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1. 发明授权

US11424100B2 Charged particle beam irradiation apparatus and control method 有权
公开(公告)号：US11424100B2
公开(公告)日：2022-08-23
申请号：US17027312
申请日：2020-09-21
申请人： HITACHI HIGH-TECH SCIENCE CORPORATION
发明人： Takuma Aso , Xin Man , Makoto Sato , Tatsuya Asahata
IPC分类号： H01J37/26 , H01J37/28 , H01J37/244 , G01N23/2251 , G01N23/2206 , G01N23/2258
摘要： The charged particle beam irradiation apparatus includes: a focused ion beam column; an electron beam column; an electron detector; an image forming unit configured to form an observation image based on a signal output from the electron detector; and a control unit configured to repeatedly perform exposure control in which the focused ion beam column is controlled to expose a cross section of a multilayered sample toward a stacking direction with the focused ion beam, the control unit being configured to perform, every time exposure of an observation target layer at a cross section of the multilayered sample is detected in a process of repeatedly performing the exposure control, observation control in which the electron beam column is controlled to radiate the electron beam, and the image forming unit is controlled to form an observation image of the cross section of the multilayered sample.

2. 发明授权

US08637819B2 Cross-section processing and observation apparatus 有权
标题翻译：横截面加工和观察装置
公开(公告)号：US08637819B2
公开(公告)日：2014-01-28
申请号：US13842404
申请日：2013-03-15
申请人： Hitachi High-Tech Science Corporation
发明人： Makoto Sato , Tatsuya Asahata , Hidekazu Suzuki
IPC分类号： H01J3/12 , H01J37/30 , H01J37/31
CPC分类号： H01J37/261 , H01J37/304 , H01J37/3056 , H01J2237/221 , H01J2237/30466
摘要： Provided is a cross-section processing and observation apparatus, including a control portion for repeatedly executing a process including slice processing by an ion beam and acquisition of a SIM image by a secondary electron emitted from a cross-section formed by the slice processing, in which the control portion divides an observation image into a plurality of areas, and finishes the process when a change has occurred between an image in one area of the plurality of areas and an image in an area, which corresponds to the one area, of an observation image of another cross-section acquired by the process.
摘要翻译：本发明提供一种横截面处理和观察装置，包括用于重复执行包括通过离子束进行切片处理的处理的控制部分和通过由切片处理形成的横截面发射的二次电子获取SIM图像的控制部分，所述控制部将观察图像分割为多个区域，并且当在所述多个区域的一个区域中的图像与对应于所述一个区域的区域中的图像之间发生变化时，完成所述处理通过该过程获得的另一横截面的观察图像。

3. 发明申请

US20210341362A1 AUTOMATIC SAMPLE PREPARATION APPARATUS 有权
公开(公告)号：US20210341362A1
公开(公告)日：2021-11-04
申请号：US17373932
申请日：2021-07-13
申请人： Hitachi High-Tech Science Corporation
发明人： Atsushi Uemoto , Tatsuya Asahata , Makoto Sato , Yo Yamamoto
IPC分类号： G01N1/44 , H01J37/317 , H01J37/31 , G01N1/28
摘要： An automatic sample preparation apparatus that automatically prepares a sample piece from a sample and includes a focused ion beam irradiation optical system, an electron beam irradiation optical system configured to irradiate an electron beam from a direction different from a direction of the focused ion beam, a sample piece transfer device configured to hold and transfer the sample piece separated and extracted from the sample, a detector configured to detect secondary charged particles emitted from an irradiation object, and a computer configured to recognize a position of the sample piece transfer device by image-recognition using an image data of the focused ion beam and the electron beam generated by irradiating the sample piece transfer device with the focused ion beam and the electron beam, and drive the sample piece transfer device, wherein the image data includes a reference mark.

