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1. 发明申请

US20140299768A1 ION SOURCE AND ION BEAM DEVICE USING SAME 有权
标题翻译：离子源和离子束设备使用它
公开(公告)号：US20140299768A1
公开(公告)日：2014-10-09
申请号：US14351559
申请日：2012-10-10
申请人： Hitachi High-Technologies Corporation
发明人： Hiroyasu Shichi , Shinichi Matsubara , Yoichi Ose , Yoshimi Kawanami , Noriaki Arai
IPC分类号： H01J27/02 , H01J37/26
CPC分类号： H01J27/022 , H01J37/08 , H01J37/26 , H01J37/28 , H01J2237/0216 , H01J2237/0807
摘要： Provided is a charged particle beam microscope which has a small mechanical vibration amplitude of a distal end of an emitter tip, is capable of obtaining an ultra-high resolution sample observation image and removing shaking or the like of the sample observation image. A gas field ion source includes: an emitter tip configured to generate ions; an emitter-base mount configured to support the emitter tip; a mechanism configured to heat the emitter tip; an extraction electrode installed to face the emitter tip; and a mechanism configured to supply a gas to the vicinity of the emitter tip, wherein the emitter tip heating mechanism is a mechanism of heating the emitter tip by electrically conducting a filament connecting at least two terminals, the terminals are connected by a V-shaped filament, an angle of the V shape is an obtuse angle, and the emitter tip is connected to a substantial center of the filament.
摘要翻译：提供了一种具有发射极尖端的远端的小的机械振动振幅的带电粒子束显微镜，能够获得超高分辨率的样本观察图像并且去除样本观察图像的抖动等。气体场离子源包括：配置成产生离子的发射极尖端; 配置为支撑发射极尖端的发射极 - 基极安装座; 构造成加热发射极尖端的机构; 安装成面向发射极尖端的引出电极; 以及构造成将气体供给到发射极尖端附近的机构，其中发射极尖端加热机构是通过导电连接至少两个端子的灯丝来加热发射极尖端的机构，所述端子通过V形灯丝，V形的角度是钝角，并且发射极尖端连接到灯丝的大致中心。

2. 发明授权

US09653256B2 Charged particle-beam device 有权
公开(公告)号：US09653256B2
公开(公告)日：2017-05-16
申请号：US15035265
申请日：2014-11-05
申请人： Hitachi High-Technologies Corporation
发明人： Akira Ikegami , Hideto Dohi , Hideyuki Kazumi , Yoichi Ose , Naomasa Suzuki , Momoyo Enyama , Ryuji Nishi , Akio Takaoka
IPC分类号： H01J3/26 , H01J37/28 , H01J37/147 , H01J37/153 , H01J3/12 , H01J37/14
CPC分类号： H01J37/28 , H01J3/12 , H01J37/14 , H01J37/147 , H01J37/153 , H01J2237/15 , H01J2237/2611 , H01J2237/2814
摘要： Provided is a charged-particle-beam device capable of simultaneously cancelling out a plurality of aberrations caused by non-uniform distribution of the opening angle and energy of a charged particle beam. The charged-particle-beam device is provided with an aberration generation lens for generating an aberration due to the charged particle beam passing off-axis, and a corrective lens for causing the trajectory of the charged particle beam to converge on the main surface of an objective lens irrespective of the energy of the charged particle beam. The main surface of the corrective lens is disposed at a crossover position at which a plurality of charged particle beams having differing opening angles converge after passing through the aberration generation lens.

