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1. 发明申请

US20190064677A1 METROLOGY METHOD, TARGET AND SUBSTRATE 审中-公开
公开(公告)号：US20190064677A1
公开(公告)日：2019-02-28
申请号：US16174398
申请日：2018-10-30
申请人： ASML NETHERLANDS B.V.
发明人： Martin Jacobus Johan Jak , Arie Jeffrey den Boef , Martin Ebert
IPC分类号： G03F7/20 , G03F9/00 , G01B11/26 , G02B27/42 , G02B5/18 , G01N21/95 , G01N21/47 , G01N21/21
CPC分类号： G03F7/70191 , G01B11/26 , G01N21/21 , G01N21/4788 , G01N21/9501 , G02B5/1819 , G02B5/1823 , G02B27/4255 , G02B27/4272 , G03F7/70616 , G03F7/70633 , G03F7/70683 , G03F7/7085 , G03F9/7049 , G03F9/7076
摘要： A method, involving illuminating at least a first periodic structure of a metrology target with a first radiation beam having a first polarization, illuminating at least a second periodic structure of the metrology target with a second radiation beam having a second different polarization, combining radiation diffracted from the first periodic structure with radiation diffracted from the second periodic structure to cause interference, detecting the combined radiation using a detector, and determining a parameter of interest from the detected combined radiation.

2. 发明授权

US09989864B2 Lithographic method and apparatus 有权
公开(公告)号：US09989864B2
公开(公告)日：2018-06-05
申请号：US15325406
申请日：2015-06-11
申请人： ASML Netherlands B.V.
发明人： Johannes Jacobus Matheus Baselmans , Wilhelmus Petrus De Boeij
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70516 , G03F1/42 , G03F7/70191 , G03F7/70775 , G03F9/7019 , G03F9/7049 , G03F9/7088
摘要： A measurement method including using multiple radiation poles to illuminate a diffraction grating on a mask at a mask side of a projection system of a lithographic apparatus, coupling at least two different resulting diffraction orders per illumination pole through the projection system, using the projection system to project the diffraction orders onto a grating on a wafer such that a pair of combination diffraction orders is formed by diffraction of the diffraction orders, coupling the combination diffraction orders back through the projection system to detectors configured to measure the intensity of the combination diffraction orders, and using the measured intensity of the combination diffraction orders to measure the position of the wafer grating.

3. 发明授权

US09846374B2 Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method 有权
公开(公告)号：US09846374B2
公开(公告)日：2017-12-19
申请号：US15650439
申请日：2017-07-14
申请人： NIKON CORPORATION
发明人： Yuichi Shibazaki
IPC分类号： G01B11/00 , G01B11/22 , G03B27/32 , G03B27/58 , H02K41/02 , H02K41/03 , G03F7/20
CPC分类号： G03F7/70775 , G01B21/042 , G03F7/70341 , G03F7/70483 , G03F7/70716 , G03F7/70725 , G03F7/70975 , G03F9/70 , G03F9/7046 , G03F9/7049 , H01L21/68 , H01L21/681 , Y10T29/49002
摘要： A substrate is exposed with an illumination light via a projection optical system. A stage that holds the substrate moves below the projection optical system. A measurement system measures positional information of the stage with a plurality of heads that face a grating section. Movement of the stage is controlled based on the positional information measured with the measurement system, while compensating for a measurement error of the measurement system that occurs due to the heads.

4. 发明申请

US20170329236A1 POSITIONING SYSTEM USING SURFACE PATTERN RECOGNITION AND INTERPOLATION 审中-公开
公开(公告)号：US20170329236A1
公开(公告)日：2017-11-16
申请号：US15669661
申请日：2017-08-04
申请人： NIKON CORPORATION
发明人： Paul Derek Coon , Jonathan K. Wells , Matthew Rosa , Michael Binnard
IPC分类号： G03F7/20 , H02K41/03 , G01D5/347 , G03F9/00
CPC分类号： G03F7/70725 , G01D5/34715 , G03F7/70341 , G03F7/70716 , G03F7/70775 , G03F9/7026 , G03F9/7034 , G03F9/7049 , H02K41/031 , H02K2201/18
摘要： A stage assembly for positioning a device along a first axis, the stage assembly comprising: a base; a stage that retains the device and moves above the base; a mover assembly that moves the stage along the first axis relative to the base; a first sensor system that monitors the movement of the stage along the first axis, the first sensor system generating a first signal, the first sensor system having a first sensor accuracy; a second sensor system that monitors the movement of the stage along the first axis, the second sensor system having a second sensor accuracy that is different from the first sensor accuracy of the first sensor system, the second sensor generating a second signal; and a control system that controls the mover assembly using at least one of the first sensor and the second signal.

