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1. 发明授权

US08497995B2 Measurement apparatus and method for measuring surface shape and roughness 有权
标题翻译：用于测量表面形状和粗糙度的测量装置和方法
公开(公告)号：US08497995B2
公开(公告)日：2013-07-30
申请号：US12669825
申请日：2008-08-14
申请人： Kazuyuki Ota , Hiroshi Yoshikawa , Yusuke Mitarai , Masafumi Takimoto , Kazunori Okudomi , Hiroyuki Shinbata , Kenji Saitoh , Masakazu Matsugu
发明人： Kazuyuki Ota , Hiroshi Yoshikawa , Yusuke Mitarai , Masafumi Takimoto , Kazunori Okudomi , Hiroyuki Shinbata , Kenji Saitoh , Masakazu Matsugu
IPC分类号： G01B11/24
CPC分类号： G01B11/24 , G01B11/30
摘要： A measurement apparatus includes an illumination light setting unit which sets illumination light having an optical characteristic corresponding to a microstructure which is formed on the surface of a measurement target and is to be measured, and a measurement unit which measures reflected light when the measurement target is irradiated with the illumination light. In addition, an extraction unit extracts, from the measured reflected light, information about the surface shape of the measurement target and the microstructure formed on the surface.
摘要翻译：测量装置包括照明光设定单元，其设置具有对应于形成在测量对象物的表面上并要被测量的微结构的光学特性的照明光，以及测量单元，其在测量对象为用照明光照射。此外，提取单元从测量的反射光中提取关于测量目标的表面形状和形成在表面上的微结构的信息。

2. 发明授权

US08456621B2 Measurement system and measurement processing method 有权
标题翻译：测量系统和测量处理方法
公开(公告)号：US08456621B2
公开(公告)日：2013-06-04
申请号：US13595013
申请日：2012-08-27
申请人： Kazuyuki Ota , Masakazu Matsugu , Kenji Saitoh
发明人： Kazuyuki Ota , Masakazu Matsugu , Kenji Saitoh
IPC分类号： G01N21/00
CPC分类号： G01B11/25
摘要： This invention is directed to extract the scattering characteristic of a measurement target together when measuring the surface shape in a measurement system, which measures the surface shape of a measurement target, by the pattern projection method. To accomplish this, the measurement system includes an illumination unit which irradiates a measurement target with dot pattern light, a reflected light measurement unit which receives the reflected light at a reflection angle almost equal to a incident angle, and a reflected light extraction unit which extracts the inclination of the surface of the measurement target, based on the shift amount between the light receiving position of the received reflected light and a predetermined reference position, and extracts the luminance value of the reflected light and the dot diameter of the dot pattern light as information about the scattering characteristic.
摘要翻译：本发明旨在通过图案投影法在测量测量对象的表面形状的测量系统中测量表面形状时，将测量对象的散射特性一起提取。为了实现这一点，测量系统包括用点阵图形光照射测量对象的照明单元，以几乎等于入射角的反射角接收反射光的反射光测量单元和提取出的反射光提取单元基于接收到的反射光的光接收位置与预定的基准位置之间的偏移量，测量对象的表面的倾斜度，并将点阵图案光的反射光的亮度值和点直径提取为关于散射特性的信息。

3. 发明授权

US08274646B2 Measurement system and measurement processing method 有权
标题翻译：测量系统和测量处理方法
公开(公告)号：US08274646B2
公开(公告)日：2012-09-25
申请号：US12816069
申请日：2010-06-15
申请人： Kazuyuki Ota , Masakazu Matsugu , Kenji Saitoh
发明人： Kazuyuki Ota , Masakazu Matsugu , Kenji Saitoh
IPC分类号： G01N21/00
CPC分类号： G01B11/25
摘要： This invention is directed to extract the scattering characteristic of a measurement target together when measuring the surface shape in a measurement system, which measures the surface shape of a measurement target, by the pattern projection method. To accomplish this, the measurement system includes an illumination unit which irradiates a measurement target with dot pattern light, a reflected light measurement unit which receives the reflected light at a reflection angle almost equal to a incident angle, and a reflected light extraction unit which extracts the inclination of the surface of the measurement target, based on the shift amount between the light receiving position of the received reflected light and a predetermined reference position, and extracts the luminance value of the reflected light and the dot diameter of the dot pattern light as information about the scattering characteristic.
摘要翻译：本发明旨在通过图案投影法在测量测量对象的表面形状的测量系统中测量表面形状时，将测量对象的散射特性一起提取。为了实现这一点，测量系统包括用点阵图形光照射测量对象的照明单元，以几乎等于入射角的反射角接收反射光的反射光测量单元和提取出的反射光提取单元基于接收到的反射光的光接收位置与预定的基准位置之间的偏移量，测量对象的表面的倾斜度，并将点阵图案光的反射光的亮度值和点直径提取为关于散射特性的信息。

