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1. 发明授权

US08488101B2 Immersion exposure apparatus and method that detects residual liquid on substrate held by substrate table on way from exposure position to unload position 有权
标题翻译：浸渍曝光装置和方法，其检测由曝光位置到卸载位置的基板台上保持的基板上的残留液体
公开(公告)号：US08488101B2
公开(公告)日：2013-07-16
申请号：US13067867
申请日：2011-06-30
申请人： Hiroaki Takaiwa , Takashi Horiuchi
发明人： Hiroaki Takaiwa , Takashi Horiuchi
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/42 , G03F7/7085 , G03F7/70916
摘要： A lithographic apparatus includes a substrate table which holds a substrate, a projection optical system which projects a patterned beam of radiation onto the substrate, a liquid supply member which supplies a liquid to a space between the projection optical system and the substrate, and a liquid detector which detects a liquid remaining on a surface of an exposed substrate before the exposed substrate is unloaded from the substrate table.
摘要翻译：光刻设备包括：保持基板的基板台，将图案化的辐射束投射到基板上的投影光学系统，向投影光学系统和基板之间的空间供应液体的液体供应部件，以及液体检测器，其在暴露的基板从衬底台卸载之前检测残留在暴露的衬底的表面上的液体。

2. 发明申请

US20110261331A1 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20110261331A1
公开(公告)日：2011-10-27
申请号：US13067867
申请日：2011-06-30
申请人： Hiroaki Takaiwa , Takashi Horiuchi
发明人： Hiroaki Takaiwa , Takashi Horiuchi
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/42 , G03F7/7085 , G03F7/70916
摘要： A lithographic apparatus includes a substrate table which holds a substrate, a projection optical system which projects a patterned beam of radiation onto the substrate, a liquid supply member which supplies a liquid to a space between the projection optical system and the substrate, and a liquid detector which detects a liquid remaining on a surface of an exposed substrate before the exposed substrate is unloaded from the substrate table.
摘要翻译：光刻设备包括：保持基板的基板台，将图案化的辐射束投射到基板上的投影光学系统，向投影光学系统和基板之间的空间供应液体的液体供应部件，以及液体检测器，其在暴露的基板从衬底台卸载之前检测残留在暴露的衬底的表面上的液体。

3. 发明申请

US20070159609A1 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20070159609A1
公开(公告)日：2007-07-12
申请号：US10587268
申请日：2005-01-28
申请人： Hiroaki Takaiwa , Takashi Horiuchi
发明人： Hiroaki Takaiwa , Takashi Horiuchi
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03B27/42 , G03F7/7085 , G03F7/70916
摘要： An exposure apparatus for exposing a substrate by emitting exposure light thereto through a projection optical system and liquid, has a detection apparatus that detects whether the liquid is present on an object disposed lower than a front end of the projection optical system. Another detection apparatus has an emitting portion that emits detection light to an immersion area between the projection optical system and an object disposed on an image plane side thereof, and a light-receiving portion disposed at a predetermined position for the detection light; therein, at least one of size and shape of the immersion area is obtained based on light receiving results. The detection apparatus is used to detect the presence of liquid on such lower-disposed object, the state of the immersion area, or shape or contact angle of the liquid. Optimal measures are taken, based on detection results, for maintaining high exposure and measurement accuracies.
摘要翻译：一种用于通过投影光学系统和液体向其发射曝光的曝光基板的曝光装置，具有检测装置，其检测液体是否存在于投影光学系统的前端下方的物体上。另一种检测装置具有发射部分，其向投影光学系统和设置在其图像平面侧的物体之间的浸没区域发射检测光;以及光接收部分，设置在用于检测光的预定位置; 其中，基于光接收结果获得浸渍区域的尺寸和形状中的至少一个。该检测装置用于检测这种下位物体上的液体的存在，浸渍区域的状态，或液体的形状或接触角。基于检测结果，采取最佳措施，保持高曝光和测量精度。

