屏蔽件远离导体基座移动，从而在导体基座和容纳屏蔽之间限定间隙，以使至少一些电弧气体能够从容纳室排出。

3. 发明申请

US20140116996A1 Plasma Generation Device Assembly, Arc Mitigation Device, and Method of Assembling a Plasma Generation Device Assembly 有权
标题翻译：等离子体生成装置组件，减弧装置和组装等离子体发生装置组件的方法
公开(公告)号：US20140116996A1
公开(公告)日：2014-05-01
申请号：US13663871
申请日：2012-10-30
申请人： GENERAL ELECTRIC COMPANY
发明人： Srinivas Naga Palvadi , Dharamveer Surya Parkash Bathla , Ravi Kumar
IPC分类号： B23K10/00 , H05K13/00
CPC分类号： H05H1/46 , H05H1/52 , Y10T29/49117
摘要： A plasma generation device assembly includes a base includes an interior portion and a top surface defining a plurality of apertures that extend through the top surface. The plasma generation device assembly also includes a plasma generation device and a plurality of coupling members. The plasma generation device is positioned on the top surface and is configured to emit ablative plasma when the plasma generation device is activated. The plurality of coupling members extends through the plurality of apertures and is configured to couple the plasma generation device to the top surface.
摘要翻译：等离子体产生装置组件包括底座，其包括内部部分和限定穿过顶部表面延伸的多个孔的顶部表面。等离子体产生装置组件还包括等离子体产生装置和多个耦合构件。等离子体产生装置位于顶表面上并且被配置为当等离子体产生装置被激活时发出烧蚀等离子体。多个联接构件延伸穿过多个孔，并且被配置为将等离子体产生装置耦合到顶表面。

4. 发明授权

US09468083B2 Plasma generation device assembly, arc mitigation device, and method of assembling a plasma generation device assembly 有权
标题翻译：等离子体发生装置组件，电弧缓解装置以及组装等离子体产生装置组件的方法
公开(公告)号：US09468083B2
公开(公告)日：2016-10-11
申请号：US13663871
申请日：2012-10-30
申请人： General Electric Company
发明人： Srinivas Naga Palvadi , Dharamveer Surya Parkash Bathla , Ravi Kumar
IPC分类号： B23K10/00 , H05H1/46 , H05H1/52
CPC分类号： H05H1/46 , H05H1/52 , Y10T29/49117
摘要： A plasma generation device assembly includes a base includes an interior portion and a top surface defining a plurality of apertures that extend through the top surface. The plasma generation device assembly also includes a plasma generation device and a plurality of coupling members. The plasma generation device is positioned on the top surface and is configured to emit ablative plasma when the plasma generation device is activated. The plurality of coupling members extends through the plurality of apertures and is configured to couple the plasma generation device to the top surface.
摘要翻译：等离子体产生装置组件包括底座，其包括内部部分和限定穿过顶部表面延伸的多个孔的顶部表面。等离子体产生装置组件还包括等离子体产生装置和多个耦合构件。等离子体产生装置位于顶表面上并且被配置为当等离子体产生装置被激活时发出烧蚀等离子体。多个联接构件延伸穿过多个孔，并且被配置为将等离子体产生装置耦合到顶表面。