4. 发明申请

US20120327400A1 MEASUREMENT SYSTEM AND MEASUREMENT PROCESSING METHOD 有权
标题翻译：测量系统和测量处理方法
公开(公告)号：US20120327400A1
公开(公告)日：2012-12-27
申请号：US13595013
申请日：2012-08-27
申请人： Kazuyuki Ota , Masakazu Matsugu , Kenji Saitoh
发明人： Kazuyuki Ota , Masakazu Matsugu , Kenji Saitoh
IPC分类号： G01B11/25 , G01N21/47
CPC分类号： G01B11/25
摘要： This invention is directed to extract the scattering characteristic of a measurement target together when measuring the surface shape in a measurement system, which measures the surface shape of a measurement target, by the pattern projection method. To accomplish this, the measurement system includes an illumination unit which irradiates a measurement target with dot pattern light, a reflected light measurement unit which receives the reflected light at a reflection angle almost equal to a incident angle, and a reflected light extraction unit which extracts the inclination of the surface of the measurement target, based on the shift amount between the light receiving position of the received reflected light and a predetermined reference position, and extracts the luminance value of the reflected light and the dot diameter of the dot pattern light as information about the scattering characteristic.
摘要翻译：本发明旨在通过图案投影法在测量测量对象的表面形状的测量系统中测量表面形状时，将测量对象的散射特性一起提取。为了实现这一点，测量系统包括用点阵图形光照射测量对象的照明单元，以几乎等于入射角的反射角接收反射光的反射光测量单元和提取出的反射光提取单元基于接收到的反射光的光接收位置与预定的基准位置之间的偏移量，测量对象的表面的倾斜度，并将点阵图案光的反射光的亮度值和点直径提取为关于散射特性的信息。

5. 发明申请

US20100328649A1 MEASUREMENT SYSTEM AND MEASUREMENT PROCESSING METHOD 有权
标题翻译：测量系统和测量处理方法
公开(公告)号：US20100328649A1
公开(公告)日：2010-12-30
申请号：US12816069
申请日：2010-06-15
申请人： Kazuyuki Ota , Masakazu Matsugu , Kenji Saitoh
发明人： Kazuyuki Ota , Masakazu Matsugu , Kenji Saitoh
IPC分类号： G01B11/24 , G01B11/30
CPC分类号： G01B11/25
摘要： This invention is directed to extract the scattering characteristic of a measurement target together when measuring the surface shape in a measurement system, which measures the surface shape of a measurement target, by the pattern projection method. To accomplish this, the measurement system includes an illumination unit which irradiates a measurement target with dot pattern light, a reflected light measurement unit which receives the reflected light at a reflection angle almost equal to a incident angle, and a reflected light extraction unit which extracts the inclination of the surface of the measurement target, based on the shift amount between the light receiving position of the received reflected light and a predetermined reference position, and extracts the luminance value of the reflected light and the dot diameter of the dot pattern light as information about the scattering characteristic.
摘要翻译：本发明旨在通过图案投影法在测量测量对象的表面形状的测量系统中测量表面形状时，将测量对象的散射特性一起提取。为了实现这一点，测量系统包括用点阵图形光照射测量对象的照明单元，以几乎等于入射角的反射角接收反射光的反射光测量单元和提取出的反射光提取单元基于接收到的反射光的光接收位置与预定的基准位置之间的偏移量，测量对象的表面的倾斜度，并将点阵图案光的反射光的亮度值和点直径提取为关于散射特性的信息。