3. 发明授权

US09058959B2 Scanning ion microscope and secondary particle control method 有权
标题翻译：扫描离子显微镜和二次粒子控制方法
公开(公告)号：US09058959B2
公开(公告)日：2015-06-16
申请号：US14363252
申请日：2012-11-08
申请人： Hitachi High-Technologies Corporation
发明人： Yoshimi Kawanami , Yoichi Ose
IPC分类号： H01J37/26 , H01J37/28 , H01J37/244 , H01J37/22 , H01J37/20
CPC分类号： H01J37/28 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/265 , H01J37/317 , H01J2237/0473 , H01J2237/0807 , H01J2237/2806 , H01J2237/2807
摘要： The present invention is provided to enable a detailed inspection of a specimen and preventing a distortion of an observation image even when a specimen containing an insulating material is partially charged. For a scanning ion microscope utilizing a gas field ionization ion source, a thin film is disposed between an ion optical system and a specimen, and an ion beam is applied to and transmitted through this thin film in order to focus a neutralized beam on the specimen. Furthermore, an electrode for regulating secondary electrons discharged from this thin film is provided in order to eliminate mixing of noises into an observation image.
摘要翻译：提供本发明，以便即使当含有绝缘材料的样本被部分充电时，也能够对样本进行详细检查并防止观察图像的变形。对于使用气体电离离子源的扫描离子显微镜，在离子光学系统和样品之间设置薄膜，并且将离子束施加并透过该薄膜，以将中和的光束聚焦在样品上。此外，设置用于调节从该薄膜排出的二次电子的电极，以消除噪声对观察图像的混合。

4. 发明申请

US20150060654A1 CHARGED PARTICLE BEAM DEVICE AND ARITHMETIC DEVICE 有权
标题翻译：充电颗粒光束装置和算术装置
公开(公告)号：US20150060654A1
公开(公告)日：2015-03-05
申请号：US14373123
申请日：2012-12-17
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Kotoko Urano , Tomonori Nakano , Yoichi Ose
IPC分类号： H01J37/28 , G01Q40/00
CPC分类号： H01J37/28 , G01Q40/00 , H01J37/153 , H01J2237/1534 , H01J2237/28 , H01J2237/2809
摘要： It is possible to determine an optimal parasitic aberration adjustment amount even when the relationship of the parasitic aberration adjustment amount with respect to the field intensity of multiple poles changes nonlinearly. To this end, in the present invention, an aberration correction amount is computed by measuring an aberration coefficient of an optical unit of a charged particle beam device, and at the same time, the present value of a power supply control value applied to an aberration corrector is measured. Then, the parasitic aberration adjustment amount for suppressing the amount of a parasitic aberration generated in the aberration corrector is computed on the basis of the aberration correction amount and the present value of the power supply control value.
摘要翻译：即使当寄生像差调整量相对于多个磁场强度的关系非线性地变化时，也可以确定最佳的寄生像差调整量。为此，在本发明中，通过测量带电粒子束装置的光学单元的像差系数来计算像差校正量，同时，应用于像差的电源控制值的当前值校正器被测量。然后，基于像差校正量和电源控制值的当前值来计算用于抑制像差校正器中产生的寄生像差量的寄生像差调整量。

5. 发明申请

US20150048247A1 SCANNING ION MICROSCOPE AND SECONDARY PARTICLE CONTROL METHOD 有权
标题翻译：扫描离子显微镜和二次粒子控制方法
公开(公告)号：US20150048247A1
公开(公告)日：2015-02-19
申请号：US14363252
申请日：2012-11-08
申请人： Hitachi High-Technologies Corporation
发明人： Yoshimi Kawanami , Yoichi Ose
IPC分类号： H01J37/28 , H01J37/20 , H01J37/22 , H01J37/26 , H01J37/244
CPC分类号： H01J37/28 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/265 , H01J37/317 , H01J2237/0473 , H01J2237/0807 , H01J2237/2806 , H01J2237/2807
摘要： The present invention is provided to enable a detailed inspection of a specimen and preventing a distortion of an observation image even when a specimen containing an insulating material is partially charged. For a scanning ion microscope utilizing a gas field ionization ion source, a thin film is disposed between an ion optical system and a specimen, and an ion beam is applied to and transmitted through this thin film in order to focus a neutralized beam on the specimen. Furthermore, an electrode for regulating secondary electrons discharged from this thin film is provided in order to eliminate mixing of noises into an observation image.
摘要翻译：提供本发明，以便即使当含有绝缘材料的样本被部分充电时，也能够对样本进行详细检查并防止观察图像的变形。对于使用气体电离离子源的扫描离子显微镜，在离子光学系统和样品之间设置薄膜，并且将离子束施加并透过该薄膜，以将中和的光束聚焦在样品上。此外，设置用于调节从该薄膜排出的二次电子的电极，以消除噪声对观察图像的混合。

