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1. 发明申请

US20210341362A1 AUTOMATIC SAMPLE PREPARATION APPARATUS 有权
公开(公告)号：US20210341362A1
公开(公告)日：2021-11-04
申请号：US17373932
申请日：2021-07-13
申请人： Hitachi High-Tech Science Corporation
发明人： Atsushi Uemoto , Tatsuya Asahata , Makoto Sato , Yo Yamamoto
IPC分类号： G01N1/44 , H01J37/317 , H01J37/31 , G01N1/28
摘要： An automatic sample preparation apparatus that automatically prepares a sample piece from a sample and includes a focused ion beam irradiation optical system, an electron beam irradiation optical system configured to irradiate an electron beam from a direction different from a direction of the focused ion beam, a sample piece transfer device configured to hold and transfer the sample piece separated and extracted from the sample, a detector configured to detect secondary charged particles emitted from an irradiation object, and a computer configured to recognize a position of the sample piece transfer device by image-recognition using an image data of the focused ion beam and the electron beam generated by irradiating the sample piece transfer device with the focused ion beam and the electron beam, and drive the sample piece transfer device, wherein the image data includes a reference mark.

2. 发明申请

US20200278281A1 AUTOMATIC SAMPLE PREPARATION APPARATUS 审中-公开
公开(公告)号：US20200278281A1
公开(公告)日：2020-09-03
申请号：US16877621
申请日：2020-05-19
申请人： Hitachi High-Tech Science Corporation
发明人： Atsushi Uemoto , Tatsuya Asahata , Makoto Sato , Yo Yamamoto
IPC分类号： G01N1/44 , G01N1/28 , H01J37/31 , H01J37/317
摘要： A charged particle beam device (10a) includes a computer (21) which controls multiple charged particle beam irradiation optical systems, the needle (18), and a gas supply portion (17) to transfer a sample piece Q to a predetermined position of the sample piece holder P, based on at least images of a sample piece holder (P), a needle (18), and the sample piece (Q) previously acquired by multiple charged particle beams.

3. 发明申请

US20170122852A1 AUTOMATIC SAMPLE PREPARATION APPARATUS 审中-公开
公开(公告)号：US20170122852A1
公开(公告)日：2017-05-04
申请号：US15317030
申请日：2015-06-29
申请人： Hitachi High-Tech Science Corporation
发明人： Atsushi Uemoto , Tatsuya Asahata , Makoto Sato , Yo Yamamoto
IPC分类号： G01N1/44 , H01J37/31 , H01J37/317
CPC分类号： G01N1/44 , G01N1/28 , H01J37/31 , H01J37/317
摘要： A charged particle beam device (10a) includes a computer (21) which controls multiple charged particle beam irradiation optical systems, the needle (18), and a gas supply portion (17) to transfer a sample piece Q to a predetermined position of the sample piece holder P, based on at least images of a sample piece holder (P), a needle (18), and the sample piece (Q) previously acquired by multiple charged particle beams.

4. 发明授权

US09548185B2 Cross section processing method and cross section processing apparatus 有权
标题翻译：截面加工方法及截面加工装置
公开(公告)号：US09548185B2
公开(公告)日：2017-01-17
申请号：US14520595
申请日：2014-10-22
申请人： HITACHI HIGH-TECH SCIENCE CORPORATION
发明人： Hidekazu Suzuki , Tatsuya Asahata , Atsushi Uemoto
IPC分类号： H01J37/26 , H01J37/305 , G01N1/32 , H01J37/304
CPC分类号： H01J37/3056 , G01N1/32 , H01J37/304 , H01J2237/31745
摘要： A cross section processing method and a cross section processing apparatus are provided in which it is possible to form a flat cross section in a sample composed of a plurality of substances having different hardness by a focused ion beam. The etching of a processing area is performed while variably controlling the irradiation interval, the irradiation time, or the like of a focused ion beam based on cross section information of an SEM image obtained by the observation of a cross section. In this way, even if a sample is composed of a plurality of substances having different hardness, it is possible to form a flat observation surface with a uniform etching rate.
摘要翻译：提供一种横截面加工方法和横截面加工装置，其中可以在通过聚焦离子束由具有不同硬度的多种物质组成的样品中形成平坦的横截面。基于通过观察截面获得的SEM图像的横截面信息，可以可变地控制聚焦离子束的照射间隔，照射时间等进行处理区域的蚀刻。以这种方式，即使样品由具有不同硬度的多种物质组成，也可以形成具有均匀蚀刻速率的平坦观察面。