4. 发明申请

US20200278281A1 AUTOMATIC SAMPLE PREPARATION APPARATUS 审中-公开
公开(公告)号：US20200278281A1
公开(公告)日：2020-09-03
申请号：US16877621
申请日：2020-05-19
申请人： Hitachi High-Tech Science Corporation
发明人： Atsushi Uemoto , Tatsuya Asahata , Makoto Sato , Yo Yamamoto
IPC分类号： G01N1/44 , G01N1/28 , H01J37/31 , H01J37/317
摘要： A charged particle beam device (10a) includes a computer (21) which controls multiple charged particle beam irradiation optical systems, the needle (18), and a gas supply portion (17) to transfer a sample piece Q to a predetermined position of the sample piece holder P, based on at least images of a sample piece holder (P), a needle (18), and the sample piece (Q) previously acquired by multiple charged particle beams.

5. 发明授权

US10692688B2 Charged particle beam apparatus 有权
公开(公告)号：US10692688B2
公开(公告)日：2020-06-23
申请号：US15871767
申请日：2018-01-15
申请人： HITACHI HIGH-TECH SCIENCE CORPORATION
发明人： Satoshi Tomimatsu , Makoto Sato , Masato Suzuki
IPC分类号： H01J37/20 , G01N1/28
摘要： A charged particle beam apparatus automatically prepares a sample piece from a sample. The apparatus includes a charged particle beam irradiation optical system that emits a charged particle beam. A sample stage with a sample placed thereon is movable relative to the charged particle beam irradiation optical system. A sample piece transferring device holds and transports a sample piece separated and extracted from the sample, and a holder fixing base holds a sample piece holder to which the sample piece is to be transferred. An electrical conduction sensor detects electrical conduction between the sample piece transferring device and an object, and a computer sets a time management mode when electrical conduction between the sample piece transferring device and the sample piece is not detected when the sample piece transferring device and the sample piece are connected to each other.

6. 发明申请

US20170122852A1 AUTOMATIC SAMPLE PREPARATION APPARATUS 审中-公开
公开(公告)号：US20170122852A1
公开(公告)日：2017-05-04
申请号：US15317030
申请日：2015-06-29
申请人： Hitachi High-Tech Science Corporation
发明人： Atsushi Uemoto , Tatsuya Asahata , Makoto Sato , Yo Yamamoto
IPC分类号： G01N1/44 , H01J37/31 , H01J37/317
CPC分类号： G01N1/44 , G01N1/28 , H01J37/31 , H01J37/317
摘要： A charged particle beam device (10a) includes a computer (21) which controls multiple charged particle beam irradiation optical systems, the needle (18), and a gas supply portion (17) to transfer a sample piece Q to a predetermined position of the sample piece holder P, based on at least images of a sample piece holder (P), a needle (18), and the sample piece (Q) previously acquired by multiple charged particle beams.

7. 发明授权

US09455119B2 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US09455119B2
公开(公告)日：2016-09-27
申请号：US14665391
申请日：2015-03-23
申请人： HITACHI HIGH-TECH SCIENCE CORPORATION
发明人： Makoto Sato , Tatsuya Asahata , Masahiro Kiyohara , Ikuko Nakatani
IPC分类号： H01J37/26 , G21K5/04 , H01J37/28
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/30438
摘要： A charged particle beam apparatus is provided with a controller configured to control other components and perform operations including: an irradiating operation to irradiate a first position of a sample with a charged particle beam while gradually changing a scan range of the charged particle beam to move from a first position; a first image acquiring operation to acquire an image of each portion where the charged particle beam moves; an indicator forming operation to form an indicator at a second position by the charged particle beam when the scan range of the charged particle beam reaches the second position; a second image acquiring operation to acquire an image of the second position in a state where the indicator is formed; and an adjusting operation to adjust relative position between the stage and the scan range of the charged particle beam.
摘要翻译：带电粒子束装置设置有控制器，其被配置为控制其他部件并执行操作，包括：照射操作，用于在逐渐改变带电粒子束的扫描范围以从第一职位第一图像获取操作，用于获取所述带电粒子束移动的每个部分的图像; 指示器形成操作，当带电粒子束的扫描范围达到第二位置时，通过带电粒子束在第二位置形成指示器; 第二图像获取操作，用于在形成指示器的状态下获取第二位置的图像; 以及调整操作，以调整带电粒子束的阶段和扫描范围之间的相对位置。