4. 发明授权

US07990517B2 Immersion exposure apparatus and device manufacturing method with residual liquid detector 有权
标题翻译：浸没曝光装置及装置制造方法与残液检测器
公开(公告)号：US07990517B2
公开(公告)日：2011-08-02
申请号：US11651551
申请日：2007-01-10
申请人： Hiroaki Takaiwa , Takashi Horiuchi
发明人： Hiroaki Takaiwa , Takashi Horiuchi
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/42 , G03F7/7085 , G03F7/70916
摘要： A lithographic projection apparatus includes a substrate table configured to hold a substrate, a projection system arranged to project a patterned beam of radiation onto the substrate, a liquid supply system configured to supply liquid to a space between the projection system and the substrate, and a residual liquid detector configured to detect liquid remaining on the substrate and/or the substrate table after an exposure is completed. A device manufacturing method includes projecting, using a projection system of a lithographic apparatus, a patterned beam of radiation through a liquid onto a substrate, the substrate being held by a substrate table, and, after the projecting is complete, detecting residual liquid on the substrate and/or the substrate table.
摘要翻译：光刻投影装置包括：被配置为保持基板的基板台;布置成将图案化的辐射束投射到基板上的投影系统;配置成将液体供应到投影系统和基板之间的空间的液体供应系统;以及剩余液体检测器被配置为在曝光完成之后检测残留在基板和/或基板台上的液体。一种器件制造方法包括使用光刻设备的投影系统将图案化的辐射束通过液体投影到衬底上，衬底由衬底台保持，并且在突出完成之后，检测残留液体衬底和/或衬底台。

5. 发明申请

US20110261345A1 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20110261345A1
公开(公告)日：2011-10-27
申请号：US13067842
申请日：2011-06-29
申请人： Hiroaki Takaiwa , Takashi Horiuchi
发明人： Hiroaki Takaiwa , Takashi Horiuchi
IPC分类号： G03B27/32
CPC分类号： G03F7/70341 , G03B27/42 , G03F7/7085 , G03F7/70916
摘要： A lithographic projection apparatus includes a substrate table configured to hold a substrate, a projection system arranged to project a patterned beam of radiation onto the substrate, a liquid supply system configured to supply liquid to a space between the projection system and the substrate, and a residual liquid detector configured to detect liquid remaining on the substrate and/or the substrate table after an exposure is completed.
摘要翻译：光刻投影装置包括：被配置为保持基板的基板台;布置成将图案化的辐射束投射到基板上的投影系统;配置成将液体供应到投影系统和基板之间的空间的液体供应系统;以及剩余液体检测器被配置为在曝光完成之后检测残留在基板和/或基板台上的液体。

6. 发明授权

US08767168B2 Immersion exposure apparatus and method that detects residual liquid on substrate held by substrate table after exposure 有权
标题翻译：浸渍曝光装置和方法，其在曝光后检测由基板台保持的基板上的残留液体
公开(公告)号：US08767168B2
公开(公告)日：2014-07-01
申请号：US13067842
申请日：2011-06-29
申请人： Hiroaki Takaiwa , Takashi Horiuchi
发明人： Hiroaki Takaiwa , Takashi Horiuchi
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/42 , G03F7/7085 , G03F7/70916
摘要： A lithographic projection apparatus includes a substrate table configured to hold a substrate, a projection system arranged to project a patterned beam of radiation onto the substrate, a liquid supply system configured to supply liquid to a space between the projection system and the substrate, and a residual liquid detector configured to detect liquid remaining on the substrate and/or the substrate table after an exposure is completed.
摘要翻译：光刻投影装置包括：被配置为保持基板的基板台;布置成将图案化的辐射束投射到基板上的投影系统;配置成将液体供应到投影系统和基板之间的空间的液体供应系统，以及剩余液体检测器被配置为在曝光完成之后检测残留在基板和/或基板台上的液体。