5. 发明申请

US20140158666A1 ARC MITIGATION ASSEMBLY AND METHOD OF ASSEMBLY TO AVOID GROUND STRIKE 有权
标题翻译： ARC减速组件及避免地面碰撞的组装方法
公开(公告)号：US20140158666A1
公开(公告)日：2014-06-12
申请号：US13707822
申请日：2012-12-07
申请人： GENERAL ELECTRIC COMPANY
发明人： Srinivas Naga Palvadi , Sudhakar Sambaiah Pachunoori , Ravi Kumar
IPC分类号： H01H9/38
CPC分类号： H01H9/38 , H01H9/50 , H01H33/10 , H01H33/26 , H01T1/15 , H01T2/02 , H02H1/0023 , Y10T29/49117
摘要： A circuit protection device is provided for use with a circuit that includes at least one pair of conductors. The protection device is configured to generate an arc. The protection device includes at least a pair of electrode assemblies electrically coupled to the at least one pair of conductors and a conductor base to support the pair of electrode assemblies. The protection device includes a cover coupled to the conductor base and defining at least one isolation chamber, wherein the electrode assemblies are disposed within the isolation chamber. The protection device includes a containment shield moveably coupled to the cover. The containment shield defines a containment chamber configured to contain charged particles produced by the arc. The containment shield is operative to move relative to the cover in response to a change in pressure produced by the arc within the containment chamber. An isolation assembly is coupled to at least one of the cover and the containment shield and configured to prevent the cover from contacting the containment shield.
摘要翻译：电路保护装置用于与包括至少一对导体的电路一起使用。保护装置被配置为产生电弧。保护装置包括至少一对电耦合到至少一对导体的电极组件和用于支撑该对电极组件的导体基座。保护装置包括耦合到导体基座并限定至少一个隔离室的盖，其中电极组件设置在隔离室内。保护装置包括可移动地联接到盖的容纳罩。容纳罩限定了容纳室，其构造成容纳由电弧产生的带电粒子。响应于由容纳室内的电弧产生的压力变化，容纳屏蔽件可操作以相对于盖板移动。隔离组件联接到盖和容纳屏蔽中的至少一个并且被配置为防止盖与容纳屏蔽接触。

6. 发明申请

US20140118879A1 Plasma Generation Device Assembly, Arc Mitigation Device, and Method of Assembling a Plasma Generation Device Assembly 有权
标题翻译：等离子体生成装置组件，减弧装置和组装等离子体发生装置组件的方法
公开(公告)号：US20140118879A1
公开(公告)日：2014-05-01
申请号：US13663913
申请日：2012-10-30
申请人： GENERAL ELECTRIC COMPANY
发明人： Ravi Kumar , Srinivas Naga Palvadi , Sudhakar Sambaiah Pachunoori
IPC分类号： H05H1/48 , H05F3/04 , H01J9/34
CPC分类号： H05H1/52
摘要： A plasma generation device assembly includes a base including a top surface. The plasma generation device assembly also includes a plasma generation device and a plurality of coupling members. The plasma generation device includes a body unitarily formed from an ablative material and a plurality of plasma generation device terminals coupled to the body. The plasma generation device is positioned on the top surface and is configured to emit ablative plasma when the plasma generation device is activated. The plurality of coupling members is configured to couple the plasma generation device to the top surface.
摘要翻译：一种等离子体产生装置组件包括一个包括顶面的基座。等离子体产生装置组件还包括等离子体产生装置和多个耦合构件。等离子体产生装置包括由烧蚀材料一体地形成的主体和耦合到主体的多个等离子体产生装置端子。等离子体产生装置位于顶表面上并且被配置为当等离子体产生装置被激活时发出烧蚀等离子体。多个联接构件被配置为将等离子体产生装置耦合到顶表面。

7. 发明申请

US20170301489A1 DEVICES, SYSTEMS, AND METHODS FOR PROTECTION OF SWITCHGEAR AGAINST ELECTRICAL ARCS 审中-公开
公开(公告)号：US20170301489A1
公开(公告)日：2017-10-19
申请号：US15132755
申请日：2016-04-19
申请人： General Electric Company
发明人： Srinivas Naga Palvadi , Triloka Chander Tankala , Karthik Kondaveeti
IPC分类号： H01H33/08 , H01H11/00 , H02H1/00 , H02H3/16
CPC分类号： H02H1/0015 , H01T1/00 , H01T1/15 , H02H7/222
摘要： An arc protection system for an electrical enclosure having an electrical component positioned in an interior thereof. The system includes two busbars and at least one arc routing device positioned in the interior and an arc containment device defining a cavity and including an electrode assembly positioned within the cavity, wherein the electrode assembly is electrically coupled to the two busbars. The system also includes at least one arc routing device having a first end proximate the electrical component and a second end proximate the arc containment device. The at least one arc routing device is operative to i) attract arc plasma generated during an arc event at the electrical component, and ii) transport the arc plasma to the arc containment device, wherein the arc containment device is configured to transfer electrical energy of the arc plasma to an exterior of the electrical enclosure.

