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1. 发明授权

US09530614B2 Charged particle beam device and arithmetic device 有权
标题翻译：带电粒子束装置和运算装置
公开(公告)号：US09530614B2
公开(公告)日：2016-12-27
申请号：US14373123
申请日：2012-12-17
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Kotoko Urano , Tomonori Nakano , Yoichi Ose
IPC分类号： H01J37/28 , H01J37/153 , G01Q40/00
CPC分类号： H01J37/28 , G01Q40/00 , H01J37/153 , H01J2237/1534 , H01J2237/28 , H01J2237/2809
摘要： It is possible to determine an optimal parasitic aberration adjustment amount even when the relationship of the parasitic aberration adjustment amount with respect to the field intensity of multiple poles changes nonlinearly. To this end, in the present invention, an aberration correction amount is computed by measuring an aberration coefficient of an optical unit of a charged particle beam device, and at the same time, the present value of a power supply control value applied to an aberration corrector is measured. Then, the parasitic aberration adjustment amount for suppressing the amount of a parasitic aberration generated in the aberration corrector is computed on the basis of the aberration correction amount and the present value of the power supply control value.
摘要翻译：即使当寄生像差调整量相对于多个磁场强度的关系非线性地变化时，也可以确定最佳的寄生像差调整量。为此，在本发明中，通过测量带电粒子束装置的光学单元的像差系数来计算像差校正量，同时，应用于像差的电源控制值的当前值校正器被测量。然后，基于像差校正量和电源控制值的当前值来计算用于抑制像差校正器中产生的寄生像差量的寄生像差调整量。

2. 发明授权

US09287084B2 Aberration corrector and charged particle beam apparatus using the same 有权
标题翻译：畸变校正器和使用其的带电粒子束装置
公开(公告)号：US09287084B2
公开(公告)日：2016-03-15
申请号：US14607736
申请日：2015-01-28
申请人： Hitachi High-Technologies Corporation
发明人： Zhaohui Cheng , Hideo Kashima , Hiroaki Baba , Takeyoshi Ohashi , Tomonori Nakano , Kotoko Urano , Naomasa Suzuki
IPC分类号： G21K1/093 , H01J3/24 , H01J37/153
CPC分类号： H01J37/153 , H01J2237/032 , H01J2237/1534
摘要： Provided are an aberration corrector that reduces irregularity of a magnetic field of a multipole to obtain an image of high resolution and a charged particle beam apparatus using the same. The aberration corrector includes a plurality of magnetic field type poles, a ring that magnetically connects the plurality of poles with one another and an adjustment member disposed between the pole and the ring to adjust a spacing between the pole and the ring per pole.
摘要翻译：提供了减少多极的磁场的不规则性以获得高分辨率的图像和使用其的带电粒子束装置的像差校正器。像差校正器包括多个磁场型磁极，将多个磁极彼此磁连接的环和设置在磁极和环之间的调节构件，以调节磁极与每个磁极之间的间隔。

3. 发明申请

US20150060654A1 CHARGED PARTICLE BEAM DEVICE AND ARITHMETIC DEVICE 有权
标题翻译：充电颗粒光束装置和算术装置
公开(公告)号：US20150060654A1
公开(公告)日：2015-03-05
申请号：US14373123
申请日：2012-12-17
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Kotoko Urano , Tomonori Nakano , Yoichi Ose
IPC分类号： H01J37/28 , G01Q40/00
CPC分类号： H01J37/28 , G01Q40/00 , H01J37/153 , H01J2237/1534 , H01J2237/28 , H01J2237/2809
摘要： It is possible to determine an optimal parasitic aberration adjustment amount even when the relationship of the parasitic aberration adjustment amount with respect to the field intensity of multiple poles changes nonlinearly. To this end, in the present invention, an aberration correction amount is computed by measuring an aberration coefficient of an optical unit of a charged particle beam device, and at the same time, the present value of a power supply control value applied to an aberration corrector is measured. Then, the parasitic aberration adjustment amount for suppressing the amount of a parasitic aberration generated in the aberration corrector is computed on the basis of the aberration correction amount and the present value of the power supply control value.
摘要翻译：即使当寄生像差调整量相对于多个磁场强度的关系非线性地变化时，也可以确定最佳的寄生像差调整量。为此，在本发明中，通过测量带电粒子束装置的光学单元的像差系数来计算像差校正量，同时，应用于像差的电源控制值的当前值校正器被测量。然后，基于像差校正量和电源控制值的当前值来计算用于抑制像差校正器中产生的寄生像差量的寄生像差调整量。