6. 发明授权

US09202668B2 Observation specimen for use in electron microscopy, electron microscopy, electron microscope, and device for producing observation specimen 有权
标题翻译：用于电子显微镜，电子显微镜，电子显微镜和观察样品生产装置的观察标本
公开(公告)号：US09202668B2
公开(公告)日：2015-12-01
申请号：US14354917
申请日：2012-10-16
申请人： Hitachi High-Technologies Corporation
发明人： Takafumi Miwa , Yoichi Ose , Eiko Nakazawa , Mami Konomi , Shunya Watanabe , Yoshinobu Kimura , Natsuki Tsuno
IPC分类号： G01N23/00 , H01J37/26 , G01B15/02 , H01J37/28 , H01J37/02
CPC分类号： H01J37/261 , G01B15/02 , G01N23/00 , H01J37/026 , H01J37/28 , H01J2237/0044 , Y10T428/24331 , Y10T428/261
摘要： The electrical charging by a primary electronic is inhibited to produce a clear edge contrast from an observation specimen (i.e., a specimen to be observed), whereby the shape of the surface of a sample can be measured with high accuracy. An observation specimen in which a liquid medium comprising an ionic liquid is formed in a thin-film-like or a webbing-film-like form on a sample is used. An electron microscopy using the observation specimen comprises: a step of measuring the thickness of a liquid medium comprising an ionic liquid on a sample; a step of controlling the conditions for irradiation with a primary electron on the basis of the thickness of the liquid medium comprising the ionic liquid; and a step of irradiating the sample with the primary electron under the above-mentioned primary electron irradiation conditions to form an image of the shape of the sample.
摘要翻译：一次电子的充电被抑制，从观察样本（即待观察的样本）产生清晰的边缘对比度，从而可以高精度地测量样品的表面形状。使用其中在样品上以薄膜状或织带膜状形成包含离子液体的液体介质的观察样本。使用观察样品的电子显微镜包括：测量在样品上包含离子液体的液体介质的厚度的步骤; 基于包含离子液体的液体介质的厚度控制用一次电子照射的条件的步骤; 以及在上述一次电子照射条件下用一次电子照射样品以形成样品形状的步骤。

7. 发明授权

US09640360B2 Ion source and ion beam device using same 有权
公开(公告)号：US09640360B2
公开(公告)日：2017-05-02
申请号：US14351559
申请日：2012-10-10
申请人： Hitachi High-Technologies Corporation
发明人： Hiroyasu Shichi , Shinichi Matsubara , Yoichi Ose , Yoshimi Kawanami , Noriaki Arai
IPC分类号： H01J27/02 , H01J37/08 , H01J37/28 , H01J37/26
CPC分类号： H01J27/022 , H01J37/08 , H01J37/26 , H01J37/28 , H01J2237/0216 , H01J2237/0807
摘要： Provided is a charged particle beam microscope which has a small mechanical vibration amplitude of a distal end of an emitter tip, is capable of obtaining an ultra-high resolution sample observation image and removing shaking or the like of the sample observation image. A gas field ion source includes: an emitter tip configured to generate ions; an emitter-base mount configured to support the emitter tip; a mechanism configured to heat the emitter tip; an extraction electrode installed to face the emitter tip; and a mechanism configured to supply a gas to the vicinity of the emitter tip, wherein the emitter tip heating mechanism is a mechanism of heating the emitter tip by electrically conducting a filament connecting at least two terminals, the terminals are connected by a V-shaped filament, an angle of the V shape is an obtuse angle, and the emitter tip is connected to a substantial center of the filament.

