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1. 发明申请

US20180197716A1 ION IMPLANTATION METHOD AND ION IMPLANTATION APPARATUS 审中-公开
公开(公告)号：US20180197716A1
公开(公告)日：2018-07-12
申请号：US15862335
申请日：2018-01-04
申请人： SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.
发明人： Haruka Sasaki
IPC分类号： H01J37/317 , H01J37/05 , H05H15/00
CPC分类号： H01J37/3171 , H01J37/05 , H01J37/304 , H01J2237/0473 , H01J2237/04924 , H01J2237/24535 , H05H7/001 , H05H9/041 , H05H15/00 , H05H2277/12
摘要： An ion implantation apparatus includes: a multistage linear acceleration unit including a plurality of stages of high-frequency resonators and a plurality of stages of focusing lenses; a first beam measuring unit disposed in the middle of the multistage linear acceleration unit and configured to allow passage of a beam portion adjacent to a center of a beam trajectory and measure a current intensity of another beam portion blocked by an electrode body outside a vicinity of the center of the beam trajectory; a second beam measuring unit disposed downstream of the multistage linear acceleration unit and configured to measure a current intensity of an ion beam exiting from the multistage linear acceleration unit; and a control device configured to adjust a control parameter of the plurality of stages of focusing lenses based on measurement results of the first and second beam measuring units.

2. 发明授权

US09666407B2 Electrostatic quadrupole deflector for microcolumn 有权
公开(公告)号：US09666407B2
公开(公告)日：2017-05-30
申请号：US14631330
申请日：2015-02-25
申请人： Tae Sik Oh , Ho Seob Kim , Dae Wook Kim
发明人： Tae Sik Oh , Ho Seob Kim , Dae Wook Kim
IPC分类号： H01J37/147 , H01J37/073 , H01J37/26 , H01J9/02
CPC分类号： H01J37/1477 , H01J9/02 , H01J37/073 , H01J37/26 , H01J2237/04924 , H01J2237/1516
摘要： Disclosed is an electrostatic quadrupole deflector for a microcolumn. The deflector includes an electron beam passage hole, deflecting electrodes to which a deflection voltage is applied, and floating electrodes to which the deflection voltage is not applied. The deflector is structurally stable and has a simple driving system. The deflector has good performance and characteristics.

3. 发明授权

US09396903B1 Apparatus and method to control ion beam current 有权
标题翻译：控制离子束电流的装置和方法
公开(公告)号：US09396903B1
公开(公告)日：2016-07-19
申请号：US14615602
申请日：2015-02-06
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： Shengwu Chang , Kristen S. Rounds , William Leavitt , Michael St. Peter
IPC分类号： C23C14/48 , G21K1/08 , H01J37/317 , H01J37/08 , H01J37/10
CPC分类号： H01J37/08 , H01J37/3171 , H01J2237/024 , H01J2237/04735 , H01J2237/04756 , H01J2237/04924
摘要： An apparatus to control an ion beam for treating a substrate. The apparatus may include a fixed electrode configured to conduct the ion beam through a fixed electrode aperture and to apply a fixed electrode potential to the ion beam, a ground electrode assembly disposed downstream of the fixed electrode. The ground electrode assembly may include a base and a ground electrode disposed adjacent the fixed electrode and configured to conduct the ion beam through a ground electrode aperture, the ground electrode being reversibly movable along a first axis with respect to the fixed electrode between a first position and a second position, wherein a beam current of the ion beam at the substrate varies when the ground electrode moves between the first position and second position.
摘要翻译：控制用于处理基板的离子束的装置。该装置可以包括固定电极，其被配置为使离子束通过固定电极孔并且将固定电极电位施加到离子束，设置在固定电极下游的接地电极组件。接地电极组件可以包括基部和邻近固定电极设置的接地电极，并且被配置为使离子束通过接地电极孔，接地电极可相对于固定电极的第一轴线在第一位置以及第二位置，其中当所述接地电极在所述第一位置和所述第二位置之间移动时，所述衬底处的离子束的束电流变化。