5. 发明申请

US20170315457A1 MOVABLE BODY DRIVE METHOD AND MOVABLE BODY DRIVE SYSTEM, PATTERN FORMATION METHOD AND APPARATUS, EXPOSURE METHOD AND APPARATUS, DEVICE MANUFACTURING METHOD, AND CALIBRATION METHOD 有权
公开(公告)号：US20170315457A1
公开(公告)日：2017-11-02
申请号：US15650439
申请日：2017-07-14
申请人： NIKON CORPORATION
发明人： Yuichi SHIBAZAKI
IPC分类号： G03F7/20
CPC分类号： G03F7/70775 , G01B21/042 , G03F7/70341 , G03F7/70483 , G03F7/70716 , G03F7/70725 , G03F7/70975 , G03F9/70 , G03F9/7046 , G03F9/7049 , H01L21/68 , H01L21/681 , Y10T29/49002
摘要： A substrate is exposed with an illumination light via a projection optical system. A stage that holds the substrate moves below the projection optical system. A measurement system measures positional information of the stage with a plurality of heads that face a grating section. Movement of the stage is controlled based on the positional information measured with the measurement system, while compensating for a measurement error of the measurement system that occurs due to the heads.

6. 发明授权

US09740114B2 Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method 有权
公开(公告)号：US09740114B2
公开(公告)日：2017-08-22
申请号：US15433269
申请日：2017-02-15
申请人： NIKON CORPORATION
发明人： Yuichi Shibazaki
IPC分类号： G01B11/00 , G01B11/22 , G03B27/32 , G03B27/58 , H02K41/02 , H02K41/03 , G03F7/20
CPC分类号： G03F7/70775 , G01B21/042 , G03F7/70341 , G03F7/70483 , G03F7/70716 , G03F7/70725 , G03F7/70975 , G03F9/70 , G03F9/7046 , G03F9/7049 , H01L21/68 , H01L21/681 , Y10T29/49002
摘要： A substrate is exposed with an illumination light via a projection optical system. A stage that holds the substrate moves below the projection optical system. A measurement system measures positional information of the stage with a plurality of heads that face a grating section. Movement of the stage is controlled based on the positional information measured with the measurement system, while compensating for a measurement error of the measurement system that occurs due to the heads.

7. 发明申请

US20170184977A1 METROLOGY METHOD, TARGET AND SUBSTRATE 审中-公开
公开(公告)号：US20170184977A1
公开(公告)日：2017-06-29
申请号：US15387431
申请日：2016-12-21
申请人： ASML NETHERLANDS B.V.
发明人： Martin Jacobus Johan JAK , Arie Jeffrey DEN BOEF , Martin EBERT
IPC分类号： G03F7/20 , G01N21/95 , G01B11/26
CPC分类号： G03F7/70191 , G01B11/26 , G01N21/21 , G01N21/4788 , G01N21/9501 , G02B5/1819 , G02B5/1823 , G02B27/4255 , G02B27/4272 , G03F7/70616 , G03F7/70633 , G03F7/70683 , G03F7/7085 , G03F9/7049 , G03F9/7076
摘要： A method, involving illuminating at least a first periodic structure of a metrology target with a first radiation beam having a first polarization, illuminating at least a second periodic structure of the metrology target with a second radiation beam having a second different polarization, combining radiation diffracted from the first periodic structure with radiation diffracted from the second periodic structure to cause interference, detecting the combined radiation using a detector, and determining a parameter of interest from the detected combined radiation.