8. 发明授权

US08981248B2 Arc mitigation assembly and method of assembly to avoid ground strike 有权
标题翻译：电弧缓解装配及组装方法避免地面撞击
公开(公告)号：US08981248B2
公开(公告)日：2015-03-17
申请号：US13707822
申请日：2012-12-07
申请人： General Electric Company
发明人： Srinivas Naga Palvadi , Sudhakar Sambaiah Pachunoori , Ravi Kumar
IPC分类号： H01H3/60 , H01H77/00 , H01H75/00 , H02H3/00 , H02H9/00 , H01H9/38 , H01H9/50 , H01H33/10 , H01H33/26 , H01T1/15 , H02H1/00 , H01T2/02
CPC分类号： H01H9/38 , H01H9/50 , H01H33/10 , H01H33/26 , H01T1/15 , H01T2/02 , H02H1/0023 , Y10T29/49117
摘要： A circuit protection device is provided for use with a circuit that includes at least one pair of conductors. The protection device is configured to generate an arc. The protection device includes at least a pair of electrode assemblies electrically coupled to the at least one pair of conductors and a conductor base to support the pair of electrode assemblies. The protection device includes a cover coupled to the conductor base and defining at least one isolation chamber, wherein the electrode assemblies are disposed within the isolation chamber. The protection device includes a containment shield moveably coupled to the cover. The containment shield defines a containment chamber configured to contain charged particles produced by the arc. The containment shield is operative to move relative to the cover in response to a change in pressure produced by the arc within the containment chamber. An isolation assembly is coupled to at least one of the cover and the containment shield and configured to prevent the cover from contacting the containment shield.
摘要翻译：电路保护装置用于与包括至少一对导体的电路一起使用。保护装置被配置为产生电弧。保护装置包括至少一对电耦合到至少一对导体的电极组件和用于支撑该对电极组件的导体基座。保护装置包括耦合到导体基座并限定至少一个隔离室的盖，其中电极组件设置在隔离室内。保护装置包括可移动地联接到盖的容纳罩。容纳罩限定了容纳室，其构造成容纳由电弧产生的带电粒子。响应于由容纳室内的电弧产生的压力变化，容纳屏蔽件可操作以相对于盖板移动。隔离组件联接到盖和容纳屏蔽中的至少一个并且被配置为防止盖与容纳屏蔽接触。

9. 发明申请

US20140160634A1 VARIABLE VENTING AND DAMPING ARC MITIGATION ASSEMBLIES AND METHODS OF ASSEMBLY 有权
标题翻译：可变的通风和阻尼弧减速组件和组装方法
公开(公告)号：US20140160634A1
公开(公告)日：2014-06-12
申请号：US13707845
申请日：2012-12-07
申请人： GENERAL ELECTRIC COMPANY
发明人： Srinivas Naga Palvadi , Ravi Kumar , Chandrakanth Gopularam
IPC分类号： H02H1/00 , H01H69/00
CPC分类号： H02H1/0015 , H01H9/50 , H01H69/00 , H01T1/15 , H01T2/02 , H01T4/04 , Y10T29/49117
摘要： Equipment protection systems, arc containment devices, and methods of assembling arc containment devices are disclosed. In one example, an electrical isolation structure includes a conductor base, a cover coupled to the conductor base and defining an isolation chamber, a containment shield disposed on the conductor base within the isolation chamber, and a biasing assembly positioned between the cover and the containment shield. The containment shield defines a containment chamber configured to enclose the plurality of electrode assemblies. The containment shield is configured to at least partially contain the arc products within the containment chamber. The biasing assembly is configured to permit the containment shield to move away from the conductor base to thereby define a gap between the conductor base and the containment shield to enable at least some of the arc gases to vent from the containment chamber.
摘要翻译：公开了设备保护系统，电弧遏制装置和组装电弧遏制装置的方法。在一个示例中，电气隔离结构包括导体基座，耦合到导体基座并限定隔离室的盖子，设置在隔离室内的导体基座上的容纳屏蔽件以及定位在盖子和容纳物之间的偏压组件屏蔽。容纳护罩限定了构造成封闭多个电极组件的容纳室。防护罩构造成至少部分地包含容纳室内的电弧产物。偏压组件被配置为允许容纳屏蔽件远离导体基座移动，从而在导体基座和容纳屏蔽之间限定间隙，以使至少一些电弧气体能够从容纳室排出。

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