4. 发明申请

US20130248732A1 ION BEAM APPARATUS 有权
标题翻译：离子束设备
公开(公告)号：US20130248732A1
公开(公告)日：2013-09-26
申请号：US13845582
申请日：2013-03-18
申请人： HITACHI HIGH-TECH SCIENCE CORPORATION
发明人： Tatsuya ASAHATA , Yasuhiko SUGIYAMA , Hiroshi OBA
IPC分类号： H01J37/10
CPC分类号： H01J37/10 , H01J37/302 , H01J37/3056 , H01J2237/0206 , H01J2237/04924 , H01J2237/216 , H01J2237/24535 , H01J2237/31749
摘要： An ion beam apparatus including: an ion source configured to emit an ion beam; a condenser lens electrode configured to condense the ion beam; a condenser lens power source configured to apply a voltage to the condenser lens electrode; a storage portion configured to store, a first voltage value, a second voltage value, a third voltage value, and a fourth voltage value; and a control portion configured to retrieve the third voltage value from the storage portion and set the retrieved third voltage value to the condenser lens power source when an observation mode is switched to a wide-range observation mode, and retrieve the fourth voltage value from the storage portion and set the retrieved fourth voltage value to the condenser lens power source when a processing mode is switched to the wide-range observation mode.
摘要翻译：一种离子束装置，包括：被配置为发射离子束的离子源; 配置成冷凝离子束的聚光透镜电极; 聚光透镜电源，被配置为向聚光透镜电极施加电压; 存储部，被配置为存储第一电压值，第二电压值，第三电压值和第四电压值; 以及控制部，被配置为当观察模式切换到宽范围观察模式时，从存储部分检索第三电压值，并将检索到的第三电压值设置为聚光透镜电源，并且从第存储部分，并且当处理模式切换到宽范围观察模式时，将获取的第四电压值设置到聚光透镜电源。

5. 发明申请

US20120295203A1 DRAWING APPARATUS AND METHOD OF MANUFACTURING ARTICLE 失效
标题翻译：绘图装置和制造方法
公开(公告)号：US20120295203A1
公开(公告)日：2012-11-22
申请号：US13471322
申请日：2012-05-14
申请人： Kentaro Sano
发明人： Kentaro Sano
IPC分类号： H01J3/20 , G03F7/20
CPC分类号： H01J37/3007 , B82Y10/00 , B82Y40/00 , H01J37/3177 , H01J2237/04924 , H01J2237/1501 , H01J2237/1534
摘要： A drawing apparatus includes an aperture array, a lens array configured to form a plurality of crossovers of a plurality of charged particle beams from the aperture array, and a projection system including an element having a single aperture and configured to converge the plurality of charged particle beams corresponding to the plurality of crossovers and to project the plurality of charged particle beams having passed through the single aperture onto the substrate. The lens array includes a correction lens array including a converging lens eccentric relative to corresponding one of a plurality of apertures of the aperture array such that the plurality of charged particle beams converged according to aberration of the projection system are converged to the single aperture. The lens array includes a magnifying lens array configured, so as to form the plurality of crossovers, to magnify a plurality of crossovers formed by the correction lens array.
摘要翻译：一种绘图装置，包括孔径阵列，透镜阵列，被配置为从孔径阵列形成多个带电粒子束的多个交叉点;以及投影系统，包括具有单个孔的元件，并且被配置成会聚多个带电粒子对应于多个交叉的梁，并将已经穿过单个孔的多个带电粒子束突出到基板上。透镜阵列包括校正透镜阵列，该校正透镜阵列包括相对于孔径阵列的多个孔中的相应的一个孔偏心的会聚透镜，使得根据投影系统的像差会聚的多个带电粒子束会聚到单个孔径。透镜阵列包括放大透镜阵列，其被配置为形成多个分频器，以放大由校正透镜阵列形成的多个交越。

6. 发明授权

US08269188B2 Charged particle beam apparatus and sample processing method 有权
公开(公告)号：US08269188B2
公开(公告)日：2012-09-18
申请号：US13135300
申请日：2011-06-30
申请人： Takashi Ogawa
发明人： Takashi Ogawa
IPC分类号： H01J3/14 , H01J37/28 , H01J37/30
CPC分类号： H01J37/12 , H01J37/3056 , H01J2237/04924 , H01J2237/1202 , H01J2237/30472 , H01J2237/31745 , H01J2237/31749
摘要： A charged particle beam apparatus includes an ion beam column having an ion source for generating an ion beam, a first objective lens electrode which forms a first objective lens for focusing the ion beam on a sample, and a second objective lens electrode which is disposed at a position closer to the sample than the first objective lens electrode and forms a second objective lens for focusing an ion beam accelerated with a lower acceleration voltage on the sample.

7. 发明申请

US20120211677A1 MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM 有权
标题翻译：多束光束粒子光学系统
公开(公告)号：US20120211677A1
公开(公告)日：2012-08-23
申请号：US13461594
申请日：2012-05-01
申请人： Pieter Kruit , Yanxia Zhang , Matijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
发明人： Pieter Kruit , Yanxia Zhang , Matijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
IPC分类号： G21K5/10
CPC分类号： H01J37/12 , H01J37/153 , H01J2237/04924 , H01J2237/1205 , H01J2237/121 , H01J2237/317
摘要： The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.
摘要翻译：本发明涉及一种多束带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。该系统可以包括发散的带电粒子束部分，其中包括透镜结构。透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。在进一步的阐述中，透镜与限流孔结合，相对于所述结构的透镜对准，所述透镜中由所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