8. 发明授权

US09625834B2 Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method 有权
公开(公告)号：US09625834B2
公开(公告)日：2017-04-18
申请号：US15216840
申请日：2016-07-22
申请人： NIKON CORPORATION
发明人： Yuichi Shibazaki
IPC分类号： G01B11/00 , G01B11/22 , G03B27/32 , G03B27/58 , H02K41/02 , H02K41/03 , G03F7/20 , H01L21/68 , G03F9/00 , G01B21/04
CPC分类号： G03F7/70775 , G01B21/042 , G03F7/70341 , G03F7/70483 , G03F7/70716 , G03F7/70725 , G03F7/70975 , G03F9/70 , G03F9/7046 , G03F9/7049 , H01L21/68 , H01L21/681 , Y10T29/49002
摘要： A substrate is exposed with an illumination light via a projection optical system. A stage that holds the substrate is moved over a base disposed below the projection optical system. An encoder system measures positional information of the stage with a plurality of heads that face a grating section. Movement of the stage is controlled based on the positional information measured with the encoder system, while compensating for a measurement error of the encoder system that occurs due to a head of the plurality of heads. During movement of the stage, one head of the plurality of heads is switched to another head different from the plurality of heads. Correction information for controlling movement of the stage using the another head after the switching is acquired based on the positional information measured with the plurality of heads used before the switching.

9. 发明申请

US20160252753A1 ALIGNMENT SYSTEM 有权
标题翻译：对齐系统
公开(公告)号：US20160252753A1
公开(公告)日：2016-09-01
申请号：US14387379
申请日：2013-11-19
申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
发明人： Chaoyang DENG , Zijin LIN , Haisheng ZHAO
IPC分类号： G02F1/13
CPC分类号： G02F1/1303 , G02F2001/133354 , G02F2001/133374 , G03F7/70358 , G03F7/70775 , G03F9/00 , G03F9/70 , G03F9/7049 , G03F9/7076 , G03F9/7088
摘要： An alignment system includes: a light emitting device located on one side of an object to be aligned for emitting light towards the object to be aligned; a light receiving device located on the other side of the object to be aligned and at a standard position corresponding to an alignment mark disposed on the object to be aligned, the light receiving device being provided with a plurality of light sensors for sensing light emitting from the light emitting device on an end surface facing the object to be aligned; a processor configured to receive sensing signals transmitted from each of the light sensors and determine whether the object to be aligned is aligned accurately according to whether each of the light sensors sense the light emitted from the light emitting device. This alignment system shortens the processing time and enhances the processing efficiency.
摘要翻译：对准系统包括：发光装置，位于待对准物体的一侧，用于朝向待对准的物体发射光; 光接收装置，其位于待对准的物体的另一侧，并且在与设置在待对准物体上的对准标记相对应的标准位置处，光接收装置设置有多个光传感器，用于感测从所述发光装置在面向要对准的物体的端面上; 处理器，被配置为接收从每个光传感器发射的感测信号，并且根据每个光传感器感测从发光器件发射的光，确定要对齐的物体是否准确对准。该对准系统缩短了处理时间，提高了处理效率。

10. 发明授权

US09207549B2 Exposure apparatus and exposure method, and device manufacturing method with encoder of higher reliability for position measurement 有权
标题翻译：曝光装置和曝光方法，以及具有较高可靠性的编码器的位置测量装置制造方法
公开(公告)号：US09207549B2
公开(公告)日：2015-12-08
申请号：US13727286
申请日：2012-12-26
申请人： NIKON CORPORATION
发明人： Yuichi Shibazaki
IPC分类号： G03F9/00 , G03F7/20
CPC分类号： G03F9/7049 , G03F7/20 , G03F7/70725 , G03F7/70775 , G03F7/709 , Y10T29/49764
摘要： An exposure apparatus is equipped with a table which holds a wafer and is movable along an XY plane and has a grating provided on its rear surface, an encoder which irradiates a first measurement beam on the grating from below, receives a return light, and measures a first position information of the table when the table moves in a predetermined range, and another encoder which has a head section provided in a frame and irradiates a second measurement beam on a different grating on the table from the head section, receives a return light, and can measure a second position information of the table, concurrently with measurement of the first position information by the encoder when the table moves in predetermined range. A controller drives the table, based on position information having a higher reliability of the first and the second position information.
摘要翻译：曝光装置具有保持晶片并且可沿着XY平面移动并具有设置在其后表面上的光栅的工作台，从下方向光栅照射第一测量光束的编码器，接收返回光并测量当桌子在预定范围内移动时的桌子的第一位置信息，以及另一编码器，其具有设置在框架中的头部部分，并将第二测量光束从头部部分在桌子上的不同光栅上照射回来光并且当表移动到预定范围内时，可以与编码器测量第一位置信息同时测量表的第二位置信息。控制器基于具有第一和第二位置信息的较高可靠性的位置信息来驱动该表。

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