6. 发明申请

US20100220338A1 MEASUREMENT APPARATUS AND METHOD FOR MEASURING SURFACE SHAPE AND ROUGHNESS 有权
标题翻译：测量装置和测量表面形状和粗糙度的方法
公开(公告)号：US20100220338A1
公开(公告)日：2010-09-02
申请号：US12669825
申请日：2008-08-14
申请人： Kazuyuki Ota , Hiroshi Yoshikawa , Yusuke Mitarai , Masafumi Takimoto , Kazunori Okudomi , Hiroyuki Shinbata , Kenji Saitoh , Masakazu Matsugu
发明人： Kazuyuki Ota , Hiroshi Yoshikawa , Yusuke Mitarai , Masafumi Takimoto , Kazunori Okudomi , Hiroyuki Shinbata , Kenji Saitoh , Masakazu Matsugu
IPC分类号： G01B11/24
CPC分类号： G01B11/24 , G01B11/30
摘要： A measurement apparatus includes an illumination light setting unit which sets illumination light having an optical characteristic corresponding to a microstructure which is formed on the surface of a measurement target and is to be measured, a measurement unit which measures reflected light when the measurement target is irradiated with the illumination light, and an extraction unit which extracts, from the measured reflected light, information about the surface shape of the measurement target and the microstructure formed on the surface.
摘要翻译：测量装置包括照明光设定单元，其设置具有对应于形成在测量对象物的表面上并要被测量的微结构的光学特性的照明光，测量单元，其在测量对象被照射时测量反射光以及从测量的反射光中提取关于测量对象的表面形状和形成在表面上的微结构的信息的提取单元。

7. 发明授权

US08437003B2 Information processing apparatus and method 有权
标题翻译：信息处理装置和方法
公开(公告)号：US08437003B2
公开(公告)日：2013-05-07
申请号：US12812008
申请日：2009-01-28
申请人： Hiroshi Yoshikawa , Yusuke Mitarai , Masafumi Takimoto , Kazuyuki Ota , Kenji Saitoh , Masakazu Matsugu
发明人： Hiroshi Yoshikawa , Yusuke Mitarai , Masafumi Takimoto , Kazuyuki Ota , Kenji Saitoh , Masakazu Matsugu
IPC分类号： G01N21/55
CPC分类号： G01N21/57 , G01N21/4738 , G01N2021/4735
摘要： An information processing apparatus includes an obtaining unit configured to obtain first information regarding a distribution of reflected light from a target to be measured and second information regarding geometrical-optics components of the reflected light, a calculating unit configured to calculate third information on the basis of the first information and the second information, the third information indicating an approximation of the distribution of reflected light, and an output unit configured to output information regarding wave-optics components of the reflected light on the basis of the third information.
摘要翻译：一种信息处理设备，包括：获取单元，被配置为获得关于来自待测目标的反射光的分布的第一信息和关于反射光的几何光学分量的第二信息;计算单元，被配置为基于所述第一信息和所述第二信息，所述第三信息指示反射光的分布的近似值;以及输出单元，被配置为基于所述第三信息输出关于所述反射光的波长成分的信息。

8. 发明申请

US20110037984A1 INFORMATION PROCESSING APPARATUS AND METHOD 有权
标题翻译：信息处理装置和方法
公开(公告)号：US20110037984A1
公开(公告)日：2011-02-17
申请号：US12812008
申请日：2009-01-28
申请人： Hiroshi Yoshikawa , Yusuke Mitarai , Masafumi Takimoto , Kazuyuki Ota , Kenji Saitoh , Masakazu Matsugu
发明人： Hiroshi Yoshikawa , Yusuke Mitarai , Masafumi Takimoto , Kazuyuki Ota , Kenji Saitoh , Masakazu Matsugu
IPC分类号： G01N21/55
CPC分类号： G01N21/57 , G01N21/4738 , G01N2021/4735
摘要： An information processing apparatus includes an obtaining unit configured to obtain first information regarding a distribution of reflected light from a target to be measured and second information regarding geometrical-optics components of the reflected light, a calculating unit configured to calculate third information on the basis of the first information and the second information, the third information indicating an approximation of the distribution of reflected light, and an output unit configured to output information regarding wave-optics components of the reflected light on the basis of the third information.
摘要翻译：一种信息处理设备，包括：获取单元，被配置为获得关于来自待测目标的反射光的分布的第一信息和关于反射光的几何光学分量的第二信息;计算单元，被配置为基于所述第一信息和所述第二信息，所述第三信息指示反射光的分布的近似值;以及输出单元，被配置为基于所述第三信息输出关于所述反射光的波长成分的信息。