8. 发明授权

US08158939B2 High resolution gas field ion column 有权
标题翻译：高分辨率气田离子柱
公开(公告)号：US08158939B2
公开(公告)日：2012-04-17
申请号：US12691932
申请日：2010-01-22
申请人： Juergen Frosien , Dieter Winkler
发明人： Juergen Frosien , Dieter Winkler
IPC分类号： H01J37/05 , H01J37/28 , H01J37/285
CPC分类号： H01J37/05 , H01J37/12 , H01J37/153 , H01J37/28 , H01J37/285 , H01J2237/04756 , H01J2237/04924 , H01J2237/053 , H01J2237/057 , H01J2237/0805 , H01J2237/0807 , H01J2237/1534 , H01J2237/28
摘要： An ion beam apparatus and a method for providing an energy-filtered primary ion beam are described. Therein, a primary ion beam having an asymmetric first energy distribution is generated by means of an ion source. The primary ion beam is energy filtered using, for example, a retarding lens.
摘要翻译：描述了用于提供能量过滤的一次离子束的离子束装置和方法。其中，通过离子源产生具有不对称的第一能量分布的一次离子束。使用例如延迟透镜对初级离子束进行能量过滤。

9. 发明申请

US20110297841A1 Generalized Focusing And Deflection Utilizing Deformed Conducting Electrodes 审中-公开
标题翻译：使用变形导电电极的通用聚焦和偏转
公开(公告)号：US20110297841A1
公开(公告)日：2011-12-08
申请号：US13152216
申请日：2011-06-02
申请人： George J. Caporaso , Yu-Jiuan Chen , Steven A. Hawkins
发明人： George J. Caporaso , Yu-Jiuan Chen , Steven A. Hawkins
IPC分类号： H01J1/50
CPC分类号： H01J37/1472 , H01J37/04 , H01J2237/04924 , H01J2237/1516
摘要： A charged particle focusing and deflection apparatus and system utilizing one or more (i.e. stacked) ring-shaped electrodes which are contorted or deformed to shape a multipole electric field and thereby effect multipole electric focusing and deflection. In particular the ring-shaped electrodes may be used in a high gradient insulator of a particle accelerator, such as a dielectric wall accelerator (DWA).
摘要翻译：一种带电粒子聚焦和偏转装置和系统，利用一个或多个（即堆叠的）环形电极，其被扭曲或变形以形成多极电场，从而实现多极电聚焦和偏转。特别地，环状电极可以用于粒子加速器的高梯度绝缘体，例如电介质壁加速器（DWA）。

10. 发明申请

US20090256075A1 Charged Particle Inspection Method and Charged Particle System 审中-公开
标题翻译：带电粒子检测方法和带电粒子系统
公开(公告)号：US20090256075A1
公开(公告)日：2009-10-15
申请号：US11991547
申请日：2006-09-06
申请人： Thomas Kemen , Rainer Knippelmeyer , Stefan Schubert
发明人： Thomas Kemen , Rainer Knippelmeyer , Stefan Schubert
IPC分类号： G01N23/00 , G01K1/08
CPC分类号： H01J37/04 , H01J37/045 , H01J37/09 , H01J37/145 , H01J37/147 , H01J37/244 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/04922 , H01J2237/04924 , H01J2237/04926 , H01J2237/15 , H01J2237/2446 , H01J2237/2448 , H01J2237/2561 , H01J2237/2817 , H01J2237/31774
摘要： The present invention relates to a charged particle system comprising: a charged particle source; a first multi aperture plate; a second multi aperture plate disposed downstream of the first multi aperture plate, the second multi aperture plate; a controller configured to selectively apply at least first and second voltage differences between the first and second multi aperture plates; wherein the charged particle source and the first and second multi aperture plates are arranged such that each of a plurality of charged particle beamlets traverses an aperture pair, said aperture pair comprising one aperture of the first multi aperture plate and one aperture of the second multi aperture plate, wherein plural aperture pairs are arranged such that a center of the aperture of the first multi aperture plate is, when seen in a direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced relative to a center of the aperture of the second multi aperture plate. The invention further pertains to a a particle-optical component configured to change a divergence of a set of charged particle beamlets and a charged particle inspection method comprising inspection of an object using different numbers of charged particle beamlets.
摘要翻译：带电粒子系统本发明涉及一种带电粒子系统，包括：带电粒子源; 第一个多孔板; 设置在所述第一多孔板的下游的第二多孔板，所述第二多孔板; 控制器，被配置为选择性地施加所述第一和第二多孔板之间的至少第一和第二电压差; 其中所述带电粒子源和所述第一和第二多孔径孔布置成使得多个带电粒子子束中的每一个穿过孔径对，所述孔径对包括所述第一多孔板的一个孔和所述第二多孔的一个孔板，其中多个孔径对布置成使得当穿过穿过第一多孔板的孔的带电粒子束的入射方向从第一多孔板的孔的中心相对于中心位移时，第一多孔板的孔的中心的第二多孔板的孔径。本发明还涉及一种构造成改变一组带电粒子子束的发散度的粒子光学部件，以及包括使用不同数目的带电粒子子束对物体进行检查的带电粒子检查方法。

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