8. 发明授权

US09111716B2 Charged particle microscope 有权
标题翻译：带电粒子显微镜
公开(公告)号：US09111716B2
公开(公告)日：2015-08-18
申请号：US14397466
申请日：2013-04-24
申请人： Hitachi High-Technologies Corporation
发明人： Shinichi Matsubara , Yoshimi Kawanami , Hiroyuki Tanaka , Hiroyasu Shichi , Yoichi Ose
IPC分类号： H01J37/26 , H01J37/08 , H01J27/26 , H01J27/02 , H01J37/28
CPC分类号： H01J37/08 , H01J37/28 , H01J2237/002 , H01J2237/006 , H01J2237/0807
摘要： The ionized gas supplied to the emitter tip of a gas field ionization ion source is cooled and purified to enable supplying a reliable and stable ion beam. Impurities contained in the ionized gas destabilize the field ionization ion source. The invention is configured to include a first heat exchanger thermally connected to a part of the field ionization ion source, a cryocooler capable of cooling a second gas line and a cold head, the second gas line being connected to the first heat exchanger and circulating a refrigerant, and a second heat exchanger that cools the first and second gas lines and is connected to the cold head.
摘要翻译：供给到气田电离离子源的发射极尖端的电离气体被冷却和净化，以提供可靠和稳定的离子束。包含在电离气体中的杂质使场电离离子源稳定化。本发明被构造成包括与场电离离子源的一部分热连接的第一热交换器，能够冷却第二气体管线和冷头的低温冷却器，第二气体管线连接到第一热交换器并循环制冷剂和冷却第一和第二气体管线并连接到冷头的第二热交换器。

9. 发明授权

US10586674B2 Field emission electron source, method for manufacturing same, and electron beam device 有权
公开(公告)号：US10586674B2
公开(公告)日：2020-03-10
申请号：US16081372
申请日：2016-11-24
申请人： Hitachi High-Technologies Corporation
发明人： Toshiaki Kusunoki , Tomihiro Hashizume , Keigo Kasuya , Takashi Ohshima , Yusuke Sakai , Yoichi Ose , Noriaki Arai
IPC分类号： H01J37/073 , H01J1/22 , H01J1/304 , H01J9/02 , H01J37/28
摘要： In order to provide a stable hexaboride single-crystal field emission electron source capable of heat-flashing, this field emission electron source is provided with a metal filament, a metal tube joined thereto, a hexaboride tip that emits electrons, and graphite sheets that are independent of the metal tube and the hexaboride tip. The hexaboride tip is arranged so as not to be in structural contact with the metal tube due to the graphite sheets. The hexaboride tip, the graphite sheets, and the metal tube are configured so as to be mechanically and electrically in contact with one another.

10. 发明授权

US09530614B2 Charged particle beam device and arithmetic device 有权
标题翻译：带电粒子束装置和运算装置
公开(公告)号：US09530614B2
公开(公告)日：2016-12-27
申请号：US14373123
申请日：2012-12-17
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Kotoko Urano , Tomonori Nakano , Yoichi Ose
IPC分类号： H01J37/28 , H01J37/153 , G01Q40/00
CPC分类号： H01J37/28 , G01Q40/00 , H01J37/153 , H01J2237/1534 , H01J2237/28 , H01J2237/2809
摘要： It is possible to determine an optimal parasitic aberration adjustment amount even when the relationship of the parasitic aberration adjustment amount with respect to the field intensity of multiple poles changes nonlinearly. To this end, in the present invention, an aberration correction amount is computed by measuring an aberration coefficient of an optical unit of a charged particle beam device, and at the same time, the present value of a power supply control value applied to an aberration corrector is measured. Then, the parasitic aberration adjustment amount for suppressing the amount of a parasitic aberration generated in the aberration corrector is computed on the basis of the aberration correction amount and the present value of the power supply control value.
摘要翻译：即使当寄生像差调整量相对于多个磁场强度的关系非线性地变化时，也可以确定最佳的寄生像差调整量。为此，在本发明中，通过测量带电粒子束装置的光学单元的像差系数来计算像差校正量，同时，应用于像差的电源控制值的当前值校正器被测量。然后，基于像差校正量和电源控制值的当前值来计算用于抑制像差校正器中产生的寄生像差量的寄生像差调整量。

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