4. 发明申请

US20140217304A1 MULTIPOLE MEASUREMENT APPARATUS 有权
标题翻译：多点测量装置
公开(公告)号：US20140217304A1
公开(公告)日：2014-08-07
申请号：US14241035
申请日：2012-05-23
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Tomonori Nakano , Kotoko Urano , Hiroyuki Ito
IPC分类号： G21K1/00
CPC分类号： G21K1/00 , H01J37/153 , H01J37/244 , H01J37/26 , H01J2237/2446 , H01J2237/2826
摘要： In order to provide a multipole measurement apparatus that can easily obtain table data for an aberration corrector that corrects the aberrations in a charged particle beam apparatus, the multipole measurement apparatus, which is provided with an optical system (10), a space into which an aberration corrector (6) is to be inserted, and a position detector (7), measures the relationship between the incident position and angle of a primary charged particle beam on the aberration corrector (6) at a plurality of points, the irradiation position upon the position detector (7), and a multipole, in a state of having a multipole field excited and in a state of not having a multipole field excited, so as to extract multipole components contained in the measurement executed in the state of having the multipole field excited.
摘要翻译：为了提供一种可以容易地获得用于校正带电粒子束装置中的像差的像差校正器的表格数据的多极测量装置，具有光学系统（10）的多极测量装置，将像差校正器（6）插入，并且位置检测器（7）测量多个点处的像差校正器（6）上的初级带电粒子束的入射位置和角度之间的关系，位置检测器（7）和多极，具有被激励的多极场的状态，并且处于不具有多极场激励的状态，以便提取包含在具有多极的状态下的测量中的多极分量场激动

5. 发明授权

US10446361B2 Aberration correction method, aberration correction system, and charged particle beam apparatus 有权
公开(公告)号：US10446361B2
公开(公告)日：2019-10-15
申请号：US15741038
申请日：2015-07-01
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Zhaohui Cheng , Tomonori Nakano , Kotoko Urano , Takeyoshi Ohashi , Yasunari Sohda , Hideyuki Kazumi
IPC分类号： H01J37/153 , H01J37/141 , H01J37/147 , H01J37/22 , H01J37/244 , H01J37/28
摘要： In order to provide an aberration correction system that realizes a charged particle beam of which the anisotropy is reduced or eliminated on a sample surface even in the case where there is magnetic interference between pole stages of an aberration corrector, an correction system includes a line cross position control device (209) which controls a line cross position in the aberration corrector of the charged particle beam so that a designed value and an actually measured value of the line cross position are equal to each other, an image shift amount extraction device (210), and a feedback determination device (211) which determines whether or not changing an excitation amount of the aberration corrector is necessary whether or not changing an excitation amount is necessary from an extracted image shift amount.

6. 发明授权

US10727024B2 Charged particle beam device and aberration correction method for charged particle beam device 有权
公开(公告)号：US10727024B2
公开(公告)日：2020-07-28
申请号：US16325613
申请日：2016-08-23
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Kotoko Urano , Zhaohui Cheng , Takeyoshi Ohashi , Hideyuki Kazumi
IPC分类号： H01J37/153 , H01J37/22 , H01J37/244
摘要： A charged particle beam device using a multi-pole type aberration corrector includes: a charged particle source which generates a primary charged particle beam; an aberration correction optical system which corrects aberrations of the primary charged particle beam; a detection unit which detects a secondary charged particle generated from a sample irradiated with the primary charged particle beam whose aberrations have been corrected; an image forming unit which forms a charged particle image of the sample from a signal obtained by detecting the secondary charged particle; an aberration correction amount calculation unit which processes the charged particle image, separates aberrations having different symmetries, selects an aberration to be preferentially corrected from the separated aberrations, and calculates a correction amount of the aberration correction optical system; and an aberration correction optical system control unit which controls the aberration correction optical system based on the calculated correction amount.

7. 发明申请

US20150248944A1 ABERRATION CORRECTOR AND CHARGED PARTICLE BEAM APPARATUS USING THE SAME 有权
标题翻译：使用相同的ABERRATION CORRECTOR和充电颗粒光束装置
公开(公告)号：US20150248944A1
公开(公告)日：2015-09-03
申请号：US14607736
申请日：2015-01-28
申请人： Hitachi High-Technologies Corporation
发明人： Zhaohui Cheng , Hideo Kashima , Hiroaki Baba , Takeyoshi Ohashi , Tomonori Nakano , Kotoko Urano , Naomasa Suzuki
IPC分类号： G21K1/093 , H01J37/153
CPC分类号： H01J37/153 , H01J2237/032 , H01J2237/1534
摘要： Provided are an aberration corrector that reduces irregularity of a magnetic field of a multipole to obtain an image of high resolution and a charged particle beam apparatus using the same. The aberration corrector includes a plurality of magnetic field type poles, a ring that magnetically connects the plurality of poles with one another and an adjustment member disposed between the pole and the ring to adjust a spacing between the pole and the ring per pole.
摘要翻译：提供了减少多极的磁场的不规则性以获得高分辨率的图像和使用其的带电粒子束装置的像差校正器。像差校正器包括多个磁场型磁极，将多个磁极彼此磁连接的环和设置在磁极和环之间的调节构件，以调节磁极与每个磁极之间的间隔。

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