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    • 5. 发明授权
    • Undercoating material for photosensitive resins
    • 感光树脂底漆材料
    • US4902770A
    • 1990-02-20
    • US52466
    • 1987-05-20
    • Wataru IshiiShozo MiyazawaShinji TsuchiyaHisashi NakaneAkira Yokota
    • Wataru IshiiShozo MiyazawaShinji TsuchiyaHisashi NakaneAkira Yokota
    • G03F7/09G03F7/11
    • G03F7/11G03F7/094
    • The undercoating composition of the invention, useful for providing an undercoating layer for a top coat of a photosensitive resist layer on a substrate surface, comprises, as a principal ingredient thereof, a condensation product obtained by the condensation reaction between a hydroxy-substituted diphenylamine and a melamine compound substituted on the nitrogen atoms with methylol groups and/or alkoxymethyl groups. The undercoating obtained of the composition is highly resistant against the attack by the overcoating solution applied thereon so that the fidelity of the pattern reproduction by the photolithographic technique is greatly improved by virtue of the absence of any disorder at the interface between the undercoating and top coat layers. The advantage is further increased when the undercoating composition further comprises a photoextinctive agent, e.g. a dye, having absorptivity in the wave length region where the photosensitive resist of the top coat has sensitivity.
    • 本发明的底涂层组合物可用作在基材表面上提供感光性抗蚀剂层的顶涂层的底涂层,其主要成分为通过羟基取代的二苯胺和 在氮原子上被羟甲基和/或烷氧基甲基取代的三聚氰胺化合物。 获得的组合物的底漆对于施加在其上的外涂层溶液的侵蚀是高度抗性的,使得由于在底漆和面漆之间的界面处没有任何障碍,通过光刻技术的图案再现的保真度被大大提高 层。 当底涂层组合物还包含光致纤维素剂,例如, 染料,其表面涂层的光敏抗蚀剂具有敏感性的波长区域具有吸收性。
    • 7. 发明申请
    • CAD APPARATUS AND PROGRAM USED IN THE SAME
    • CAD设备和程序在其中使用
    • US20090119633A1
    • 2009-05-07
    • US12093833
    • 2006-11-14
    • Hiroki GotoShuji OnoShinji Tsuchiya
    • Hiroki GotoShuji OnoShinji Tsuchiya
    • G06F17/50
    • G06F17/5095G06F2217/36
    • A CAD apparatus is comprised of: input unit 102A for inputting design input information of the component model by a CAD operator; sequence information storage unit 105A for previously storing thereinto sequence information corresponding to information produced by dividing all of designing processes related to the component model and by ordering the divided designing processes; designing reference storage unit 105B for previously storing thereinto a designing reference which constitutes a reference for designing the component model, and has been allocated to each of the plural-divided designing processes; designing unit 101A for judging whether or not the designing input information entered in each of the designing processes can satisfy the designing reference, and for automatically designing the component model allocated to the designing process and for permitting a transfer to the next designing process in such a case that the designing unit judges that the designing input information can satisfy the designing reference; and display unit capable of displaying thereon at least the component model designed by the designing unit 101A.
    • CAD装置包括:用于由CAD操作者输入部件模型的设计输入信息的输入单元102A; 序列信息存储单元105A,用于预先存储对应于通过划分与组件模型相关的所有设计过程产生的信息的序列信息,并且通过对分割的设计过程进行排序; 设计参考存储单元105B,用于预先存储构成用于设计组件模型的参考的设计参考,并且已经分配给多个分割设计过程中的每一个; 设计单元101A,用于判断输入到每个设计过程中的设计输入信息是否可以满足设计参考,并且用于自动设计分配给设计过程的组件模型并允许转移到下一个设计过程中 设计单元判断设计输入信息可以满足设计参考的情况; 以及至少能够在其上显示由设计单元101A设计的组件模型的显示单元。
    • 8. 发明授权
    • Indoline compound and 5-HT.sub.3 receptor antagonist containing the same
as active ingredient
    • 二氢吲哚化合物和含有与活性成分相同的5-HT 3受体拮抗剂
    • US5677326A
    • 1997-10-14
    • US624417
    • 1996-03-29
    • Shinji TsuchiyaNobuyuki YasudaAtsushi FukuzakiKoichi Kazama
    • Shinji TsuchiyaNobuyuki YasudaAtsushi FukuzakiKoichi Kazama
    • C07D403/06A61K31/415
    • C07D403/06
    • Indoline compounds represented by the general formula: ##STR1## wherein R.sup.1 represents the group ##STR2## R.sup.2 represents a phenyl group which may be substituted or an aromatic heterocyclic group, and R.sup.3 represents hydrogen, a halogen, or a lower alkyl group, hydroxyl group, lower alkoxy group, carbamoyl group or lower alkoxycarbonyl group, and physiologically acceptable salts thereof, and their solvates, as well as 5-HT.sub.3 receptor antagonists containing them as effective components. The indoline compounds of the invention have stronger antagonism against intestinal 5-HT.sub.3 receptors than known 5-HT.sub.3 receptor antagonists and also have excellent sustained action, making them useful as prophylactic or therapeutic agents against vomiting or irritancy induced by chemotherapy or radiation, irritable bowel syndrome, diarrhea, and the like.
    • PCT No.PCT / JP94 / 01641 Sec。 371日期:1996年3月29日 102(e)1996年3月29日PCT 1994年9月30日PCT PCT。 出版物WO95 / 09168 日期1995年4月6日由通式表示的二氢化合物:其中R 1表示基团R 2表示可被取代的苯基或芳族杂环基,R 3表示氢,卤素或低级 烷基,羟基,低级烷氧基,氨基甲酰基或低级烷氧基羰基及其生理学上可接受的盐及其溶剂化物,以及含有它们作为有效成分的5-HT 3受体拮抗剂。 本发明的二氢吲哚化合物比已知的5-HT 3受体拮抗剂对肠道5-HT 3受体具有更强的拮抗作用,并且还具有优异的持续作用,使其可用作预防或治疗药物,用于通过化学疗法或辐射引起的呕吐或刺激,肠易激综合征 ,腹泻等。