9. 发明授权

US5325176A Position detecting method and apparatus including Fraunhofer diffraction detector 失效
$Position detecting method and apparatus including Fraunhofer diffraction detector$
标题翻译：位置检测方法和装置，包括弗劳恩霍夫衍射检测器
公开(公告)号：US5325176A
公开(公告)日：1994-06-28
申请号：US875601
申请日：1992-04-28
申请人： Shigeyuki Suda , Kenji Saitoh , Masakazu Matsugu , Naoto Abe , Minoru Yoshii , Ryo Kuroda
发明人： Shigeyuki Suda , Kenji Saitoh , Masakazu Matsugu , Naoto Abe , Minoru Yoshii , Ryo Kuroda
IPC分类号： G03F9/00 , G01B11/02
CPC分类号： G03F9/7076
摘要： A device usable with a first object and a second object at least one of which is provided with a diffraction grating, for detecting the position of the second object relative to the first object, is disclosed. The device includes a light source for projecting a position detecting beam upon the first object; a beam detecting portion for receiving the position detecting beam after it is directed from the first object and being incident on the second object, the beam detecting portion receiving the position detecting beam to detect the position of the second object relative to the first object; wherein at least one diffraction grating is disposed in the path of the position detecting beam to be received by the beam detecting portion, which diffraction grating is effective to diffract the position detecting beam at least twice and wherein the beam detecting portion is disposed at a site effective not to receive unwanted diffraction light produced from the or at least one diffraction grating.
摘要翻译：公开了一种可用于第一物体和第二物体的装置，其中至少一个具有用于检测第二物体相对于第一物体的位置的衍射光栅。该装置包括用于将位置检测光束投射到第一物体上的光源; 光束检测部分，用于在从第一物体引导之后接收位置检测光束并入射到第二物体上，光束检测部分接收位置检测光束以检测第二物体相对于第一物体的位置; 其中至少一个衍射光栅设置在所述位置检测光束的路径中，以由所述光束检测部分接收，所述衍射光栅有效地将所述位置检测光束衍射至少两次，并且其中所述光束检测部分设置在位置有效地不接收由该至少一个衍射光栅产生的不想要的衍射光。

10. 发明授权

US5235408A Position detecting method and apparatus 失效
标题翻译：位置检测方法和装置
公开(公告)号：US5235408A
公开(公告)日：1993-08-10
申请号：US888434
申请日：1992-05-28
申请人： Masakazu Matsugu , Kenji Saitoh , Shigeyuki Suda
发明人： Masakazu Matsugu , Kenji Saitoh , Shigeyuki Suda
IPC分类号： G03F9/00
CPC分类号： G03F9/7049
摘要： A device for detecting a positional relationship between a mask and a wafer, includes a light source for projecting light toward the mask, a first photodetecting system for detecting the position, on a predetermined plane, of first light deflected by the mask and the wafer, wherein the position of incidence on the first photodetecting system of the first light is changeable with the positional relationship between the mask and the wafer, a second photodetecting system for detecting the position, on a predetermined plane, of incidence of second light deflected by the mask, wherein the position of incidence on the second photodetecting system, of the second light being changeable with relative inclination between the mask and the light source, and a position detecting system for detecting the relative position of the mask and the wafer on the basis of the detection by the first and second photodetecting systems, wherein the detection by the position detecting system can be free from the relative inclination between the mask and the light source.
摘要翻译：一种用于检测掩模和晶片之间的位置关系的装置，包括用于将光投射到掩模的光源，用于检测由掩模和晶片偏转的第一光在预定平面上的位置的第一光电检测系统，其中，所述第一光的第一受光系统上的入射位置可根据所述掩模和所述晶片之间的位置关系而改变;第二光电检测系统，用于检测由所述掩模偏转的第二光在预定平面上的位置的位置; 其特征在于，所述第二光检测系统中的所述入射位置，所述第二光的入射位置可以通过所述掩模和所述光源之间的相对倾斜度而变化;以及位置检测系统，用于基于所述掩模和所述光源检测所述掩模和所述晶片的相对位置由第一和第二光电检测系统进行检测，其中位置检测系统的检测可以不受面罩与光源之间的相对倾斜度。

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