5. 发明授权

US09455119B2 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US09455119B2
公开(公告)日：2016-09-27
申请号：US14665391
申请日：2015-03-23
申请人： HITACHI HIGH-TECH SCIENCE CORPORATION
发明人： Makoto Sato , Tatsuya Asahata , Masahiro Kiyohara , Ikuko Nakatani
IPC分类号： H01J37/26 , G21K5/04 , H01J37/28
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/30438
摘要： A charged particle beam apparatus is provided with a controller configured to control other components and perform operations including: an irradiating operation to irradiate a first position of a sample with a charged particle beam while gradually changing a scan range of the charged particle beam to move from a first position; a first image acquiring operation to acquire an image of each portion where the charged particle beam moves; an indicator forming operation to form an indicator at a second position by the charged particle beam when the scan range of the charged particle beam reaches the second position; a second image acquiring operation to acquire an image of the second position in a state where the indicator is formed; and an adjusting operation to adjust relative position between the stage and the scan range of the charged particle beam.
摘要翻译：带电粒子束装置设置有控制器，其被配置为控制其他部件并执行操作，包括：照射操作，用于在逐渐改变带电粒子束的扫描范围以从第一职位第一图像获取操作，用于获取所述带电粒子束移动的每个部分的图像; 指示器形成操作，当带电粒子束的扫描范围达到第二位置时，通过带电粒子束在第二位置形成指示器; 第二图像获取操作，用于在形成指示器的状态下获取第二位置的图像; 以及调整操作，以调整带电粒子束的阶段和扫描范围之间的相对位置。

6. 发明授权

US09202671B2 Charged particle beam apparatus and sample processing method using charged particle beam apparatus 有权
标题翻译：带电粒子束装置和采用带电粒子束装置的样品处理方法
公开(公告)号：US09202671B2
公开(公告)日：2015-12-01
申请号：US14220981
申请日：2014-03-20
申请人： HITACHI HIGH-TECH SCIENCE CORPORATION
发明人： Xin Man , Atsushi Uemoto , Tatsuya Asahata
IPC分类号： H01J37/252 , H01J37/26 , H01J37/30
CPC分类号： H01J37/3002 , H01J37/252 , H01J37/26 , H01J37/304 , H01J37/3056 , H01J2237/30455
摘要： A charged particle beam apparatus includes a sample stage, a focused ion beam column, a scattered electron detector that detects backscattered electrons generated from a cross-section of a sample, a crystal orientation information generation unit that generates crystal orientation information on a predetermined region of the cross-section, and an angle calculation unit that calculates attachment angles of the sample stage, corresponding to a direction of the cross-section. In response to receiving input of information indicating that the crystal orientation information on the region displayed on a display unit is changed to aimed second crystal orientation information, the angle calculation unit calculates the attachment angles corresponding to the direction of the cross-section for generating the second crystal orientation information, and the focused ion beam column performs etching processing on the cross-section at the calculated attachment angles.
摘要翻译：带电粒子束装置包括：样品台，聚焦离子束柱，检测从样品的横截面产生的反向散射电子的散射电子检测器;晶体取向信息生成单元，其在预定区域上生成晶体取向信息; 横截面，以及角度计算单元，其计算与横截面方向对应的样品台的附着角度。响应于接收到指示将显示在显示单元上的区域的晶体取向信息改变为目标第二晶体取向信息的信息的输入，角度计算单元计算与用于生成显示单元的横截面的方向相对应的附着角度第二晶体取向信息，聚焦离子束列以计算出的安装角度对横截面进行蚀刻处理。