8. 发明授权

US09310325B2 Focused ion beam apparatus and method of working sample using the same 有权
标题翻译：聚焦离子束装置及其使用方法
公开(公告)号：US09310325B2
公开(公告)日：2016-04-12
申请号：US14221611
申请日：2014-03-21
申请人： HITACHI HIGH-TECH SCIENCE CORPORATION
发明人： Ikuko Nakatani , Makoto Sato
IPC分类号： G01N23/225 , H01J37/304 , H01J37/305 , G01N1/32
CPC分类号： G01N23/2258 , G01N1/32 , G01N23/2251 , H01J37/3045 , H01J37/3056 , H01J2237/31745
摘要： A focused ion beam apparatus includes an image generation unit that generates a sample image including location detection marks formed on a sample based on secondary charged particles generated from the sample by emission of a focused ion beam to the sample, and a display that which displays a sample image. A control unit which, in a case of performing working by emitting the focused ion beam to a working region of the sample that is beyond a display range, moves a sample stage, detects locations of the location detection marks included in the sample image after the movement of the sample stage as reference marks from the location detection marks included in the sample image before moving the sample stage, and controls an emission location of the focused ion beam based on the reference marks detected in the sample image after movement of the sample stage to correct a working location shift due to movement of the sample stage.
摘要翻译：聚焦离子束装置包括图像生成单元，该图像生成单元基于通过将聚焦离子束发射到样本而从样品产生的二次带电粒子，生成包含在样本上形成的位置检测标记的样本图像，以及显示器，样品图像。一种控制单元，在通过将聚焦离子束发射到超过显示范围的样品的工作区域进行工作的情况下，移动样品台，检测样品图像中包含的位置检测标记的位置，在移动样品台之前，将来自样品图像中包括的位置检测标记的样品台的运动作为参考标记，并且基于在样品台的运动之后在样品图像中检测到的参考标记来控制聚焦离子束的发射位置以校正由于样品台的移动引起的工作位置偏移。

9. 发明授权

US11114276B2 Apparatus, method, and program for processing and observing cross section, and method of measuring shape 有权
公开(公告)号：US11114276B2
公开(公告)日：2021-09-07
申请号：US16294543
申请日：2019-03-06
申请人： HITACHI HIGH-TECH SCIENCE CORPORATION
发明人： Xin Man , Tatsuya Asahata , Makoto Sato
IPC分类号： H01J37/304 , H01J37/244 , H01J37/28 , H01J37/305 , H01J37/22
摘要： An apparatus for processing and observing a cross-section includes: a sample bed holding a sample; a focused ion beam column radiating a focused ion beam to the sample; an electron beam column radiating an electron beam to the sample, perpendicularly to the focused ion beam; an electron detector detecting secondary electrons or reflection electrons generated from the sample; a irradiation position controller controlling irradiation positions of the focused ion beam and the electron beam based on target irradiation position information showing target irradiation positions of beams on the sample; a process controller controlling a cross-section-exposing process that exposes a cross-section of the sample by radiating the focused ion beam to the sample and a cross-section image-obtaining process that obtains a cross-section image of the cross-section by radiating the electron beam to the cross-section; and an image quality corrector correcting image quality of the cross-section image obtained.

10. 发明授权

US11073453B2 Automatic sample preparation apparatus and automatic sample preparation method 有权
公开(公告)号：US11073453B2
公开(公告)日：2021-07-27
申请号：US16935575
申请日：2020-07-22
申请人： Hitachi High-Tech Science Corporation
发明人： Atsushi Uemoto , Tatsuya Asahata , Makoto Sato , Yo Yamamoto
IPC分类号： G01N1/44 , H01J37/31 , G01N1/28 , H01J37/317
摘要： An automatic sample preparation apparatus that automatically prepares a sample piece from a sample includes: a focused ion beam irradiation optical system configured to irradiate a focused ion beam; an electron beam irradiation optical system configured to irradiate an electron beam from a direction different from a direction of the focused ion beam; a sample piece transfer device configured to hold and transfer the sample piece separated and extracted from the sample; a detector configured to detect secondary charged particles emitted from an irradiation object by irradiating the irradiation object with the focused ion beam and/or the electron beam; and a computer configured to recognize a position of the sample piece transfer device by image-recognition using an image data of the focused ion beam and the electron beam generated by irradiating the sample piece transfer device with the focused ion beam and the electron beam, and drive the transfer device.

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