7. 发明授权

US07990516B2 Immersion exposure apparatus and device manufacturing method with liquid detection apparatus 有权
标题翻译：浸液曝光装置及液体检测装置的装置制造方法
公开(公告)号：US07990516B2
公开(公告)日：2011-08-02
申请号：US10587268
申请日：2005-01-28
申请人： Hiroaki Takaiwa , Takashi Horiuchi
发明人： Hiroaki Takaiwa , Takashi Horiuchi
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/42 , G03F7/7085 , G03F7/70916
摘要： An exposure apparatus for exposing a substrate by emitting exposure light thereto through a projection optical system and liquid, has a detection apparatus that detects whether the liquid is present on an object disposed lower than a front end of the projection optical system. Another detection apparatus has an emitting portion that emits detection light to an immersion area between the projection optical system and an object disposed on an image plane side thereof, and a light-receiving portion disposed at a predetermined position for the detection light; therein, at least one of size and shape of the immersion area is obtained based on light receiving results. The detection apparatus is used to detect the presence of liquid on such lower-disposed object, the state of the immersion area, or shape or contact angle of the liquid. Optimal measures are taken, based on detection results, for maintaining high exposure and measurement accuracies.
摘要翻译：一种用于通过投影光学系统和液体向其发射曝光的曝光基板的曝光装置，具有检测装置，其检测液体是否存在于投影光学系统的前端下方的物体上。另一种检测装置具有发射部分，其向投影光学系统和设置在其图像平面侧的物体之间的浸没区域发射检测光;以及光接收部分，设置在用于检测光的预定位置; 其中，基于光接收结果获得浸渍区域的尺寸和形状中的至少一个。该检测装置用于检测这种下位物体上的液体的存在，浸渍区域的状态，或液体的形状或接触角。基于检测结果，采取最佳措施，保持高曝光和测量精度。

8. 发明申请

US20070109517A1 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20070109517A1
公开(公告)日：2007-05-17
申请号：US11651551
申请日：2007-01-10
申请人： Hiroaki Takaiwa , Takashi Horiuchi
发明人： Hiroaki Takaiwa , Takashi Horiuchi
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03B27/42 , G03F7/7085 , G03F7/70916
摘要： A lithographic projection apparatus includes a substrate table configured to hold a substrate, a projection system arranged to project a patterned beam of radiation onto the substrate, a liquid supply system configured to supply liquid to a space between the projection system and the substrate, and a residual liquid detector configured to detect liquid remaining on the substrate and/or the substrate table after an exposure is completed. A device manufacturing method includes projecting, using a projection system of a lithographic apparatus, a patterned beam of radiation through a liquid onto a substrate, the substrate being held by a substrate table, and, after the projecting is complete, detecting residual liquid on the substrate and/or the substrate table.
摘要翻译：光刻投影装置包括：被配置为保持基板的基板台;布置成将图案化的辐射束投射到基板上的投影系统;配置成将液体供应到投影系统和基板之间的空间的液体供应系统;以及剩余液体检测器被配置为在曝光完成之后检测残留在基板和/或基板台上的液体。一种器件制造方法包括使用光刻设备的投影系统将图案化的辐射束通过液体投影到衬底上，衬底由衬底台保持，并且在突出完成之后，检测残留液体衬底和/或衬底台。

9. 发明授权

US09041901B2 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method 有权
公开(公告)号：US09041901B2
公开(公告)日：2015-05-26
申请号：US12318574
申请日：2008-12-31
申请人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
发明人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70533 , G03F7/70866 , G03F7/70933 , G03F7/70991
摘要： A lithographic projection apparatus includes a substrate table by which a substrate is held, a projection system via which a patterned beam is projected onto the substrate to expose the substrate through liquid, and a liquid supply system. The liquid supply system includes a supply flow path, and supplies the liquid via the supply flow path during the exposure. The liquid supply system also includes a device by which the supply flow path is connected with a vacuum system to prevent liquid in the supply flow path from leaking.

10. 发明授权

US07826031B2 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method 有权
公开(公告)号：US07826031B2
公开(公告)日：2010-11-02
申请号：US11606935
申请日：2006-12-01
申请人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
发明人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
IPC分类号： G03B27/52 , G03B27/42 , G03B27/58 , G03B27/32
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70533 , G03F7/70866 , G03F7/70933 , G03F7/70991
摘要： An exposure apparatus exposes a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid that fills a gap between the projection optical system and the substrate. The exposure apparatus has a liquid recovery mechanism with a drive section powered by electric power supplied from a commercial power source and an uninterruptible power source separate from the commercial power source. When the commercial power source has a failure, the supply of electric power to the drive section is switched to the uninterruptible power source.

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