7. 发明授权

US09111717B2 Ion beam apparatus 有权
标题翻译：离子束装置
公开(公告)号：US09111717B2
公开(公告)日：2015-08-18
申请号：US13845582
申请日：2013-03-18
申请人： HITACHI HIGH-TECH SCIENCE CORPORATION
发明人： Tatsuya Asahata , Yasuhiko Sugiyama , Hiroshi Oba
IPC分类号： H01J37/10 , H01J37/302 , H01J37/305
CPC分类号： H01J37/10 , H01J37/302 , H01J37/3056 , H01J2237/0206 , H01J2237/04924 , H01J2237/216 , H01J2237/24535 , H01J2237/31749
摘要： An ion beam apparatus includes an ion source configured to emit an ion beam, a condenser lens electrode that condenses the ion beam, and a condenser lens power source configured to apply a voltage to the condenser lens electrode. A storage portion stores a first voltage value, a second voltage value, a third voltage value, and a fourth voltage value. A control portion retrieves the third voltage value from the storage portion and sets the retrieved third voltage value to the condenser lens power source when an observation mode is switched to a wide-range observation mode, and retrieves the fourth voltage value from the storage portion and sets the retrieved fourth voltage value to the condenser lens power source when a processing mode is switched to the wide-range observation mode.
摘要翻译：离子束装置包括被配置为发射离子束的离子源，冷凝离子束的聚光透镜电极和被配置为向聚光透镜电极施加电压的聚光透镜电源。存储部分存储第一电压值，第二电压值，第三电压值和第四电压值。当观察模式切换到大范围观察模式时，控制部分从存储部分检索第三电压值，并将获取的第三电压值设置为聚光透镜电源，并从存储部分检索第四电压值，当处理模式切换到大范围观察模式时，将检索到的第四电压值设置为聚光透镜电源。

8. 发明授权

US11335534B2 Particle beam irradiation apparatus 有权
公开(公告)号：US11335534B2
公开(公告)日：2022-05-17
申请号：US17027341
申请日：2020-09-21
申请人： HITACHI HIGH-TECH SCIENCE CORPORATION
发明人： Takuma Aso , Xin Man , Makoto Sato , Tatsuya Asahata
IPC分类号： H01J37/22 , H01J37/244 , H01J37/28 , H01J37/30 , H01J37/26
摘要： The particle beam irradiation apparatus includes: an irradiation unit configured to radiate a particle beam; a first detection unit configured to detect first particles; a second detection unit configured to detect second particles; an image forming unit configured to form an observation image based on a first signal obtained by the detection of the first particles, which is performed by the first detection unit, and to form an observation image based on a second signal obtained by the detection of the second particles, which is performed by the second detection unit; and a control unit configured to calculate a brightness of a first region in the formed first observation image and perform a brightness adjustment of the first detection unit based on a first target brightness as a first brightness adjustment when the brightness of the first region is different from the first target brightness.

9. 发明授权

US11239046B2 Charged particle beam apparatus 有权
公开(公告)号：US11239046B2
公开(公告)日：2022-02-01
申请号：US17030992
申请日：2020-09-24
申请人： HITACHI HIGH-TECH SCIENCE CORPORATION
发明人： Ayana Muraki , Atsushi Uemoto , Tatsuya Asahata
IPC分类号： H01J37/20 , H01J37/26 , H01J37/22 , H01J37/304 , H01J37/30
摘要： To stabilize automated MS, provided is a charged particle beam apparatus, which is configured to automatically fabricate a sample piece from a sample, the charged particle beam apparatus including: a charged particle beam irradiation optical system configured to radiate a charged particle beam; a sample stage configured to move the sample that is placed on the sample stage; a sample piece transportation unit configured to hold and convey the sample piece separated and extracted from the sample; a holder fixing base configured to hold a sample piece holder to which the sample piece is transported; and a computer configured to perform control of a position with respect to a target, based on: a result of second determination about the position, which is executed depending on a result of first determination about the position; and information including an image that is obtained by irradiation with the charged particle beam.

10. 发明授权

US10832890B2 Charged particle beam device 有权
公开(公告)号：US10832890B2
公开(公告)日：2020-11-10
申请号：US16364898
申请日：2019-03-26
申请人： HITACHI HIGH-TECH SCIENCE CORPORATION
发明人： Masato Suzuki , Satoshi Tomimatsu , Makoto Sato , Tatsuya Asahata
IPC分类号： H01J37/305 , H01J37/20
摘要： To automatically repeat an operation of isolating a sample piece, which is formed by processing a sample with an ion beam, and transferring the sample piece to a sample piece holder, a charged particle beam device includes a computer configured to perform control so that, without rotating a needle with which the sample piece is fixed to the sample piece holder, a deposition film deposited on the needle is irradiated with a charged particle beam from a charged particle beam irradiation optical system.

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